JPS60114834A - Reticle and its production - Google Patents

Reticle and its production

Info

Publication number
JPS60114834A
JPS60114834A JP22276183A JP22276183A JPS60114834A JP S60114834 A JPS60114834 A JP S60114834A JP 22276183 A JP22276183 A JP 22276183A JP 22276183 A JP22276183 A JP 22276183A JP S60114834 A JPS60114834 A JP S60114834A
Authority
JP
Japan
Prior art keywords
pyramid
lens
relief
electroplating
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22276183A
Other languages
Japanese (ja)
Other versions
JPH037924B2 (en
Inventor
Kenji Hayashi
賢二 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Corp
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp, Olympus Optical Co Ltd filed Critical Olympus Corp
Priority to JP22276183A priority Critical patent/JPS60114834A/en
Priority to DE19843442781 priority patent/DE3442781A1/en
Publication of JPS60114834A publication Critical patent/JPS60114834A/en
Priority to US06/943,833 priority patent/US4851164A/en
Publication of JPH037924B2 publication Critical patent/JPH037924B2/ja
Priority to US07/758,346 priority patent/US5696630A/en
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B13/00Viewfinders; Focusing aids for cameras; Means for focusing for cameras; Autofocus systems for cameras
    • G03B13/18Focusing aids
    • G03B13/24Focusing screens

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Viewfinders (AREA)

Abstract

PURPOSE:To produce reticles simply and economically by working a pyramid- like regular uneven relief, electroplating the relief surface to form a lens surface and forming many fine recessed parts on the lens to transfer the electroplating surface to an optical element. CONSTITUTION:Nickel is plated on the mechanically worked pyramid-like relief to turn the pyramids to a shape arraying smooth semisperical surfaces regulately. When the arraying pitches of the relief is 20mu or less and an angle formed by the fine lens-like shapes turned from the pyramids by the nickel plating with the bottom is 15 deg. or less, required brightness and focusing are obtained. Since the fine lens group has regularity due to the mechanical working, diffraction phenomenon is generated, an interference color is generated on the reticle and a out-of-focus image is made like a ring. Since the extremely fine recessed parts are formed on the plated surface, coloring due to the diffraction phenomenon and the ring formation can be removed and a particle-less and bright reticle having high focusing property is obtained.

Description

【発明の詳細な説明】 技術分野 本発明はカメラの焦点板並びにその製造方法に関する。[Detailed description of the invention] Technical field The present invention relates to a focusing plate for a camera and a method for manufacturing the same.

従来技術 従来、−眼レフ等のカメラの焦点板としては金属表面全
砂摺シした8!!ヲ用い、アクリル似に転写したものが
広く用いらnてぃた。この製法による焦点板は表面のw
T面形状が不規則な鋭い凹凸となって却シ、拡散性を良
くするとボケが大きくなシピントが仕せ易くなるが、マ
ット面の粒状佃が大きくなり、ファインダーが著しく暗
くなる。拡散性を減らせばファインダーは明るくなるが
ボケの検出能力は低下する。この欠点を克服するために
種々の改善が試みらnてぃた。
Prior Art Conventionally, the entire metal surface of the focal plate for cameras such as reflex cameras was sand-sanded. ! It was widely used, and acrylic-like transfers were widely used. The focusing plate made by this manufacturing method has a surface w
The shape of the T surface becomes irregular and sharp, which makes it difficult to see.If the diffusivity is improved, it becomes easier to achieve sharp focus with large blur, but the granules on the matte surface become larger and the viewfinder becomes noticeably darker. If you reduce the diffusivity, the viewfinder will become brighter, but the ability to detect blur will decrease. Various improvements have been attempted to overcome this drawback.

例えば、特開昭53−42726号1%開昭54−92
232号にはスペックルパターンを感材に記録したもの
が考案さnている。こnは明るく粒状性の少ない焦点板
が得らnるが、小絞pになるに従って粒状性が目立つ。
For example, JP-A-53-42726 1% JP-A-54-92
No. 232 devised a method in which a speckle pattern was recorded on a sensitive material. This produces a bright reticle with less graininess, but the graininess becomes more noticeable as the aperture becomes smaller.

この粒状性を除くために、規則的な微a構造をもたせた
焦点板として、特公昭54−83846号では金属基板
上に感光性樹脂を塗布し、微細パターンのマスク像を露
光現像してエツチングして形成する。特公昭55−90
931号では、レーザ光線の規則的干渉パターンを乾板
に焼きっけ。
In order to eliminate this graininess, in Japanese Patent Publication No. 54-83846, a photosensitive resin was applied onto a metal substrate, a fine pattern mask image was exposed and developed, and etched. and form it. Special Public Service 1986-1990
In No. 931, a regular interference pattern of a laser beam was printed on a dry plate.

プリーチ処理を行なう。しかし、エツチングの方法は深
さの均等な調整は極めて困難であり、レーザの方法は設
備が極めて大型であシ、調整制御が困難であり2.F)
現性が小さい。
Perform pleat processing. However, with the etching method, it is extremely difficult to adjust the depth uniformly, and with the laser method, the equipment is extremely large and adjustment control is difficult. F)
The actuality is small.

特開昭57−148728号に記す焦点板は。The focus plate described in Japanese Patent Application Laid-Open No. 57-148728 is as follows.

規則的な微細構造パターン像を、元の強度分布奮表面の
凹凸分布に変換する特性を有する感光材料に記録し、感
光材料表面金微細凹凸購造とし、この型を電鋳によって
作成する。この方法も焦点板全面の均等な凹凸を得るの
は困難であシ、型製造が高価になる。
An image of a regular fine structure pattern is recorded on a photosensitive material that has the property of converting the original intensity distribution into a surface unevenness distribution, the surface of the photosensitive material is made with gold fine unevenness, and this mold is created by electroforming. In this method as well, it is difficult to obtain uniform unevenness over the entire surface of the reticle, and mold manufacturing becomes expensive.

焦点板面をレンズの集合体とすること自体には種々の利
点がある。即ち、各レンズ間の配列ピッチとレンズパワ
ーを制御することでボケ強度と明るさの制御が容易であ
る。更に、拡散光のクラレが出ないため、黒い点状の粒
状性もなく一小口径レンズを用い穴場合にも暗くなるこ
とが少ない。
There are various advantages in making the focusing plate surface a collection of lenses. That is, by controlling the arrangement pitch and lens power between each lens, it is easy to control the blur intensity and brightness. Furthermore, since there is no clarinet of diffused light, there is no black dot-like graininess, and there is little darkness even when a small diameter lens is used.

しかし、この欠点としては、規則正しい配列による回折
現象を生じ、焦点板に干渉色が現・セ扛る。
However, this has the disadvantage that a diffraction phenomenon occurs due to the regular arrangement, and interference colors appear on the reticle.

更に、ボケ像が輪帯状の不自然な像となシ、砂摺りマッ
トによる焦点板特有の自然なボケが山ないO カメラの焦点板の拡散板に使用するレンズ集合体は、配
列ピッチが20μ程度で、ファインダー倍率4〜5倍の
場合に人の目の解像能の限界以下となる。レンズの底面
とのなす角度lo′程度で元の拡散に基く光量の減衰を
少なくすることが可能である。
Furthermore, the blurred image does not turn out to be an unnatural ring-like image, and the sand-printed mat eliminates the natural blur that is characteristic of focusing plates. When the finder magnification is 4 to 5 times, the resolution is below the limit of the human eye's resolution. It is possible to reduce the attenuation of the amount of light due to the original diffusion by adjusting the angle lo' formed with the bottom surface of the lens.

しかし、微小レンズ金均等な寸法で正確に配列した型を
製造するのは極めて困難であシ、上述した種々の特許は
著しく高価であシ、しかも近似的なレンズとなるにすぎ
ない。
However, it is extremely difficult to manufacture molds with uniformly sized and precisely arranged microlenses, and the various patents mentioned above are extremely expensive and provide only approximate lenses.

目 ° 的 本発明の目的位、上述の欠点を生ぜず、著しく簡単安価
に製造できる焦点板並びに焦点板の製造方法全提供する
にある。
OBJECTS OF THE INVENTION It is an object of the present invention to provide a reticle and a method for manufacturing the reticle, which do not suffer from the above-mentioned drawbacks and can be manufactured extremely simply and at low cost.

概 侠 上述の目的を達するための本発明による焦点板の製造万
@は、角錐状の規則的な凹凸レリーフを加工し、角錐状
凹凸レリーフ面に電気めっきを行ない、上記電気めっき
によって各角錐をレンズ面とすると共にレンズに多数の
微小凹み全形成させ。
General In order to achieve the above-mentioned object, the reticle according to the present invention is manufactured by processing a pyramid-shaped regular uneven relief, electroplating the pyramid-shaped uneven relief surface, and forming each pyramid by the electroplating. In addition to forming a lens surface, a large number of minute dents are completely formed on the lens.

上記電気めっき面を光学素材に転写する。Transfer the electroplated surface to an optical material.

実施例 本発明の好適な実施例は次の通シである。Example A preferred embodiment of the invention is as follows.

第1に角錐の集合゛がら成る規則的な凹凸レリーフを機
械か工によって形成する。次に角錐面に電気めっきを施
し、めっきによるスムージングパワーによって角錐頂部
及び稜線は丸めらnてレンズ状となる。同時にニッケル
電気めっき浴中に分散さ−nた微細分散状エマルジョン
が電気過程で凹凸レリーフ面に耐着し離れることによっ
てレンズ面に多数の微小凹みが形成さ扛る。
First, a regular uneven relief consisting of a collection of pyramids is formed by a machine. Next, electroplating is applied to the pyramidal surface, and the smoothing power of the plating causes the pyramidal top and ridgeline to be rounded into a lens shape. At the same time, the finely dispersed emulsion dispersed in the nickel electroplating bath adheres to and separates from the uneven relief surface through an electrical process, thereby forming a large number of minute dents on the lens surface.

かくして形成さnた焦点板は砂摺面の生ずる粒状性やフ
ァインダーが暗くなる欠点を生ぜず一規則的配列のレン
ズ面の生ずる色付きゃ輪帯ボケはなくなる。
The focusing plate thus formed does not suffer from the graininess caused by a sandy surface or the darkening of the finder, and eliminates the annular blur due to the coloring caused by the regularly arranged lens surface.

本発明の焦点板製造方法は著しく簡単で安価であシ、単
純な腺引き機械加工とニッケル電気めっきのみであシ、
再現性は高く、性能は艮い。
The reticle manufacturing method of the present invention is extremely simple and inexpensive, requiring only simple gland machining and nickel electroplating;
The reproducibility is high and the performance is excellent.

(オl笑施例) 本発明を例示゛とした実施例運びに図面についてターン
の拡散レリーフ1全有する焦点板2によって光線3が大
きな角度αで散乱さnる特性4を示す。こn’を改良し
て、第2図に示す通シ、比較的狭い角度βとし、散乱性
が少ない特性5t−有し、ボケ性の良い微小レンズ状レ
リーフ6に:有する焦点板70安価、正確な製造方法を
本発明によって提供する。
(Other Embodiment) As an embodiment illustrating the present invention, the drawing shows a characteristic 4 in which a light ray 3 is scattered at a large angle α by a reticle 2 having the entire diffuser relief 1 of the turn. This n' is improved to a relatively narrow angle β as shown in FIG. 2, and a focusing plate 70 having a microlens-like relief 6 with low scattering property and good blurring property is produced. An accurate manufacturing method is provided by the present invention.

第3図は本発明による焦点板の製造工程の最初の段階と
して、ピッチ゛20μ、底面とのなす角度’に20’ 
とした六角錐lOと五角錐11との組合せから成シ、規
則的に機械加工さnたレリーフ型12の斜視間を示す。
FIG. 3 shows the first stage of the manufacturing process of the reticle according to the present invention, with a pitch of 20 μm and an angle of 20 μm with respect to the bottom surface.
A perspective view of a regularly machined relief mold 12 made of a combination of a hexagonal pyramid 10 and a pentagonal pyramid 11 is shown.

角錐のレリーフ加工は研摩盤等を使用してダイアモンド
バイトで容易に加工できる。近年の高精度加工機械の発
展によって%被切削材料を適切、に選択すれば、第3図
に示すような簡単な3本の直線の組合せによる角錐の機
械加工は容易であシ。
Relief machining of pyramids can be easily done with a diamond cutting tool using a grinder or the like. With the recent development of high-precision machining machines, if the material to be cut is appropriately selected, it is easy to machine a pyramid using a simple combination of three straight lines as shown in Figure 3.

精度も著しく高い。The accuracy is also extremely high.

上述の機械加工した角錐レリーフの上にニッケルめっき
を行なうことによって、角錐は容易に滑らかな半球面が
規則正しく配列した形状となる。
By performing nickel plating on the above-mentioned machined pyramidal relief, the pyramid easily becomes a shape in which smooth hemispherical surfaces are regularly arranged.

この場合の半球の形状は角錐の底面となす角度によって
容易に変えることが可能である。
The shape of the hemisphere in this case can be easily changed by changing the angle it makes with the base of the pyramid.

こ工で、微小レンズのパワーは焦点板として使用する時
に焦点板の明るさに関係すると共に合焦性も支配するこ
と、並びに配列ピッチはカメラの7アインダ一倍率4〜
5倍の下で目の解像能より小さくすることの機作がある
。この条件全満足させるために、配列ピッチ及び角錐の
底面とのなす角度を種々の値として機械加工し、ニッケ
ルめっきの膜厚、電解染件、浴の一組成を変えて実験し
た結果、レリーフの配列ピッチは20p以下とし。
In this process, the power of the microlens is related to the brightness of the focusing plate when used as a focusing plate, and also controls the focusing ability, and the array pitch is 4 to 4 times the magnification of the camera's 7-in-dah.
There is a mechanism for making the resolution smaller than the eye's resolution under 5x. In order to satisfy all of these conditions, we machined the array pitch and the angle with the bottom of the pyramid to various values, and experimented by changing the nickel plating thickness, electrolytic dye, and bath composition. The array pitch should be 20p or less.

角錐がニッケルめっきによって微小レンズ状となった時
の底面とのなす角度を15°以下とすnは所望の明るさ
と合焦性とを得ることが可能となった。
By setting the angle between the pyramid and the bottom when it is shaped like a microlens by nickel plating to be 15° or less, it is possible to obtain the desired brightness and focusability.

しかし、微小レンズ群は機械加工による規則性を有する
ため回折現象を生じ、焦点板に干渉色が現、v n 、
ボケ像が輪帯状となる。角錐を三角、四角、六角と三角
の組合せとしても、配列ピッチを変えた角錐としても性
能は不十分であった。
However, since the microlens group has regularity due to machining, a diffraction phenomenon occurs, and interference colors appear on the focus plate, v n ,
The blurred image becomes ring-shaped. Even when the pyramids were made of triangular, square, hexagonal and triangular combinations, or pyramids with different arrangement pitches, the performance was insufficient.

本発明によって、上述のニッケルめっきの効果を得ると
共に更にめっきさnた面に極めて微小の凹みをつけるこ
とによって回折現象による色つきと1輪帯化が生ぜず、
小口径レンズに絞った場合にも粒状性のない、明るい、
@−焦性の良い焦点板を得ることができることを知った
。こn″f:説明図として第4図に示し、焦点板12に
微細凹レリーフ13を形成する。
According to the present invention, in addition to obtaining the above-mentioned effects of nickel plating, by creating extremely small indentations on the plated surface, coloring and single ring formation due to diffraction phenomenon do not occur,
Bright, grain-free, even when stopped down to a small aperture lens.
@-I learned that it is possible to obtain a focusing plate with good focusing. This n″f: This is shown in FIG. 4 as an explanatory diagram, and a fine concave relief 13 is formed on the focus plate 12.

この目的のための本発明の第1の実施例は、酸性ニッケ
ル電気めっき浴の一成分として、エチレンオキサイド又
はプロピレンオキサイド又はエチレンオキサイドプロピ
レンオキサイド附加生成物と加えて角錐レリーフをめっ
きする。こnによって1機械加工さnた坦釧的なパター
ンの一部を不規則状に変えることができる。このめっき
さnたレリーフ形状を有する型を使用して透明な光学プ
ラスチックに転写して所要の焦点板を得る。
A first embodiment of the invention for this purpose is to plate the pyramidal reliefs in addition to ethylene oxide or propylene oxide or ethylene oxide propylene oxide adducts as a component of the acidic nickel electroplating bath. This makes it possible to change a part of a machined pattern into an irregular pattern. A mold having this plated relief shape is used to transfer it to a transparent optical plastic to obtain the desired reticle.

めっきさnたレリーフッ(ターンはそのまへ転写型とし
ても使用でき%電鋳によって反転した型を使用すること
もできる。透明な光学プラスチックに転写した場合に凹
凸は反対となるが性能は同じになる。
The plated relief surface (turn can be used as a transfer mold as it is, and a mold reversed by electroforming can also be used. When transferred to transparent optical plastic, the unevenness will be opposite, but the performance will be the same. Become.

この実施例によるニッケルめっきは、硫酸ニッケルと塩
化ニッケルと硼酸と全基礎ニッケル浴とし、電解質pH
値ヲ4.4〜4.6に保ち、基礎光沢剤としてスA/7
オン酸末を用い、特公昭46−644号による上述の微
細分散化エマルジョンを加え、浴温度を48〜52°C
とし、液をかく拌せずにカソードロッキング法によって
めっきした0この場合に、微細分散化エマルジョンによ
るサテン効果は、一定添加量以下では効果が少なく。
Nickel plating according to this example uses nickel sulfate, nickel chloride, boric acid, and an all-based nickel bath, with an electrolyte pH of
Keep the value between 4.4 and 4.6 and use A/7 as a basic brightener.
Using onic acid powder, add the above-mentioned finely dispersed emulsion according to Japanese Patent Publication No. 46-644, and adjust the bath temperature to 48-52°C.
In this case, the satin effect due to the finely dispersed emulsion is less effective below a certain amount added.

−足置を越えnばめつきの安定性を害するO更にめっき
時間を増してもサテン性は一定であることを知′)た。
- It was found that even if the plating time was increased, the satin properties remained constant even if the plating time was increased.

(第2笑施例) 本発明の22の実施例によって、上述のサテン効果はニ
ッケルめっき浴中のニッケル濃度に支配さnることt知
ったO −足の微細分散状エマルジョンの添加量はシエーリング
社(西独)の商品名ベロアA30t−使用した場合にめ
っき液1!当り2 tar程度1i適当である。
(Second Embodiment) According to the 22 embodiments of the present invention, it was learned that the satin effect described above is controlled by the nickel concentration in the nickel plating bath. (West Germany) product name: Velor A30t - Plating solution 1 when used! Approximately 1 i of 2 tar is appropriate.

サテン効果を大とすnには一ニッケル濃度は硫酸ニッケ
ル(含5 H,0)としてめっき液11当り380〜4
00 gr、塩化ニッケ7I/(含sH,0)で35〜
55g程度の高濃度とすることによって良い効果が得ら
nた。この時に、電解電流密度の高い状態でめっきする
場合は、硼酸の含有量をめっき液17fi、955〜6
(lr、の高いイ直とし、うぶ状のニッケルの析出を防
止できる。
To increase the satin effect, the nickel concentration is nickel sulfate (including 5 H, 0) and 380 to 4 per plating solution 11.
00 gr, nickel chloride 7I/(including sH, 0) from 35 to
Good effects were obtained by using a high concentration of about 55 g. At this time, when plating with a high electrolytic current density, the boric acid content should be changed to plating solution 17fi, 955-6
(It is possible to achieve a high level of lr, and prevent the precipitation of hollow nickel.

ニッケル濃度の低いめっき浴でめっきする場合には、被
めっき物の形状、破めっき刊す位の電解電流分布の不均
一、めっき液の発熱による対流によってサテンのむらか
生じ易い。
When plating in a plating bath with a low nickel concentration, satin tends to become uneven due to the shape of the object to be plated, uneven electrolytic current distribution at the point of plating failure, and convection due to heat generated by the plating solution.

本実施例によって−めつき濃度會上げる仁とによってサ
テン効果の向上と均一性d!可11ヒとなる。
This example improves the satin effect and uniformity by increasing the plating density! 11 hits.

次に、ニッケルめっき浴に添加して微細なサテン状効果
をもたらす微細分状エマルジョンはそn自体の分解によ
って被めっき面に分解物が附着した場合、めっきが終了
するまで被めっき面へのニッケルの電着を阻害する。
Next, if the finely divided emulsion that is added to the nickel plating bath produces a fine satin-like effect, and if the decomposition products adhere to the plated surface due to its own decomposition, the nickel will remain on the plated surface until the plating is completed. inhibits electrodeposition.

阻害さ扛た面は正常な微細分散状エマルジョンの粒径3
〜20μに対して60〜100p程度の広い面積であシ
ー精密な拡散板金型として致命ロリな欠陥となる。めっ
き液の清浄化、薬品の添加。
The disturbed surface has a normal finely dispersed emulsion particle size of 3.
It has a wide area of about 60 to 100p for ~20μ, and is a fatal defect for a precision diffusion plate mold. Cleaning of plating solution and addition of chemicals.

を解条件の変化ではこの欠陥がなくならなかつlヒ。Changing the solution conditions does not eliminate this defect.

(23実施例) 本発明の23の実施例によって1例えは、1回の連続め
っき15分程度で所要のめりき膜厚會得る場合に、IM
の連続めっき時間′ft3分〜5分とし、5回ないし3
回に分け、七nぞ牡の中間で裸めつき面を超音波をかけ
ながら活性化処理と洗滌とを行なった。こnによって分
解生成物音めっき面から除去し、所要のめつき厚さを得
た。この途中洗滌過程の追加によって1分解生成物の電
着阻害部分は焦点板金型として問題にならない程度とな
った。かくして1分解生成物の存在下で歩留まシの良い
めっき作業を行ない得た。この理由は。
(23 Embodiments) According to the 23 embodiments of the present invention, for example, when the required plating film thickness is obtained in one continuous plating for about 15 minutes, IM
The continuous plating time is 3 to 5 minutes, and the plating is repeated 5 to 3 times.
The bare plating surface was activated and washed in several times while applying ultrasonic waves to the bare plated surface between the seven sides. This removed the decomposition products from the sonoplated surface to obtain the required plating thickness. By adding this midway cleaning process, the electrodeposition inhibiting portion of the 1 decomposition product was reduced to such an extent that it did not pose a problem as a focusing plate mold. In this way, plating work with good yield could be carried out in the presence of decomposition products. The reason for this is.

分解生成物が前と同じ部位に附着する確本が著しく小さ
いためと思わnる。
This seems to be because the probability that the decomposition products will adhere to the same site as before is extremely small.

発明の効果 上述によって明らかにさnた通シ1本発明の利点は次の
通りである。
Advantages of the Invention As revealed above, the advantages of the present invention are as follows.

本発明による焦点板は機械加工によって容易に得らnる
微小角錐をめっき手段によって角錐と同じ寸法のレンズ
を得ると共に、このレンズ面に極めて小さa多数の凹部
即ちレンズを形成した型を得ることができる。この型を
透明な光学プラスチックに転写した焦点板に微小角錐と
同じ寸法のレンズの配列で生ずるモアレ現象や輪帯ボケ
はなくなる。かくして、容易に、安価に、再現性のある
焦点板が得らnる。
In the reticle of the present invention, a lens having the same dimensions as the pyramid is obtained by plating a minute pyramid that can be easily obtained by machining, and a mold is obtained in which a large number of extremely small concave portions, that is, lenses are formed on the lens surface. I can do it. A focus plate that has this mold transferred onto transparent optical plastic eliminates the moiré phenomenon and annular blur that occurs when lenses of the same size as the tiny pyramids are arranged. In this way, a focusing plate with reproducibility can be obtained easily and inexpensively.

機械加工する角錐の形状上三角、四角、六角又はその組
合せとし1寸法全任意に定めることができる。角錐の角
度、めっきの膜厚、サテン状粒子の密度等の関数を任意
に選択して目的に応じた特性の焦点板金m會容易に製作
することができる。
The shape of the pyramid to be machined can be triangular, square, hexagonal, or a combination thereof, and one dimension can be determined arbitrarily. By arbitrarily selecting functions such as the angle of the pyramid, the thickness of the plating film, and the density of the satin-like particles, it is possible to easily produce a focal sheet metal sheet having characteristics suited to the purpose.

機械加工して得ら詐た角錐レリーフにめっきを行ったも
のを金型として使用することもでき、めっきした後にI
tIL鋳して反転像を金型とすることもできる。
A plated pyramidal relief obtained by machining can also be used as a mold, and after plating,
It is also possible to perform tIL casting and use the reversed image as a mold.

めっき浴の組成とめつき方法と全選択して歩留まりの良
いめっきを行なうことができ、金型のW工が容易、確実
になり、再現性があシ、焦点板を安価に製造できる。
It is possible to perform plating with a high yield by fully selecting the composition of the plating bath and the plating method, the W processing of the mold is easy and reliable, the reproducibility is high, and the focus plate can be manufactured at low cost.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は既知の砂摺シによって得た凹凸レリーフ形状と
した焦点板と光線の散乱特性を示す図。 第2図は微小レンズの凹凸レリーフとした焦点板と光線
の散乱特性を示す図、第3因は本発明焦点板製造の第1
工程として機械加工面の例を図す図。 第4図は本発明焦点板の凹凸レリーフの拡大説明図であ
る。 1.6.12・・・拡散レリーフ 2.7.12・・・焦点板 4.5・・・散乱特性 10.11・・・角錐 l3・・・微細口レリーフ。 特許出願人 オリンパス光学工業株式会社 −第1図 
第2図 第3図 2 手続補正書(自発) 昭11159年!E281J 特許庁長官 志 賀 学 殿 1、事件の表示 昭和58年特許願第2227G1号 2、発明の名称 焦点板とその製造方法 3、補正をする者 事件との関係 特許出願人 住 所 東京都渋谷区幡ケ谷2丁目43番2号名 称 
(037) オリンパス光学工業(1、式会拮取締役社
長 下 山 部 4、代 理 人 6、補正の対象 明細書の「詳細な説明ヨの榴 7、補正の内容 (1) 明細書第6頁第10行目に記載するr電気過程
で1を「電解過程で」と訂正する。 (2) 明細書第7頁第9行目、同頁第11行目及び第
9頁5行目に夫々記載するr本発明。 を「本実施例」とn]正する。 (3) 明細書第7頁第16行目に記載する「研磨盤等
」を「研削盤等、に8]正する。 (4) 明細書第9頁第17行目に記載する「と加えて
ヨを「を加えて、と訂正する。 (5) 明細書第1O頁第11行目に記載する「微細分
散化工エマルジョン、を「微細分散状エマルジョン」七
訂正する。 (6) 明細書第10頁第14行目に記載の「微細分散
化エマルジョン」を「微細分散状エマルジョン」と訂正
する。 (7) 明細書第11頁第6行目に記載する「大とすれ
には」を「大吉するには、に訂正する。 (8) 明細書第11頁第7行目及び同頁第8行目に夫
々記載するr(含5H20)Jを「(含6H20)Jと
a]正する。 (9) 明細書′as l 2 )7im I行ljL
記+iik’J−’+’ii&細分状エマルジョン」を
「微細分散状1マルジヨン」と訂正する。
FIG. 1 is a diagram illustrating a focus plate with an uneven relief shape obtained by known sand printing and the scattering characteristics of light rays. Figure 2 is a diagram showing the scattering characteristics of light rays and a focus plate with a concave-convex relief of microlenses.
A diagram illustrating an example of a machining surface as a process. FIG. 4 is an enlarged explanatory view of the uneven relief of the focusing plate of the present invention. 1.6.12... Diffusion relief 2.7.12... Focal plate 4.5... Scattering characteristics 10.11... Pyramid l3... Fine mouth relief. Patent applicant Olympus Optical Industry Co., Ltd. - Figure 1
Figure 2 Figure 3 2 Procedural amendment (voluntary) 1987! E281J Manabu Shiga, Commissioner of the Patent Office1, Indication of the case, Patent Application No. 2227G1 of 1982, Name of the invention Focus plate and its manufacturing method3, Relationship with the amended person case Patent applicant address Shibuya, Tokyo Ward Hatagaya 2-43-2 Name
(037) Olympus Optical Industry (1) President Shimoyama 4, Agent 6, Detailed explanation of the specification subject to amendment 7, Contents of amendment (1) Page 6 of the specification Correct 1 in the r electrical process written in line 10 to "in an electrolytic process." (2) In the specification, page 7, line 9, page 11, line 11, and page 9, line 5, respectively. (3) Correct "grinding machine, etc." described in page 7, line 16 of the specification to "grinding machine, etc.". (4) Correct the statement "Finely dispersed chemical emulsion" stated on page 10, line 11 of the specification, by adding "in addition to ". (6) Correct "finely dispersed emulsion" stated in page 10, line 14 of the specification to "finely dispersed emulsion." (7) Specification No. "Great luck" written in line 6 of page 11 is corrected to "great luck." (8) Written in line 7 of page 11 of the specification and line 8 of the same page, respectively. Correct r (including 5H20) J to ``(including 6H20) J and a]. (9) Specification 'as l 2 ) 7im Line I ljL
Correct "Finely dispersed emulsion" to "Finely dispersed one emulsion".

Claims (1)

【特許請求の範囲】 11+焦点板の製造方法であって、角錐状の規則的な凹
凸レリーフを加工し、上記角錐状凹凸レリーフ面に電気
めっきを行ない、上記電気めっきによって各角錐をレン
ズ面とすると共にレンズに多数の微小凹み全形成させ、
上記電気めっき面vi−元学素材に転写することを特徴
とする焦点板の製造方法。 (2)焦点板の製造方法であって、規則的な角錐状の凹
凸レリーフt″加工し、上記凹凸レリーフ面に電気めっ
きを行ない、上記電気めっきによって各角錐をレンズ面
とすると共にレンズ面に多数の微小凹みを形成させ、上
記電気めっき面會電鋳法で金型に転写し、金型に転写し
た面を光字素材に転写するとと′t−特徴とする焦点板
の製造方法。 (3)前記規則的な角錐状凹凸レリーフは五角錐。 四角錐、五角錐と六角錐の組合せとして機械W工によっ
て得る特許請求の範囲i−1項又は第2項記載の方法。 (4)前記電気めっきには微細分散状のエマルショアを
含有するニッケA/′#L気めっき酸性浴によって行な
う特許請求の範囲第1項又は3・2項記載の方法。 (5)前記電気めっきは洗5冬工程を介した複数回に分
けて行なう特許請求の範囲第4項記載の方法。 (6)規則的に配列した多数のレンズ状凹凸全備え。 各レンズ状凹凸面にレンズより著しく小さい多数の6向
を有することを特徴とする焦点板。
[Claims] A method for manufacturing an 11+ reticle, comprising: processing a pyramid-shaped regular uneven relief surface, electroplating the pyramid-shaped uneven relief surface, and forming each pyramid with a lens surface by the electroplating. At the same time, a large number of microscopic dents are completely formed in the lens,
A method for manufacturing a focusing plate, characterized in that the electroplated surface is transferred onto a vi-gen material. (2) A method for manufacturing a focusing plate, in which a regular pyramid-shaped uneven relief t'' is processed, electroplating is performed on the uneven relief surface, and each pyramid is made into a lens surface by the electroplating, and the lens surface is A method for manufacturing a focusing plate characterized in that a large number of minute depressions are formed, the electroplated surface is transferred to a mold by the electroforming method, and the surface transferred to the mold is transferred to an optical character material. ( 3) The regular pyramid-shaped uneven relief is a pentagonal pyramid. The method according to claim i-1 or 2, which is obtained by mechanical work as a combination of a square pyramid, a pentagonal pyramid, and a hexagonal pyramid. The method according to claim 1 or 3 and 2, wherein the electroplating is carried out using a Nikke A/'#L plating acidic bath containing finely dispersed emulsion. The method according to claim 4, which is carried out in multiple steps through the process. (6) Completely equipped with a large number of regularly arranged lens-like concavities and convexities. Each lens-like concave and convex surface has a large number of 6 rays that are significantly smaller than a lens. 1. A focusing plate characterized by having a direction.
JP22276183A 1983-11-26 1983-11-26 Reticle and its production Granted JPS60114834A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP22276183A JPS60114834A (en) 1983-11-26 1983-11-26 Reticle and its production
DE19843442781 DE3442781A1 (en) 1983-11-26 1984-11-23 DISPLAY PLATE AND METHOD FOR THEIR PRODUCTION
US06/943,833 US4851164A (en) 1983-11-26 1986-12-17 Method of manufacturing focal plates
US07/758,346 US5696630A (en) 1983-11-26 1991-09-09 Focal plates and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22276183A JPS60114834A (en) 1983-11-26 1983-11-26 Reticle and its production

Publications (2)

Publication Number Publication Date
JPS60114834A true JPS60114834A (en) 1985-06-21
JPH037924B2 JPH037924B2 (en) 1991-02-04

Family

ID=16787485

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22276183A Granted JPS60114834A (en) 1983-11-26 1983-11-26 Reticle and its production

Country Status (1)

Country Link
JP (1) JPS60114834A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5227634A (en) * 1975-08-27 1977-03-02 Minolta Camera Co Ltd Focus plate
JPS5550228A (en) * 1978-10-06 1980-04-11 Ricoh Co Ltd Focus plate
JPS5713401A (en) * 1980-06-27 1982-01-23 Canon Inc Diffusing plate
JPS5860642A (en) * 1981-10-01 1983-04-11 Nippon Kogaku Kk <Nikon> Preparation of focusing glass

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5227634A (en) * 1975-08-27 1977-03-02 Minolta Camera Co Ltd Focus plate
JPS5550228A (en) * 1978-10-06 1980-04-11 Ricoh Co Ltd Focus plate
JPS5713401A (en) * 1980-06-27 1982-01-23 Canon Inc Diffusing plate
JPS5860642A (en) * 1981-10-01 1983-04-11 Nippon Kogaku Kk <Nikon> Preparation of focusing glass

Also Published As

Publication number Publication date
JPH037924B2 (en) 1991-02-04

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