JPS60161305A - Purification apparatus for gaseous hydrogen - Google Patents

Purification apparatus for gaseous hydrogen

Info

Publication number
JPS60161305A
JPS60161305A JP59016647A JP1664784A JPS60161305A JP S60161305 A JPS60161305 A JP S60161305A JP 59016647 A JP59016647 A JP 59016647A JP 1664784 A JP1664784 A JP 1664784A JP S60161305 A JPS60161305 A JP S60161305A
Authority
JP
Japan
Prior art keywords
gas
purge gas
hydrogen gas
hydrogen
purge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59016647A
Other languages
Japanese (ja)
Other versions
JPH049723B2 (en
Inventor
Yasushi Nakada
泰詩 中田
Michiyoshi Nishizaki
西崎 倫義
Shigemasa Kawai
河合 重征
Katsuhiko Yamaji
克彦 山路
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP59016647A priority Critical patent/JPS60161305A/en
Publication of JPS60161305A publication Critical patent/JPS60161305A/en
Publication of JPH049723B2 publication Critical patent/JPH049723B2/ja
Granted legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/32Hydrogen storage

Landscapes

  • Gas Separation By Absorption (AREA)
  • Hydrogen, Water And Hydrids (AREA)

Abstract

PURPOSE:To increase the yield of purification of hydrogen using metal hydride and to reduce hydrogenation cost by purifying purge gas previously and utilizing the purified gas are crude hydrogen gas again. CONSTITUTION:Crude hydrogen gas is fed to the first and second vessels 1, 2 for purifying hydrogen alternately with a specified pressure through a crude hydrogen gas pipe 14 and an ON/OFF control valve 32, 33. After occlusion of H2 by metal hydride is completed, gaseous impurities are discharged as purge gas from a vessel 1, and the purge gas is introduced into one of a purge gas reservoir 5 through a pipe 18. After the purge from the vessel 1 is completed, liberation of H2 from the metal hydride in the vessel 1 is proceeded, and the liberated gas is obtd. as purified gaseous H2 through a pipe 17. When >=2 vessels for the purified H2 are installed in parallel, purified gaseous H2 is obtd., alternately from each vessel, and purge gas is accumulated in the purge gas reservoir 5.

Description

【発明の詳細な説明】 (技術分野) 本発明は水素ガス精製装置に関し、詳しくは、金属水素
化物を利用した水素ガス精製装置に関す一般に水素ガス
は炭化水素やアンモニアの分解、或いは水の電気分解等
によって工業的に製造されているが、かかる水素ガスは
ヘリウム、アルゴン等の不活性ガスのほか、酸素、水、
窒素、−酸化炭素、二酸化炭素等、種々の不純物ガスを
含有しているため、例えば、半導体工業、金属処理工業
或いは機器分析等の分野においては、」二記の粗製水素
ガスを精製した後に使用している。
DETAILED DESCRIPTION OF THE INVENTION (Technical Field) The present invention relates to a hydrogen gas purification device, and more particularly, to a hydrogen gas purification device that uses metal hydrides.Hydrogen gas is generally used to decompose hydrocarbons or ammonia, or to convert water into electricity. Hydrogen gas is produced industrially by decomposition, etc., but in addition to inert gases such as helium and argon, hydrogen gas also contains oxygen, water,
Because it contains various impurity gases such as nitrogen, carbon oxide, and carbon dioxide, for example, in the semiconductor industry, metal processing industry, or instrumental analysis, it is used after refining the crude hydrogen gas mentioned in 2. are doing.

(従来技術) 水素ガ不を精製するための方法は既に従来より種々知ら
れているが、近年、ある種の金属又は合金が水素ガスを
選択的に吸蔵して金属水素化物を形成し、また、この金
属水素化物がこの水素を可逆的に放出する特性を利用し
た水素ガス精製が提察されている。この方法は基本的に
は、例えば、特開昭57−156304号公報に記載さ
れているように、金属水素化物を充填した容器内に粗製
水素ガスを所定の加圧下に充填し、金属水素化物に水素
ガスを選択的に吸蔵させた後、金属水素化物から水素を
一部放出させ、容器内に金属水素化物に吸蔵されないで
残存する不純物ガスをこの水素呆共に容器からパージさ
−Uることにより除去し、この後に金属水素化物の有す
る水素平衡分解圧て水素を放出させて、精製水素ガスを
得るものである。
(Prior Art) Various methods for purifying hydrogen gas have already been known, but in recent years, certain metals or alloys selectively absorb hydrogen gas to form metal hydrides. It has been proposed to purify hydrogen gas by utilizing the property of metal hydrides to reversibly release hydrogen. This method basically involves filling a container filled with metal hydride with crude hydrogen gas under a predetermined pressure, for example, as described in Japanese Patent Application Laid-open No. 57-156304. After selectively storing hydrogen gas in the metal hydride, some hydrogen is released from the metal hydride, and any impurity gas remaining in the container without being stored in the metal hydride is purged from the container together with this hydrogen gas. After that, hydrogen is released under the hydrogen equilibrium decomposition pressure of the metal hydride to obtain purified hydrogen gas.

この方法によれば、極めて高純度の精製水素ガスを容易
に得ることができるが、反面、容器内に供給した水素ガ
スの5〜30%がパージガスとして失われるので、A’
N製水素ガスの収率が低いうえに、精製コストか101
価となる問題を有する。
According to this method, purified hydrogen gas of extremely high purity can be easily obtained, but on the other hand, 5 to 30% of the hydrogen gas supplied into the container is lost as purge gas, so A'
The yield of N-made hydrogen gas is low, and the purification cost is 101
There are some serious problems.

(発明の目的) 本発明は金属水素化物を用いる水素ガス精製におりる上
記した問題を解決するためになされたものであって、パ
ージガスを予備精製し、これを旧1製水素ガスとして再
利用することにより、金属水素化物による水素ガス精製
の収率を高めると共に、そのコストの低減を可能とする
水素ガス精製装置を提供することを目的とする。
(Object of the Invention) The present invention was made to solve the above-mentioned problems in hydrogen gas purification using metal hydrides, and the purpose is to pre-purify purge gas and reuse it as hydrogen gas from former No. 1 product. It is an object of the present invention to provide a hydrogen gas purification device that can increase the yield of hydrogen gas purification using metal hydrides and reduce the cost.

(発明の構成) 本発明の水素ガス精製装置は、 fa+水素を吸蔵、放出し得る金属水素化物を充填した
水素ガス精製容器と、 (blこの水素ガス精製容器から放出される不純物ガス
を含むパージガスを貯蔵するパージガス貯蔵容器、 telこのパージガス貯蔵容器からのパージガス中の不
純物ガスを除去するパージガス予備精製器、及び +dlパージガスを前記粗製水素ガスとほぼ同じ圧力に
高めるパージガス昇圧器を備え、 このパージカスを粗製水素ガスに合流させるようにした
ことを特徴とする水素ガス精製装置。
(Structure of the Invention) The hydrogen gas purification apparatus of the present invention includes a hydrogen gas purification container filled with a metal hydride capable of absorbing and releasing fa + hydrogen, and a purge gas containing impurity gas released from the hydrogen gas purification container. a purge gas storage container for storing the purge gas, a purge gas prepurifier for removing impurity gas in the purge gas from the purge gas storage container, and a purge gas booster for increasing the +dl purge gas to approximately the same pressure as the crude hydrogen gas, A hydrogen gas purification device characterized in that the hydrogen gas is mixed with crude hydrogen gas.

第1図は本発明の装置の一例を示す。FIG. 1 shows an example of the apparatus of the present invention.

それぞれ金属水素化物を充填した第1及び第2の水素ガ
ス精製容器1及び2は、その入口側で分岐管15にて粗
製水素ガス供給管14と並列に接続され、この管14に
より粗製水素ガスが容器1及び2に交互に供給され、ま
た、出口側で分岐管16により精製水素ガス導出管17
とパージガス導出管18とに接続されて、精製水素ガス
及びパージガスがそれぞれ交互に各容器からこれら精製
水素ガス導出管17及びパージガス導出管18に送り出
される。
The first and second hydrogen gas purification vessels 1 and 2, each filled with a metal hydride, are connected in parallel with a crude hydrogen gas supply pipe 14 through a branch pipe 15 on the inlet side thereof, and the crude hydrogen gas is supplied through this pipe 14. is alternately supplied to the containers 1 and 2, and a purified hydrogen gas outlet pipe 17 is provided via a branch pipe 16 on the outlet side.
and the purge gas outlet pipe 18, and purified hydrogen gas and purge gas are alternately sent out from each container to the purified hydrogen gas outlet pipe 17 and the purge gas outlet pipe 18, respectively.

パージガス導出管18は分岐管19によりそれぞれパー
ジガス貯蔵容器としてのパージガスリザーバタンク5及
び6に接続され、水素ガス精製容器からのパージガスは
一方のリザーバタンクに貯蔵され、所定圧力に達したと
き、管20を経て、パーンガス予備精製器7又は8に導
かれる。図示した実施例においては、パージガスリザー
バタンクはパーンガス導出管に並列に接続されており、
一方のリザーバタンクからパージガスが予備精製器に送
られている間、水素ガス精製容器からのパージガスは他
方のリザーバタンクに供給され、所定の圧力に達するま
で貯蔵される。
The purge gas outlet pipe 18 is connected to the purge gas reservoir tanks 5 and 6 as purge gas storage containers through branch pipes 19, respectively. The purge gas from the hydrogen gas purification container is stored in one of the reservoir tanks, and when the purge gas reaches a predetermined pressure, the pipe 20 The gas is then led to a parn gas prepurifier 7 or 8. In the illustrated embodiment, the purge gas reservoir tank is connected in parallel to the purn gas outlet pipe;
While purge gas is being sent from one reservoir tank to the pre-purifier, purge gas from the hydrogen gas purification vessel is supplied to the other reservoir tank and stored until a predetermined pressure is reached.

−に記した予備精製器7及び8は、例えば、吸着剤を充
填した吸着器や気体分離膜を備えた膜分冊1器であつζ
、パーンガス中の不純物ガスを除去し、その純度を前記
粗製水素ガスとほぼ同等にする。
The pre-purifiers 7 and 8 described in - are, for example, an adsorbent filled with an adsorbent or a single membrane unit equipped with a gas separation membrane.
, the impurity gas in the parn gas is removed to make its purity almost equivalent to the crude hydrogen gas.

図示した実施例においては、予備精製器も並列に2段に
構成されており、一方がパーンガスを予備精製する間に
、他方の装置は例えば再生に4=Iされる。
In the embodiment shown, the prepurifiers are also arranged in two stages in parallel, one of which prepurifies the parn gas while the other device is, for example, 4=I for regeneration.

この予(Jfi 積製器は管23によりパージガス貯蔵
昇圧容器9又は10に接続されている。図示した実施例
においては、各貯蔵昇圧容器は、それぞれ金属水素化物
を充填した容器からなり、」1記のように予備精製され
たパージガスを吸蔵し、放出するために、内部に所定の
温度の熱媒が循環される熱媒回路11及び12をそれぞ
れ有する。即ち、金属水素化物は、予備精製されたパー
ジガスの所定量を所定の温度で吸蔵し、次いで、熱媒回
路によって所定温度に加熱されることにより、パージガ
スをi’Il製水素ガスとほぼ同じ圧力にて放出する。
This pre-storage vessel is connected by a line 23 to a purge gas storage booster vessel 9 or 10. In the embodiment shown, each storage booster vessel consists of a vessel filled with a metal hydride. As described above, in order to store and release the pre-purified purge gas, the metal hydride has heat medium circuits 11 and 12 in which a heat medium at a predetermined temperature is circulated.That is, the metal hydride is pre-purified. A predetermined amount of purge gas is stored at a predetermined temperature, and then heated to a predetermined temperature by a heating medium circuit, thereby releasing the purge gas at approximately the same pressure as the i'Il hydrogen gas.

このパージガスか粗製水素ガスに合流される。尚、パー
ジガスの冗圧にはコンプレッサーを用いてもよい。
This purge gas is combined with the crude hydrogen gas. Note that a compressor may be used to increase the pressure of the purge gas.

」1記の装置の作動を説明する。尚、簡単のために、当
初、すべての弁は閉しられているものとする。
” The operation of the device described in item 1 will be explained. For simplicity, it is assumed that all valves are initially closed.

粗製水素ガスを粗製水素ガス供給管14を経て、開閉制
御される弁32及び33により所定の圧力で第1及び第
2の水素ガス精製容器1及び2に交互に供給すると、例
えば、金属水素化物は所定の温度と圧力で水素を吸蔵し
、不純物ガスは金属水素化物に吸蔵されないで容器内に
滞留する。そこで、金属水素化物による吸蔵が完了した
後、粗製水素ガス供給弁31を閉じ、弁34及び37を
開いて不純物ガスをこの第1の容器1からパージガスと
して排出し、管18を経て、一方のパージガスリザーバ
タンク5に送入する。このようにして、水素ガス精製容
器Iからのパージガスの終了後、弁37を閉し、弁36
を開けて、容器1内の金属水素化物から水素を放出させ
、これをtFj’A水素ガスとして精製水素ガス導出管
I7より得る。精製水素ガス容器を2以上並列して設置
することにより、各容器から交互に精製水素ガスを得る
ことができると共に、パージガスリザーバタンク5には
パージガスが蓄積される。
When crude hydrogen gas is alternately supplied through the crude hydrogen gas supply pipe 14 to the first and second hydrogen gas purification vessels 1 and 2 at a predetermined pressure by valves 32 and 33 whose opening and closing are controlled, for example, metal hydride absorbs hydrogen at a predetermined temperature and pressure, and impurity gases remain in the container without being absorbed by the metal hydride. Therefore, after the storage by the metal hydride is completed, the crude hydrogen gas supply valve 31 is closed, the valves 34 and 37 are opened, and the impurity gas is discharged from this first container 1 as a purge gas. The purge gas is sent to the purge gas reservoir tank 5. In this way, after the purge gas from the hydrogen gas purification container I is finished, the valve 37 is closed, and the valve 36 is closed.
is opened to release hydrogen from the metal hydride in the container 1, and this is obtained as tFj'A hydrogen gas from the purified hydrogen gas outlet pipe I7. By installing two or more purified hydrogen gas containers in parallel, purified hydrogen gas can be obtained alternately from each container, and purge gas is accumulated in the purge gas reservoir tank 5.

パージガスリザーバタンク内のパージガス圧力が所定値
に達したとき、弁39.41.43及び46を開げ、管
20によりこのパージガスを一方のパージガス予備精製
器7に送入して、不純物ガスを除去した後、一方のパー
ジガス貯蔵胛圧容器10に送入する。この容器において
は、金属水素化物に所定量のパージガスを吸蔵させた後
、内蔵された熱媒回路12にて金属水素化物を所定の温
度に加熱し、弁49及び50を開&Jて、パージガスを
所定のlJEカに高めて放出させ、管26により前記精
製水素ガス供給管14中の粗製水素ガスに合流させる。
When the purge gas pressure in the purge gas reservoir tank reaches a predetermined value, the valves 39, 41, 43 and 46 are opened, and the purge gas is sent to one of the purge gas prepurifiers 7 through the pipe 20 to remove impurity gases. After that, the purge gas is delivered to one purge gas storage pressure vessel 10. In this container, after a predetermined amount of purge gas is stored in the metal hydride, the metal hydride is heated to a predetermined temperature in the built-in heating medium circuit 12, and the valves 49 and 50 are opened to release the purge gas. It is discharged at a predetermined level of 1JE, and is made to join the crude hydrogen gas in the purified hydrogen gas supply pipe 14 through the pipe 26.

尚、図示した実施例においては、リザーバタンクをパー
ジガス貯蔵容器として用いているが、金属水素化物を充
填した容器をパージガス貯蔵容器として用い、所定量の
パージガスを吸蔵させてもよい。また、反対にパージガ
ス貯蔵昇圧容器としてリザーバタンクを用いることがで
きる。更に、必要に応して、水素ガス精製容器からパー
ジガス放出させるに際して、金属水素化物を所定の温度
に加熱し、パージガスを所定の圧力で放出させることも
できる。
In the illustrated embodiment, a reservoir tank is used as a purge gas storage container, but a container filled with metal hydride may be used as a purge gas storage container to store a predetermined amount of purge gas. Conversely, a reservoir tank can be used as a purge gas storage pressurization container. Furthermore, if necessary, when releasing the purge gas from the hydrogen gas purification vessel, the metal hydride can be heated to a predetermined temperature and the purge gas can be released at a predetermined pressure.

(発明の効果) 以」二のようにして、本発明の装置によれば、水素ガス
精製容器から放出される不純物ガスを含むパージガスを
予備精製し、その圧力を]′11製水素ガスとほぼ同し
圧力に高めて、これに合流さ−υ、再ひ、水素ガス精製
容器に送入するので、精製水素ガスの収率が高く、従っ
て、その精製コストも低減する。
(Effect of the Invention) As described above, according to the apparatus of the present invention, the purge gas containing impurity gas discharged from the hydrogen gas purification container is pre-purified, and its pressure is approximately equal to that of hydrogen gas made in '11. Since the hydrogen gas is raised to the same pressure, combined with the same pressure, -υ, and then sent to the hydrogen gas purification vessel, the yield of purified hydrogen gas is high, and the purification cost is also reduced.

以下に実施例を挙げて本発明を説明する。The present invention will be explained below with reference to Examples.

(実施例) 図示した装置において、第1及び第2の水素ガス積製容
器に金属水素化物としてLaNi を3.55.0 kgずつ充填すると共に、各容器をそれぞれ熱媒回路に
よって、’] O’Cに保持しながら、各容器の入口4
i及び出1」弁の開閉を制御して、水素99モル%、メ
タン1モル%からなる粗製水素ガスを粗製水素ガス供給
箱から9気圧の圧力にて父n、に各容器に供給した。面
、各容器におりる水素ガスの吸蔵、パーツガス放出及び
精製水素ガス放出の1ザイクルに要する114間&;I
: 15分であった。
(Example) In the illustrated apparatus, 3.55.0 kg of LaNi as a metal hydride is filled into the first and second hydrogen gas storage containers, and each container is heated by a heating medium circuit. Inlet 4 of each container while holding at 'C'
By controlling the opening and closing of the valves 1 and 1, crude hydrogen gas consisting of 99 mol% hydrogen and 1 mol% methane was supplied to each container from the crude hydrogen gas supply box at a pressure of 9 atmospheres. 114 hours required for one cycle of storing hydrogen gas in each container, releasing part gas, and releasing purified hydrogen gas
: It was 15 minutes.

各4器にコ−9いて水素ガスの吸蔵か完了した後、吸蔵
水素量の10%をパージし、残余を精製水素ガスとして
精製水素カス導出管に放出させた。このようにして、各
容器から交互に純度99.99モル%の精製水素ガスを
得た。その取得速度は2NrI?/時であった。
After the storage of hydrogen gas in each of the four vessels was completed, 10% of the amount of stored hydrogen was purged, and the remainder was discharged as purified hydrogen gas to the purified hydrogen waste outlet pipe. In this way, purified hydrogen gas with a purity of 99.99 mol% was obtained alternately from each container. Is the acquisition speed 2NrI? / It was time.

各容器から交互にパージガスを放出させて、一方のパー
ジガスリザーバタンクに送入した。バージカスの水素純
度は平均で90モル%であった。
Purge gas was alternately released from each container and delivered to one purge gas reservoir tank. The average hydrogen purity of the Versicas was 90 mol%.

リザーバタンクにお&Jるパージガスの圧力が3.5気
圧に達したとき、このパージガスをパージガス予備精製
装置としての一方の吸着器に送入し、不純物であるメタ
ンガスを吸着除去して、水素純度約99モル%まで精製
した。
When the pressure of the purge gas in the reservoir tank reaches 3.5 atmospheres, this purge gas is sent to one adsorption device as a purge gas pre-purification device, and the impurity methane gas is adsorbed and removed, resulting in hydrogen purity of approximately It was purified to 99 mol%.

次いで、金属水素化物としてLaNi4.85AI、、
、50、5 kgずつ充填したパージガス貯蔵昇圧器に
上記予備Ii’j ′!Aシたパージガスを導入し、所
定量を貯蔵した後、熱媒回路によって金属水素化物を9
0°Cに加熱し、パージガスを9気圧の圧力に昇圧し、
管により粗製水素ガス供給管に送り出した。
Then, LaNi4.85AI, as a metal hydride,
, 50, 5 kg each in the purge gas storage booster filled with the above reserve Ii'j'! After introducing the purge gas and storing a predetermined amount, the metal hydride is removed by the heating medium circuit.
heated to 0 °C and boosted the purge gas to a pressure of 9 atmospheres,
The crude hydrogen gas was sent through a pipe to the crude hydrogen gas supply pipe.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明の方法を実施するのに好適な装置構成の例
を示す。 1.2・・・水素ガス精製容器、3.4・・・熱媒回路
、5.6・・・パージガスリザーバタンク、7.8・・
・パージガス予備精製装置、9.10・・・パージガス
貯蔵昇圧容器、11.12・・・熱媒回路、14・・・
粗製水素ガス供給管、17・・精製水素ガス導出管、1
Σ)・・・パージガス導出管。 特許出願人 積水化学工業株式会社 代表壱 g 沼 基 利
The drawings show examples of apparatus configurations suitable for carrying out the method of the invention. 1.2... Hydrogen gas purification container, 3.4... Heat medium circuit, 5.6... Purge gas reservoir tank, 7.8...
・Purge gas preliminary purification device, 9.10...Purge gas storage pressurization container, 11.12...Heating medium circuit, 14...
Crude hydrogen gas supply pipe, 17... Purified hydrogen gas outlet pipe, 1
Σ)...Purge gas outlet pipe. Patent applicant Mototoshi Numa, Representative Ichi, Sekisui Chemical Co., Ltd.

Claims (1)

【特許請求の範囲】 +1.1 (a)水素を吸蔵、放出し得る金属水素化物
を充填した水素ガス精製容器と、 +blこの水素ガス精製容器から放出される不純物ガス
を含むパージガスを貯蔵するパージガス貯蔵容器、 (C1このパージガス貯蔵容器からのパージガス中の不
純物カスを除去するパージガス予備精製器、及び (d+パージガスを前記tn製水素ガスとほぼ同し圧力
に高めるパージガス昇圧器を備え、このパージガスを粗
製水素ガスに合流させるようにしたことを特徴とする水
素ガス精製装置。
[Scope of Claims] +1.1 (a) A hydrogen gas purification container filled with a metal hydride capable of absorbing and releasing hydrogen, and +bl a purge gas for storing purge gas containing impurity gas released from the hydrogen gas purification container. A storage container, (C1) a purge gas pre-purifier for removing impurity residue in the purge gas from this purge gas storage container, and a purge gas booster that raises the purge gas to approximately the same pressure as the tn hydrogen gas, and A hydrogen gas purification device characterized in that the hydrogen gas is mixed with crude hydrogen gas.
JP59016647A 1984-01-31 1984-01-31 Purification apparatus for gaseous hydrogen Granted JPS60161305A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59016647A JPS60161305A (en) 1984-01-31 1984-01-31 Purification apparatus for gaseous hydrogen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59016647A JPS60161305A (en) 1984-01-31 1984-01-31 Purification apparatus for gaseous hydrogen

Publications (2)

Publication Number Publication Date
JPS60161305A true JPS60161305A (en) 1985-08-23
JPH049723B2 JPH049723B2 (en) 1992-02-21

Family

ID=11922137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59016647A Granted JPS60161305A (en) 1984-01-31 1984-01-31 Purification apparatus for gaseous hydrogen

Country Status (1)

Country Link
JP (1) JPS60161305A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62167204A (en) * 1986-01-17 1987-07-23 Mitsubishi Heavy Ind Ltd Method and device for continuously purifying high-purity gaseous hydrogen
JPS63282103A (en) * 1987-05-12 1988-11-18 Nippon Sanso Kk Purification of hydrogen
EP0921097A1 (en) * 1996-06-04 1999-06-09 The Kansai Electric Power Co., Inc. Method and apparatus for the purification of hydrogen
CN104760933A (en) * 2014-07-08 2015-07-08 刘小利 Novel super-pure hydrogen generator

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62167204A (en) * 1986-01-17 1987-07-23 Mitsubishi Heavy Ind Ltd Method and device for continuously purifying high-purity gaseous hydrogen
JPS63282103A (en) * 1987-05-12 1988-11-18 Nippon Sanso Kk Purification of hydrogen
EP0921097A1 (en) * 1996-06-04 1999-06-09 The Kansai Electric Power Co., Inc. Method and apparatus for the purification of hydrogen
US5956970A (en) * 1996-06-04 1999-09-28 The Kansai Electric Power Company, Inc. Hydrogen purify improving method and the apparatus for the same
CN104760933A (en) * 2014-07-08 2015-07-08 刘小利 Novel super-pure hydrogen generator
CN104760933B (en) * 2014-07-08 2018-02-02 苏州宝晶新材料科技有限公司 A kind of ultra-pure hydrogen generator

Also Published As

Publication number Publication date
JPH049723B2 (en) 1992-02-21

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