JPS60167337U - Wafer rotation mechanism for deposition - Google Patents

Wafer rotation mechanism for deposition

Info

Publication number
JPS60167337U
JPS60167337U JP5607384U JP5607384U JPS60167337U JP S60167337 U JPS60167337 U JP S60167337U JP 5607384 U JP5607384 U JP 5607384U JP 5607384 U JP5607384 U JP 5607384U JP S60167337 U JPS60167337 U JP S60167337U
Authority
JP
Japan
Prior art keywords
vapor deposition
rotation mechanism
wafer rotation
supported
tip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5607384U
Other languages
Japanese (ja)
Inventor
弘光　茂治
Original Assignee
日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電気株式会社 filed Critical 日本電気株式会社
Priority to JP5607384U priority Critical patent/JPS60167337U/en
Publication of JPS60167337U publication Critical patent/JPS60167337U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来の蒸着用ウェハ回転機構の平面図。第２図
は第１図のＡ−Ａ断面図。第３図は本考案の蒸着用ウェ
ハ回転機構の平面図。第４図は第３図のＡ−Ａ断面拡大
図づである。 図において、４はウェハ、５は軌道輪、６は蒸着装置、
？、　８．９は軸、１０，１１．１２は金具、１３，１
４．１５は平歯車、１６．　１７．　１８は恒星板、１
９は軸、２０は遊星歯車、２１は端部、２２は惑星板、
２３はウェハ挾持金具である。FIG. 1 is a plan view of a conventional deposition wafer rotation mechanism. FIG. 2 is a sectional view taken along line AA in FIG. FIG. 3 is a plan view of the evaporation wafer rotation mechanism of the present invention. FIG. 4 is an enlarged cross-sectional view taken along the line AA in FIG. 3. In the figure, 4 is a wafer, 5 is a bearing ring, 6 is a vapor deposition device,
? , 8.9 is the shaft, 10, 11.12 is the metal fittings, 13, 1
4.15 is a spur gear, 16. 17. 18 is a star plate, 1
9 is a shaft, 20 is a planetary gear, 21 is an end, 22 is a planetary plate,
23 is a wafer holding fixture.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 蒸着装置内にある環状の軌道輪と、前記軌道輪の等分割
された位置に固定され伝導機構を備えた複数個の固定軸
と、前記固定軸のそれぞれの蒸着面側の先端に回転自在
に支持され外周縁が蒸着装置内の円形溝に接触している
恒星板と、前記恒星板それぞれの等分割された位置に回
転自在に支持され、一方の端が前記軸のそれぞれに備え
られた伝導機構と噛み合っている伝導機構を備えた回転
軸と、前記回転軸のそれぞれの蒸着面側にある先端が傾
斜自在に支持され、それぞれにウエノ１支持機構を備え
た複数の惑星板とから構成されたことを特徴とする蒸着
用ウェハ回転機構。An annular bearing ring in the vapor deposition apparatus, a plurality of fixed shafts fixed at equally divided positions of the bearing ring and equipped with transmission mechanisms, and a rotatable shaft at the tip of each of the fixed shafts on the vapor deposition surface side. A star plate is supported and whose outer periphery is in contact with a circular groove in the vapor deposition apparatus, and a conductor plate is rotatably supported at equally divided positions on each of the star plates, and one end is provided on each of the shafts. It is composed of a rotating shaft equipped with a transmission mechanism that meshes with the mechanism, and a plurality of planetary plates each having a Ueno 1 support mechanism, each of which is tiltably supported at its tip on the vapor deposition surface side. A wafer rotation mechanism for deposition, characterized by the following.
JP5607384U 1984-04-17 1984-04-17 Wafer rotation mechanism for deposition Pending JPS60167337U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5607384U JPS60167337U (en) 1984-04-17 1984-04-17 Wafer rotation mechanism for deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5607384U JPS60167337U (en) 1984-04-17 1984-04-17 Wafer rotation mechanism for deposition

Publications (1)

Publication Number Publication Date
JPS60167337U true JPS60167337U (en) 1985-11-06

Family

ID=30579334

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5607384U Pending JPS60167337U (en) 1984-04-17 1984-04-17 Wafer rotation mechanism for deposition

Country Status (1)

Country Link
JP (1) JPS60167337U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03191059A (en) * 1989-12-20 1991-08-21 Matsushita Electric Ind Co Ltd Sputtering device
JP2007100123A (en) * 2005-09-30 2007-04-19 Kyocera Kinseki Corp Vacuum vapor deposition apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03191059A (en) * 1989-12-20 1991-08-21 Matsushita Electric Ind Co Ltd Sputtering device
JP2007100123A (en) * 2005-09-30 2007-04-19 Kyocera Kinseki Corp Vacuum vapor deposition apparatus

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