JPS60113506U - position measuring device - Google Patents

position measuring device

Info

Publication number
JPS60113506U
JPS60113506U JP32284U JP32284U JPS60113506U JP S60113506 U JPS60113506 U JP S60113506U JP 32284 U JP32284 U JP 32284U JP 32284 U JP32284 U JP 32284U JP S60113506 U JPS60113506 U JP S60113506U
Authority
JP
Japan
Prior art keywords
tool
stage
measuring device
position measuring
interferometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32284U
Other languages
Japanese (ja)
Inventor
章 鈴木
Original Assignee
東芝機械株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東芝機械株式会社 filed Critical 東芝機械株式会社
Priority to JP32284U priority Critical patent/JPS60113506U/en
Publication of JPS60113506U publication Critical patent/JPS60113506U/en
Pending legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図(1従来のレーザ干渉計を用いた電子ビーム描画
装置のステージ位置測長システムを示す   。 図、第2図はその要部を示す説明図、第3図は本考案の
一実施例を示す眸第−4図はミラーを示す  ]平面図
、第5図は干渉計の内部構造を示す図、第6図は本考案
の他の実施例を示す図である。
Figure 1 (1) shows a stage position and length measurement system for an electron beam lithography apparatus using a conventional laser interferometer. Figure 4 is a plan view showing the mirror, Figure 5 is a diagram showing the internal structure of the interferometer, and Figure 6 is a diagram showing another embodiment of the present invention.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 被加工物を載置したステージと工具との相対位置を測定
する装置であって、前記ステージに設けられたミラーと
、前記工具に近接して設けられたミラーと、この両ミラ
ーに周波数の異なる光を照射し、その両ミラーからの反
射光を互いに干渉状態として出力する干渉計とを備え、
この干渉計から出力される両反射光の干渉状態の移相に
よってステージと工具との相対位置を測定することを特
徴とする位置測定装置。
A device for measuring the relative position of a stage on which a workpiece is placed and a tool, the device including a mirror provided on the stage, a mirror provided close to the tool, and a mirror that has different frequencies. Equipped with an interferometer that emits light and outputs the reflected light from both mirrors as mutual interference,
A position measuring device that measures the relative position of a stage and a tool by phase shifting the interference state of both reflected lights output from the interferometer.
JP32284U 1984-01-05 1984-01-05 position measuring device Pending JPS60113506U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32284U JPS60113506U (en) 1984-01-05 1984-01-05 position measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32284U JPS60113506U (en) 1984-01-05 1984-01-05 position measuring device

Publications (1)

Publication Number Publication Date
JPS60113506U true JPS60113506U (en) 1985-08-01

Family

ID=30472057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32284U Pending JPS60113506U (en) 1984-01-05 1984-01-05 position measuring device

Country Status (1)

Country Link
JP (1) JPS60113506U (en)

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