JPS60135949A - Production for optical formed article - Google Patents
Production for optical formed articleInfo
- Publication number
- JPS60135949A JPS60135949A JP58250760A JP25076083A JPS60135949A JP S60135949 A JPS60135949 A JP S60135949A JP 58250760 A JP58250760 A JP 58250760A JP 25076083 A JP25076083 A JP 25076083A JP S60135949 A JPS60135949 A JP S60135949A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- optical
- formed article
- density
- photomolded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Abstract
Description
【発明の詳細な説明】
（技術分野）
本発明は、例えば、光ファイバを利用した情報伝送シス
テムに用いられる光分岐結合器、光を利用しｆｃＩ！ン
サー、データタブレット、ディスプレイ等νζ用いらｆ
’Ｌ６モ而光回路光回路は＠光性樹脂を用いた印刷版、
型取り用の版の如き光成形体の製造方法に関する、
（背景技術）
従来、元ファイバ金用いたデータバス系等の光１＋ｖ報
伝送／ステム系における光分岐方法として、尤７ｆイバ
同志を接合する方法、あるいはレンズ、・・−７ミラー
等の光学部品を組合せる方法で実用化されているが、前
者の４合、接合部分のＺＩｌｌ玉が難かしく分岐数、分
岐比に制約があり、また、後者の場会、光軸調整が錐か
しく小型化が困難である等の欠点かあった。Detailed Description of the Invention (Technical Field) The present invention relates to an optical branching coupler used in an information transmission system using optical fibers, and an fcI! sensors, data tablets, displays, etc.
'L6 Moji Optical Circuit The optical circuit is a printing plate using photoresin,
(Background technology) Conventionally, as an optical branching method in optical 1+V information transmission/stem systems such as data bus systems using original fiber gold, 7F fibers are joined together. This method has been put into practical use by combining optical components such as lenses, lenses, and -7 mirrors, but the former method is difficult because of the ZIll beads at the joints, and there are restrictions on the number of branches and branching ratio. In addition, in the latter case, there were drawbacks such as the optical axis adjustment being difficult and miniaturization difficult.
また、上記欠点を改善する目的で、第１図に示すように
、透明性基板１上に形成さｎた感光性物質２に、所定パ
ターンのホトマスク３を重ね、その上から丸源４で４光
することにより、任意形状の光導波路の如き光１成形体
５を形成する方法が提案きれている（特開昭５４−１３
０１４３号、特開昭５０−２２６４８号等）。これは従
来の感光性樹脂ケ用いて印刷版等を製造する技術と類似
しており、該雑な形状の加工も再現性良く行なえるとい
う利点がある。In addition, in order to improve the above-mentioned drawback, as shown in FIG. A method of forming a light 1 molded body 5 such as an optical waveguide of an arbitrary shape by using light has been proposed (Japanese Patent Laid-Open No. 54-13
No. 0143, JP-A-50-22648, etc.). This is similar to the conventional technique of manufacturing printing plates and the like using photosensitive resins, and has the advantage that processing of rough shapes can be carried out with good reproducibility.
しかしながら、小かる方法で形成した光成形体５は、第
１図Ｈｂ）に示すように断面が略矩形であるため、該光
成形体５を光導波路として利用した場合、尤ファイバと
の接合に、６−いＣ析面杉犬の違い（′＃、ファイバの
Ｅ折面は円形である）による九の接続損失を生じる入点
かあり、また、印刷版とＬ ゛Ｃ利用した場合は、型取
りを行うときに離型しにくい等の入点があった。However, since the optical molded body 5 formed by the small method has a substantially rectangular cross section as shown in FIG. , 6. There is an entry point that causes a splice loss of 9 due to the difference in C analysis plane ('#, the E fold plane of the fiber is circular), and when using a printing plate and L゛C, There were some issues such as difficulty in releasing the mold when making a mold.
（発明の目的）
本発明は上記の欠点に鑑＝２１−なされたもので、その
目的とするところは、漫らｎる光成形体を光導波路とし
て利用した場合、尤ファイバとの接続損失がなく、印刷
版として利用した場合、・離型が容易な光成形体の製造
方法を提供するにある。(Objective of the Invention) The present invention has been made in view of the above-mentioned drawbacks, and its purpose is to reduce the connection loss with the fiber when a randomly shaped optical body is used as an optical waveguide. The object of the present invention is to provide a method for producing a photomolded article that is easy to release from the mold when used as a printing plate.
（発明の開示〕
本発明は、感光性′＃Ｊ質にホトマスフケ介して曙光し
所望パターンの光成形棒金形成する製造方法において、
上記ホトマスクのマスク濃度ケ異ならせ、得られる光成
形体の角部に丸みをもたせたことｔ特漱とする。(Disclosure of the Invention) The present invention provides a manufacturing method in which light is formed on a photosensitive '#J material through a photomass flake to form a photomolded metal bar with a desired pattern.
The mask density of the above-mentioned photomasks was varied, and the corners of the resulting photomolded product were made to have rounded corners.
第２図は本発明に係る製造工程の一例を模式的に示す図
で、同図（ＩＬハ・ま曙光プロセスを示し、同図（ｂ）
は非露九部金洗い出した鏝の尤成形体金示す。FIG. 2 is a diagram schematically showing an example of the manufacturing process according to the present invention.
The figure shows the gold molded body of a trowel that has been washed without dew.
図において、１１は透明ｊ生基板、１２ばＩ感光性物質
、１３は後述のホトマスク、１４は光源−１１５は光成
形体である。In the figure, 11 is a transparent raw substrate, 12 is an I photosensitive material, 13 is a photomask to be described later, 14 is a light source, and 115 is a photomolded body.
而して、ホトマスク１３は第３図ｊａ）に示スヨうに、
ＩＭ蔽部Ａ、半漉蔽部Ｂ１非遮蔽部Ｃからなり該マスク
１３の４度分布は第３図Ｂｂ）の通りである。。Thus, the photomask 13 is as shown in FIG.
The 4 degree distribution of the mask 13, which consists of an IM shielding part A, a semi-shielding part B1 and a non-shielding part C, is as shown in FIG. 3Bb). .
な分、マスク濃度ｔこ磯淡金つける方法としては、マス
クの＋１本を変える方法、乳剤濃度を変える方法等があ
る。However, there are several ways to increase the mask density, such as changing the +1 line of the mask and changing the emulsion density.
かかる製造方法Ｖｔｂい゛Ｃ１感光物質１２が感光に要
する砲和曜光遺ｔＷ１とすれば、ｑ先光強度Ｉ。If the amount of light required for exposure of the photosensitive material 12 is tW1, then the light intensity at q is I.
及ヒヘ光時間ｔは次の関係を満足する必要がある。The light time t must satisfy the following relationship.
１旦し、
１１・・・非嗅・液部ｃＶこおける透過強度Ｉ２．、、
！卜遮１蔽部Ｂにおける透過強度に１ 、、、非、＋ｌ
蔽部Ｃの光透過係数に２１１．半嶋蔽部Ｂの光透過係数
Ｄ１・・・ マスク１３の厚み
Ｋ・・・ 感光性物質１２の光透過係数Ｄ・・・ 感光
性物質１２の厚み
ｋ・・・ 透明性基板１１の光透過係数（１・・・ 透
明性基板ｌｌの厚み
次に実施例について述べる。−ド記配合の光硬化不飽和
ポリエステル樹脂より成る感光性物質１２に、第３図に
示す如きホトマスク１３に通して曙光し、洗い出しを行
ない、厚さ及び幅がいずれも２羽の光成形体１５に作製
した結果、角部には半径約０．８ｍ＋の丸みが形成され
た。11... Transmission intensity in the non-olfactory/liquid part cV I2. ,,
! Transmission intensity at shielding part B is 1,,, non, +l
The light transmission coefficient of the shielding part C is 211. Light transmission coefficient D1 of half-covering portion B... Thickness K of mask 13... Light transmission coefficient D of photosensitive material 12... Thickness k of photosensitive material 12... Light transmission of transparent substrate 11 Coefficient (1... Thickness of transparent substrate 11) Next, an example will be described. Then, washing was performed to produce an optically molded article 15 having two thicknesses and two widths, and as a result, rounded corners with a radius of approximately 0.8 m+ were formed.
く光硬化性不飽和ポリエステル樹脂〉
（発明の効果）
本発明に係る製法にｊり形成された光成形体Ｖま、Ｊ：
、記のように角部に丸み金もつため、該光成形体音光導
波路として利用した場合は、光ファイバとの接続損失の
ない、また、印刷版として利用した場合Ｖｉ、雛型か容
嶋な光成形体を提供できる。Photocurable unsaturated polyester resin> (Effects of the invention) Photomolded articles V, J formed by the manufacturing method according to the present invention:
As shown in the following, the light molded body has rounded corners at the corners, so when it is used as an acoustic waveguide, there is no connection loss with the optical fiber, and when it is used as a printing plate, it can be It is possible to provide a photomolded body.
第１図は従来例の製造工程の模式図で、ｔａ）は露光プ
ロセスを（ｂ）ｆ’！非疼ｔｔ部全洗い出した後の光成
形体を示す。第２図ｉｄ本発明に係るＪＪ！！＋告工桿
の一同を示す模式図で、（ａ）は曙光プロセスを、（ｂ
）は非雌光部金洗い出しｆＣ陵の光成形体乞示す。＠３
図（＋Ｌ）は本発明に係るホ１マスクの断面図、４３図
（ｂ）は同上のマスク濃度分布を示すグラフでめる。
１２・・・ｉ盛尤性１勿１、ｔａ・・・ホトマスク１４
・・・光 源 １５・・・光成形体特許出願人
松下電工株式会社
代理人弁理士 竹 元 敏 丸
（ほか２名）
第１図
（ａ）
Δ
（ｂ）
４
（ｂ）
第３図
（ａ）
（ｂ）FIG. 1 is a schematic diagram of a conventional manufacturing process, where ta) shows the exposure process and (b) f'! The photomolded product is shown after the non-painful part has been completely washed out. Figure 2 id JJ according to the present invention! ! +Schematic diagram showing all members of the Cheong-Geong, (a) shows the dawning process, (b)
) shows a photo-molded body of a non-metallic gold-washed fC-shaped body. @3
Figure (+L) is a cross-sectional view of the H1 mask according to the present invention, and Figure 43 (b) is a graph showing the mask concentration distribution. 12...i likelihood 1 but 1, ta...photomask 14
...Light source 15... Photomolded object patent applicant Matsushita Electric Works Co., Ltd. Representative Patent Attorney Toshimaru Takemoto (and 2 others) Figure 1 (a) Δ (b) 4 (b) Figure 3 ( a) (b)
Claims (1)
望パターンの光成形体を形成する製造方法に督いＣ１上
記ホトマスクのマスク一度を異ならせ、得らｎる光成形
体の角部に丸みをもたせたことを特徴とする光成形体の
製造方法、(1) The photosensitive material Q is explained in the manufacturing method of forming a photomolded article with a desired pattern through a tomask. A method for producing a photomolded object characterized by having a rounded shape,
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58250760A JPS60135949A (en) | 1983-12-23 | 1983-12-23 | Production for optical formed article |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58250760A JPS60135949A (en) | 1983-12-23 | 1983-12-23 | Production for optical formed article |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60135949A true JPS60135949A (en) | 1985-07-19 |
Family
ID=17212631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58250760A Pending JPS60135949A (en) | 1983-12-23 | 1983-12-23 | Production for optical formed article |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60135949A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2590376A1 (en) * | 1985-11-21 | 1987-05-22 | Dumant Jean Marc | MASKING METHOD AND MASK USED |
| JPH02309303A (en) * | 1989-05-25 | 1990-12-25 | Semiconductor Res Found | Semiconductor device having heterostructure |
| US5098815A (en) * | 1988-07-11 | 1992-03-24 | E. I. Du Pont De Nemours And Company | Process for the production of dielectric layers in planar circuits on ceramics substrates |
| WO2015018672A1 (en) * | 2013-08-06 | 2015-02-12 | Ams Ag | Method of producing a resist structure with undercut sidewall |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4858780A (en) * | 1971-11-24 | 1973-08-17 | ||
| JPS5877231A (en) * | 1981-11-04 | 1983-05-10 | Hitachi Ltd | Taper formation of resist pattern |
| JPS59128540A (en) * | 1983-01-13 | 1984-07-24 | Fujitsu Ltd | Photomask |
| JPS59135468A (en) * | 1983-01-24 | 1984-08-03 | Nec Corp | Exposing mask |
-
1983
- 1983-12-23 JP JP58250760A patent/JPS60135949A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4858780A (en) * | 1971-11-24 | 1973-08-17 | ||
| JPS5877231A (en) * | 1981-11-04 | 1983-05-10 | Hitachi Ltd | Taper formation of resist pattern |
| JPS59128540A (en) * | 1983-01-13 | 1984-07-24 | Fujitsu Ltd | Photomask |
| JPS59135468A (en) * | 1983-01-24 | 1984-08-03 | Nec Corp | Exposing mask |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2590376A1 (en) * | 1985-11-21 | 1987-05-22 | Dumant Jean Marc | MASKING METHOD AND MASK USED |
| US4762396A (en) * | 1985-11-21 | 1988-08-09 | Dumant Jean M | Masking method |
| US5098815A (en) * | 1988-07-11 | 1992-03-24 | E. I. Du Pont De Nemours And Company | Process for the production of dielectric layers in planar circuits on ceramics substrates |
| JPH02309303A (en) * | 1989-05-25 | 1990-12-25 | Semiconductor Res Found | Semiconductor device having heterostructure |
| WO2015018672A1 (en) * | 2013-08-06 | 2015-02-12 | Ams Ag | Method of producing a resist structure with undercut sidewall |
| US9766546B2 (en) | 2013-08-06 | 2017-09-19 | Ams Ag | Method of producing a resist structure with undercut sidewall |
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