JPS60131899A - Manufacture of silicon carbide whisker - Google Patents

Manufacture of silicon carbide whisker

Info

Publication number
JPS60131899A
JPS60131899A JP58237698A JP23769883A JPS60131899A JP S60131899 A JPS60131899 A JP S60131899A JP 58237698 A JP58237698 A JP 58237698A JP 23769883 A JP23769883 A JP 23769883A JP S60131899 A JPS60131899 A JP S60131899A
Authority
JP
Japan
Prior art keywords
silicon carbide
reaction
carbon
whiskers
atmosphere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58237698A
Other languages
Japanese (ja)
Other versions
JPH03353B2 (en
Inventor
Atsushi Asano
淳 浅野
Tetsuo Kato
加藤 哲郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKAI KOUNETSU KOGYO KK
Original Assignee
TOKAI KOUNETSU KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKAI KOUNETSU KOGYO KK filed Critical TOKAI KOUNETSU KOGYO KK
Priority to JP58237698A priority Critical patent/JPS60131899A/en
Publication of JPS60131899A publication Critical patent/JPS60131899A/en
Publication of JPH03353B2 publication Critical patent/JPH03353B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/005Growth of whiskers or needles
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/36Carbides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To manufacture safely a titled silicon carbide whisker at low cost and in high yield by allowing Si3N4 to react with C by heating in a nonoxidizing atmosphere. CONSTITUTION:An Si3N powder and powdery C are charged into a tubular vessel made of graphite. A nonoxidizing gas contg. 0.1-90vol% CO is introduced into the vessel, and the vessel is heated at 1,400-1,900 deg.C to carry out the reaction. A silicon carbide whisker is manufactured in this way. The reaction pressure is not specifically limited and the reaction proceeds even under ordinary pressure.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は炭化ケイ素ウィスカーの製造方法に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a method for producing silicon carbide whiskers.

〔従来技術〕[Prior art]

従来、炭化ケイ素ウィスカーの製造方法として様々な方
法が提案されている。原料としてのケイ素源に着目する
と、5tcz4のような塩化物、酸化物(5102) 
、あるいは単体(Si )と酸化物(Sin2)の混合
物を用いたものが多く、原料として窒化ケイ素(5ij
N4)を用いた例は少Aい。原料として5lC24のよ
うな塩化物を用いる方法は、低温で加熱処理できるとい
う長Qi&もっているが、原料が加水分解され易く、取
扱いが録しいために、工業的に有オ!Iな方法とはいえ
ない。また、原料として酸化物(5h02) 、あるい
は単体(Si)と酸化物(5102) とを用いる方法
では、生成し1ヒSiCウイスカー中に&科Sin、が
!B4留するため梢製工根が必費であり、しかも収率が
低いので安価な原料を用いているにも拘らず、製造コス
トが高くなるという欠点がある。さらに、特公昭、to
−17200号公報には、窒化夛イ累をケイ素源として
用いる方法が開示守れている。この方法は、窒化ケイ素
粉末と炭素質粉末を、水系中にて/3θθ℃〜/S00
℃で7時間以上加熱反応させるものである、しかしこの
方法は、水素雰囲気中で行うため、爆発防止のための十
分な配慮が必要であり、収率も惨めて低く、工業的に十
分有利な方法とはいえない。
Conventionally, various methods have been proposed as methods for producing silicon carbide whiskers. Focusing on silicon sources as raw materials, chlorides and oxides (5102) such as 5tcz4
, or a mixture of a simple substance (Si) and an oxide (Sin2), and silicon nitride (5ij) is used as the raw material.
There are few examples using N4). Methods using chlorides such as 5lC24 as raw materials have a long Qi and can be heat-treated at low temperatures, but the raw materials are easily hydrolyzed and are difficult to handle, making them difficult to use industrially. It cannot be said to be an ideal method. In addition, in the method of using oxide (5h02) or simple substance (Si) and oxide (5102) as raw materials, & family Sin is produced in the SiC whiskers! Since B4 distillation is carried out, tree cutting is necessary, and the yield is low, so even though inexpensive raw materials are used, the manufacturing cost is high. In addition, Tokkosho, to
Japanese Patent Application No. 17200 discloses a method of using nitride as a silicon source. In this method, silicon nitride powder and carbonaceous powder are mixed in an aqueous system at /3θθ℃~/S00
The reaction is carried out by heating at ℃ for 7 hours or more. However, this method requires sufficient consideration to prevent explosions because it is carried out in a hydrogen atmosphere, and the yield is also extremely low, making it difficult to achieve industrial advantages. It cannot be called a method.

〔発明の目的〕[Purpose of the invention]

したがって本発明の目的は、低コスト、鍋収率かつ安全
に炭化ケイ素ウィスカーを製造する方法を提供すること
である。
Therefore, it is an object of the present invention to provide a method for producing silicon carbide whiskers at low cost, pot yield and safety.

〔発明の構成〕[Structure of the invention]

本発明者らは、窒化ケイ素(5lsN4) t−ケイ素
源として用いる炭化ケイ累ウィスカーの装造方法につい
て鋭意研究の結果、窒化ケイ素と炭素の反応系中に一酸
化炭素を任在させることにより上記目的が通数されるこ
とを見出し、本発明全完成するに至った。
The present inventors have conducted intensive research on a method for preparing silicon carbide whiskers used as a silicon nitride (5lsN4) t-silicon source. They found that the purpose of the invention was to be repeated, and the present invention was completed.

すなわち本発明に、窒化ケイ素と炭素ヲ、−酸化炭素を
宮む非酸化性雰囲気中で加熱反応させることを特徴とす
る炭化ケイ素ウィスカーの装造方法である。
That is, the present invention is a method for preparing silicon carbide whiskers, which is characterized by carrying out a heating reaction in a non-oxidizing atmosphere containing silicon nitride, carbon, and carbon oxide.

原料として窒化ケイ素と炭素を用い、水素雰囲気中で加
熱処理して炭化ケイ素つイスカーヲ#!造する、前記特
公昭30’−17200号公報記載の方法では、式Iに
示すような、窒化ケイ素と炭素との直接−的な反応によ
り、炭化ケイ素ウィスカーが生成するものと考えられる
Using silicon nitride and carbon as raw materials, heat treatment in a hydrogen atmosphere produces silicon carbide! In the method described in Japanese Patent Publication No. 30'-17200, silicon carbide whiskers are thought to be produced by a direct reaction between silicon nitride and carbon as shown in Formula I.

Si、N4+3C→、J’SIG +−2N2↑ 中こ
れに対し、本発明の方法では、窒化ケイ素と炭素を含む
反応系中に、−酸化炭素ガスを存在させることを特徴と
している。以下の理論に拘泥するものではないが、本発
明では、第/段階として、鴛化ケイ素と一酸化炭素が反
応して中間生Fy:、物510を生成しく式■)、次に
このSiOが炭素と反応して炭化ケイ累ウィスカーSi
Cf生成しく式III)、また、弐■の反応により同時
に生成した一酸化炭素は再び式…の反応に循環使用され
る、すなわちこの反応糸において一酸化炭素は一種の触
媒として作用しているものと考えられる。
Si, N4+3C→, J'SIG +-2N2↑ In contrast, the method of the present invention is characterized in that -carbon oxide gas is present in the reaction system containing silicon nitride and carbon. Although not bound by the following theory, in the present invention, as the first step, silicon silica reacts with carbon monoxide to form an intermediate product Fy (formula 510), and then this SiO is Reacts with carbon to form silicon carbide whiskers
Cf is generated (Formula III), and the carbon monoxide simultaneously generated by the reaction of 2) is recycled and used again for the reaction of the formula... In other words, carbon monoxide acts as a kind of catalyst in this reaction thread. it is conceivable that.

313N4千3C0→、7510 +3C+JN2↑叩
、7SiO+ l、C→3SiC+ 3COuI11本
発明において、反応系雰囲気中の一酸化炭素鑓度は0.
/体Mt%以上であることが好ましい。
313N4,0003C0→, 7510 +3C+JN2↑knock, 7SiO+ l, C→3SiC+ 3COuI11 In the present invention, the carbon monoxide concentration in the reaction system atmosphere is 0.
/body Mt% or more is preferable.

これより低濃度では粒状炭化ケイ素が生成し、ウィスカ
ー状炭化ケイ素の瞥率は極端に少なくなる。
At a concentration lower than this, granular silicon carbide is produced, and the visibility of whisker-like silicon carbide becomes extremely small.

−酸化炭素濃度の上限は特にないが、原料窒化ケイ素の
分解によV猿集ガスが発生するため、−酸化炭lam度
は通常、7θ体lA%程度より高くならない。
- Although there is no particular upper limit for the carbon oxide concentration, since V-synthesis gas is generated by decomposition of the raw material silicon nitride, - the carbon oxide lam degree usually does not become higher than about 1A% of 7θ body.

本発明において、反応系雰囲気中には一酸化炭一索以外
の非酸化性ガス、例えは窒素、アルゴンまたはこれらの
混合ガスを含有iせることかできる・本発明では、反応
系雰囲気が非酸化性でありかつ一酸化炭素を、好ましく
は0./体績多以上含んでいれはよく、必ずしも非酸化
性雰囲気ガスを反応系中に積極的に流入させたり、攪拌
、循環させる必貴銑ない。したがって、−酸化炭素を含
む、窒素あるいはアルゴンのような非酸化性ガスを反応
系中に送り込みながら、あるいは、−酸化炭素を含む非
酸化性ガス、または−酸化炭素ガスで反応容器中の雰囲
気を置換した後、加熱反応させればよい。また反□応糸
は原料炭素を含んでいるので、反応容器中の当初の雰囲
気が酸化性雰囲気であっても、これを加熱によって一酸
化炭素を含む非酸化性雰囲気に変換することができる。
In the present invention, the reaction atmosphere may contain a non-oxidizing gas other than carbon monoxide, such as nitrogen, argon, or a mixture thereof.In the present invention, the reaction atmosphere may contain a non-oxidizing gas other than carbon monoxide. carbon monoxide, preferably 0. /It is good to include more than that in the past, but it is not necessarily necessary to actively flow, stir, or circulate a non-oxidizing atmospheric gas into the reaction system. Therefore, - while feeding a non-oxidizing gas, such as nitrogen or argon, containing carbon oxide into the reaction system, - or - creating an atmosphere in the reaction vessel with a non-oxidizing gas containing carbon oxide, or - carbon oxide gas. After the substitution, a heating reaction may be performed. In addition, since the reaction yarn contains raw material carbon, even if the initial atmosphere in the reaction vessel is an oxidizing atmosphere, it can be converted into a non-oxidizing atmosphere containing carbon monoxide by heating.

本発明方法において反応温度は、/’700〜/900
Cが好ましい。/lI0θCより低いとウィスカーの生
成収率が低くなり、−力、/900CよV高いと、炭化
ケイ素のβ→α転移によりウィスカーが破壊されるので
好ましくない。キャリヤーガスとしてアルゴンを用いる
と、/4t00℃でウィスカーが得られるが、窒素を用
いた場合には、7500℃以上にしないと、ウィスカー
の生成収率が十分^くならない。
In the method of the present invention, the reaction temperature is /'700 to /900
C is preferred. If the V is lower than /lI0θC, the yield of whiskers will be low, and if the V is higher than /900C, the whiskers will be destroyed by β→α transition of silicon carbide, which is not preferable. When argon is used as the carrier gas, whiskers can be obtained at /4t00°C, but when nitrogen is used, the whisker production yield will not be sufficient unless the temperature is 7500°C or higher.

本発明の反応圧力は、特に制限されない。一般に常圧で
十分に反応が進行する。
The reaction pressure of the present invention is not particularly limited. Generally, the reaction proceeds satisfactorily at normal pressure.

本発明によれは、−酸化炭素ガス、キャリャーガスの有
無、キャリヤーガスの種類、加熱温度を調整することに
より、生成するウィスカーの形状を任意に変えることが
できる。
According to the present invention, the shape of the generated whiskers can be arbitrarily changed by adjusting the presence or absence of carbon oxide gas, carrier gas, type of carrier gas, and heating temperature.

たとえば、長いウィスカーを製造するには、一般的に、
−酸化炭素濃度は低い方がよく、加熱温度も低い方がよ
い。筐た、キャリヤーガスを使用する場合、アルゴンよ
り舅累1i−使用した方が長いウィスカーが得られる傾
向が強い。さらに炭素源として、結晶性の低いものを用
いた方が、長いウィスカーが得られることが多く、さら
にまた、窒化ケイ素と炭素の粉末を混合して使用する場
合、充填密度が低くなるに従い、長いウィスカーが得ら
れるようになる。このようにして、本発明によれば、長
さ2θ−j 00 #= % 直径0.1−20μmn
程度のウィスカーを、任意に高収率で得ることができる
For example, to produce long whiskers, typically
-The lower the carbon oxide concentration, the better, and the lower the heating temperature. When a carrier gas is used, longer whiskers are more likely to be obtained when a carrier gas is used than when argon is used. Furthermore, long whiskers are often obtained when a carbon source with low crystallinity is used, and furthermore, when a mixture of silicon nitride and carbon powder is used, the lower the packing density, the longer the whiskers. Whiskers can now be obtained. Thus, according to the invention, length 2θ-j 00 #=% diameter 0.1-20 μmn
whiskers can be obtained in optionally high yields.

本発1J4に使用される、原料屋化ケイ累および炭素の
形状は特に限定されない。両者の粉末全混合し、またに
混合することなく反応系中に存在させ九はよい。また、
籍に粉末にすることなく、塊状で使用しても反応が進行
し、炭化ケイ素ウィスカーが得られる。さらには、一方
の素材でつくられfc答器中に他方の素剃の粉末または
塊状物全存在させて反応させることもできる。
The shapes of the raw material silica and carbon used in the present invention 1J4 are not particularly limited. It is best to completely mix the powders of both powders, or to have them present in the reaction system without mixing them. Also,
Even if it is used in bulk form without powdering, the reaction proceeds and silicon carbide whiskers are obtained. Furthermore, it is also possible to cause the reaction to take place in an FC reactor made of one material, with the powder or lumps of bare shaving of the other material present in its entirety.

〔発明の効果〕〔Effect of the invention〕

本発明によれは、不純物の少ない高品質の炭化ケイ素ウ
ィスカーを、低コスト、尚収率かつ賃金に製造すること
ができる、 〔実施例〕 以下、実施例および比較例により本発明をさらに具体的
に説明する。なお実施例および比較例中、ウィスカーの
「収率」は次式により算出した。
According to the present invention, high-quality silicon carbide whiskers with few impurities can be produced at low cost, high yield, and low cost. Explain. Note that in the Examples and Comparative Examples, the "yield" of whiskers was calculated using the following formula.

実施例/〜3θ α及びβを含む窒化ケイ素粉末/、4tK2と粉末状炭
素θ、6に9との混合物を、黒鉛製チューブ容器(/、
33.グダx10/、6’XAOOt)円に充填し、グ
ラファイト抵抗発熱体(22g1 x15.2.グ’X
210θL)を使用した連続式横型算囲気炉中において
、表に示すような所定の温度、所定の雰囲気、送り速度
23 wm / mi nで該チューブ容器を加熱焼成
した。雰囲気ガス社該チューグ容器の送り方向と逆向き
に流量SQL/mnでチューブの出口側から供給した。
Example/Silicon nitride powder containing ~3θ α and β/A mixture of 4tK2 and powdered carbon θ, 6 and 9 was placed in a graphite tube container (/,
33. Fill the circle with graphite resistance heating element (22g1 x15.2.g'X
The tube container was heated and fired in a continuous horizontal enclosed air furnace using a 210θL) at a predetermined temperature, a predetermined atmosphere, and a feed rate of 23 wm/min as shown in the table. Atmosphere gas was supplied from the outlet side of the tube at a flow rate of SQL/mn in the opposite direction to the feeding direction of the Thug container.

雰囲気が窒素及び−酸化炭素から成る場合、ウィスカー
の生成するCOガス濃度杖0.7から/θθ体4it%
までの範囲であった。しかし、実施例デの00=/θ0
%は原料輩化ケイ素の熱分解による窒素ガスの発生のた
め、実貿的に90%付近まで希釈された。他の実施例の
ガス組成は流入時と反応時において殆んど差が認められ
なかった。
When the atmosphere consists of nitrogen and -carbon oxide, the CO gas concentration produced by whiskers ranges from 0.7 to 4 it%
The range was up to However, 00=/θ0 in Example D
% was diluted to around 90% in commercial practice due to the generation of nitrogen gas through thermal decomposition of silicon as a raw material. In the other Examples, almost no difference was observed in the gas composition between the inflow time and the reaction time.

実施例ダ〜gから明らかなように、収率の点からCa2
度はS−グ0体槓チがより望ましい。
As is clear from Examples D to G, Ca2
As for the degree, S-G0 body punch is more preferable.

雰囲気がアルゴン及び−酸化炭素から成る場合一実施例
//〜13に見られるように収率の点からCO濃度は/
〜30体N*チがより望ヂしい。
When the atmosphere consists of argon and -carbon oxide, the CO concentration is
~30 bodies N*chi is more desirable.

ウィスカーの長さ及び形状(アスペクト比すなわち長さ
/直径の比二大きい方が好ましい)は、前記のとおり、
原料の炭素のa類、充填度合等を変えることにより制御
□することができる。500μm程度の長さのウィスカ
ーを収率よく得るにはカーがンの種類として結晶性の低
いもの、例えはファーネスグラツク(FEF )を用い
るとよい(実施例7および/4)。
The length and shape of the whisker (the aspect ratio, that is, the length/diameter ratio is preferably larger) are as described above.
It can be controlled by changing the type a of carbon in the raw material, the filling degree, etc. In order to obtain whiskers with a length of about 500 μm in good yield, it is preferable to use a type of carbon having low crystallinity, such as furnace graccharide (FEF) (Examples 7 and 4).

また1炭化ケイ素化率、すなわち、法科窒化ケイ素が炭
化ケイ素に転化した割合h1実施例6が99%、実施例
IOが39%および後述の比較例/が/、1%であつf
cttかは、すべて700%であった。
In addition, the silicon carbide conversion ratio, that is, the ratio of silicon nitride converted to silicon carbide, h1 is 99% in Example 6, 39% in Example IO, and 1% in the comparative example /, which will be described later.
ctt was all 700%.

特公昭30−17200号公報記載の方法である、雰囲
気が水素あるいは水素及び窒素から成る場合を、比較例
/〜ダに示した。この場合でもウィスカーd生成するが
、その収率は敢艮のものでも60%以下であり(比較例
3)、極めて効率の悪い方法であることがわかる。しか
るに、本発明の雰囲気ガス中に一酸化炭素を共存させる
方法は、水素の場合と凡戦して炭化ケイ素りイスカーの
収率が尚<、′畠にほは90%を越えており、炭化ケイ
累ウィスカーを経済的に量産する上で極めてすぐれた方
法であると言える。
The method described in Japanese Patent Publication No. 30-17200, in which the atmosphere consists of hydrogen or hydrogen and nitrogen, is shown in Comparative Examples. In this case as well, whiskers d are produced, but the yield is less than 60% even in the most daring method (Comparative Example 3), indicating that this is an extremely inefficient method. However, with the method of the present invention in which carbon monoxide coexists in the atmospheric gas, the yield of silicon carbide iscar is comparable to that of hydrogen, and the yield of silicon carbide is still over 90%. It can be said that this is an extremely excellent method for economically mass producing multi-layered whiskers.

これ迄炭化ケイ素ウィスカーの製造は生産コストが尚く
〜紅色的に量産化することが困難とされていたが、本党
明方法で妹、各温IgL条件下の雰囲気に00〃スを共
存させることにより〜収率よくウィスカーを!#並でき
る。しかもその形状を任意に制御することが可能となり
、用途に応じた形状のものが提供できるようになった。
Until now, the production cost of silicon carbide whiskers was high and it was considered difficult to mass-produce them, but our company's method allows 00 sulfur to coexist in the atmosphere under various temperature IgL conditions. By doing so ~ good whisker yield! #Can be done in parallel. Moreover, it has become possible to control the shape arbitrarily, and it has become possible to provide shapes that suit the purpose.

Claims (1)

【特許請求の範囲】 (1)窒化ケイ素と炭素を、−酸化炭素を含む非酸化性
雰囲気中で加熱反応させることを峙徴とする炭化ケイ素
ウィスカーの製造方法。 (2+ −’m化炭素濃度が、0./〜ヲθ体積チであ
る特許請求の範囲第(1)項記載の方法。 (3) 反応温度が、/’700〜/9θθCである特
許請求の範囲第(11項記載の方法。
[Scope of Claims] (1) A method for producing silicon carbide whiskers, which features a heating reaction between silicon nitride and carbon in a non-oxidizing atmosphere containing -carbon oxide. The method according to claim (1), wherein the carbon concentration is 0./~wo θ volume. (3) The method according to claim 1, wherein the reaction temperature is /'700~/9θθC. Range No. (method described in item 11).
JP58237698A 1983-12-16 1983-12-16 Manufacture of silicon carbide whisker Granted JPS60131899A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58237698A JPS60131899A (en) 1983-12-16 1983-12-16 Manufacture of silicon carbide whisker

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58237698A JPS60131899A (en) 1983-12-16 1983-12-16 Manufacture of silicon carbide whisker

Publications (2)

Publication Number Publication Date
JPS60131899A true JPS60131899A (en) 1985-07-13
JPH03353B2 JPH03353B2 (en) 1991-01-07

Family

ID=17019180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58237698A Granted JPS60131899A (en) 1983-12-16 1983-12-16 Manufacture of silicon carbide whisker

Country Status (1)

Country Link
JP (1) JPS60131899A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6236100A (en) * 1985-08-09 1987-02-17 Ube Ind Ltd Production of silicon carbide whisker
CN108002839A (en) * 2017-12-08 2018-05-08 东华大学 A kind of ZrC1-xThe preparation method of-SiC complex phase ceramics

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6236100A (en) * 1985-08-09 1987-02-17 Ube Ind Ltd Production of silicon carbide whisker
JPH0331679B2 (en) * 1985-08-09 1991-05-08 Ube Industries
CN108002839A (en) * 2017-12-08 2018-05-08 东华大学 A kind of ZrC1-xThe preparation method of-SiC complex phase ceramics

Also Published As

Publication number Publication date
JPH03353B2 (en) 1991-01-07

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