JPS60250338A - Reticle and its manufacture - Google Patents

Reticle and its manufacture

Info

Publication number
JPS60250338A
JPS60250338A JP10798784A JP10798784A JPS60250338A JP S60250338 A JPS60250338 A JP S60250338A JP 10798784 A JP10798784 A JP 10798784A JP 10798784 A JP10798784 A JP 10798784A JP S60250338 A JPS60250338 A JP S60250338A
Authority
JP
Japan
Prior art keywords
lens
uneven
honeycomb pattern
shaped
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10798784A
Other languages
Japanese (ja)
Other versions
JPH037925B2 (en
Inventor
Kenji Hayashi
賢二 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Corp
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp, Olympus Optical Co Ltd filed Critical Olympus Corp
Priority to JP10798784A priority Critical patent/JPS60250338A/en
Priority to DE19843442781 priority patent/DE3442781A1/en
Publication of JPS60250338A publication Critical patent/JPS60250338A/en
Priority to US06/943,833 priority patent/US4851164A/en
Publication of JPH037925B2 publication Critical patent/JPH037925B2/ja
Priority to US07/758,346 priority patent/US5696630A/en
Granted legal-status Critical Current

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Abstract

PURPOSE:To easily focus by a titled focusing screen, and also to manufacture it easily and at a low cost by arranging regularly many lens-shaped uneven parts on the surface of an optical blank material, and also forming a remarkably small uneven part on this uneven part. CONSTITUTION:As for a reticle, many lens-shaped uneven parts 2 are arranged regularly on the surface of an optical blank material 1, and also on this uneven surface, a remarkably smaller uneven part 3 than said uneven part is formed. When manufacturing this reticle, a pyramid relief 14 which has combined many hexagonal pyramids 12 and triangular pyramids 13 by machining is formed on the surface of a plate material 11. A honeycomb pattern 16 consisting of a lens surface 15 is formed by performing an electric plating, and this pattern 16 is transferred directly to an optical blank material, by which the reticle is completed. Therefore, the reticle-which harmonizes regularity and irregularity of a diffusion relief, can execute easily the focusing, and can be manufactured easily and at a low cost is obtained.

Description

【発明の詳細な説明】 本発明は、カメラの焦点板とその製造方法に関する。[Detailed description of the invention] The present invention relates to a focusing plate for a camera and a method for manufacturing the same.

従来、−眼レフ等のカメラの焦点板としては、広く用い
られている。この熱点板は、金属板の表面を砂mbした
型を用いて板状の光学素材に転写して製造されるもので
ある。
Conventionally, it has been widely used as a focus plate for cameras such as eye reflex cameras. This heat spot plate is manufactured by transferring the surface of a metal plate onto a plate-shaped optical material using a sand mold.

しかし、上記砂摺シ拡散レリーフを有する焦点板は、拡
散性を良くするとボケが大きくガリピント合せが容易と
なるが、マー、 )面の粒状性が大きくなってファイン
ダーが著しく暗くなる。反対に拡散性を減らすとファイ
ンダーは明るくなるが、ボケの検出能力が低下する問題
がある。
However, when the above-mentioned reticle having the sand-printed diffusion relief improves the diffusivity, the blur becomes large and it becomes easy to focus, but the graininess of the (mar) and ) surfaces becomes large and the finder becomes extremely dark. On the other hand, reducing the diffusivity will make the viewfinder brighter, but there is a problem in that the ability to detect blur will decrease.

上記問題を解決するため種々の改良がなされている。Various improvements have been made to solve the above problems.

たとえば、特開昭58−42726号公報、特開昭54
−92282号公報忙は、スペックルパターンを感材に
記録したものが記載されているが、この焦点板は、明る
く粒状性が少ないものの、小紋シになるに従って粒状性
が目立ってくる問題がある。
For example, JP-A-58-42726, JP-A-54
-Publication No. 92282 describes a speckle pattern recorded on a photosensitive material, but although this focusing plate is bright and has little graininess, there is a problem that the graininess becomes more noticeable as fine patterns become visible. .

かかる問題の解決を図るため規則的な微細構造の拡散レ
リーフを形成した焦点板があシ、この焦点板を製造する
ため、特公昭54−88846号公報には、金属基板上
に感光性樹脂を塗布し、微細パターンのマスク像を露光
現像して工9チングする方法が記載されておシ、また、
特公昭55−90981号公報には、レーザー光線の規
則的干渉パターンを乾板に焼き付はプリーチ処理を行う
方法が記載されている。
In order to solve this problem, a focusing plate with a regular fine-structured diffusion relief is developed. In order to manufacture this focusing plate, Japanese Patent Publication No. 1988-88846 discloses a method in which a photosensitive resin is coated on a metal substrate. It describes a method of coating, exposing and developing a fine pattern mask image, and etching it.
Japanese Patent Publication No. 55-90981 describes a method in which a regular interference pattern of a laser beam is printed onto a dry plate using a pleating process.

しかし、工〜チングの方法は、深さを均一に調整するこ
とがきわめて困難であシ、また、レーザーの方法は、設
備がきわめて大がかりとなる問題がある。
However, with the engraving method, it is extremely difficult to adjust the depth uniformly, and with the laser method, there is a problem in that the equipment is extremely large-scale.

さらに1規則的な微細構造の拡散レリーフを形成した焦
点板を製造するため、特開昭57−148728号公報
には、光の強度分布を表面の凹凸分布に変換する特性を
備えた感光材料に記録し、感光材料表面を微細凹凸構造
とし、この型を電鋳によって作成する方法が記載されて
いる。
Furthermore, in order to manufacture a reticle with a diffused relief with a regular fine structure, Japanese Patent Application Laid-Open No. 148728/1983 discloses that a photosensitive material with a property of converting the light intensity distribution into a surface unevenness distribution is used. A method is described in which the surface of the photosensitive material is recorded to have a finely uneven structure, and this mold is created by electroforming.

しかしながら、上記方法も焦点板全面に亘って均一な深
さの拡散レリーフを得ることは困難であシ、かつ型製造
が高価となる問題がある。
However, the above method also has the problem that it is difficult to obtain a diffusion relief with a uniform depth over the entire surface of the reticle, and mold manufacturing is expensive.

上述した如く焦点板面をレンズの集合体とすること自体
には、種々の利点がある。
As described above, there are various advantages in making the focusing plate surface an aggregate of lenses.

すなわち、各レンズ間の配列ピ1.チとレンズパワーを
制御することでボケ強度と明るさの制御が容易である。
That is, the array pi 1 between each lens. Bokeh intensity and brightness can be easily controlled by controlling the lens power.

また、拡散光のクランが出ないため黒い点状の粒状性も
なく、小口径レンズを用いた場合忙も暗くなることが少
ない。
Furthermore, since there is no scattering of diffused light, there is no black dot-like graininess, and when a small aperture lens is used, there is little chance of darkening.

反面、規則正しい配列による回折現象を生じ、干渉色が
現われる。また、ボケ僚が輪帯状の不自然な僧となシ、
砂摺りマットの焦点板にみられる自然なボケが出ない。
On the other hand, a diffraction phenomenon occurs due to the regular arrangement, and interference colors appear. Also, the blurred members are unnatural monks with a ring shape,
There is no natural bokeh that can be seen with a sand-printed matte focusing plate.

カメラの焦点板の拡散板に使用するレンズ集合体は、配
列ピ〜チが20μm程度で、ファインダー倍率4〜5倍
の場合に人の目の解像能の限界以下となる。レンズの底
面とのなす角度が10!s度で光の拡散に基づく光量の
減衰を少なくすることが可能である。しかし、微小レン
ズを均一な寸法で正確に配列した型を製造するのはきわ
めて困難であるとともに1高価となり、かつ近似的なレ
ンズとなるにすぎない。
The lens assembly used in the diffuser of the focusing plate of a camera has an array pitch of about 20 μm, which is below the resolution limit of the human eye when the finder magnification is 4 to 5 times. The angle made with the bottom of the lens is 10! It is possible to reduce the attenuation of the amount of light due to light diffusion at s degrees. However, it is extremely difficult and expensive to manufacture a mold in which microlenses are accurately arranged with uniform dimensions, and the result is only an approximate lens.

発明の目的 本発明は、上述した問題に鑑み、ピント合せが容易であ
るとともに、著しく簡単かつ安価に製造し得る焦点板と
その製造方法の提供を目的とする。
OBJECTS OF THE INVENTION In view of the above-mentioned problems, it is an object of the present invention to provide a focusing plate that allows easy focusing and can be manufactured extremely simply and inexpensively, and a method for manufacturing the same.

発明の概要 本発明は、上記目的を達成すべく、光学素材の表面に多
数のレンズ状凹凸部を規則的に配列して形成するととも
に、各レンズ状凹凸面にこれらよる。
SUMMARY OF THE INVENTION In order to achieve the above-mentioned object, the present invention forms a large number of lenticular irregularities in a regular arrangement on the surface of an optical material, and each lens-shaped irregular surface has these irregularities.

また、上記焦点板を得るため、機械加工による規則的な
凹凸レリーフ面に電気めっきを施して外周が6角形状を
したレンズ面からなシ、かつレンズ面に微小な凹凸を有
するハニカムパターンを形成し、このハニカムパターン
を光学素材に直接に転写しまたはハニカムパターンを電
鋳法により一旦金型に転写してから金型を用いて光学素
材に転写するものである。
In addition, in order to obtain the above focusing plate, electroplating is applied to the regularly uneven relief surface by mechanical processing to form a honeycomb pattern that is not a lens surface with a hexagonal outer periphery and has minute unevenness on the lens surface. Then, this honeycomb pattern is directly transferred to an optical material, or the honeycomb pattern is once transferred to a mold by electroforming, and then transferred to an optical material using a mold.

実施例 以下、図面を参照してこの発明の詳細な説明する。Example Hereinafter, the present invention will be described in detail with reference to the drawings.

第1図は、本発明に係る焦点板の一実施例を示す拡大断
面訝明図で、この実施例においては、アクリル板等の板
状の光学素材1の一方の表面(板面)K、多数のレンズ
状凹凸部2を規則的に配列して形成しである。そして、
各レンズ状凹凸面にけ、これらより著しく小さい凹部8
を形成しである。
FIG. 1 is an enlarged cross-sectional view showing an embodiment of the focusing plate according to the present invention. In this embodiment, one surface (plate surface) K of a plate-shaped optical material 1 such as an acrylic plate, It is formed by regularly arranging a large number of lens-shaped concavo-convex portions 2. and,
On each lenticular uneven surface, a concave portion 8 that is significantly smaller than these
It is formed.

しかして、砂mbによって得られた不規則な凹凸パター
ンの拡散レリーフ4を光学素材5の一方の面に有する従
来のいわゆる砂摺シ焦点板は、第2図に示すように、光
線6が大きな角度αで散乱される拡散光のパターン?を
示すのに対し、本実施例の焦点板は、第8図に示すよう
に1光学素材8の表面に微細な拡散パターン(図示せ−
ず)を表面に有するレンズ状凹凸向9を有するので、光
線6が比較的小さい角度βで散乱するパターン1゜を示
す。
As shown in FIG. The pattern of diffused light scattered at angle α? In contrast, the focusing plate of this embodiment has a fine diffusion pattern (not shown) on the surface of the optical material 8, as shown in FIG.
Since it has a lenticular asperity direction 9 having a lenticular irregularity 9 on its surface, it exhibits a pattern 1° in which the light rays 6 are scattered at a relatively small angle β.

したがって、上記実施例によれば、砂摺り焦点板によう
に粒状性を呈したり、ファインダーが悪くなることは々
く、また規則的配列のレンズ面を有する焦点板のように
色付きや輪帯ボケがなくなる。
Therefore, according to the above-mentioned embodiments, graininess and poor viewfinder quality are not likely to occur as in the case of a sand-print focusing plate, and coloring and annular blur as in the case of a focusing plate with regularly arranged lens surfaces. disappears.

次に、上記焦点板を製造するには、まず、第4図に示す
ように1金属からなる板材11の表面に1ダイヤモンド
砥石を用いる研削盤等による機械加工によりピ、・・チ
ェ5μm1底面とのなす角度を80”とする多数の6角
錐12と8角錐18とを規則的に組み合せた角錐レリー
フ14を形成する。
Next, in order to manufacture the above-mentioned focusing plate, first, as shown in FIG. A pyramidal relief 14 is formed by regularly combining a large number of hexagonal pyramids 12 and octagonal pyramids 18 whose angle is 80''.

ついで、角錐レリーフ14の表面にニッケル電気めっき
を施して、めっきによるスムージングパワーによって角
錐頂部および稜線を丸め、第5図に示すように、外周が
6角形状をしたレンズ面15からなるハニカムパターン
16を形成する。
Next, nickel electroplating is applied to the surface of the pyramidal relief 14, and the smoothing power of the plating is used to round off the pyramidal top and ridgeline, resulting in a honeycomb pattern 16 consisting of a lens surface 15 with a hexagonal outer periphery, as shown in FIG. form.

二9ケル電気めっきは、硫酸ニッケル、塩化ニッケルお
よび硼酸を基礎工9ケル浴とし、電解質…稙を4.4〜
4.6 K保ち、基礎光沢剤としてスルフォン酸未を用
い、かつエチレンオキサイド、プロピレンオキサイド、
プロピレンオキサイドもしくはエチレンオキサイド・プ
ロピレンオキサイド附加生成物のいずれかを微細分散状
エマルジョンとして加え、浴温度を48〜520Cとし
、液を攪拌せずにカッ−ドロ・Iキング法によシ行った
29 Kel electroplating uses nickel sulfate, nickel chloride, and boric acid as a basic 9 Kel bath, and the electrolyte...
4.6 K, no sulfonic acid was used as the basic brightener, and ethylene oxide, propylene oxide,
Either propylene oxide or an ethylene oxide/propylene oxide addition product was added as a finely dispersed emulsion, the bath temperature was set at 48 to 520 C, and the liquid was stirred without stirring according to the Cudlo-I King method.

この場合、6角錐12より高さの低い8角錐IBは、ス
ムージング効果によシ消滅し、6角錐によってハニカム
パターン16が形成されるものである。
In this case, the octagonal pyramid IB having a lower height than the hexagonal pyramid 12 disappears due to the smoothing effect, and the honeycomb pattern 16 is formed by the hexagonal pyramid.

また、微細分散状エマルジョンが電解過程で、角錐レリ
ーフ面14に付着し離脱することによりて、レンズ面1
5に多数の微小凹凸が形成される。
In addition, the finely dispersed emulsion adheres to and separates from the pyramidal relief surface 14 during the electrolytic process, so that the lens surface 1
5, a large number of minute irregularities are formed.

この微細分散状エマルジョンによるサテン効果は、一定
添加量以下では効果が少なく、一定電を超えれはめっき
の安定性を害するものであり、めっき時間を増してもサ
テン性は一定であった。またサテン効果はニッケルめっ
き浴中のニーケル濃度に支配された。
The satin effect caused by this finely dispersed emulsion is less effective when the amount added is less than a certain level, and when the amount exceeds a certain level, it impairs the stability of the plating, and even if the plating time is increased, the satin effect remains constant. The satin effect was also dominated by the nickel concentration in the nickel plating bath.

微細分散状エマルジョンの添加量は、シエーリング社(
西独)の商品名ベロア扁80を使用した場合に、めっき
液11当り2ml程度が適当である。
The amount of finely dispersed emulsion added was determined by the Schering company (
When using Velor Flat 80 (trade name, manufactured by West Germany), it is appropriate to use approximately 2 ml per 11 plating solutions.

サテン効果を大とするには、二・・ケル濃度は、硫酸ニ
ッケル(含む6)(、O)としてめっき液11当り、8
80〜460 Ffr1塩化二、・ケル(含む6)!、
O)で85〜55 F8度の高濃度とすることによって
良い効果が得られた。この際硼酸の含有量をめっき液I
IJ当り、55〜691rの高い値とし、つぶ状の二、
ケルの析出を防止できる。
In order to increase the satin effect, the concentration of nickel sulfate (including 6) (, O) should be 8 per 11 of the plating solution.
80-460 Ffr1 dichloride, Kel (including 6)! ,
A good effect was obtained by using a high concentration of 85 to 55 F (O). At this time, the content of boric acid in plating solution I
A high value of 55 to 691r per IJ,
Prevents precipitation of Kel.

二〜ケル瀞度の低いめっき浴でめっきする場合には、被
めっき物の形状、被めっき部位の電解電流分布の不均一
、めっき液の発熱による対流によってサテンのむらが生
じやすいが、濃度を上げることによってサテン効果の同
士と均一化が可能となる。
When plating in a plating bath with a low hardness of 2 to 10 degrees, satin unevenness tends to occur due to the shape of the object to be plated, uneven electrolytic current distribution in the area to be plated, and convection due to heat generation of the plating solution, but increase the concentration. This makes it possible to make the satin effect uniform.

最後に、上述したハニカムパターン16を有fる型を使
用して透明な光学プラスチ・、クス(光学素材)の板に
転写すると所望の焦点板が完成する。
Finally, the above-described honeycomb pattern 16 is transferred onto a transparent optical plastic (optical material) plate using a mold to complete the desired reticle.

なお、規則的な凹凸レリーフを形成するKは、6角錐1
2と8角#18とからなる規則的に配列した角錐レリー
フによる場合に限らず、たとえば第6図に示すように、
金属からなる板材170表面に機械加工によって形成し
たピッチ15μm1高さ6μm1−辺の長さ8μmとす
る多数の6角柱18を規則的に配列した角柱レリーフ1
9によってもよいものであるとともに、第7図に示すよ
うに、金属からなる板材zOの表面忙機械加工によって
形成したピッチ15μm1高さ4μm1−辺の長さ6μ
mとする多数の菱形柱21を規則的に配列した角柱レリ
ーフ22によってもよいものであシ、これらの角柱レリ
ーフ19.22は、前述した二、、ケル電気めっきを施
すことにより、第8図、第9図に示すように1いずれも
外周が6角形状をしたレンズ面15からなり、かつレン
ズ面15に多数の微小凹凸(図示せず)を有するハニカ
ムパターン16が形成されるものである。
Note that K, which forms a regular uneven relief, is a hexagonal pyramid 1
This is not limited to the case of regularly arranged pyramidal reliefs consisting of #2 and #18 octagons, for example, as shown in Fig. 6,
A prismatic relief 1 in which a large number of hexagonal columns 18 are regularly arranged with a pitch of 15 μm, a height of 6 μm, and a side length of 8 μm, formed by machining on the surface of a plate material 170 made of metal.
As shown in FIG.
The prismatic reliefs 22 may be formed by regularly arranging a large number of rhombic columns 21, 21 and 22. As shown in FIG. 9, each lens surface 15 is composed of a lens surface 15 having a hexagonal outer periphery, and a honeycomb pattern 16 having a large number of minute irregularities (not shown) is formed on the lens surface 15. .

しかして、レンズ面15のなす半球の形状は、角錐の場
合は、底面とのなす角度によって、角柱の場合は、底面
からの高さによって容易に変えることができる。
Therefore, the shape of the hemisphere formed by the lens surface 15 can be easily changed in the case of a pyramid by changing the angle made with the bottom surface, and in the case of a prism by changing the height from the bottom surface in the case of a prism.

ここで、微小レンズ0パ9−は、焦点板として使用する
とき虻、焦点板の明るさに関係するとともに合焦性も支
配すること、ならびに配列ピ・・チは、カメラのファイ
ンダー倍率4〜5倍の下では、目の解像能より小さくす
ることが要求される。この条件を満足させるために、配
列ピリチおよび角錐の場合では底面とのなす角度を角柱
の場合祉底面からの高さと角柱の太さを種々の値として
機械加工し、また、二噌ケルめっきの膜厚、電解条件お
よび浴の組成を変えて実験した結果、レリーフの配列ピ
噌チは20μm以下とし、微小レンズ状となった時の底
面とのなす角度を15°以下とすれば、所望の明るさと
合焦性を得ることができた。
Here, when using the microlens as a focus plate, it is important to note that it is related to the brightness of the focus plate and also controls the focusing performance, and the array pitch is the same as the camera's viewfinder magnification of 4 to 4. Below 5x, it is required to be smaller than the resolution of the eye. In order to satisfy this condition, we machined the angles with the bottom surface of arrayed piritchi and pyramids to various values for the height from the bottom surface and the thickness of the prisms in the case of prismatic pillars. As a result of experiments by changing the film thickness, electrolytic conditions, and bath composition, we found that if the array pitch of the relief is 20 μm or less and the angle with the bottom surface when it becomes microlens-like is 15° or less, the desired result can be obtained. I was able to obtain brightness and focus.

また、光学プラスチ9クスの板に対する転写は、ハニカ
ムパターン16を直接に転写する場合に限られず、たと
えば電鋳法によりハニカムパターン16を反転した金型
を形成し、しかる後に金型表面を光学プラスチ〜クスに
転写してもよいものであシ、この場合の性能は同じでち
る。
Furthermore, the transfer of optical plastic onto a plate is not limited to the case where the honeycomb pattern 16 is directly transferred. For example, a mold in which the honeycomb pattern 16 is reversed is formed by electroforming, and then the surface of the mold is coated with optical plastic. ~It may be transferred to a plastic, and the performance in this case is the same.

発明の効果 以上の如く本発明によれば、従来技術に比し、明るさと
ボケ味を一層向上することができるとともに、干渉色や
輪帯ボケがなくすことができる。
Effects of the Invention As described above, according to the present invention, brightness and blur can be further improved as compared to the prior art, and interference colors and annular blur can be eliminated.

また、単純な線引き加工とニーケル電気めっきのみによ
るものであるから、簡単にして安価に製造できるととも
に、再現性が高くかつ性能が良いなどの効果を奏する。
In addition, since it is based on only a simple wire drawing process and kneel electroplating, it can be manufactured easily and at low cost, and has effects such as high reproducibility and good performance.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る焦点板の一実施例を示す要部拡大
断面図、第2図は従来の砂摺り焦点板と光線の散乱パタ
ーンを示す説明図、第8図は本発明に係る焦点板と光線
の散乱パターンを示す説明図、第4図は本発明に係る焦
点板を製造する機械加工工程における角錐レリーフの斜
視図、第5図ハ角錐レリーフをハニカムパターンにめっ
きする過程の説明図、第6図および第7図はそれぞれ焦
点板を製造する他の実施例による機械加工工程における
角柱レリーフの斜視図、第8図および第9図社それぞれ
角柱レリーフをハニカムパターンにめりきする過程の観
、明図である。 1・・・・・・・光学素材 2−・・・・・・レンズ状凹凸部 8・・・・・・・凹部 11ψ・・・・・・板材 12・・・・・・・6角錐 18・・・・・・・8角錐 14、・・・―奉・角錐レリーフ 15 、、、、、・・レンズ面 16・・・Φ・・・ハニカムパターン 17・・・・・・・板材 18・・・・・・・6角柱 19 mmmamen角柱レリーフ 20・・・・・・・板材 21・・・・・・・菱形柱 22−・・e・・・角柱レリーフ 特許出願人 オリンパス光学工業株式会社代理人 弁理
士奈良 武 同 弁理士 荒 木 昭 仕 第8図 第9図 手続補正書(自発) 昭和60年5月31日 特許庁長官 志 賀 字 殿 昭和59年特許頓第107987号 2、発明の名称 焦点板とその製造方法 3、補正をする者 事件との関係 特許出願人 住 所 東京都渋谷区幡ケ谷2丁目43番2弓4、代理
人 6、補正の対象 願書 7、補正の内容
FIG. 1 is an enlarged cross-sectional view of essential parts showing an embodiment of the focusing plate according to the present invention, FIG. 2 is an explanatory diagram showing a conventional sand-sealed focusing plate and a scattering pattern of light rays, and FIG. An explanatory diagram showing a focusing plate and a scattering pattern of light rays, FIG. 4 is a perspective view of a pyramidal relief in the machining process for manufacturing the focusing plate according to the present invention, and FIG. 5 is an explanation of the process of plating the pyramidal relief into a honeycomb pattern. 6 and 7 are perspective views of a prismatic relief in a machining process according to another embodiment of manufacturing a focus plate, and FIGS. 8 and 9 are a process of cutting a prismatic relief into a honeycomb pattern, respectively. This is a clear picture of the view. 1... Optical material 2 - Lens-shaped uneven portion 8... Concave portion 11ψ... Plate material 12... Hexagonal pyramid 18 ...... 8-sided pyramid 14, ... - pyramidal relief 15,... lens surface 16... Φ... honeycomb pattern 17... plate material 18.・・・・・・Hexagonal column 19 mmmamen prismatic relief 20・・・Plate material 21・・・・・・Rhombic column 22-・e・・・Prismatic relief patent applicant Olympus Optical Industry Co., Ltd. agent Person Patent Attorney Nara Takedo Patent Attorney Akira Araki Figure 8 Figure 9 Procedural Amendment (Voluntary) May 31, 1985 Commissioner of the Japan Patent Office Toshika Shiga Patent Office Patent No. 107987 No. 107987 2 of 1980 Name focus plate and its manufacturing method 3, relationship with the case of the person making the amendment Patent applicant address: 4, 2-43-2, Hatagaya, Shibuya-ku, Tokyo, Agent 6, Application to be amended 7, Contents of the amendment

Claims (8)

【特許請求の範囲】[Claims] (1)光学素材の表面に多数のレンズ状凹凸部を規則的
に配列17て形成するとともに、更に、該レンズ状凹凸
面に、これらより著しく小さい凹凸部を形成して構成し
たことを特徴とする焦点板。
(1) A large number of lens-shaped uneven portions are formed on the surface of the optical material in a regular arrangement 17, and further, uneven portions that are significantly smaller than these are formed on the lens-shaped uneven surface. focus plate.
(2)多数のレンズ状凹凸は、6角錐と3角錐とから成
ることを特徴とする特徴請求の範囲第1項記載の焦点板
(2) The focusing plate according to claim 1, characterized in that the large number of lens-shaped irregularities are composed of hexagonal pyramids and triangular pyramids.
(3)多数のレンズ状凹凸は、6角柱から成ることを特
徴とする特許請求の範囲第1項記載の焦点板。
(3) The focusing plate according to claim 1, wherein the large number of lens-shaped unevennesses are made of hexagonal prisms.
(4)多数のレンズ状凹凸は、菱形角柱から成ることを
特徴とする特許請求の範囲第1項記載の焦点板。
(4) The focusing plate according to claim 1, wherein the large number of lens-like irregularities are composed of rhombic prisms.
(5)板材の表面に規則的な凹凸レリーフを加工し、前
記凹凸レリーフ面に電気めっきを施して外周がb角形状
をしたレンズ面から成るハニカムパターンを形成し、前
記ハニカムパターンを光学素材に転写することを特徴と
する無点板の製造方法。
(5) Machining regular uneven relief on the surface of the plate material, electroplating the uneven relief surface to form a honeycomb pattern consisting of a lens surface with a b-shaped outer periphery, and converting the honeycomb pattern into an optical material. A method for producing a pointless board characterized by transfer.
(6)前記ハニカムパターンの形成は、微細分散状エマ
ルジョンを含有する二、リケル電気めっき酸性浴によっ
て行うことを特徴とする特許請求の範囲鯖5項記載の焦
点板の製造方法。
(6) The method for manufacturing a focusing plate according to claim 5, wherein the formation of the honeycomb pattern is carried out using a Rikel electroplating acid bath containing a finely dispersed emulsion.
(7)板状の表面に規則的な凹凸レリーフを加工し、前
記凹凸レリーフ面忙電気めっきを施して外周が6角形状
をしたレンズ面からなるハニカムパターンを形成し、前
記ハニカムパターンを電鋳法により金型に転写し、前記
金型表面を光学素材に転写することを特徴とする焦点板
の製造方法。
(7) Machining regular uneven relief on the plate-shaped surface, electroplating the uneven relief surface to form a honeycomb pattern consisting of a lens surface with a hexagonal outer periphery, and electroforming the honeycomb pattern. 1. A method for producing a focusing plate, comprising transferring the surface of the mold onto an optical material by a method.
(8)前記ハニカムパターンの形成は、微細分散状エマ
ルジョンを含有する二・lケル電気めっき酸性浴によっ
て行うことを特徴とする特許請求の範囲第7項記載の焦
点板の製造方法、。
(8) The method for manufacturing a reticle as set forth in claim 7, wherein the formation of the honeycomb pattern is performed using a 2.1 Kel electroplating acidic bath containing a finely dispersed emulsion.
JP10798784A 1983-11-26 1984-05-28 Reticle and its manufacture Granted JPS60250338A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP10798784A JPS60250338A (en) 1984-05-28 1984-05-28 Reticle and its manufacture
DE19843442781 DE3442781A1 (en) 1983-11-26 1984-11-23 DISPLAY PLATE AND METHOD FOR THEIR PRODUCTION
US06/943,833 US4851164A (en) 1983-11-26 1986-12-17 Method of manufacturing focal plates
US07/758,346 US5696630A (en) 1983-11-26 1991-09-09 Focal plates and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10798784A JPS60250338A (en) 1984-05-28 1984-05-28 Reticle and its manufacture

Publications (2)

Publication Number Publication Date
JPS60250338A true JPS60250338A (en) 1985-12-11
JPH037925B2 JPH037925B2 (en) 1991-02-04

Family

ID=14473107

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10798784A Granted JPS60250338A (en) 1983-11-26 1984-05-28 Reticle and its manufacture

Country Status (1)

Country Link
JP (1) JPS60250338A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6438739A (en) * 1987-08-05 1989-02-09 Asahi Optical Co Ltd Focusing plate
TWI426302B (en) * 2010-02-12 2014-02-11 Au Optronics Corp Display device and light enhancement film of the display device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5227634A (en) * 1975-08-27 1977-03-02 Minolta Camera Co Ltd Focus plate
JPS5860642A (en) * 1981-10-01 1983-04-11 Nippon Kogaku Kk <Nikon> Preparation of focusing glass

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5227634A (en) * 1975-08-27 1977-03-02 Minolta Camera Co Ltd Focus plate
JPS5860642A (en) * 1981-10-01 1983-04-11 Nippon Kogaku Kk <Nikon> Preparation of focusing glass

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6438739A (en) * 1987-08-05 1989-02-09 Asahi Optical Co Ltd Focusing plate
TWI426302B (en) * 2010-02-12 2014-02-11 Au Optronics Corp Display device and light enhancement film of the display device

Also Published As

Publication number Publication date
JPH037925B2 (en) 1991-02-04

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