JPS60113868U - 吸着チヤツク装置 - Google Patents

吸着チヤツク装置

Info

Publication number
JPS60113868U
JPS60113868U JP1984001548U JP154884U JPS60113868U JP S60113868 U JPS60113868 U JP S60113868U JP 1984001548 U JP1984001548 U JP 1984001548U JP 154884 U JP154884 U JP 154884U JP S60113868 U JPS60113868 U JP S60113868U
Authority
JP
Japan
Prior art keywords
suction
chuck device
suction chuck
item
exhaust passage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1984001548U
Other languages
English (en)
Inventor
板本　繁
喜義 鈴木
賢司 安田
Original Assignee
富士写真光機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士写真光機株式会社 filed Critical 富士写真光機株式会社
Priority to JP1984001548U priority Critical patent/JPS60113868U/ja
Priority to US06/688,011 priority patent/US4597569A/en
Publication of JPS60113868U publication Critical patent/JPS60113868U/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005—Vacuum work holders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Jigs For Machine Tools (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【図面の簡単な説明】
第１−は本考案装置の一実施例を示す外観斜視図である
。第２図は第１図に示した装置の縦断面図である。第３
図は本考案の他の実施例の縦断面図である。 １・・・台座本体１．２・・・上面、４・・・吸引孔、
９・・・排気路、１０・・・吸引室、１１・・・吸引路
、１５，１５′・・・可撓板。

Claims (1)

  1. 【実用新案登録請求の範囲】 （１）台座本体の上面が複数の吸引孔が加酸された試料
    吸着支持面と、前記台座本体の底面に穿設された前記複
    数の吸引孔と吸引路を介して連通されると共に排気路を
    介してその室内が負圧とされる吸引室とを備え、前記吸
    引室の前記吸引′　５　、路および排気路を除く外部開
    放部を可撓部材により気密に閉塞したことを特等とする
    吸着チャック装置。　　　　　　　　　　　　　　　　
    −（２）試料が接する試料吸着支持面に、凹部もしく−
    は溝を設けたことを特徴とする実用新案登録請求の範囲
    第（１）項に記載の吸着チャック装置。 （３）　　台座本体の底面側部に台座本体固定用突出片
    を設けたことを特徴とする実用新案登録請求の範囲第（
    １）項もしくは第（２）項に記載の吸着チャック装置。
JP1984001548U 1984-01-10 1984-01-10 吸着チヤツク装置 Pending JPS60113868U (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1984001548U JPS60113868U (ja) 1984-01-10 1984-01-10 吸着チヤツク装置
US06/688,011 US4597569A (en) 1984-01-10 1984-12-31 Attraction holding device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1984001548U JPS60113868U (ja) 1984-01-10 1984-01-10 吸着チヤツク装置

Publications (1)

Publication Number Publication Date
JPS60113868U true JPS60113868U (ja) 1985-08-01

Family

ID=11504572

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1984001548U Pending JPS60113868U (ja) 1984-01-10 1984-01-10 吸着チヤツク装置

Country Status (2)

Country Link
US (1) US4597569A (ja)
JP (1) JPS60113868U (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000126959A (ja) * 1998-10-27 2000-05-09 Tokyo Seimitsu Co Ltd 被加工材のチャックテーブル

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4711610A (en) * 1986-04-04 1987-12-08 Machine Technology, Inc. Balancing chuck
US5660380A (en) * 1995-08-15 1997-08-26 W. L. Gore & Associates, Inc. Vacuum fixture and method for dimensioning and manipulating materials
US5885353A (en) * 1996-06-21 1999-03-23 Micron Technology, Inc. Thermal conditioning apparatus
US20030062734A1 (en) * 2001-10-02 2003-04-03 Faris Sadeg M. Device and method for handling fragile objects, and manufacturing method thereof
DE102009044305A1 (de) * 2009-10-21 2011-05-05 Fooke Gmbh Verfahren zum Halten und Bearbeiten eines Werkstückes mit Spannplatte, sowie Vorrichtung zum Aussteifen eines Werkstückes mit Spannplatte
CN107649914B (zh) * 2017-10-11 2019-12-24 曹蔚萌 一种真空吸盘组件

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5914437A (ja) * 1982-07-09 1984-01-25 Hitachi Ltd 真空チヤツク

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US477304A (en) * 1892-06-21 Apparatus for placing plate-glass on grinding and polishing tables
US1823537A (en) * 1930-06-21 1931-09-15 Bay State Tool & Machine Co Vise
US3851758A (en) * 1972-04-26 1974-12-03 Ibm Semiconductor chip fixture
US3971552A (en) * 1975-11-12 1976-07-27 Mayfield Johnny W Quick release pipe vise
JPS5985987A (ja) * 1982-11-08 1984-05-18 Seiko Epson Corp スケジユ−ルアラ−ム付電子腕時計
US4428815A (en) * 1983-04-28 1984-01-31 Western Electric Co., Inc. Vacuum-type article holder and methods of supportively retaining articles
US4541717A (en) * 1983-12-08 1985-09-17 Fuji Photo Optical Co., Ltd. Attraction holding device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5914437A (ja) * 1982-07-09 1984-01-25 Hitachi Ltd 真空チヤツク

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000126959A (ja) * 1998-10-27 2000-05-09 Tokyo Seimitsu Co Ltd 被加工材のチャックテーブル

Also Published As

Publication number Publication date
US4597569A (en) 1986-07-01

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