JPS60119546A - Active energy ray hardenable solder masking agent composition - Google Patents

Active energy ray hardenable solder masking agent composition

Info

Publication number
JPS60119546A
JPS60119546A JP22696383A JP22696383A JPS60119546A JP S60119546 A JPS60119546 A JP S60119546A JP 22696383 A JP22696383 A JP 22696383A JP 22696383 A JP22696383 A JP 22696383A JP S60119546 A JPS60119546 A JP S60119546A
Authority
JP
Japan
Prior art keywords
meth
active energy
acrylate
peelability
compd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22696383A
Other languages
Japanese (ja)
Other versions
JPH0481181B2 (en
Inventor
Kazutaka Kinoshita
和孝 木下
Ikuzo Usami
育三 宇佐美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SURIIBONDO KK
ThreeBond Co Ltd
Original Assignee
SURIIBONDO KK
ThreeBond Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SURIIBONDO KK, ThreeBond Co Ltd filed Critical SURIIBONDO KK
Priority to JP22696383A priority Critical patent/JPS60119546A/en
Publication of JPS60119546A publication Critical patent/JPS60119546A/en
Publication of JPH0481181B2 publication Critical patent/JPH0481181B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

PURPOSE:To obtain the optimum composition for protecting nonsoldered part in fabrication of a printed circuit board, etc., by mixing a polymerizable compd. hardenable by irradiation of active energy rays, with a modifying agent for improviding the hardening performance of said compd., its heat resistance, and its peelability, etc., in a specified proportion. CONSTITUTION:A solder masking agent compsn. superior in driability in fabrication of electronic parts, etc., and their peelability after services, not injurious to health, and not affected by the air on the hardenability is obtained by mixing 40-95pts.wt. of a liquid material hardenable with active energy rays, such as UV rays or electron beams, contg. (meth)acrylic acid or its ester, epoxy-modified di(meth)acrylate, diallyl phthalate, acrylonitrile, styrene, or ion-polymerizable epoxy compd., or the like; with 5-60pts.wt. of a polymer-modifying agent for giving heat insulating property and heat resistance, and improving peelability, such as glass beads or shirasu (volcanic ashes) balloons, including a plasticizer, etc.; and a polymn. initiator, such as benzophenone, a sensitizer, or the like necessary additives.

Description

【発明の詳細な説明】 本発明は活性エネルギ線硬化性ソルダマスキング剤組成
物、詳しくは半田付工程で半田41着を防止り”ると共
にマスキング不要の際は剥離することの可能な粘性エネ
ルギ線硬化性ソルダマスキング剤組成物に関でる。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides an active energy beam-curable solder masking agent composition, more specifically, a viscous energy beam-curable solder masking agent composition that prevents solder adhesion in the soldering process and can be peeled off when masking is not required. It relates to a curable solder masking agent composition.

従来より、印刷配線数、電子部品の組立て等の半田付工
程には非半田部の保護を目的として有機溶剤型、及び水
溶液型のソルダマスキング剤が使用されている。又一部
には活性エネルギ線硬化性マス4−ング剤も使用されよ
うとしている。
Conventionally, organic solvent type and aqueous solution type solder masking agents have been used for the purpose of protecting non-soldered parts in soldering processes such as printing wiring numbers and assembling electronic components. In some cases, massing agents curable by active energy radiation are also being used.

しかし、従来のマスキング剤は乾燥性又は硬化性、耐熱
性、衛生性、剥離性、等所要の特性中いずれかに重大な
欠陥を有している。
However, conventional masking agents have serious deficiencies in any of the required properties, such as drying or curing properties, heat resistance, sanitary properties, and removability.

即ち、有機溶剤型のソルダマスキング剤は乾燥に時間を
要すると共に衛生上の問題があり、熱エネルギを与えて
促進乾燥するとしても衛生上の問題が残る。なお、ウニ
イブソルダリング工程付属のコンベア速度は、200−
3000m/分、ディプソルダリンゲイ」属のコンベア
速度は150〜200 C11l/分程度とされている
が、この場合自然乾燥では15〜30mの乾燥用コンベ
アラインを要することになり経済的にも好ましくない。
That is, organic solvent type solder masking agents require a long time to dry and are hygienic, and even if heat energy is applied to accelerate drying, hygienic problems remain. In addition, the conveyor speed attached to the Unibu soldering process is 200-
3000 m/min, and the conveyor speed for the genus "Dipsolderingei" is said to be about 150 to 200 C11 l/min, but in this case, natural drying requires a drying conveyor line of 15 to 30 m, which is economically preferable. do not have.

水溶液型のソルダマスキング剤は有機溶剤型に対して衛
生上の問題を解決しているが、水の気化潜熱が大である
ため乾燥性がより悪いという欠点がある。従って乾燥に
長時間を要することと長い −コンベアラインを要する
ことが欠点である。
Aqueous solution type solder masking agents solve sanitary problems compared to organic solvent type solder masking agents, but have the disadvantage that drying properties are worse because the latent heat of vaporization of water is large. Therefore, the disadvantage is that drying takes a long time and requires a long conveyor line.

−1−記有機溶剤型、及び水溶液型のソルダマスキング
剤に対し活性エネルギ線硬化型のソルダマスキング剤も
一部使用されようとしているが、このマス−1−ング剤
は耐熱性が悪いと共に剥離性がほとんど或いは全く無い
ものであり、所要の特性を満足でき行ないものであった
In contrast to the organic solvent type and aqueous solution type solder masking agents described in -1-, active energy radiation curing type solder masking agents are also being used, but these masking agents have poor heat resistance and peeling. These materials had little or no characteristics and were able to satisfy the required characteristics.

本発明は上記従来技術に鑑みて為されたもので、所要の
硬化性、耐熱性、lfj生性、剥離性等特性を有する活
性エネルギ線硬化性ソルダマスキング剤組成物を提供づ
ることを目的としている。
The present invention has been made in view of the above-mentioned prior art, and it is an object of the present invention to provide an active energy ray-curable solder masking agent composition having required properties such as curability, heat resistance, LFJ susceptibility, and peelability.

上記目的を達成するためのこの発明は、)に性エネルギ
線により反応を起7J弔合性化合物40・−95重量部
、ポリマ改質剤5〜60重量部を含むことを特徴どする
活性エネルギ線硬化性ソルダマスキング剤組成物である
In order to achieve the above object, the present invention is characterized in that it contains 40.-95 parts by weight of a 7J binding compound which reacts with active energy rays and 5 to 60 parts by weight of a polymer modifier. This is a line-curable solder masking agent composition.

この発明に使用Jる活性エネルギ線により反応を起す重
合性化合物(以下、主成分と称す)は、モノマー、オリ
ゴマー、ポリマーの1種又は組合せて臂られるいわゆる
ラジカル、カチ図ン、ア二Aン重合性化合物であり、4
0〜95重量部の範囲で使用してりr成績を収めること
ができる。モノマー、オリゴマーおよびポリマーとして
は、(メタ)アクリルニスデル化合物、および、スチレ
ン、ビニルトルエン、α−メチルスチレン、β−メチル
スチレン、t−ブチルスチレン、ビニルベンゼン、N−
ビニルごロリドン、アクリロニトリル、酢酸ビニル、ア
リル化合物等の不飽和結合を右する化合物、並びに、エ
ポキシを右する化合物が挙げられる。
The polymerizable compound (hereinafter referred to as the main component) that causes a reaction with the active energy rays used in this invention is a so-called radical, a monomer, an anionic compound, etc., which is treated with one or a combination of monomers, oligomers, and polymers. It is a polymerizable compound, and 4
It is possible to achieve excellent results by using it in the range of 0 to 95 parts by weight. Monomers, oligomers and polymers include (meth)acrylic Nisder compounds, styrene, vinyltoluene, α-methylstyrene, β-methylstyrene, t-butylstyrene, vinylbenzene, N-
Compounds containing unsaturated bonds, such as vinyl chloride, acrylonitrile, vinyl acetate, and allyl compounds, and compounds containing epoxy bonds may be mentioned.

(メタ)アクリルエステル化合物、としては、(メタ)
アクリル酸、(メタンアクリル酸メブール、(メタ)ア
クリル酸]−チル、(メタ)アクリル酸ブチル、ヘギシ
ル(メタ)アクリレ−1−12−エヂルヘニ1シル(メ
タ)アクリレート、イソオクチル(メタ)アクリレート
、ラウリル(メタ)アクリレート、ステアリル(メタ)
アクリレート、2−にドロキシエチル(メタ)アクリレ
ート、2−ヒドロキシプロピル(メタ)アクリレート、
3−クロロ−2−ヒドロキシプロピル(メタ)アクリレ
−1−、グリセロールモノ(メタ)アクリレ−1−、ポ
リエチレングリコール(メタ)アクリレート、又、N、
N=−ジメチルアミノエチル(メタ)アクリレート、N
−N−−ジエチルアミノエチル(メタ)アクリレ−]・
、グリシジル(メタ)アクリレート、カルピトール 7トラヒドロフルフリル(メタ)アクリレ−]・、ジシ
クロペンタジェニル(メタ)アクリレート、ジヒドロジ
シクロペンタジェニル〈メタ)アクリレ−1〜、イソボ
ニル(メタ)アクリレート、1、6−へ二1−サンジオ
ール(メタ)アクリレ−1−、ネオペンデルグル」−ル
ジ(メタ)アクリレート、]ニヂレングリコールジ(メ
タ)アクリレ−h、ポリエチレングリコールジ(メタ)
アクリレート、ポリプロピレングリコールジ(メタ)ア
クリレート、ブヂレングリコールジ(メタ)アクリレ−
1−、ペンタエリスリトールジ(メタ)アクリレ−1〜
、1、4−1タンジA−ルジ(メタ)アクリレ−[・、
史に、エポキシ変性ジ(メタ)アクリレ−l〜、ウレタ
ン変性ジ(メタ)アクリレート、トリメチロールプロパ
ントリ(メタ)アクリレート、ペンタエリスリトール(
メタ)アクリレート、ジペンタエリスリトールヘキサン
(メタ〉アクリレ−1−、テトラメチロールメタンテト
ラ(メタ)アクリレート、N,N,N′、N”−デ1ヘ
ラキス(β−ヒドロキシエチル)エチレンジアミンの(
メタ)アクリル酸ニスデルなどの化合物およびそれらの
誘導体等が挙げられる。
The (meth)acrylic ester compound is (meth)
Acrylic acid, (methane acrylate meburu, (meth)acrylic acid]-thyl, butyl (meth)acrylate, hegysyl (meth)acrylate-1-12-ethylhenyl (meth)acrylate, isooctyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)
acrylate, 2-droxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate,
3-chloro-2-hydroxypropyl (meth)acrylate-1-, glycerol mono(meth)acrylate-1-, polyethylene glycol (meth)acrylate, and N,
N=-dimethylaminoethyl (meth)acrylate, N
-N--diethylaminoethyl (meth)acrylate]・
, glycidyl (meth)acrylate, carpitol 7 trahydrofurfuryl (meth)acrylate], dicyclopentagenyl (meth)acrylate, dihydrodicyclopentagenyl (meth)acrylate 1~, isobornyl (meth)acrylate , 1,6-hedi-1-sanediol (meth)acrylate-1-, neopendelglu di(meth)acrylate, ]nidylene glycol di(meth)acrylate-h, polyethylene glycol di(meth)acrylate
Acrylate, polypropylene glycol di(meth)acrylate, butylene glycol di(meth)acrylate
1-, Pentaerythritol di(meth)acrylate-1~
, 1, 4-1 Tanji A-ruji (meth)acrylate [・,
Historically, epoxy-modified di(meth)acrylate, urethane-modified di(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol (
meth)acrylate, dipentaerythritol hexane (meth)acryle-1-, tetramethylolmethanetetra(meth)acrylate, N,N,N',N"-de1herakis(β-hydroxyethyl)ethylenediamine (
Examples include compounds such as Nisder meth)acrylate and derivatives thereof.

不飽和結合を有し活性エネルギ線によりラジカル重合し
うるアリル系化合物としては、ジアリルフタレート、ジ
アリルイソフタレート、ジアリルアジベー1−等が挙げ
られる。
Examples of allyl compounds having an unsaturated bond and capable of radical polymerization by active energy rays include diallyl phthalate, diallyl isophthalate, diallylazibe-1-, and the like.

不飽和結合を有し活性エネルギ線によりラジカル重合し
うる化合物としては、N−ごニルビ[lリドン、スチレ
ン、アクリロニトリル、酢酸ビニル、ビニルトルエンJ
3よびぞれらの誘導体等が挙げられる。
Compounds that have unsaturated bonds and can be radically polymerized by active energy rays include N-gonylbi[lydone, styrene, acrylonitrile, vinyl acetate, vinyltoluene J
3 and derivatives thereof.

カチオン重合またはアニAンル合しうるエポキシ基を右
づる化合物としては、例えばエチレンA4ニナイド,プ
ロピレンオキサイド、ブチルグリシジルエーテル、エピ
クロルヒドリン、メチルエピクロルヒドリン、アリルグ
リシジルニーデル、フェニルグリシジルエーテル、エビ
クロルヒドリンとごスフ1ノールAの縮重合体、パーサ
ディック酸グリシジルJ−−デル、エチレングリコール
ジグリシジルコニ−iル、ポリエチレングリコール#2
00ジグリシジルエーデル、ポリエチレングリコール#
400ジグルシジルエーデル、1.6−ヘキ1ナンジA
−ルジグリシジルエーデル、ネオペンデルゲルコールジ
グリシジルエーテル、トリメチロールプロパントリグル
シジルエーアル、エポキシ端末すをインし、エクス1ヘ
マー構造を包含り−る化合物等が挙げられる。
Examples of compounds having an epoxy group that can undergo cationic polymerization or anionic polymerization include ethylene A4 nide, propylene oxide, butyl glycidyl ether, epichlorohydrin, methyl epichlorohydrin, allyl glycidyl needle, phenyl glycidyl ether, and shrimp chlorohydrin. Condensation polymer of Suf-1-nol A, glycidyl persadic acid J-del, ethylene glycol diglycidylconyl, polyethylene glycol #2
00 diglycidyl edel, polyethylene glycol #
400 diglucidyl edel, 1,6-hexylnandi A
Examples include compounds containing an epoxy terminal and an Ex1 hemer structure, and the like.

本発明に使用するポリマー改質剤としては、特に廖i熱
性及び耐熱性を伺勾し、剥離性を向上さける+4− )
l’lとして例えば、ガラスピーズ、ガラスバルーン、
シラスバルーン、マイクロバルーン等があげられる。さ
らにポリマー改質剤として剥H1性の効果を増加するた
めに、可塑剤、例えばDOP、D B P、ワックスな
ど或いは(れらの組合l!5〜60重但部を使用して好
成績を収めることができる。
The polymer modifier used in the present invention is particularly designed to improve heat resistance and heat resistance, and to improve releasability.
For example, glass peas, glass balloons,
Examples include whitebait balloons and microballoons. Furthermore, in order to increase the effect of peelability as a polymer modifier, plasticizers such as DOP, DBP, wax, etc. or combinations thereof (15~60 parts) can be used with good results. be able to.

カヂAン重合開始剤として、例えばジアゾニウム塩、ヨ
ードニウム塩、フエスフAニウム塩、スルフtニウム塩
、アンモニウム塩等の誘導体がある。
Examples of Kajin A polymerization initiators include derivatives such as diazonium salts, iodonium salts, Fesph A nium salts, sulft nium salts, and ammonium salts.

紫外線重合開始剤どし−C主なものは、ペンシフ1ノン
、p −tart−ブチルクロロフェノン、2.2ジ1
1ヘキシアセトフェノン、4.4′−ビスジメチルアミ
ノベンゾフ■−ノン、ベンゾイン、ベンゾインメチル]
ニーデル、ベンゾインプロプルエーテル、ベンジルジメ
チルケタール、71−ラメチルチrンラムモノサルフ7
/イド、ヂA−1ニザン1−ン、2−クロロヂAキサン
トン、等公知の化合物がある。
The main UV polymerization initiators are pencil 1-one, p-tart-butylchlorophenone, and 2.2 di-1.
1-hexyacetophenone, 4,4'-bisdimethylaminobenzophenone, benzoin, benzoinmethyl]
Needle, benzoin propyl ether, benzyl dimethyl ketal, 71-ramethylthyrinram monosulfate 7
There are known compounds such as /ide, diA-1nizan-1-one, and 2-chlorodiA-xanthone.

増感剤の主なものとしては、アミノ類、尿素、イΔつ化
合物、二1〜リル、リン化合物、その他室素化合物、塩
素化合物等公知の化合物がある。
The main sensitizers include aminos, urea, IΔ compounds, 21-lyl compounds, phosphorus compounds, and other known compounds such as chlorine compounds and chlorine compounds.

上記主成分、ポリマー改良剤、重合開始剤を通常の塗料
製造技術に応じて配合ずれば流動性液状物が得られる。
A fluid liquid product can be obtained by blending the above-mentioned main components, polymer modifier, and polymerization initiator according to common coating manufacturing techniques.

該液状物を、例えば印刷配線板上の半田イ]の際に、刷
毛塗り、シゴキ塗り、浸漬、吹刊【プ等通常のマスキン
グ方法により使用づることができる。それぞれのマスキ
ング方法と伯の作業条件に合せて構成成分を選択、調整
できることは勿論である。
The liquid material can be used, for example, during soldering on a printed wiring board by a conventional masking method such as brushing, ironing, dipping, or spraying. Of course, the constituent components can be selected and adjusted according to each masking method and operating conditions.

活性エネルギ線発生源としては、高圧水銀灯、低圧水銀
灯、超高圧水銀灯、メタルハライドランプ、キセノン灯
などの紫外線、発生装置、電子線加速機、コバル1〜6
0などのα線源、X線発生機などが挙げられるが、短時
間硬化が要求される場合には紫外線または電子線を採用
づることが望ましい。硬化に要り−る時間は活性1ネル
ギ線の種類、強度によつ−(、異なるが、1列えば箆・
長1C111当り8Q wの人力を持つ4kwの高圧水
銀灯において拡散型では1〜30秒間、集光型では、0
.2・〜10秒間の照射で硬化させることができ、一般
に膜即0.1・〜3n1mの硬化塗膜を形成できる。
Sources of active energy rays include ultraviolet rays such as high-pressure mercury lamps, low-pressure mercury lamps, ultra-high-pressure mercury lamps, metal halide lamps, and xenon lamps, generators, electron beam accelerators, and Kobal 1 to 6.
Examples include α-ray sources such as 0, X-ray generators, etc., but when short-time curing is required, it is preferable to use ultraviolet rays or electron beams. The time required for curing depends on the type and strength of the active 1 energy wire (although it varies, one row can be used to
In a 4kW high-pressure mercury lamp with 8Qw of human power per length 1C111, the diffused type takes 1 to 30 seconds, and the condensed type takes 0 seconds.
.. It can be cured by irradiation for 2 to 10 seconds, and generally a cured coating film with a thickness of 0.1 to 3 nm can be formed.

次に実施例および比較例を挙げて本発明を!4 (A的
に説明する。第1.2.3表に3実施例と3比較例の配
合をイれぞれ示し、第4表にその結果を示した。なお、
デス1ヘピースは1 Q Qmmx 25mmx2mm
片面銅張り積層板を使用し銅箔面上を被覆して行った。
Next, we will explain the present invention by giving Examples and Comparative Examples! 4 (Explained in terms of A. Table 1.2.3 shows the formulations of 3 Examples and 3 Comparative Examples, and Table 4 shows the results.
Death 1 piece is 1 Q Qmmx 25mmx2mm
A single-sided copper-clad laminate was used to cover the copper foil surface.

第2表 第3表 第4表 ハンダ耐熱性は260℃、10秒間溶融ハンダ浴へ浸漬
し剥離後胴箔面のハンダ41着の右、無で判定した。又
、密着性試験は、1 mmrl」クロスカット100目
をとり、粘着デーゾで剥離し、残り目を数え、残りの%
で表わした。残存クロスカット目O%が最も良いことを
示づ。剥離性は、ゲ1ベラを用い、被覆材境界の一箇所
より手で起し、全体を手で剥離して行いハンダ耐熱性と
共に、異常な)−Jれば01多少問題が右れぽ△、只常
があればX印で示している。
Table 2 Table 3 Table 4 Solder heat resistance was immersed in a molten solder bath at 260° C. for 10 seconds, and after peeling off, it was judged whether there was 41 solder or no solder on the surface of the body foil. In addition, for the adhesion test, take 100 crosscuts of 1mmrl, peel them off with adhesive deso, count the remaining stitches, and calculate the remaining percentage.
It was expressed as It is shown that the remaining crosscuts O% is the best. Peelability was determined by manually starting from one place on the boundary of the covering material using a spatula and peeling off the entire surface by hand. , If there are any irregularities, they are indicated by an X.

上記実施例の試験結果より明らかなように本発明実施例
ではいずれもハンダ耐熱性、非密着性、剥1i8Il性
共に良好である。又、本発明組成物の硬化反応には空気
による阻害作用が殆ど認められなかった。尚、有機溶剤
型の如き衛生を害する要因はないことは勿論である。
As is clear from the test results of the above examples, all of the examples of the present invention have good solder heat resistance, non-adhesion, and peelability. Moreover, almost no inhibition effect by air was observed on the curing reaction of the composition of the present invention. It goes without saying that there is no factor that harms hygiene such as an organic solvent type.

よって活性エネルギ線により反応を起−づ重合f1化合
物40〜95重1部、ポリマ改質剤5〜60重量部を含
むことを特徴とする耐熱性の剥離可能な活性エネルギ線
砂化性ソルダマスキング剤組成物は所要の硬化性、耐熱
性、衛生性、剥離性等持性をイjするマスキング剤組成
物を提供JることがCきる。
Therefore, a heat-resistant, removable active energy beam-sandable solder masking comprising 40 to 95 parts by weight of a polymerizing f1 compound that causes a reaction with active energy beams, and 5 to 60 parts by weight of a polymer modifier. The masking agent composition can provide a masking agent composition that has required properties such as curability, heat resistance, sanitary properties, and removability.

Claims (1)

【特許請求の範囲】[Claims] 活性エネルギ線により反応を起1重合性化合物40・〜
95重量部、ポリマ改質剤5〜60重量部を含むことを
特徴とする活性エネルギ線硬化性ソルダマスキング剤組
成物。
Polymerizable compound 40.~ which causes a reaction with active energy rays
An active energy beam-curable solder masking agent composition comprising 95 parts by weight of a polymer modifier and 5 to 60 parts by weight of a polymer modifier.
JP22696383A 1983-12-02 1983-12-02 Active energy ray hardenable solder masking agent composition Granted JPS60119546A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22696383A JPS60119546A (en) 1983-12-02 1983-12-02 Active energy ray hardenable solder masking agent composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22696383A JPS60119546A (en) 1983-12-02 1983-12-02 Active energy ray hardenable solder masking agent composition

Publications (2)

Publication Number Publication Date
JPS60119546A true JPS60119546A (en) 1985-06-27
JPH0481181B2 JPH0481181B2 (en) 1992-12-22

Family

ID=16853361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22696383A Granted JPS60119546A (en) 1983-12-02 1983-12-02 Active energy ray hardenable solder masking agent composition

Country Status (1)

Country Link
JP (1) JPS60119546A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02116537A (en) * 1988-10-26 1990-05-01 Matsushita Electric Works Ltd Photo-setting resin and method for forming three-dimensional shape
US5973034A (en) * 1995-10-11 1999-10-26 Nippon Kayaku Kabushiki Kaisha (Oxide or sulfide) powder epoxy (meth) acrylate w/glass and/or metal

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52134643A (en) * 1976-05-04 1977-11-11 Gen Electric Photohardenable composition for coating

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52134643A (en) * 1976-05-04 1977-11-11 Gen Electric Photohardenable composition for coating

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02116537A (en) * 1988-10-26 1990-05-01 Matsushita Electric Works Ltd Photo-setting resin and method for forming three-dimensional shape
US5973034A (en) * 1995-10-11 1999-10-26 Nippon Kayaku Kabushiki Kaisha (Oxide or sulfide) powder epoxy (meth) acrylate w/glass and/or metal

Also Published As

Publication number Publication date
JPH0481181B2 (en) 1992-12-22

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