JPS60124035U - Constant temperature device for sample chamber in electron beam lithography system - Google Patents
Constant temperature device for sample chamber in electron beam lithography systemInfo
- Publication number
- JPS60124035U JPS60124035U JP1123984U JP1123984U JPS60124035U JP S60124035 U JPS60124035 U JP S60124035U JP 1123984 U JP1123984 U JP 1123984U JP 1123984 U JP1123984 U JP 1123984U JP S60124035 U JPS60124035 U JP S60124035U
- Authority
- JP
- Japan
- Prior art keywords
- holes
- sample chamber
- electron beam
- constant temperature
- beam lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Testing Of Individual Semiconductor Devices (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Electron Beam Exposure (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図ないし第３図は本考案の一実施例を示し第１図は
縦断面図、第２図は第１図の２−２線断面図、第３図は
第１図の３−３線断面図、第４図は本考案の他の実施例
における第２図に相当する図面である。
１１・・・試料室、１２・・・上部板、１３・・・下部
板、１４・・・壁、１９．２０・・・溝、２１・・・穴
。Figures 1 to 3 show one embodiment of the present invention; Figure 1 is a longitudinal sectional view, Figure 2 is a sectional view taken along line 2-2 in Figure 1, and Figure 3 is a 3-3 line in Figure 1. The line sectional view, FIG. 4, is a drawing corresponding to FIG. 2 in another embodiment of the present invention. DESCRIPTION OF SYMBOLS 11... Sample chamber, 12... Upper plate, 13... Lower plate, 14... Wall, 19.20... Groove, 21... Hole.
Claims (2)
設け、この穴に冷却水を流すようにした恒温装置におい
て、 前記壁に設けられた複数の穴を、その上下端で一端側の
２つのみを残して他を溝によりそれぞれ２つずつに区切
って連通させると共に、前記上下端における２つずつの
穴の連通の位相を１つずらせて、１本の流路を形成し、
前記の連通されていない２つの穴の端部にそれぞれ入口
栓と出口柱を設けてなる電子ビーム描画装置における試
料室の恒温装置。(1) In a constant temperature device in which a plurality of holes are provided in the wall of a sample chamber, etc. of an electron beam lithography device, and cooling water is allowed to flow through the holes, one end of the plurality of holes provided in the wall is set at the upper and lower ends of the holes. Leaving only the two on the side, the others are divided into two each by grooves and communicated with each other, and the communication phase of the two holes at the upper and lower ends is shifted by one to form one flow path. ,
A constant temperature device for a sample chamber in an electron beam lithography apparatus, comprising an inlet plug and an outlet column provided at the ends of the two holes that do not communicate with each other.
られる上部板および下部板との間にそれぞれ形成された
１つの環状の溝をシキリ板によって仕切ることにより穴
を２つずつ区切って連通させるようになっている実用新
案登録請求の範囲第１項記載の電子ビーム描画装置にお
ける試料室等の恒温装置。(2) The grooves are formed by partitioning one annular groove formed between the wall of the sample chamber with the hole and the upper and lower plates provided above and below the wall with a shikiri plate, so that two holes are formed each. A constant temperature device for a sample chamber or the like in an electron beam lithography apparatus according to claim 1, which is configured to be separated and communicated with each other.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1123984U JPS60124035U (en) | 1984-01-30 | 1984-01-30 | Constant temperature device for sample chamber in electron beam lithography system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1123984U JPS60124035U (en) | 1984-01-30 | 1984-01-30 | Constant temperature device for sample chamber in electron beam lithography system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60124035U true JPS60124035U (en) | 1985-08-21 |
| JPH0328508Y2 JPH0328508Y2 (en) | 1991-06-19 |
Family
ID=30493174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1123984U Granted JPS60124035U (en) | 1984-01-30 | 1984-01-30 | Constant temperature device for sample chamber in electron beam lithography system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60124035U (en) |
-
1984
- 1984-01-30 JP JP1123984U patent/JPS60124035U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0328508Y2 (en) | 1991-06-19 |
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