JPS60152584A - Rubber o-ring - Google Patents
Rubber o-ringInfo
- Publication number
- JPS60152584A JPS60152584A JP59009885A JP988584A JPS60152584A JP S60152584 A JPS60152584 A JP S60152584A JP 59009885 A JP59009885 A JP 59009885A JP 988584 A JP988584 A JP 988584A JP S60152584 A JPS60152584 A JP S60152584A
- Authority
- JP
- Japan
- Prior art keywords
- ring
- rubber
- fluorine
- corrosion
- resistant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Sealing Devices (AREA)
- Sealing Material Composition (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、ゴム製0リングに関する。更に詳しくは、表
面に被覆被膜を有するゴム製0リングに関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to rubber O-rings. More specifically, the present invention relates to a rubber O-ring having a coating on its surface.
ケミカルタンカー、化学プラントなどには、サフマージ
ドポンプか使用されていることか多く、このホ゛ンプに
はメカニカルシールが必要なため、その内部にはOリン
クが組込まれている。しかるに、このポンプの使用対象
が、ベンゼン、トルエン、キシレンなどの芳香族炭化水
素類などの場合には、通常のゴム材料では瞬時に膨潤な
どの問題が生じ、従ってこれを長期間あるいはくり返し
て使用することは不可能であった。また、最近では、耐
薬品性のすぐれたゴム材料も開発されているが、これら
は一般に非常に高価であり、汎用材料としては使用し得
ない。Submerged pumps are often used in chemical tankers, chemical plants, etc., and because these pumps require mechanical seals, O-links are built into them. However, when this pump is used for aromatic hydrocarbons such as benzene, toluene, and xylene, ordinary rubber materials can cause problems such as swelling instantaneously, making it difficult to use them for long periods of time or repeatedly. It was impossible to do so. Furthermore, recently, rubber materials with excellent chemical resistance have been developed, but these are generally very expensive and cannot be used as general-purpose materials.
しかるに、ゴム製0リングの表面を耐食性含フツ素重合
体の高周波スパッタリング被膜で波器すると、低コスト
で耐薬品性の良好なゴム1ilQリングが得られること
が、本発明者によって見出された。従って、本発明は、
かかる表面破波ゴム製0リングに係る。However, the inventors have discovered that by corrugating the surface of a rubber O-ring with a high-frequency sputtering coating of a corrosion-resistant fluorine-containing polymer, a rubber 1ilQ ring with good chemical resistance can be obtained at low cost. . Therefore, the present invention
The present invention relates to such a surface-broken rubber O-ring.
表面被覆される0リングは、フッ素ゴムなどの工業用ゴ
ム材料から成形され、その表面がポリテトラフルオロエ
チレン、ボリフ、ツ化ビニリデンなどの耐食性含フツ素
重合体のスパッタリング(被膜によって被覆される。The surface-coated O-ring is molded from an industrial rubber material such as fluororubber, and its surface is coated with a sputtering film (film) of a corrosion-resistant fluorine-containing polymer such as polytetrafluoroethylene, borif, vinylidene fluoride, etc.
被覆は、高周波スパッタリング法によって行われ、その
処理方法の一態様の概略図が第1図に示されている。The coating is performed by radio frequency sputtering, and a schematic diagram of one embodiment of the process is shown in FIG.
Rljち、真空用(図示せず)を備えた反応器1内に、
互いに対向位置にある上部電極2および下部電#i+3
をそれぞれ設置し、上部電極には取付用ネジ加工などを
施しだ円板状含フッ索車合体成形品ターゲット4を取付
けると共に、下部電極にはメタノールなどで脱脂したフ
ッ累ゴA製0’Jング5.5′を搭載する。Rlj, in a reactor 1 equipped with a vacuum (not shown),
Upper electrode 2 and lower electrode #i+3 located opposite each other
were installed, and the upper electrode was fitted with a disc-shaped fluorocarbon-containing combined molded product target 4, which was machined with mounting screws, etc., and the lower electrode was made of 0'J made from fluorocarbon A, which had been degreased with methanol, etc. Equipped with a 5.5' engine.
スパッタリング処理は、まず油拡散ポンプなどの真空ポ
ンプ(図示せず)f用いて、反応器内の空気を排気口6
から拮・気し、て、1O−5Torrのオーダー迄減圧
し、次いでバリアプルリークバルブ7を調整しるCから
圧力調整バルブ8を開け、アルゴン、などの不活性ガス
のボンベ9からのアル、ボンガスなどを反応器内に増、
入し、そこでの圧力を1O−3Torrのオーダーとす
る。ここで、排気筒のメインバルブ(図示せず)を調整
して、圧力を1O−2TorrのA−ダーとする。なお
、符号10は、圧力計である。In the sputtering process, first use a vacuum pump (not shown) such as an oil diffusion pump to exhaust the air in the reactor through the exhaust port 6.
Then, reduce the pressure to the order of 10-5 Torr, then adjust the barrier pull leak valve 7. Open the pressure adjustment valve 8 from step C, and add argon or other inert gas from the cylinder 9. Adding bongas etc. to the reactor,
The pressure there is on the order of 10-3 Torr. Here, the main valve (not shown) of the exhaust stack is adjusted to bring the pressure to A-der of 10-2 Torr. In addition, the code|symbol 10 is a pressure gauge.
スパッタリング操作は、高周波電源(i3.56MHz
)11iよびバリアプルコンデンサー12から発振され
る高周波放電によって行われるが、まず上記アルゴン圧
力下で、有効電力約50 Wで約3分間の高周波−スバ
ツタエッヂングをbなつT:Oリングの表面を清浄化し
た後、有効電力約200Wで約30分間高周波スパッタ
リングを行ない、Oリングの表面にピンホールの形成防
止および耐久性(屈曲穴を晒9
性、密着性)の点か−ら°打Tt101rm、一般には
約5μn7程度の膜厚の被膜が得られた時点で放電を停
止シ、アルゴンガスなどの導入を中止し7、メインバル
ブを閉じて、処理を一旦中止し、その後Oリングの処理
面と反対面側にも同様の処理を行なう。The sputtering operation is performed using a high frequency power source (i3.56MHz
) 11i and the barrier pull capacitor 12. First, under the above argon pressure, the surface of the O-ring is subjected to high-frequency sputter edging for about 3 minutes with an effective power of about 50 W. After cleaning, high-frequency sputtering was performed at an effective power of about 200 W for about 30 minutes, and the surface of the O-ring was sputtered to a Tt of 101 rms in order to prevent pinholes from forming on the O-ring surface and from the viewpoint of durability (flexibility and adhesion). Generally, when a film with a thickness of about 5 μm is obtained, the discharge is stopped, the introduction of argon gas, etc. is stopped, the main valve is closed, the process is temporarily stopped, and then the treated surface of the O-ring is Perform the same process on the opposite side.
このようにして処理された、膜厚5μmのポリテトラフ
ルオロエチレンのスパッタリング被膜で表面被覆された
O IJングの耐薬品性の効果を確認するために、室温
下(26〜30℃)にトルエンへの浸漬試験を行ない、
彰潤による重量増加率を測定した。得られた結果は、次
の表に示される。In order to confirm the chemical resistance effect of the thus treated O-IJ, the surface of which was coated with a polytetrafluoroethylene sputtering film with a film thickness of 5 μm, it was added to toluene at room temperature (26-30°C). We conducted an immersion test of
The weight increase rate due to Akijun was measured. The results obtained are shown in the following table.
浸漬時間(分) 未処理0リング 表面波No’)ング
5 +0.10% 0
10 +0.12% 0
100 +0.62% +0.07%
5(1(1+1.60% +(1,25%1000 +
2.38% +0.74%5000 ’ +5.0 %
+1.65%以上の結果からも分るように、スパッタ
リング材料とし、て用いられた耐食性含フッ繁重合体と
はその組成や化学的打付を異にする高周波スパッタリン
グ被膜で表面被覆されたO l)ングは、従来から耐薬
品性のすぐれていることで各部に使用されているフッ素
ゴム0リングの約%以下の膨潤性しか示さず、良好な耐
薬品性を有している。捷だ、破折ざわ、;/(、被膜の
厚さが薄くとも、高周波スパッタリング被膜のため密着
性も良好で、耐屈曲性があり耐久性の点でもすぐれてい
る。Immersion time (min) Untreated 0 ring Surface wave No. 5 +0.10% 0 10 +0.12% 0 100 +0.62% +0.07% 5(1(1+1.60% +(1,25%) 1000+
2.38% +0.74%5000' +5.0%
As can be seen from the results of +1.65% or more, the O l surface was coated with a high-frequency sputtering film that was different in composition and chemical application from the corrosion-resistant fluorinated polymer used as the sputtering material. ) ring has good chemical resistance, showing only about % less swelling than the fluororubber O-ring used in various parts due to its excellent chemical resistance. Even though the coating is thin, it has good adhesion because it is a high-frequency sputtering coating, and it has excellent bending resistance and durability.
4 図面の簡@’、 72 f、I4明第1図は、本発
明で適用される高周仮スパッタリング法の概略図でaつ
る。Figure 1 is a schematic diagram of the high-frequency temporary sputtering method applied in the present invention.
(符号の説明)
1・・・・・・反応器
2・・・・・・上部電極
3・・・・・下部電極
4・・・・・・含フッ索車合体ターゲット5・・・・・
・ゴム製Oリング
9・・・・・・不活性ガスボンベ
11・・・・・高周波型nり1
12・・・・・パリアブAコンデンサー代理人
弁迎[士 古 [IXI 倭 失(Explanation of symbols) 1... Reactor 2... Upper electrode 3... Lower electrode 4... Fluorine-containing cable car combination target 5...
・Rubber O-ring 9...Inert gas cylinder 11...High frequency type nri 1 12...Pariabu A condenser representative reception [Shiko [IXI Wa lost]
Claims (1)
ング被膜−C表面が被板されたゴム製0リング。 2、耐食性含フツ素本合体がポリテトラフルオロエチレ
ンである特許曲水ノftklhm l 項記go −f
ム製0リンク。 3、厚己約1〜10μmの被膜で表面が被覆された特許
請求の範囲第1項または第2墳記載のゴム製0リング。[Scope of Claims] A rubber O-ring whose surface is coated with a high-frequency snow-cutter nong film-C made of a tiUV edible fluorine-containing polymer. 2. Patent curved water in which the corrosion-resistant fluorine-containing main body combination is polytetrafluoroethylene.
0 link made by Mu. 3. A rubber O-ring according to claim 1 or 2, the surface of which is coated with a coating having a thickness of about 1 to 10 μm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59009885A JPS60152584A (en) | 1984-01-23 | 1984-01-23 | Rubber o-ring |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59009885A JPS60152584A (en) | 1984-01-23 | 1984-01-23 | Rubber o-ring |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60152584A true JPS60152584A (en) | 1985-08-10 |
JPH0455233B2 JPH0455233B2 (en) | 1992-09-02 |
Family
ID=11732596
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59009885A Granted JPS60152584A (en) | 1984-01-23 | 1984-01-23 | Rubber o-ring |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60152584A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH067075U (en) * | 1992-07-03 | 1994-01-28 | 岩谷産業株式会社 | Seal structure in a cryostat for a vibrating sample magnetometer |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS515391A (en) * | 1974-07-04 | 1976-01-17 | Toa Gosei Chem Ind | Kitaihyomenni jugotaisookeiseisaseruhoho |
JPS52108476U (en) * | 1976-02-16 | 1977-08-18 | ||
JPS58184363A (en) * | 1982-04-19 | 1983-10-27 | Nippon Pillar Packing Co Ltd | Packing |
-
1984
- 1984-01-23 JP JP59009885A patent/JPS60152584A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS515391A (en) * | 1974-07-04 | 1976-01-17 | Toa Gosei Chem Ind | Kitaihyomenni jugotaisookeiseisaseruhoho |
JPS52108476U (en) * | 1976-02-16 | 1977-08-18 | ||
JPS58184363A (en) * | 1982-04-19 | 1983-10-27 | Nippon Pillar Packing Co Ltd | Packing |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH067075U (en) * | 1992-07-03 | 1994-01-28 | 岩谷産業株式会社 | Seal structure in a cryostat for a vibrating sample magnetometer |
Also Published As
Publication number | Publication date |
---|---|
JPH0455233B2 (en) | 1992-09-02 |
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