JPS60167334U - Semiconductor substrate manufacturing equipment - Google Patents

Semiconductor substrate manufacturing equipment

Info

Publication number
JPS60167334U
JPS60167334U JP5440384U JP5440384U JPS60167334U JP S60167334 U JPS60167334 U JP S60167334U JP 5440384 U JP5440384 U JP 5440384U JP 5440384 U JP5440384 U JP 5440384U JP S60167334 U JPS60167334 U JP S60167334U
Authority
JP
Japan
Prior art keywords
semiconductor substrate
substrate manufacturing
manufacturing equipment
substrate
abstract
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5440384U
Other languages
Japanese (ja)
Inventor
菊池 義文
基守 宮嶋
Original Assignee
富士通株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士通株式会社 filed Critical 富士通株式会社
Priority to JP5440384U priority Critical patent/JPS60167334U/en
Publication of JPS60167334U publication Critical patent/JPS60167334U/en
Pending legal-status Critical Current

Links

Landscapes

  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図イは半導体基板の正面図、同図口は前記多結晶膜
成膜後の基板A−A線切断になる断面図、第2図は第1
図のエツジクラウン除去をなすエツジ研削の側面図、第
3図は本考案の研削砥石実施例とする側断面図である。 図中、1はn型半導体基板、2は多結晶シリコン膜、3
はエツジクラウン、4は従来の研削砥石、7は基板エツ
ジ、5と11は回転軸、10は本考案の研削砥石(研削
刃)、及び13は10のテーパ形成のベベル刃面である
Figure 1A is a front view of the semiconductor substrate, the opening of the figure is a cross-sectional view taken along the line A-A of the substrate after the polycrystalline film has been formed, and Figure 2 is the front view of the semiconductor substrate.
FIG. 3 is a side view of edge grinding for removing the edge crown, and FIG. 3 is a side sectional view of an embodiment of the grinding wheel of the present invention. In the figure, 1 is an n-type semiconductor substrate, 2 is a polycrystalline silicon film, and 3 is a polycrystalline silicon film.
4 is an edge crown, 4 is a conventional grinding wheel, 7 is a substrate edge, 5 and 11 are rotating shafts, 10 is a grinding wheel (grinding blade) of the present invention, and 13 is a tapered beveled blade surface of 10.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体形成基板のエツジ研削装置に於いて、基板厚さ方
向に駆動されるベベル形状砥石により研削することを特
徴とする半導体基板の製造装置。
A semiconductor substrate manufacturing device characterized in that the edge grinding device for semiconductor substrates performs grinding using a bevel-shaped grindstone driven in the thickness direction of the substrate.
JP5440384U 1984-04-13 1984-04-13 Semiconductor substrate manufacturing equipment Pending JPS60167334U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5440384U JPS60167334U (en) 1984-04-13 1984-04-13 Semiconductor substrate manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5440384U JPS60167334U (en) 1984-04-13 1984-04-13 Semiconductor substrate manufacturing equipment

Publications (1)

Publication Number Publication Date
JPS60167334U true JPS60167334U (en) 1985-11-06

Family

ID=30576129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5440384U Pending JPS60167334U (en) 1984-04-13 1984-04-13 Semiconductor substrate manufacturing equipment

Country Status (1)

Country Link
JP (1) JPS60167334U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117059A (en) * 1976-03-27 1977-10-01 Toshiba Corp Preparation of semiconductor wafer

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117059A (en) * 1976-03-27 1977-10-01 Toshiba Corp Preparation of semiconductor wafer

Similar Documents

Publication Publication Date Title
JPS6088535U (en) semiconductor wafer
JP2658135B2 (en) Semiconductor substrate
JPS60167334U (en) Semiconductor substrate manufacturing equipment
JPS63134174A (en) Grinding wheel
JPS5831951U (en) rotary cutting tool
JPS59152734U (en) Production plate for polycrystalline silicon wafers
JPS5878644U (en) dicing equipment
JPS58120655U (en) Adhesive sheet for wafer dicing
JPS5831952U (en) semiconductor manufacturing equipment
JPS5892737U (en) Semiconductor package can cutter
JPS6115733U (en) Substrate deposit removal device
JPS6247128U (en)
JPS6056467U (en) Semiconductor wafer dicing blade
JPS62154648U (en)
JPS60109327U (en) Semiconductor wafer support mechanism for semiconductor ion implantation equipment
JPS6115740U (en) Semiconductor wafer dicing blade
JPS6313642U (en)
JPS5934961U (en) Mold polishing tool
JPS596834U (en) silicon wafer
JPS6056472U (en) All-purpose blade grinding tool
JPS6018558U (en) thin film transistor element
JPS61184846A (en) Dividing method of compound semiconductor substrate
JPS6066051U (en) thin film transistor
JPS5858340U (en) Semiconductor wafer scriber
JPS6142291U (en) knife cutlery