JPH01102710A - Thin film magnetic head - Google Patents
Thin film magnetic headInfo
- Publication number
- JPH01102710A JPH01102710A JP25839487A JP25839487A JPH01102710A JP H01102710 A JPH01102710 A JP H01102710A JP 25839487 A JP25839487 A JP 25839487A JP 25839487 A JP25839487 A JP 25839487A JP H01102710 A JPH01102710 A JP H01102710A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magnetic
- substance
- magnetic head
- head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 120
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 239000000126 substance Substances 0.000 claims abstract description 12
- 238000005260 corrosion Methods 0.000 abstract description 13
- 230000007797 corrosion Effects 0.000 abstract description 13
- 230000007613 environmental effect Effects 0.000 abstract description 4
- 229910001004 magnetic alloy Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 229910000702 sendust Inorganic materials 0.000 description 2
- 229910020018 Nb Zr Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000007736 thin film deposition technique Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
- G11B5/3133—Disposition of layers including layers not usually being a part of the electromagnetic transducer structure and providing additional features, e.g. for improving heat radiation, reduction of power dissipation, adaptations for measurement or indication of gap depth or other properties of the structure
- G11B5/314—Disposition of layers including layers not usually being a part of the electromagnetic transducer structure and providing additional features, e.g. for improving heat radiation, reduction of power dissipation, adaptations for measurement or indication of gap depth or other properties of the structure where the layers are extra layers normally not provided in the transducing structure, e.g. optical layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/40—Protective measures on heads, e.g. against excessive temperature
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野コ
本発明は基板上に磁性薄膜からなる磁気回路と導体薄膜
からなるコイルなどを設けて構成され磁気記録媒体に情
報の磁気記録又は再生を行なう薄膜磁気ヘッドに関する
ものである。[Detailed Description of the Invention] [Industrial Field of Application] The present invention is configured by providing a magnetic circuit made of a magnetic thin film and a coil made of a conductive thin film on a substrate, and magnetically records or reproduces information on a magnetic recording medium. This invention relates to thin film magnetic heads.
［従来の技術］
スパッタリングや蒸着などの薄膜形成技術を用いて製造
される上記の薄膜磁気ヘッドは、磁気記録密度の高密度
化に伴いコンピュータの外部記憶装置を中心とした情報
処理機器をはじめ、ビデオテープレコーダ、磁気記録写
真機、デジタルオーディオレコーダ等に広く採用されて
いる。そして薄膜磁気ヘッドはＩＣと同様な薄膜形成技
術で製造することができるため、量産性に富み、性能の
安定化、均一化が図れる。また薄膜の加工精度がＩＣ加
工方法の発達に伴って向上し、同一基板上に多数のヘッ
ド素子を並べたマルチトラックヘッド等のように高密度
に集積された薄膜磁気ヘッドの製作も行なわれている。[Prior Art] The above-mentioned thin film magnetic heads manufactured using thin film forming techniques such as sputtering and vapor deposition are used in information processing equipment, mainly external storage devices of computers, as magnetic recording density increases. It is widely used in video tape recorders, magnetic recording cameras, digital audio recorders, etc. Since thin-film magnetic heads can be manufactured using the same thin-film forming technology as ICs, they are highly mass-producible and can achieve stable and uniform performance. Furthermore, the processing accuracy of thin films has improved with the development of IC processing methods, and thin film magnetic heads that are densely integrated, such as multi-track heads that have many head elements arranged on the same substrate, have also been manufactured. There is.
なお薄ｌＩＵ磁気ヘッドの磁気回路を構成する磁性薄膜
はパーマロイ、センダスト、或いはアモルファス磁性合
金等の各種磁性合金から形成されている。The magnetic thin film constituting the magnetic circuit of the thin 1IU magnetic head is made of various magnetic alloys such as permalloy, sendust, or amorphous magnetic alloy.
［発明が解決しようとする問題点］
ところが従来の薄膜磁気ヘッドでは、磁気回路を構成す
る磁性薄膜が空気中の水分を介して経時的に酸、化し腐
食してしまう。また薄膜磁気ヘッドの製造工程でヘッド
先端の磁気記録媒体摺動面の加工中にも冷却水が磁性薄
膜に当ることにより磁性薄膜が酸化、腐食し溶は出して
しまう。そしてこのような磁性薄膜の腐食によって薄膜
磁気ヘッドの特性が経時的に劣化するという問題があっ
た。[Problems to be Solved by the Invention] However, in conventional thin film magnetic heads, the magnetic thin film constituting the magnetic circuit becomes acidic and corrodes over time through moisture in the air. Further, during the manufacturing process of a thin film magnetic head, cooling water hits the magnetic thin film during processing of the sliding surface of the magnetic recording medium at the tip of the head, causing the magnetic thin film to oxidize, corrode, and dissolve. There is a problem in that the characteristics of the thin film magnetic head deteriorate over time due to such corrosion of the magnetic thin film.
［問題点を解決するための手段］
このような問題点を解決するため本発明によれば、基板
上に磁性薄膜からなる磁気回路と導体薄膜からなるコイ
ルなどを設けて構成される薄膜磁気ヘッドにおいて、前
記磁性薄膜よりイオン化傾向の大きな物質からなる薄膜
を前記基板上で前記磁性薄膜と接触するとともに少なく
とも一部が薄Ｉ１Ｍ磁気ヘッドの外側面に露出するよう
に設けた構造を採用した。[Means for Solving the Problems] In order to solve these problems, the present invention provides a thin film magnetic head that is constructed by providing a magnetic circuit made of a magnetic thin film and a coil made of a conductive thin film on a substrate. In this method, a structure is adopted in which a thin film made of a substance having a greater ionization tendency than the magnetic thin film is provided on the substrate so as to be in contact with the magnetic thin film and at least a portion thereof is exposed on the outer surface of the thin I1M magnetic head.
［作 用］
このような構造によれば磁性薄膜よりイオン化傾向の大
きな物質からなる薄膜と磁性薄膜により極部電池が構成
される。このため上記のイオン化傾向の大きな物質から
なる薄膜と磁性薄膜についての腐食は磁性薄膜よりイオ
ン化傾向が大きな物質の薄膜から進行し、磁性薄膜の腐
食が抑えられる。[Function] According to such a structure, the pole battery is constituted by the thin film made of a substance having a greater ionization tendency than the magnetic thin film and the magnetic thin film. For this reason, the corrosion of the thin film and magnetic thin film made of the substance with a greater ionization tendency as described above proceeds from the thin film of the substance with a greater ionization tendency than the magnetic thin film, and corrosion of the magnetic thin film is suppressed.
［実施例コ
以下、添付した図を参照して本発明の実施例の詳細を説
明する。[Embodiments] Hereinafter, details of embodiments of the present invention will be explained with reference to the attached drawings.
第１図及び第２図は本発明の実施例による薄膜磁気ヘッ
ドの構造を説明するもので、第１図は薄膜磁気ヘッドの
保護板を取り払った要部の構造を示しており、第２図は
ヘッド全体の外観を示している。1 and 2 explain the structure of a thin-film magnetic head according to an embodiment of the present invention. FIG. 1 shows the structure of the main part of the thin-film magnetic head with the protective plate removed, and FIG. shows the appearance of the entire head.
両図において符号１は薄膜磁気ヘッド全体を支持する基
板であり、非磁性材から形成される。この基板１上には
、まず薄膜磁気ヘッドの磁気回路の下半分を構成する下
部磁性薄膜２が設けられ、る。この下部磁性薄膜２はパ
ーマロイ、センダスト、或いはアモルファス磁性合金等
の材料から形成される。In both figures, reference numeral 1 denotes a substrate that supports the entire thin film magnetic head, and is made of a nonmagnetic material. On this substrate 1, first, a lower magnetic thin film 2 constituting the lower half of the magnetic circuit of the thin film magnetic head is provided. The lower magnetic thin film 2 is made of a material such as permalloy, sendust, or an amorphous magnetic alloy.
そして下部磁性薄膜２上には不図示の絶縁層を介して・
導体、薄膜パターンからなるコイル３が設けられる。Then, on the lower magnetic thin film 2, an insulating layer (not shown) is provided.
A coil 3 made of a conductor and a thin film pattern is provided.
さらにツーイル３上には不図示の絶縁層を介して磁気回
路の上半分を構成する上部磁性薄膜４と、コイル３の外
部導出用の電ｉ７が設けられる。上部磁性薄膜４は下部
磁性薄膜２と同様の材料から形成され、その第１図中右
端部は磁気ギャップ５のギャップスペーサを介して下部
磁性薄膜２に重ねられる。また上部磁性薄膜４の第１図
中左端部は下部磁性薄膜２上の不図示の絶縁層に形成さ
れた不図示のコンタクトホールを介して下部磁性薄膜２
に接触し、磁気的に接続される。Further, on the tool 3, an upper magnetic thin film 4 constituting the upper half of the magnetic circuit and an electric wire i7 for leading the coil 3 to the outside are provided via an insulating layer (not shown). The upper magnetic thin film 4 is formed from the same material as the lower magnetic thin film 2, and its right end in FIG. Further, the left end portion of the upper magnetic thin film 4 in FIG.
and are magnetically connected.
次に上部磁性薄膜４上には、本発明に係る構造として両
磁性薄膜２．４よりイオン化傾向が大きい金属、合金或
いは化合物などの物質からなる薄膜８のパターンが不図
示の絶縁層を介して設けられる。薄膜８はここでは細長
い帯状に形成されており、その第１図中左端部は上部磁
性薄膜４上の不図示の絶縁層に形成された穴を介して上
部磁性薄膜４に接触する。また薄膜８の第１図中の右端
部は磁気ギャップ５が面する第１図中右側の薄膜磁気ヘ
ッドの磁気記録媒体摺動面６に上部磁性薄膜４と並んで
露出するように配置される。なお両磁性薄膜２．４を例
えばＣｏ−Ｎｂ−Ｚｒアモルファス磁性合金から形成す
るものとして薄膜８はそれよりイオン化傾向が大きい物
質として例えばＡ）またはＺｎなどから形成される。Next, on the upper magnetic thin film 4, as a structure according to the present invention, a pattern of a thin film 8 made of a substance such as a metal, an alloy, or a compound having a higher ionization tendency than the magnetic thin film 2.4 is formed via an insulating layer (not shown). provided. The thin film 8 is formed here in the shape of a long and narrow strip, and its left end in FIG. 1 contacts the upper magnetic thin film 4 through a hole formed in an insulating layer (not shown) on the upper magnetic thin film 4. Further, the right end portion of the thin film 8 in FIG. 1 is arranged so as to be exposed along with the upper magnetic thin film 4 on the magnetic recording medium sliding surface 6 of the thin film magnetic head on the right side in FIG. 1, which the magnetic gap 5 faces. . Note that while both magnetic thin films 2.4 are formed of, for example, a Co--Nb--Zr amorphous magnetic alloy, the thin film 8 is formed of a material having a greater ionization tendency, such as A) or Zn.
以上に述べた基板１上の各構成要素は薄膜堆積法とフォ
トリソグラフィー技術によって形成される。そして更に
これら全体の上に不図示のＳ ｉ ０．２などからなる
保護膜を形成した後に、第２図に示すように保護板９を
低融点ガラス１０の溶着により接合し、磁気記録媒体摺
動面６を仕上げ加工して薄膜磁気ヘッドが構成される。Each component on the substrate 1 described above is formed by a thin film deposition method and a photolithography technique. Further, after forming a protective film made of Si 0.2 (not shown) on all of these, a protective plate 9 is joined by welding a low melting point glass 10 as shown in FIG. The moving surface 6 is finished to form a thin film magnetic head.
このような構造のもとに記録時にはコイル３に記録信号
電流を流すことにより発生する記録磁界が磁気ギャップ
５から漏洩し、磁気ギャップ５に摺動する不図示の磁気
記録媒体を磁化し、記録が行なわれる。また再生時には
磁気ギャップ５の近傍に位置する磁気記録媒体の記録磁
化部分から発生する。磁束が磁気ギャップ５を介し拾わ
れ、下部磁性薄膜２と上部磁性薄膜４からなる磁気回路
を通ってコイル３と鎖交し、この磁束が磁気記録媒体の
り動に伴なって変化することによりコイル３に再生信号
電圧が言秀起される。Based on this structure, during recording, a recording magnetic field generated by passing a recording signal current through the coil 3 leaks from the magnetic gap 5, magnetizes a magnetic recording medium (not shown) sliding in the magnetic gap 5, and performs recording. will be carried out. Further, during reproduction, it is generated from the recorded magnetized portion of the magnetic recording medium located near the magnetic gap 5. Magnetic flux is picked up through the magnetic gap 5, passes through the magnetic circuit consisting of the lower magnetic thin film 2 and the upper magnetic thin film 4, and interlinks with the coil 3. This magnetic flux changes with the movement of the magnetic recording medium, so that the coil 3, the reproduction signal voltage is generated.
以上のような本実施例の薄膜磁気ヘッドによれば、両辺
性薄膜２．４よりイオン化傾向の大きな物質からなる薄
膜８と両辺性薄膜２．４によって極部電池が構成される
。従って両辺性薄膜２．４と薄膜８に関する酸化、腐食
については周知の作用によってイオン化傾向の大きな薄
膜８についてのみ先に進行し、両辺性薄膜２．４の酸化
、腐食は抑えられる。According to the thin film magnetic head of this embodiment as described above, the polar battery is constituted by the thin film 8 made of a substance having a greater ionization tendency than the double-sided thin film 2.4 and the double-sided thin film 2.4. Therefore, the oxidation and corrosion of the double-sided thin film 2.4 and the thin film 8 proceed only with respect to the thin film 8 with a large ionization tendency due to well-known effects, and the oxidation and corrosion of the double-sided thin film 2.4 are suppressed.
即ち本実施例によれば、前述したように空気中の水分を
介して両辺性薄膜２．４が経時的に酸化、腐食すること
、及びヘッドの製造工程の摺動面６の加工時に冷却水を
介して両辺性薄膜２．４が腐食し溶は出すことを防止で
き、薄膜磁気ヘッドの耐食性を向上できる。That is, according to this embodiment, as described above, the double-sided thin film 2.4 is oxidized and corroded over time through moisture in the air, and the cooling water is removed during machining of the sliding surface 6 in the manufacturing process of the head. The double-sided thin film 2.4 can be prevented from being corroded and molten through the process, and the corrosion resistance of the thin film magnetic head can be improved.
ここでこのような本実施例の作用効果を裏づけるために
行なった環境試験とその結果につき述べておく。環境試
験として、第１図と第２図の構造において両辺性薄膜２
．４をＣｏ−Ｎｂ−Ｚｒアモルファス磁性合金から形成
し、薄膜８をそれよりイオン化傾向の大きなＡ１から形
成したへ・ソドと、比較試料−として同様の構造で薄膜
８を設けない従来のヘッドのそれぞれについて気温７０
℃で湿度９５％のτ囲気中に１０００時間放置し、その
前後での磁性薄膜２．４の溶は出しの深さを測定した。Here, environmental tests conducted to prove the effects of this example and their results will be described. As an environmental test, a double-sided thin film 2 with the structure shown in Figures 1 and 2 was tested.
．． 4 was formed from a Co-Nb-Zr amorphous magnetic alloy, and the thin film 8 was formed from A1, which has a greater ionization tendency, and a conventional head with a similar structure but without the thin film 8 was used as a comparative sample. Temperature about 70
The magnetic thin film 2.4 was left in a τ atmosphere with a humidity of 95% for 1,000 hours at a temperature of 1,000 hours, and the depth of dissolution of the magnetic thin film 2.4 was measured before and after that time.
その結果従来のヘッドについては溶は出しの深さは２０
０〜３００オングストロームであったが、本実施例につ
いては１０オングストローム以下であって本実施例によ
ればヘッドの耐食性を顕著に向上できることが確認でき
た。As a result, for the conventional head, the melting depth is 20
The thickness was 0 to 300 angstroms, but in this example it was 10 angstroms or less, and it was confirmed that the corrosion resistance of the head could be significantly improved according to this example.
なお以上の本実施例の構造では両ｂｎ性薄１］！ ２
。In addition, in the structure of this embodiment described above, both BN properties are thin 1]! 2
.
４において特に腐食が問題となる磁気記録媒体摺動面６
側の部分において腐食を効果的に防止するために、薄膜
８の端部を磁気記録媒体摺動面６に露出させるものとし
たが、必ずしもそうしなくとも良く、薄膜８の端部を磁
気記録媒体摺動面６以外の、薄膜磁気ヘッドの外側面に
露出させるように配置してもよい。また特に薄膜８の端
部を磁気記録媒体摺動面６に露出させる場合は、薄膜８
の端部がいわゆる擬似ギャップを形成することを防止す
るために薄膜８は非磁性材から形成するものとする。ま
た薄膜８の端部を摺訪面６以外のヘッドの外側面に露出
させる場合でも薄膜８はやはり非磁性材から形成したほ
うが良い。Magnetic recording medium sliding surface 6 where corrosion is a particular problem in 4
In order to effectively prevent corrosion on the side portions, the end of the thin film 8 is exposed to the magnetic recording medium sliding surface 6; however, it is not necessary to expose the end of the thin film 8 to the magnetic recording medium sliding surface 6. It may be arranged so as to be exposed on the outer surface of the thin film magnetic head other than the medium sliding surface 6. In particular, when the end of the thin film 8 is exposed to the magnetic recording medium sliding surface 6, the thin film 8
The thin film 8 is made of a non-magnetic material in order to prevent the end portions from forming a so-called pseudo gap. Further, even when the end portion of the thin film 8 is exposed on the outer surface of the head other than the sliding surface 6, the thin film 8 is still preferably formed from a non-magnetic material.
［発明の効果］
以上の説明から明らかなように、本発明によれば、基板
上に磁性薄膜からなる磁気回路と導体薄膜からなるコイ
ルなどを設けて構成される薄膜磁気ヘッドにおいて、前
記磁性薄膜よりイオン化傾向の大きな物質からなる薄膜
を前記基板上で前記磁性薄膜と接触するとともに少なく
とも一部が薄膜磁気ヘッドの外側面に露出するように設
けた構造を採用したので、磁性薄膜の酸化、腐食を効果
的に防止でき、薄膜磁気ヘッドの耐食性、耐環境性を向
上できるという優れた効果が得られる。[Effects of the Invention] As is clear from the above description, according to the present invention, in a thin film magnetic head configured by providing a magnetic circuit made of a magnetic thin film and a coil made of a conductive thin film on a substrate, the magnetic thin film Since a structure is adopted in which a thin film made of a substance with a higher ionization tendency is in contact with the magnetic thin film on the substrate and at least a portion thereof is exposed on the outer surface of the thin film magnetic head, oxidation and corrosion of the magnetic thin film are prevented. This provides excellent effects in that corrosion resistance and environmental resistance of the thin film magnetic head can be effectively prevented.
第１図は本発明の実施例による薄膜磁気ヘッドの要部の
構造を示す斜視図、第２図は同ヘッドの全体の外観を示
す斜視図である。
１・・・基板 ２・・・下部磁性薄膜３・・
・コイル ４・・・上部磁性薄膜５・・・磁気
ギャップ ６・・・磁気記録媒体摺動面７・・・電極FIG. 1 is a perspective view showing the structure of a main part of a thin film magnetic head according to an embodiment of the present invention, and FIG. 2 is a perspective view showing the overall appearance of the head. 1...Substrate 2...Lower magnetic thin film 3...
・Coil 4...Top magnetic thin film 5...Magnetic gap 6...Magnetic recording medium sliding surface 7...Electrode
Claims (1)
コイルなどを設けて構成される薄膜磁気ヘッドにおいて
、前記磁性薄膜よりイオン化傾向の大きな物質からなる
薄膜を前記基板上で前記磁性薄膜と接触するとともに少
なくとも一部が薄膜磁気ヘッドの外側面に露出するよう
に設けたことを特徴とする薄膜磁気ヘッド。In a thin film magnetic head configured by providing a magnetic circuit made of a magnetic thin film and a coil made of a conductive thin film on a substrate, a thin film made of a substance having a greater ionization tendency than the magnetic thin film is brought into contact with the magnetic thin film on the substrate. What is claimed is: 1. A thin film magnetic head, characterized in that at least a portion thereof is exposed on an outer surface of the thin film magnetic head.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25839487A JPH01102710A (en) | 1987-10-15 | 1987-10-15 | Thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25839487A JPH01102710A (en) | 1987-10-15 | 1987-10-15 | Thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01102710A true JPH01102710A (en) | 1989-04-20 |
Family
ID=17319628
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25839487A Pending JPH01102710A (en) | 1987-10-15 | 1987-10-15 | Thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01102710A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04106709A (en) * | 1990-08-27 | 1992-04-08 | Fuji Photo Film Co Ltd | Magnetic head |
| US6667457B1 (en) | 2002-09-17 | 2003-12-23 | Hitachi Global Storage Technologies | System and method for a sacrificial anode in a kerf for corrosion protection during slider fabrication |
| US6747846B2 (en) | 2001-08-31 | 2004-06-08 | Hitachi Global Storage Technologies Japan, Ltd. | Thin film magnetic head preventing corrosion and thin film magnetic head slider, and methods of producing the same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6289210A (en) * | 1985-10-16 | 1987-04-23 | Fujitsu Ltd | thin film magnetic head |
-
1987
- 1987-10-15 JP JP25839487A patent/JPH01102710A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6289210A (en) * | 1985-10-16 | 1987-04-23 | Fujitsu Ltd | thin film magnetic head |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04106709A (en) * | 1990-08-27 | 1992-04-08 | Fuji Photo Film Co Ltd | Magnetic head |
| US6747846B2 (en) | 2001-08-31 | 2004-06-08 | Hitachi Global Storage Technologies Japan, Ltd. | Thin film magnetic head preventing corrosion and thin film magnetic head slider, and methods of producing the same |
| US6667457B1 (en) | 2002-09-17 | 2003-12-23 | Hitachi Global Storage Technologies | System and method for a sacrificial anode in a kerf for corrosion protection during slider fabrication |
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