JPS60164915A - Check method of thin film magnetic head - Google Patents
Check method of thin film magnetic headInfo
- Publication number
- JPS60164915A JPS60164915A JP2118684A JP2118684A JPS60164915A JP S60164915 A JPS60164915 A JP S60164915A JP 2118684 A JP2118684 A JP 2118684A JP 2118684 A JP2118684 A JP 2118684A JP S60164915 A JPS60164915 A JP S60164915A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magnetic head
- film magnetic
- block
- magnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/455—Arrangements for functional testing of heads; Measuring arrangements for heads
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
（ａｌ 発明の技術分野
本発明は磁気ディスク装置、磁気テープ装置等に実装さ
れ、情報の書込み、鮪取りＹ％行する薄膜磁気ヘッドの
検査方法に関する。DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to a method for inspecting a thin film magnetic head that is mounted on a magnetic disk device, magnetic tape device, etc. and that writes information and performs tuna picking.
（ｂｌ 従来技術と問題点
薄膜磁気ヘッドの製作法は一般的に第１図に示すように
ウェファ（セラミック等）１上に、蒸着技術、スパッタ
リング技術、エツチング技術ケ駆使して、（後述の第２
図参照）磁性層（下部磁性層２．上部磁性ｆｉ３）、絶
縁層４．導体層５火形成した薄膜磁気ヘッド部Ａとした
ものｔ多数作成している。このウェア１上に形成された
薄膜磁気ヘッドＡは１個１個に切断されて所望の形状に
加工され、第２図に示すような薄膜磁気ヘッドＡとなる
。その後、情報の書込み、読取りを行うための引出線（
図示せず）ン設置し、さらに薄膜磁気ヘッドＡＶ保持す
る機構（図示せず）に取り付は所定の形態に製作する（
磁気ディスク装置に実装状態）。この様な薄膜磁気ヘッ
ドＡのギャップ６を磁気ディスク７に対向させた状態（
硲気デイスり回転方向乞矢印で示す）で、薄膜磁気ヘッ
ドＡの特性試験乞実施し、良否の判断（コイル断ショー
ト、ギャップ不良、磁気特性等）ン行っている。(bl) Prior Art and Problems Generally, as shown in Fig. 1, thin-film magnetic heads are manufactured by making full use of vapor deposition technology, sputtering technology, and etching technology on a wafer (ceramic, etc.) 1 (as shown in Fig. 1). 2
(see figure) magnetic layer (lower magnetic layer 2. upper magnetic fi3), insulating layer 4. A large number of thin film magnetic head portions A were prepared by forming the conductor layer 5 by fire. The thin film magnetic head A formed on the wear 1 is cut into pieces one by one and processed into a desired shape to form the thin film magnetic head A as shown in FIG. After that, a leader line (
(not shown) is installed in a mechanism (not shown) for holding the thin film magnetic head AV (not shown).
mounted on a magnetic disk device). A state in which the gap 6 of such a thin film magnetic head A is opposed to the magnetic disk 7 (
Characteristics tests of the thin film magnetic head A are carried out in the direction of rotation (indicated by arrows), and judgments are made as to whether the head is good or bad (coil breaks, shorts, gaps, magnetic properties, etc.).
しかし、前記薄膜形処に関して最新技術乞採用して行な
うが層の厚さが非常に薄く、かつ隣接層との間が狭い。However, although the latest technology is employed in forming the thin film, the thickness of the layer is very thin and the distance between adjacent layers is narrow.
さらに層の幅が狭い等の１こめに、各層に脱落、隆起等
が発生する。この場合、磁気ヘッドとしての機能、特性
が低下し書込み読、取りが出来なくなってしまうが、こ
れが判明するのは、最終組立状藺（磁気ディスク装置に
実装）であるため、それまでついやした時間、労働が無
駄になってしまう欠点がある。Furthermore, if the width of the layer is narrow, each layer may fall off, bulge, etc. In this case, the function and characteristics of the magnetic head deteriorate, making it impossible to read, write, or read data. However, this is only discovered during the final assembly (installed in the magnetic disk drive), so The drawback is that time and labor are wasted.
ｔｅｌ 発明の目的
本発明の目的は製作の途中で、疑似的に特性検査ン実施
し、良否の判定をした後、不良品はその時で取り除き、
良品のみの製作Ｚ進め無駄な時間、労働′Ｐ！′省くよ
うにした薄膜磁気ヘッド検査方法を提供することにある
。tel Purpose of the Invention The purpose of the present invention is to conduct a simulated characteristic inspection during production, to determine whether it is good or bad, and to remove defective products at that time.
Proceed with the production of only good products, wasted time and labor 'P! 'An object of the present invention is to provide a thin film magnetic head testing method that eliminates the above problems.
（ｄｌ 発明の構成
そしてこの目的は本発明によれば、ウェファ上に形成し
た薄膜磁気ヘッド素子群を所定のブロック状に加工した
後、該ブロックの薄膜磁気ヘッド素子群の磁気へッドギ
ャｙブｌ磁界発生手段の磁界発生側に対向させて配置し
、薄膜磁気ヘッド素子の磁気へラドギャップで磁界発生
手段より発生した礎界Ｙ拾い、該薄膜磁気ヘッド素子の
コイルに発生した電圧を測定するようにしたことを特徴
とする薄膜磁気ヘッド検査方法乞提供することにより達
成される。According to the present invention, after a group of thin film magnetic head elements formed on a wafer is processed into a predetermined block shape, a magnetic head gear of the group of thin film magnetic head elements of the block is processed. It is arranged to face the magnetic field generating side of the magnetic field generating means, and picks up the fundamental field Y generated by the magnetic field generating means in the magnetic field gap of the thin film magnetic head element, and measures the voltage generated in the coil of the thin film magnetic head element. This is achieved by providing a method for testing a thin film magnetic head characterized by the following.
ｔｅｌ 発明の実施例 以下本発明の実施例を図面により詳述する。tel Embodiments of the invention Embodiments of the present invention will be described in detail below with reference to the drawings.
第３図（イ）（ロ）？−１及び第４図は本発明の薄膜磁
気ヘッド検査方法の一実施例を説明する図で、第３図（
イ）は薄膜磁気ヘッド群が形成されたウェファの斜視図
、第３図仲）はブロック状態の斜視図、第３図（ハ）は
第３図（ロ）の拡大図、第４図は第３図（ハ）のＸ −
Ｘ断面を示す。Figure 3 (a) (b)? 1 and 4 are diagrams for explaining an embodiment of the thin film magnetic head inspection method of the present invention, and FIG.
A) is a perspective view of a wafer on which a group of thin film magnetic heads is formed, FIG. X in Figure 3 (c) -
An X cross section is shown.
本実施例の薄膜磁気ヘッド検査方法は第３図（イ）に示
すように蒸着技術、スパッタリング技術、エツチング技
術を駆使して、ウェファ１上に薄膜磁気ヘッドＡ群ン形
成した後、先づ機械加工で所望のブロック状態に削り出
しに後（例えば図の横方向の切断８）、第３図（ロ）に
示すようにその中のブロック９の２枚ン、両ブロック９
の薄膜磁気ヘッドＡの１込み、読取りギャップが対向す
るように配置する。即ち磁界発生手段として薄膜磁気ヘ
ッド素子群のブロック９上いる。ギヤツブの扁さ方向は
ウエフγｌの厚さであり一致するので、ブロックの横方
向のみの位置合せでよい。なお１０は端子を示し、端子
にはブロック９内部でコイルと接続し、第３図（イ）（
ロ）の斜視図では省略しであるが、ブロック９上の保護
膜１１より露出して、後述の引出線１２が設置される。As shown in FIG. 3(A), the thin film magnetic head inspection method of this embodiment utilizes vapor deposition technology, sputtering technology, and etching technology to form groups A of thin film magnetic heads on a wafer 1, and then first performs mechanical testing. After machining the block into the desired state (for example, by cutting 8 in the horizontal direction in the figure), as shown in FIG.
The thin film magnetic heads A are arranged so that their read gaps face each other. That is, the magnetic field generating means is provided on block 9 of the thin film magnetic head element group. Since the width direction of the gears coincides with the thickness of the wafer γl, it is only necessary to align the blocks in the lateral direction. Note that 10 indicates a terminal, which is connected to a coil inside the block 9 and shown in Fig. 3 (A) (
Although not shown in the perspective view of b), a leader line 12, which will be described later, is installed exposed from the protective film 11 on the block 9.
片方のブロック９の薄膜磁気ヘッド素子Ａには所定の電
流ｔｙｌ流し、書込み、読取りギャップ６から磁界乞発
生させる。それに対向している別のブロック９の薄膜磁
気ヘッド素子Ａの書込み、読取りギャップ６は、前述の
磁界ヶ吸収し、それに対応した電圧Ｅを発生する。さら
に逆方向のその動作をさせ、お互の薄膜磁気ヘッド素子
Ａの電圧乞測定して特性良否ン判定する。A predetermined current tyl is applied to the thin film magnetic head element A of one block 9, and a magnetic field is generated from the write/read gap 6. The writing/reading gap 6 of the thin film magnetic head element A of another block 9 facing it absorbs the aforementioned magnetic field and generates a voltage E corresponding to it. Further, the operation is performed in the opposite direction, and the voltage level of each thin film magnetic head element A is measured to determine whether the characteristics are good or bad.
上記のように薄膜磁気ヘッド製作途中において、ブロッ
ク状態の薄膜磁気ヘッド乞検査することにより、不良品
Ｚ取り除き、良品のみの製作乞進めることができる。以
下に薄膜磁気ヘッドの製作組立工程を示すと、
１ ウェファＩ上に薄膜磁気ヘッドへ群乞パターニング
により形成する。As described above, by inspecting the thin film magnetic head in a blocked state during the manufacturing of the thin film magnetic head, it is possible to remove defective products Z and proceed with manufacturing only good products. The manufacturing and assembly process of a thin film magnetic head is shown below: 1. A thin film magnetic head is formed on a wafer I by group patterning.
２、 ウェファ１ヶ機械加工で所望のブロック状態に削
り出す。削り出した後、ブロック状態で本発明の薄膜磁
気ヘッド検査を行う。2. Machine one wafer into the desired block shape. After cutting, the thin film magnetic head of the present invention is inspected in a block state.
３ スライダ加工馨行りた後、ブロックの薄膜磁気ヘッ
ドＡ群ｙ切断し、個々の薄膜磁気ヘッドＡに分離する。3 After performing the slider processing, the block of thin-film magnetic heads A group is cut into individual thin-film magnetic heads A.
この時不良品は取除かれる。Defective products are removed at this time.
４ フレクチャー組立（ジンパルバネン薄膜磁気ヘッド
Ａに取付けるも
５、ヘッドアーム組立（フレクチャー組立品をヘッドア
ームに取付ける）。4. Flexure assembly (attaching to the Jinparbanen thin film magnetic head A) 5. Head arm assembly (attaching the flexure assembly to the head arm).
６ 試験（ヘッドアーム組立品乞磁気ディスク装訛に実
装して検査する）。6. Test (mount the head arm assembly on a magnetic disk drive and inspect it).
上記のように薄膜磁気ヘッドの製作組立の途中で、疑似
的に特性検査を実施し、良否判定して良品のみの製作を
進め、無駄な不良品は取除き加工しないようにしている
。As described above, during the manufacturing and assembly of thin film magnetic heads, a pseudo characteristic test is performed to determine the quality of the head, and only good products are manufactured, while wasteful defective products are removed and not processed.
第５図は本発明の別の実施例である。第４図の変形例と
して、電流を流す方のブロックをギャップ１３．コイル
１４ン有するコ字状フエライ口５で作成している。即ち
磁界発生手段として、フェライトの磁気ヘッド乞用いる
。ギャップ１３と対向し、被測定のブロック９の薄膜磁
気ヘッドＡのギヤツブ６乞位置させるように被測定ブロ
ック９を設置する。フェライト１５のコイル１４に電流
を流し、ギャップ１３から磁界を発生させ、その磁界を
被測定ブロック９のコイル５で発生した電圧ン端子１０
から取り出す。FIG. 5 shows another embodiment of the invention. As a modification of FIG. 4, the block through which the current flows is connected to the gap 13. It is made with a U-shaped fly opening 5 having 14 coils. That is, a ferrite magnetic head is used as the magnetic field generating means. The block 9 to be measured is installed so as to face the gap 13 and to position the gear 6 of the thin film magnetic head A of the block 9 to be measured. A current is passed through the coil 14 of the ferrite 15 to generate a magnetic field from the gap 13, and the magnetic field is applied to the voltage terminal 10 generated by the coil 5 of the block 9 to be measured.
Take it out.
ｆｆｌ 発明の効果
以上詳細に説明し六−ように、本発明によればウェファ
上に形成された？Ｊ［磁気ヘッド素子群に磁界発生手段
より発生させＴこ磁界乞抽出し、この薄膜磁気ヘッド素
子群よりの出力電圧ケチニックして特性の良否ン判断す
る。薄膜磁気ヘッド製作途中において、その特性Ｚ検査
することが可能であり最終組立状態においてのみ検査す
るものではないので、無駄な不良品の加工組立乞行うこ
となく良品のみの製作が進められ、工数削減の効果は太
きい。ffl Effects of the Invention As explained in detail above, according to the present invention, ? The magnetic field generated by the magnetic field generating means in the magnetic head element group is extracted, and the output voltage from the thin film magnetic head element group is determined to determine whether the characteristics are good or bad. Since it is possible to inspect the characteristic Z of the thin film magnetic head during the manufacturing process, and not only in the final assembled state, only good products can be manufactured without wasteful processing and assembly of defective products, reducing man-hours. The effect is strong.
第１図、第２図は従来の薄膜磁気ヘッド検査方法？説明
するための図で、第１図はウェファ斜視図、第２図は薄
膜磁気ヘッド断面図、第３図、第４図は本発明の薄膜磁
気ヘッド検査方法の一実施例を示す図で、第３図（イ）
（ＣＩ）（／→は斜視図、第４図は第３図（ハ）の断面
図、第５図は本発明の別の実雄側乞示す断面図である。
図において、ｌはウェファ、２は下部磁性層、３は上部
磁性層、５は導体層、６はギャップ、８は切断、９はブ
ロック、ｌＯは端子、１１は保護膜、１２は引出線、１
３はギャップ、１４はコイｖ−７凹
＃２閉
ハ
寮３ 唄Is the conventional thin film magnetic head inspection method shown in Figures 1 and 2? FIG. 1 is a perspective view of a wafer, FIG. 2 is a sectional view of a thin film magnetic head, and FIGS. 3 and 4 are diagrams showing an embodiment of the thin film magnetic head inspection method of the present invention. Figure 3 (a)
(CI) (/→ is a perspective view, FIG. 4 is a cross-sectional view of FIG. 3 (c), and FIG. 5 is a cross-sectional view showing another actual side of the present invention. In the figure, l is a wafer, 2 3 is a lower magnetic layer, 3 is an upper magnetic layer, 5 is a conductor layer, 6 is a gap, 8 is a cut, 9 is a block, IO is a terminal, 11 is a protective film, 12 is a leader line, 1
3 is gap, 14 is carp v-7 concave #2 closed ha dormitory 3 song
Claims (2)
定のブロック状に加工した後、該ブロックの薄膜磁気ヘ
ッド素子群の磁気へラドギヤノブ乞磁界発生手段の磁界
発生側に対向させて配置し、薄膜磁気ヘッド素子の磁気
へラドギャップで該磁界発生手段より発生した磁界を拾
い、該薄膜磁気ヘッド素子のコイルに発−生し１こｔ圧
を測定するようにしたこと乞特徴とする薄膜磁気ヘット
検査方法。(1) After processing the thin-film magnetic head element group formed on the wafer into a predetermined block shape, the magnetic rad gear knob of the thin-film magnetic head element group of the block is placed facing the magnetic field generating side of the magnetic field generating means; The thin film magnetic head element is characterized in that the magnetic field generated by the magnetic field generating means is picked up by the magnetic field gap of the thin film magnetic head element, and the pressure generated in the coil of the thin film magnetic head element is measured. Het inspection method.
ライトで作成されり磁気ヘッドであることＺ（３）上記
磁界発生手段は上記薄膜磁気ヘッド素子群のブロックで
あることを特徴とする特許請求の範囲第１項記載の薄膜
磁気ヘッドψ検査方法。(2) The magnetic field generating means is a magnetic head made of ferrite having a gap and a winding χ. (3) The patent characterized in that the magnetic field generating means is a block of the thin film magnetic head element group. A method for inspecting a thin film magnetic head ψ according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2118684A JPS60164915A (en) | 1984-02-08 | 1984-02-08 | Check method of thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2118684A JPS60164915A (en) | 1984-02-08 | 1984-02-08 | Check method of thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60164915A true JPS60164915A (en) | 1985-08-28 |
Family
ID=12047915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2118684A Pending JPS60164915A (en) | 1984-02-08 | 1984-02-08 | Check method of thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60164915A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7365531B2 (en) | 2004-12-03 | 2008-04-29 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic reader recording characterization at slider or bar level |
| US7368905B2 (en) | 2004-09-30 | 2008-05-06 | Hitachi Global Storage Technologies Netherlands Bv | System, method, and apparatus for use of micro coils within a single slider test nest |
-
1984
- 1984-02-08 JP JP2118684A patent/JPS60164915A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7368905B2 (en) | 2004-09-30 | 2008-05-06 | Hitachi Global Storage Technologies Netherlands Bv | System, method, and apparatus for use of micro coils within a single slider test nest |
| US7365531B2 (en) | 2004-12-03 | 2008-04-29 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic reader recording characterization at slider or bar level |
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