JPS60154440A - Optical mirror body for charged beam - Google Patents

Optical mirror body for charged beam

Info

Publication number
JPS60154440A
JPS60154440A JP861484A JP861484A JPS60154440A JP S60154440 A JPS60154440 A JP S60154440A JP 861484 A JP861484 A JP 861484A JP 861484 A JP861484 A JP 861484A JP S60154440 A JPS60154440 A JP S60154440A
Authority
JP
Japan
Prior art keywords
charged
beams
charged beam
lens
focused
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP861484A
Other languages
Japanese (ja)
Inventor
Akihira Fujinami
藤波 明平
Nobuo Shimazu
信生 島津
Yasushi Wada
康 和田
Akira Kikuchi
章 菊池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP861484A priority Critical patent/JPS60154440A/en
Publication of JPS60154440A publication Critical patent/JPS60154440A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement

Abstract

PURPOSE:To focus charged beams having different acceleration voltage on the same position at small incident angles while minutely stopping down by using focusing lenses, which respectively focus the respective charged beams, deflectors, which respectively deflect the charged beam directions and one common lens. CONSTITUTION:When impressing the same reference acceleration voltage on the charged beam sources 41-1 and 41-2, the radiated charged beams 51-1 and 51-2 are focused into the parallel beams through the lenses 31-1 and 31-2 for being incident on a common lens 11. The two parallel beams are focused on a fucusing position on a sample surface 1 through the common lens 11. Thereby, the amounts of deflection of the deflectors 21-1 and 21-2 are almost zeron. When the acceleration voltage of one of the charged beams sources, for instance of 41-1 is set slightly higher than the reference voltage, the beam 51-1 and the beam 51-2 can be focused on the same position by intensifying the focusing of the lens 31-1 and operating the deflector 21-1.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、加速電圧が相異なる複数個の荷電ビーム源の
像を同時に一つの試料面上に結像させる荷電ビーム用光
学鏡体に関するもので、例えば、半導体装置製造時のバ
タン描画や半導体装置の検査などに使用される。
[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to an optical mirror body for charged beams that simultaneously forms images of a plurality of charged beam sources having different acceleration voltages on one sample surface. , for example, is used for baton drawing during semiconductor device manufacturing, semiconductor device inspection, and the like.

〔発明の背景〕[Background of the invention]

従来、複数の異なる加速電圧をもつ荷電ビームを試料面
上に集束させるためには複数の荷電ビーム光学鏡筒を単
に組合わせて用いていた。そのため対物偏向系部分の設
置およびレンズ、偏向器間の電磁界分布の干渉防止にお
ける際の寸法上の問題を解決するために長いワーキング
ディスタンスの光学系を用いざるを得す、その結果収差
が大となってビームが絞れなかった。またビームのうち
のあるものは試料面への入射角が数10度と大きくなり
、その結果ビーム偏向にともなう試料面上の焦点合わせ
が困難となって、ビーム偏向量は大きな制限をうけると
いう問題点もあった。
Conventionally, in order to focus charged beams having a plurality of different accelerating voltages onto a sample surface, a plurality of charged beam optical columns were simply combined and used. Therefore, in order to solve dimensional problems in installing the objective deflection system and preventing interference in the electromagnetic field distribution between the lens and deflector, it is necessary to use an optical system with a long working distance, resulting in large aberrations. As a result, the beam could not be narrowed down. In addition, the angle of incidence of some of the beams on the sample surface is large, as large as several tens of degrees, and as a result, it becomes difficult to focus on the sample surface due to beam deflection, and the amount of beam deflection is severely limited. There were also points.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、従来技術での上記した問題点を解決し
、加速電圧を異にする複数本の荷電ビームを同一の試料
面上の位置に小さな入射角でかつ微細に絞って集束させ
ることのできる荷電ビーム用光学鏡体を提供することに
ある。
The purpose of the present invention is to solve the above-mentioned problems in the prior art, and to focus a plurality of charged beams with different acceleration voltages onto the same sample surface at a small angle of incidence and finely narrow the focus. An object of the present invention is to provide an optical mirror body for a charged beam that can perform the following.

〔発明の概要〕[Summary of the invention]

本発明の特徴は、上記目的を達成するために、加速電圧
が相異なる複数個の荷電ビーム源と、これらの荷電ビー
ム源からの各荷電ビームごとに設けられて各荷電ビーム
をそれぞれ集束させる集束レンズと、各集束レンズの後
段位置にそれぞれ設けられて荷電ビーム方向をそれぞれ
偏向させる偏向器と、これらの偏向器からの荷電ビーム
を同時に受けてそれぞれの荷電ビーム源の像を後段側の
任意の位置に結像させる一つの共通レンズとから成る光
学鏡体とするにある。
In order to achieve the above object, the present invention is characterized by a plurality of charged beam sources having different acceleration voltages, and a focusing device provided for each charged beam from these charged beam sources to respectively focus each charged beam. A lens, a deflector that is installed at a downstream position of each focusing lens and deflects the charged beam direction, and a deflector that simultaneously receives the charged beams from these deflectors and transfers the image of each charged beam source to an arbitrary position on the downstream side. An optical mirror body consisting of one common lens that forms an image at a certain position.

〔発明の実施例〕[Embodiments of the invention]

第1図は本発明の一実施例であり荷電ビームの数が2本
の場合を示す。1は試料面、11は共通レンズ、21−
1.21−2は偏向器群、51−1.62−2は集束レ
ンズ群、41−1.41−2は荷電ビーム源、51−1
.51−2は荷電ビームである。第1図では41−1.
41−2の荷電ビーム源に同一の基準となる加速電圧を
印加している場合を図示している。荷電ビーム源41−
1.41−2より放射された荷電ビーム51−1.51
−2はレンズ61−1.61−2によシ平行なビームに
集束され共通レンズ11に入射する。共通レンズ11に
より二本の平行ビームは試料面1上の焦点位置に集束さ
れる。このとき偏向器21−1.21−2の偏向量はほ
とんど零である。
FIG. 1 shows an embodiment of the present invention in which the number of charged beams is two. 1 is the sample surface, 11 is the common lens, 21-
1.21-2 is a deflector group, 51-1.62-2 is a focusing lens group, 41-1.41-2 is a charged beam source, 51-1
.. 51-2 is a charged beam. In Figure 1, 41-1.
A case is shown in which the same reference acceleration voltage is applied to the charged beam source 41-2. Charged beam source 41-
Charged beam 51-1.51 emitted from 1.41-2
-2 is focused into a parallel beam by lenses 61-1 and 61-2 and enters the common lens 11. The two parallel beams are focused by a common lens 11 onto a focal position on the sample surface 1. At this time, the amount of deflection of the deflectors 21-1 and 21-2 is almost zero.

第2図は荷電ビーム源の一方、たとえば41−1の加速
電圧を標準電圧より高めに設定した場合の状態を示して
いる。荷電ビーム51−1は標準状態より高速に運動し
ているので、第1図と同一の光学条件では、レンズ61
−1によシ集束される量が小となシ、かつ共通レンズ1
1により集束される位置は試料面1の後方となる。また
ビーム軸と直角 i方向の位置にも誤差が生ずる。
FIG. 2 shows a state in which the acceleration voltage of one of the charged beam sources, for example 41-1, is set higher than the standard voltage. Since the charged beam 51-1 is moving faster than in the standard state, under the same optical conditions as in FIG.
- The amount focused by 1 is small, and the common lens 1
The position focused by 1 is behind the sample surface 1. An error also occurs in the position in the i direction perpendicular to the beam axis.

第6図はレンズ31−1 、の集束を強めた状態を示し
ている。レンズ51−1の集束を強めたため加速電圧の
高いビーム51−1は共通レンズ11に入る前に絞られ
、さらに共通レンズ11によりて集束、偏向されて試料
面1上に焦点を結ぶ。しかし共通レンズ11によるビー
ム51−1の偏向量は加速電圧によって異なるため、ビ
ーム51−2の焦点位置とは一致しない。
FIG. 6 shows a state in which the focusing of the lens 31-1 is strengthened. Since the focusing of the lens 51 - 1 is strengthened, the beam 51 - 1 with a high acceleration voltage is focused before entering the common lens 11 , and is further focused and deflected by the common lens 11 to focus on the sample surface 1 . However, since the amount of deflection of the beam 51-1 by the common lens 11 differs depending on the accelerating voltage, it does not match the focal position of the beam 51-2.

第4図は偏向器21−1によりビーム51−1を偏向し
たことを示す図である。21−1の偏向器を作動させる
ことによシ、51−1のビームと51−2のビームを同
一位置に集束させることができる。
FIG. 4 is a diagram showing that the beam 51-1 is deflected by the deflector 21-1. By operating the deflector 21-1, the beams 51-1 and 51-2 can be focused at the same position.

第5図は特許請求の範囲第2項の実施例を示したもので
ある。第4図で述べたように21−1の偏向器と61−
1のレンズを作動させることにより、51−1のビーム
と51−2のビームを同一位置に集束させ、さらに2本
のビームを共通の偏向器乙により同時に偏向させる。こ
の場合2本のビームは加速電圧が異ガるので偏向量が異
なることになるが、偏向器21−1.21−2のいずれ
か、あるいは両方を微調整することで試料面1上に集束
させることができる。
FIG. 5 shows an embodiment according to claim 2. As described in FIG. 4, the deflector 21-1 and the deflector 61-
By operating lens 1, the beams 51-1 and 51-2 are focused on the same position, and the two beams are simultaneously deflected by a common deflector B. In this case, the two beams have different accelerating voltages, so the amount of deflection will be different, but by finely adjusting either or both of the deflectors 21-1 and 21-2, the beams can be focused on the sample surface 1. can be done.

なお共通レンズ11内のビームの径路はレンズ中心から
外れているため、収差の増大が考えられるが、これに対
しては共通レンズ11のボーア径を大きくすることによ
り対処することができる。
Note that since the beam path within the common lens 11 is deviated from the center of the lens, aberrations may increase, but this can be countered by increasing the Bohr diameter of the common lens 11.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば、異なる加速電圧
を持つ荷電ビームを同一の位置に小さな入射角でかつ微
細に絞って集束させることができる荷電ビーム用光学鏡
体を実現することができる
As explained above, according to the present invention, it is possible to realize an optical mirror body for charged beams that can finely focus charged beams having different accelerating voltages at a small angle of incidence at the same position.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の詳細な説明用の光学系配置図、第2図
、第6図、第4図はそれぞれ本発明の動作説明用の光学
系配置図、第5図は本発明の他の実施例を示す光学系配
置図である。 〔符号の説明〕 1・・・試料面 11・・・共通レンズ21−1.21
−2・・・偏向器群 61−1.61−2・・・集束レンズ群41−1.41
−2・・・荷電ビーム源51−1.51−2・・・荷電
ビーム 6・・・共通の偏向器 特許出願人 日本電信電話公社 代理人弁理士 中村純之助 tl 図 オ・・2 角 才4 図
FIG. 1 is an optical system layout diagram for explaining the present invention in detail, FIGS. 2, 6, and 4 are optical system layout diagrams for explaining the operation of the present invention, and FIG. 5 is an optical system layout diagram for explaining the operation of the present invention. FIG. 2 is an optical system layout diagram showing an example. [Explanation of symbols] 1... Sample surface 11... Common lens 21-1.21
-2...Deflector group 61-1.61-2...Focusing lens group 41-1.41
-2...Charged beam source 51-1.51-2...Charged beam 6...Common deflector Patent applicant Nippon Telegraph and Telephone Corporation patent attorney Junnosuke Nakamura tl Figure O...2 Kakusai 4 figure

Claims (2)

【特許請求の範囲】[Claims] (1)加速電圧が相異なる複数個の荷電ビーム源と、上
記荷電ビーム源からの各荷電ビームごとに設けられて各
荷電ビームをそれぞれ集束させる集束レンズと、各集束
レンズの後段位置にそれぞれ設けられて荷電ビーム方向
をそれぞれ偏向させる偏向器と、これらの偏向器からの
荷電ビームを同1゛時に受けて前記荷電ビーム源の像を
後段側の任意の位置に結像させる一つの共通レンズとか
ら成る荷電ビーム用光学鏡体。
(1) A plurality of charged beam sources with different accelerating voltages, a focusing lens provided for each charged beam from the charged beam source to focus each charged beam, and a focusing lens provided at a position subsequent to each focusing lens. a common lens that receives the charged beams from these deflectors at the same time and forms an image of the charged beam source at an arbitrary position on a subsequent stage side; Optical mirror body for charged beam consisting of.
(2)前記共通レンズはその前段、あるいは後段あるい
は内部に前記複数本の荷電ビームに共通な偏向器を備え
た共通レンズであることを特徴とする特許請求の範囲第
1項記載の荷電ビーム用光学鏡体。
(2) For a charged beam as set forth in claim 1, wherein the common lens is a common lens provided with a deflector common to the plurality of charged beams in its front stage, rear stage, or inside thereof. optical mirror body.
JP861484A 1984-01-23 1984-01-23 Optical mirror body for charged beam Pending JPS60154440A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP861484A JPS60154440A (en) 1984-01-23 1984-01-23 Optical mirror body for charged beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP861484A JPS60154440A (en) 1984-01-23 1984-01-23 Optical mirror body for charged beam

Publications (1)

Publication Number Publication Date
JPS60154440A true JPS60154440A (en) 1985-08-14

Family

ID=11697824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP861484A Pending JPS60154440A (en) 1984-01-23 1984-01-23 Optical mirror body for charged beam

Country Status (1)

Country Link
JP (1) JPS60154440A (en)

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