JPH07108536A - Manufacture of mold for forming reticle - Google Patents

Manufacture of mold for forming reticle

Info

Publication number
JPH07108536A
JPH07108536A JP27778093A JP27778093A JPH07108536A JP H07108536 A JPH07108536 A JP H07108536A JP 27778093 A JP27778093 A JP 27778093A JP 27778093 A JP27778093 A JP 27778093A JP H07108536 A JPH07108536 A JP H07108536A
Authority
JP
Japan
Prior art keywords
mold
fine lenses
creases
replica
lenses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27778093A
Other languages
Japanese (ja)
Other versions
JP3433988B2 (en
Inventor
Bunji Akimoto
文二 秋元
Kazunari Tokuda
一成 徳田
Daisuke Matsuo
大介 松尾
Yoshiki Nitta
佳樹 新田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP27778093A priority Critical patent/JP3433988B2/en
Publication of JPH07108536A publication Critical patent/JPH07108536A/en
Application granted granted Critical
Publication of JP3433988B2 publication Critical patent/JP3433988B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To avoid the occurrence of a diffraction phenomenon in a reticle having fine lenses disposed thereon by forming pyramidal fine irregular reliefs on the surface of a raw material, and subjecting them to electroplating for forming fine lenses, and then transferring and depositing them on the surface of UV hardening resin for forming creases on the surface of the lenses in order to cancel the regularity of the fine lenses. CONSTITUTION:Regular pyramidal reliefs 2 are formed on the blank 1 by machine work, and then electroplating is given to the reliefs 2 so that protrusive fine lenses 6 are formed through a smoothing effect, and on the surface of a glass substrate 7, UV hardening resin 8 is coated evenly, and subsequently the fine lenses 6 are pressed thereon for forming recessive fine lenses 9 that are then cured by irradiating ultraviolet rays thereon. A deposited film 10 is spread over the surface of the fine lenses 9 to be placed in a high temperature bath for a predetermined period for creating creases 11 on the deposited film 10 irregularly. The lens surfaces 9 having creases 11 produced is subjected to an electrocasting reversal process by a method of replica, so that a replica mold 12 Is made having fine lenses 13 with creases 11. Therefore, any diffraction phenomenon can be avoided by the creases formed on a reticle manufactured by the replica mold 12.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、一眼レフカメラに使用
されるピント合わせ用の焦点板を作成する焦点板作成金
型の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a focusing screen forming die for manufacturing a focusing screen used for a single-lens reflex camera.

【0002】[0002]

【従来の技術】一眼レフカメラに使用される焦点板はフ
ィルム面と同一像を結像させてピントを合わせており、
焦点板のマット面にはファインダー像が明るく、ピント
合わせの容易なことが要求される。しかし、ピントを合
わせ易くするためにマット面の拡散性を大きくするとフ
ァインダー像は暗くなり、ファインダー像を明るくする
ためにマット面の拡散性を小さくするとファインダー像
のボケる量が減少し、ピント合わせが難しくなるという
相反する現象を生じる。
2. Description of the Related Art A focusing screen used in a single-lens reflex camera focuses an image by forming the same image as the film surface.
The matte surface of the focusing screen is required to have a bright finder image and easy focusing. However, increasing the diffusivity of the matte surface to make it easier to focus makes the viewfinder image darker, and decreasing the diffusiveness of the matte surface to make the viewfinder image brighter reduces the amount of blurring of the viewfinder image. The opposite phenomenon that it becomes difficult occurs.

【0003】従来、上記相反する現象が生じるのを解決
するために、特開昭60−114834号公報には、規
則的なマイクロレンズを形成しその各マイクロレンズ間
の配列ピッチとレンズパワーを制御し合焦性と明るさを
制御する焦点板が提案されているが、この焦点板ではマ
イクロレンズの規則正しい配列による回折現象を生じ焦
点板に干渉色が生じる欠点があった。
In order to solve the above-mentioned contradictory phenomenon, Japanese Patent Laid-Open No. 60-114834 discloses that regular microlenses are formed and the array pitch and lens power between the microlenses are controlled. However, a reticle for controlling the focusing property and brightness has been proposed, but this reticle has a drawback that a diffraction phenomenon occurs due to a regular arrangement of microlenses and an interference color is generated on the reticle.

【0004】そのため、この干渉色を減少させる焦点板
とその製造方法が特開昭64−29827号公報におい
て開示されている。この開示された製造方法では、まず
金属面に角錐状の規則的な凸レリーフを形成し、この角
錐状のレリーフ面に電気めっきを施して各角錐をレンズ
面に形成する。そして、この電気めっきしたレンズ面を
転写したABS樹脂をエッチングにより粗面化した後、
導電処理を施してから電鋳法により粗面化したABS樹
脂面を金型に転写して、焦点板を形成するための金型を
作成し、この金型の転写面を光学素材に転写して焦点板
を得ている。この方法では、エッチングにより不規則に
粗面化されたABS樹脂の粗面が金型の成形面に転写さ
れる。このため、この金型で成形した焦点板には上記粗
面が転写され、規則正しいマイクロレンズの配列により
生じる回折現象を減少させることが可能となる。
Therefore, a focusing screen for reducing this interference color and a manufacturing method thereof are disclosed in Japanese Patent Laid-Open No. 64-29827. In the disclosed manufacturing method, first, a pyramidal regular convex relief is formed on a metal surface, and the pyramidal relief surface is electroplated to form each pyramid on a lens surface. Then, after the ABS resin that has transferred the electroplated lens surface is roughened by etching,
The ABS resin surface roughened by electroforming after being subjected to a conductive treatment is transferred to a mold to create a mold for forming a focusing screen, and the transfer surface of this mold is transferred to an optical material. To get the reticle. In this method, the rough surface of the ABS resin which is irregularly roughened by etching is transferred to the molding surface of the mold. Therefore, the rough surface is transferred to the focusing screen formed by this mold, and it is possible to reduce the diffraction phenomenon caused by the regular arrangement of the microlenses.

【0005】[0005]

【発明が解決しようとする課題】しかし、上記特開昭6
4−29827号公報で開示される方法では、ABS樹
脂の成形体をクロム−硫酸の化学エッチング液でエッチ
ングを行うが、クロム酸は人体に危険でありその取り扱
いや処理に対しドラフトや廃液処理装置、エッチング液
除去洗浄装置等が必要となるため、作業性やコスト面で
問題が生じる。
However, the above-mentioned Japanese Unexamined Patent Application Publication No.
In the method disclosed in Japanese Patent Publication No. 4-29827, a molded body of ABS resin is etched with a chemical etching solution of chromium-sulfuric acid, but chromic acid is dangerous to the human body, and a draft or waste liquid treatment device is required for its handling and processing. However, since an etching liquid removing and cleaning device and the like are required, problems arise in terms of workability and cost.

【0006】本発明は、上記従来技術の問題点に鑑みな
されたもので、回折現象を生じさせず明るく合焦性の良
い焦点板を作成することができる金型を安全で作業性良
く製造する方法を提供することを目的とする。
The present invention has been made in view of the above-mentioned problems of the prior art, and manufactures a mold which is safe and has good workability, which is capable of producing a bright and good focusing screen without causing a diffraction phenomenon. The purpose is to provide a method.

【0007】[0007]

【課題を解決するための手段】上記問題点を解決するた
めに、本発明は、金型素材表面に角錐状の規則的な微小
凹凸レリーフを加工し、前記角錐状凹凸レリーフ面に電
気めっきを行い各角錐状レリーフを規則的な微小レンズ
にし、この微小レンズを有するレンズ面を、予めUV硬
化樹脂を塗布したガラス板のUV硬化樹脂面に転写し、
このレンズ面を転写したUV硬化樹脂にUVを照射して
UV硬化樹脂を硬化させた後、真空蒸着法により誘電体
膜をUV硬化樹脂面に蒸着し、その後誘電体膜を設けた
UV硬化樹脂面を有するガラス板を40℃以上200℃
で湿度40%以上100%以下の状態に24時間以上4
8時間以下さらした後、このUV硬化樹脂面をレプリカ
法により転写して焦点板作成用金型を製造した。
In order to solve the above problems, the present invention processes a pyramidal regular fine relief pattern on the surface of a die material, and electroplates the pyramidal relief surface. Each pyramidal relief is made into a regular minute lens, and the lens surface having this minute lens is transferred to the UV curable resin surface of the glass plate coated with the UV curable resin in advance.
The UV curable resin on which the lens surface is transferred is irradiated with UV to cure the UV curable resin, and then the dielectric film is vapor-deposited on the UV curable resin surface by a vacuum deposition method, and then the UV curable resin provided with the dielectric film. A glass plate with a surface of 40 ° C or higher and 200 ° C
At a humidity of 40% or more and 100% or less for 24 hours or more 4
After being exposed for 8 hours or less, the UV cured resin surface was transferred by a replica method to manufacture a mold for producing a focusing screen.

【0008】[0008]

【作用】上記構成によれば、誘電体膜を設けたUV硬化
樹脂面を有するガラス板を40℃以上200℃で湿度4
0%以上100%以下の状態に24時間以上48時間以
下さらすと、UV硬化樹脂と蒸着した誘電体膜との熱膨
張率及び吸湿膨張率の違いによりUV硬化樹脂の表面全
体に長さ10μm、深さ0.1μm程度のシワが不規則
に生じる。このシワは40℃以上で湿度40%以上の状
態に24時間以上さらせば生じるが、200℃以上の温
度ではUV硬化樹脂に変質が生じてしまう。また48時
間以上さらしてもシワの進行はほとんど生ぜず大きな効
果はない。このシワを有するUV硬化樹脂面をレプリカ
法により転写すると金型の成形面には上記シワが存在す
る微小レンズ面を有する焦点板作成金型が得られる。そ
のためこの金型を用いて成形した焦点板にはUV硬化樹
脂面に生じたシワと同様な不規則なシワを表面に有する
微小レンズが形成される。この不規則なシワの作用によ
り焦点板表面の微小レンズの規則性が解消され、規則的
な微小レンズを配した焦点板に生じる回折現象の発生が
防止される。また、金型の作成にクロム酸等の有害な物
質を使用しないため安全でかつ作業性が良くなる。
According to the above construction, the glass plate having the UV-curing resin surface provided with the dielectric film is heated at 40 ° C. or higher and 200 ° C. and the humidity is 4 ° C.
When exposed to a state of 0% or more and 100% or less for 24 hours or more and 48 hours or less, the length of 10 μm on the entire surface of the UV curing resin due to the difference in thermal expansion coefficient and hygroscopic expansion coefficient between the UV curing resin and the deposited dielectric film, Wrinkles with a depth of about 0.1 μm occur irregularly. This wrinkle occurs when the temperature is 40 ° C. or more and the humidity is 40% or more for 24 hours or more, but the UV curable resin is deteriorated at a temperature of 200 ° C. or more. Further, even if exposed for 48 hours or more, there is almost no wrinkle progression and no great effect. When the UV curable resin surface having the wrinkles is transferred by the replica method, a mold for forming a focusing screen having a minute lens surface having the wrinkles on the molding surface of the mold is obtained. Therefore, on the focusing screen formed by using this mold, minute lenses having irregular wrinkles similar to wrinkles formed on the surface of the UV curable resin on the surface are formed. Due to the action of this irregular wrinkle, the regularity of the microlenses on the surface of the focusing screen is eliminated, and the occurrence of the diffraction phenomenon that occurs in the focusing screen on which the regular microlenses are arranged is prevented. Further, since no harmful substance such as chromic acid is used for making the mold, it is safe and the workability is improved.

【0009】[0009]

【実施例1】図1から図7は本発明の実施例1の製造工
程を示し、図1はマスター型ブランクを示す斜視図、図
2はマスター型ブランクを示す断面図、図3はマスター
型ブランク上に電気めっきを施したマスター型を示す断
面図、図4はマスター型を転写した後に蒸着膜を施した
UV硬化樹脂を示す断面図、図5は熱処理等した蒸着膜
を施したUV硬化樹脂を示す平面図、図6は図5のA−
A’線断面図、図7はレプリカ型(電鋳型)を示す断面
図である。以下、図1から図7を用いて本実施例の製造
方法を作用とともに説明する。
Embodiment 1 FIGS. 1 to 7 show a manufacturing process of Embodiment 1 of the present invention, FIG. 1 is a perspective view showing a master mold blank, FIG. 2 is a sectional view showing a master mold blank, and FIG. 3 is a master mold. Sectional view showing a master mold on which electroplating is performed on a blank, FIG. 4 is a sectional view showing a UV curable resin on which a vapor deposition film has been applied after transferring the master mold, and FIG. FIG. 6 is a plan view showing the resin, and FIG.
FIG. 7 is a sectional view showing a replica type (electroforming mold), taken along the line A ′. Hereinafter, the manufacturing method of the present embodiment will be described together with its action with reference to FIGS.

【0010】まず、図1、図2に示すように、縦横30
mm×40mm、高さ20mmからなる直方体のCu合
金片の30mm×40mmの平面に機械加工によって角
錐加工を施して規則的な角錐レリーフ2を形成したマス
ター型ブランク1を作成する。角錐レリーフ2は、先端
角120°のバイトを用いて40mmの辺に平行に15
μmピッチで平行に溝加工した後、その溝に対して12
0°と240°をなす各方向に同ピッチでそれぞれ平行
に溝加工をすることにより形成され、六角錐3と三角錐
4とが規則的に配列された状態となっている。
First, as shown in FIG. 1 and FIG.
A pyramidal Cu alloy piece having a size of mm × 40 mm and a height of 20 mm is subjected to pyramid machining by machining to form a master-shaped blank 1 in which regular pyramidal reliefs 2 are formed. The pyramid relief 2 is made parallel to the 40 mm side by using a bite with a tip angle of 120 °.
After making parallel grooves at μm pitch,
The hexagonal pyramids 3 and the triangular pyramids 4 are regularly arranged by forming grooves parallel to each other at the same pitch in each direction forming 0 ° and 240 °.

【0011】つぎに、マスター型ブランク1の角錐レリ
ーフ2にニッケル電気めっきを施し、図3に示すように
角錐レリーフ2の面にニッケルめっき層5を形成したマ
スター型1aを作成する。このニッケル電気めっきを角
錐レリーフ2に施すと、めっきによるスムージングパワ
ー(めっきのスムージング効果)により角錐レリーフ2
の角錐頂部及び稜線を丸めて各角錐レリーフ2(六角錐
3及び三角錐4)を凸状の微小レンズ6に形成する。こ
のニッケル電気めっきは、ワット浴を用い基礎光沢剤と
してアトテック社製のベロアNo.50(商品名)をめ
っき液1リットル当たり20ミリリットル加えて液温を
50〜54℃に保ちカソードロッキング法により行う。
Next, the pyramidal relief 2 of the master die blank 1 is electroplated with nickel to prepare a master die 1a in which a nickel plating layer 5 is formed on the surface of the pyramidal relief 2 as shown in FIG. When this nickel electroplating is applied to the pyramid relief 2, the pyramid relief 2 is provided due to the smoothing power (plating smoothing effect) by the plating.
The pyramid apex and the ridge line are rounded to form each pyramid relief 2 (hexagonal pyramid 3 and triangular pyramid 4) on the convex minute lens 6. This nickel electroplating uses a Watt bath as a basic brightening agent and is a velor No. manufactured by Atotech. 20 (trade name) is added in an amount of 20 ml per liter of the plating solution and the solution temperature is kept at 50 to 54 ° C. by the cathode rocking method.

【0012】ついで、図4に示すようにガラス基板7の
表面に均一に塗布してなるUV硬化樹脂8(シリコンア
クリレート)層に上記マスター1aの微小レンズ6を押
しつけてUV硬化性樹脂8の表面に上記微小レンズ6面
を転写して凹状の微小レンズ9を設けた後、UV硬化樹
脂8に紫外線を照射して硬化させ、その硬化させたUV
硬化樹脂8の微小レンズ9面にSiO2 (光学的膜厚n
d=180nm)の誘電体よりなる蒸着膜10を真空蒸
着法によって形成する。上記ガラス基板7はUV硬化樹
脂8を均一に塗布し、精度良く微小レンズ6をUV硬化
樹脂8上に転写できるように用意されその表面は平面研
磨されている。
Next, as shown in FIG. 4, the microlenses 6 of the master 1a are pressed against the UV-curable resin 8 (silicon acrylate) layer formed by uniformly coating the surface of the glass substrate 7, and the surface of the UV-curable resin 8 is pressed. After the surface of the microlens 6 is transferred to and the concave microlens 9 is provided, the UV curable resin 8 is irradiated with ultraviolet rays to be cured, and the cured UV is cured.
SiO 2 (optical film thickness n
A vapor deposition film 10 made of a dielectric material (d = 180 nm) is formed by a vacuum vapor deposition method. The glass substrate 7 is prepared such that the UV curable resin 8 is evenly applied and the microlenses 6 can be transferred onto the UV curable resin 8 with high precision, and the surface thereof is polished.

【0013】つぎに、微小レンズ9を形成したUV硬化
樹脂8を高温高湿槽内に入れ、温度40℃、湿度40%
の設定条件にて24時間さらす。これによってUV硬化
樹脂8とその表面に着けた蒸着膜10との熱膨張率及び
吸湿膨張率の違いにより、図5、図6に示すようにUV
硬化樹脂8の表面すなわち蒸着膜10面全体に長さ10
μmで深さ0.1μm程度のシワ11が不規則に生じ
る。ここで種々の実験から湿度は100%以下であれば
よく、温度はUV硬化樹脂8の変質を生じない200℃
以下であれば同等の効果が得られる。また時間について
は48時間以上さらしても大きな変化を生じないため4
8時間以内が効率的である。
Next, the UV curable resin 8 having the microlenses 9 formed thereon is placed in a high temperature and high humidity chamber at a temperature of 40 ° C. and a humidity of 40%.
Exposure for 24 hours under the setting conditions of. As a result, due to the difference in the coefficient of thermal expansion and the coefficient of hygroscopic expansion between the UV curable resin 8 and the vapor deposition film 10 attached to the surface thereof, as shown in FIGS.
The length of the cured resin 8 is 10
Wrinkles 11 having a depth of about 0.1 μm at μm occur irregularly. From various experiments, the humidity should be 100% or less, and the temperature should be 200 ° C. at which the UV curing resin 8 does not deteriorate.
The same effect can be obtained in the following cases. Also, the time does not change significantly even if exposed for 48 hours or more. 4
Efficient within 8 hours.

【0014】その後、上記シワ11を生じさせた微小レ
ンズ9面をレプリカ法(ここでは電鋳法)により電鋳反
転させ、図7に示すように表面にシワ11を有する凸状
の微小レンズ13を形成したレプリカ型(鋳造型)12
を得る。
Then, the surface of the minute lens 9 having the wrinkles 11 is inverted by electroforming by the replica method (here, electroforming method), and the convex minute lens 13 having the wrinkles 11 on the surface is formed as shown in FIG. Replica type (casting type) 12 with
To get

【0015】図8は本実施例により製造したレプリカ型
12を用いて形成した焦点板14を示す断面図で、レプ
リカ型12を金型としてアクリル樹脂を射出成形するこ
とによりレプリカ型12のシワ11を有する微小レンズ
13面を転写したシワ15を有する凹状の微小レンズ1
6が表面に形成された焦点板14を得ることができる。
FIG. 8 is a sectional view showing a focusing screen 14 formed by using the replica mold 12 manufactured according to this embodiment. A wrinkle 11 of the replica mold 12 is obtained by injection molding an acrylic resin using the replica mold 12 as a mold. Concave microlens 1 having wrinkles 15 transferred from the surface of microlens 13 having
It is possible to obtain a focusing screen 14 having 6 formed on its surface.

【0016】本実施例で作成したレプリカ型12によれ
ば、焦点板14の表面に形成される微小レンズ16の規
則性を、微小レンズ16に存在するシワ15により解消
することができ、規則的な微小レンズ16を配した焦点
板に生じる回折現象が生じない焦点板14を製作するこ
とができる。さらに、クロム酸等の有害な物質をレプリ
カ型12の作成に必要としないため、安全かつ作業性良
く焦点板14を製作することができる。
According to the replica mold 12 produced in the present embodiment, the regularity of the microlenses 16 formed on the surface of the focusing screen 14 can be eliminated by the wrinkles 15 present in the microlenses 16, so that the regularity is regular. It is possible to manufacture the focusing screen 14 in which the diffraction phenomenon that occurs in the focusing screen on which the minute lenses 16 are arranged does not occur. Furthermore, since a harmful substance such as chromic acid is not required for making the replica mold 12, the focusing screen 14 can be manufactured safely and with good workability.

【0017】なお、本実施例ではUV硬化樹脂にシリコ
ンアクリレートを用いたが、UV硬化樹脂であれば同様
の作用、効果が得られるためエポキシアクリレート、ポ
リウレタンアクリレート、ポリエーテルアクリレート等
のUV硬化樹脂を用いることができる。また、UV硬化
樹脂を塗布する板もガラスに限らず、UV硬化樹脂を均
一に塗布できるように平面研磨が可能な材質であればよ
く、セラミックや金属の板でも同様の効果が得られる。
Although silicon acrylate is used as the UV curable resin in this embodiment, the UV curable resin such as epoxy acrylate, polyurethane acrylate, and polyether acrylate can be used because similar effects and effects can be obtained with the UV curable resin. Can be used. Further, the plate to which the UV curable resin is applied is not limited to glass as long as it can be planarly polished so that the UV curable resin can be evenly applied, and the same effect can be obtained with a ceramic or metal plate.

【0018】[0018]

【実施例2】図9は本実施例の製造方法で作成したレプ
リカ反転型を示す断面図である。本実施例の製造方法
は、図4に示す硬化したUV硬化樹脂8の凹状の微小レ
ンズ9面をエポキシ系樹脂を用いて転写し凸状の微小レ
ンズを形成する。その後、エポキシ系樹脂の凸状微小レ
ンズ面上に実施例1と同様に蒸着膜を形成する。つぎ
に、エポキシ系樹脂と蒸着膜を高温高湿槽で処理し、実
施例1と同様の作用により蒸着膜の全面にシワを不規則
に生じさせる。本実施例では高温高湿槽の条件を温度7
0℃、湿度70%とし時間を24時間とした。上記シワ
を生じさせた凸状の微小レンズ面をレプリカ法により電
鋳反転させ、図9に示すように表面にシワ21を有する
凹状の微小レンズ18を形成したレプリカ反転型17を
得る。その他の製造方法は実施例1と同様である。
[Embodiment 2] FIG. 9 is a sectional view showing a replica inversion type manufactured by the manufacturing method of this embodiment. In the manufacturing method of this embodiment, the concave microlens 9 surface of the cured UV curable resin 8 shown in FIG. 4 is transferred using an epoxy resin to form a convex microlens. After that, a vapor deposition film is formed on the convex minute lens surface of the epoxy resin in the same manner as in Example 1. Next, the epoxy resin and the vapor deposition film are treated in a high temperature and high humidity tank, and wrinkles are irregularly generated on the entire surface of the vapor deposition film by the same action as in Example 1. In this embodiment, the condition of the high temperature and high humidity tank is set to a temperature of 7.
The temperature was 0 ° C., the humidity was 70%, and the time was 24 hours. The convex microlens surface having the wrinkles is electroformed by a replica method to obtain a replica inversion type 17 having concave microlenses 18 having wrinkles 21 on the surface as shown in FIG. Other manufacturing methods are the same as those in the first embodiment.

【0019】図10は上記レプリカ反転型17を用いて
射出成形した焦点板19を示す断面図で、レプリカ反転
型17を金型としてアクリル樹脂を射出成形することに
よりレプリカ反転型17のシワ21を有する微小レンズ
18面を転写したシワ22を有する凸状の微小レンズ2
0が表面に形成された焦点板19を得ることができる。
FIG. 10 is a cross-sectional view showing a focusing screen 19 injection-molded by using the replica inversion mold 17. The wrinkles 21 of the replica inversion mold 17 are formed by injection-molding acrylic resin using the replica inversion mold 17 as a mold. Convex microlens 2 having wrinkles 22 transferred from the surface of the microlens
A focusing screen 19 having 0 formed on the surface can be obtained.

【0020】本実施例で作成したレプリカ反転型17に
よれば、焦点板19の表面に形成される微小レンズ20
の規則性を、微小レンズ20に存在するシワ22により
解消することができ、規則的な微小レンズ20を配した
焦点板に生じる回折現象が生じない焦点板19を製作す
ることができる。また、本実施例の製造方法によれば、
バイト加工とめっき処理によりマスター型ブランクに形
成した凸状の微小レンズとほぼ同じ形状の凸状の微小レ
ンズを有する焦点板を成形することが可能になるため、
設計の自由度が増す。さらに、クロム酸等の有害な物質
をレプリカ反転型17の作成に必要としないため、安全
かつ作業性良く焦点板19を製作することができる。
According to the replica inversion type 17 produced in this embodiment, the minute lens 20 formed on the surface of the focusing screen 19 is used.
The wrinkles 22 present on the minute lenses 20 can eliminate the regularity of, and the focusing screen 19 in which the diffraction phenomenon that occurs in the focusing plate on which the regular minute lenses 20 are arranged does not occur can be manufactured. Further, according to the manufacturing method of the present embodiment,
Since it becomes possible to mold a focusing plate having convex microlenses of almost the same shape as the convex microlenses formed on the master type blank by the bite processing and plating treatment,
The degree of freedom in design increases. Further, since a harmful substance such as chromic acid is not required for producing the replica inversion type 17, the focusing screen 19 can be produced safely and with good workability.

【0021】[0021]

【発明の効果】以上のように、本発明によれば、回折現
象を生じさせず、明るく合焦性が良い焦点板を成形する
ことが可能になる。さらに、焦点板作成用金型を製造す
る工程に有害なクロム酸等を使用しないので安全かつ作
業性が良くなる。
As described above, according to the present invention, it is possible to form a bright and good focusing screen without causing a diffraction phenomenon. Furthermore, since harmful chromic acid or the like is not used in the process of manufacturing the reticle making die, safety and workability are improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例1におけるマスター型ブランク
を示す斜視図である。
FIG. 1 is a perspective view showing a master mold blank according to a first embodiment of the present invention.

【図2】本発明の実施例1におけるマスター型ブランク
を示す断面図である。
FIG. 2 is a cross-sectional view showing a master mold blank in Example 1 of the present invention.

【図3】本発明の実施例1におけるマスター型ブランク
上に電気めっきを施したマスター型を示す断面図であ
る。
FIG. 3 is a cross-sectional view showing a master mold in which electroplating is performed on the master mold blank according to the first embodiment of the present invention.

【図4】本発明の実施例1におけるマスター型を転写し
た後に蒸着膜を施したUV硬化樹脂を示す断面図であ
る。
FIG. 4 is a cross-sectional view showing a UV curable resin on which a vapor deposition film is applied after transferring a master mold in Example 1 of the present invention.

【図5】本発明の実施例1における熱処理等した蒸着膜
を施したUV硬化樹脂を示す平面図である。
FIG. 5 is a plan view showing a UV curable resin provided with a vapor deposition film that has been subjected to heat treatment and the like in Example 1 of the present invention.

【図6】本発明の実施例1における図5のA−A’線断
面図である。
FIG. 6 is a sectional view taken along the line AA ′ of FIG. 5 in the first embodiment of the present invention.

【図7】本発明の実施例1により作成したレプリカ型
(電鋳型)を示す断面図である。
FIG. 7 is a cross-sectional view showing a replica type (electroforming mold) produced according to Example 1 of the present invention.

【図8】本発明の実施例1で作成したレプリカ型を用い
て製造した焦点板を示す断面図でる。
FIG. 8 is a cross-sectional view showing a focusing screen manufactured using the replica mold manufactured in Example 1 of the present invention.

【図9】本発明の実施例2におけるレプリカ反転型を示
す断面図である。
FIG. 9 is a sectional view showing a replica inversion type in Example 2 of the present invention.

【図10】本発明の実施例2で作成したレプリカ反転型
を用いて製造した焦点板を示す断面図である。
FIG. 10 is a cross-sectional view showing a focusing screen manufactured by using the replica inversion type manufactured in Example 2 of the present invention.

【符号の説明】[Explanation of symbols]

1 マスター型ブランク 2 角錐レリーフ 5 ニッケルめっき層 6 凸状の微小レンズ 7 ガラス板 8 UV硬化樹脂 9 凹状の微小レンズ 10 蒸着膜 11 21 シワ 12 レプリカ型 13 凸状の微小レンズ 14 19 焦点板 15 22 シワ 16 凹状の微小レンズ 17 レプリカ反転型 18 凹状の微小レンズ 20 凸状の微小レンズ 1 Master Type Blank 2 Pyramidal Relief 5 Nickel Plating Layer 6 Convex Microlens 7 Glass Plate 8 UV Curable Resin 9 Concave Microlens 10 Evaporated Film 11 21 Wrinkles 12 Replica Type 13 Convex Microlens 14 19 Focus Plate 15 22 Wrinkle 16 concave micro lens 17 replica inversion type 18 concave micro lens 20 convex micro lens

───────────────────────────────────────────────────── フロントページの続き (72)発明者 新田 佳樹 東京都渋谷区幡ヶ谷2丁目43番2号 オリ ンパス光学工業株式会社内 ─────────────────────────────────────────────────── ─── Continued Front Page (72) Inventor Yoshiki Nitta 2-43-2 Hatagaya, Shibuya-ku, Tokyo Inside Olympus Optical Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 金型素材表面に角錐状の規則的な微小凹
凸レリーフを加工し、前記角錐状凹凸レリーフ面に電気
めっきを行い各角錐状レリーフを規則的な微小レンズに
し、この微小レンズを有するレンズ面を、予めUV硬化
樹脂を塗布したガラス板のUV硬化樹脂面に転写し、こ
のレンズ面を転写したUV硬化樹脂にUVを照射してU
V硬化樹脂を硬化させた後、真空蒸着法により誘電体膜
をUV硬化樹脂面に蒸着し、誘電体膜を設けたUV硬化
樹脂面を有するガラス板を40℃以上200℃で湿度4
0%以上100%以下の状態に24時間以上48時間以
下さらした後、このUV硬化樹脂面をレプリカ法により
転写することを特徴とする焦点板作成用金型の製造方
法。
1. A pyramidal regular fine relief pattern is formed on the surface of a die material, and the pyramidal relief surface is electroplated to form each pyramid relief into a regular fine lens. The lens surface is transferred to the UV curable resin surface of the glass plate coated with UV curable resin in advance, and the UV curable resin on which the lens surface is transferred is irradiated with UV and U
After the V-curing resin is cured, a dielectric film is vapor-deposited on the UV-curing resin surface by a vacuum evaporation method, and the glass plate having the UV-curing resin surface provided with the dielectric film is dried at 40 ° C. or higher and 200 ° C. and a humidity of 4 ° C.
A method of manufacturing a mold for producing a focusing screen, which comprises exposing the UV-cured resin surface by a replica method after exposing it to a state of 0% to 100% for 24 hours to 48 hours.
JP27778093A 1993-10-08 1993-10-08 Manufacturing method of mold for making reticle Expired - Fee Related JP3433988B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27778093A JP3433988B2 (en) 1993-10-08 1993-10-08 Manufacturing method of mold for making reticle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27778093A JP3433988B2 (en) 1993-10-08 1993-10-08 Manufacturing method of mold for making reticle

Publications (2)

Publication Number Publication Date
JPH07108536A true JPH07108536A (en) 1995-04-25
JP3433988B2 JP3433988B2 (en) 2003-08-04

Family

ID=17588212

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
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GB2365815A (en) * 1999-01-22 2002-02-27 Sony Corp Optical element and its manufacture
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GB2365815B (en) * 1999-01-22 2002-10-30 Sony Corp Manufacture of optical elements
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US6721097B2 (en) 1999-01-22 2004-04-13 Sony Corporation Optical element, its manufacturing method and optical element manufacturing metal die
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WO2012173258A1 (en) * 2011-06-17 2012-12-20 三菱レイヨン株式会社 Mould having an uneven surface structure, optical article, manufacturing method therefor, transparent base material for surface-emitting body and surface-emitting body
JPWO2012173258A1 (en) * 2011-06-17 2015-02-23 三菱レイヨン株式会社 Mold having concavo-convex structure on surface, optical article, method for producing the same, transparent substrate for surface light emitter, and surface light emitter
US9696464B2 (en) 2011-06-17 2017-07-04 Mitsubishi Rayon Co., Ltd. Mold having an uneven surface structure, optical article, manufacturing method therefor, transparent substrate for surface light emitter and surface light emitter
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