JPS60109292A - Method of producing nonoxide ceramic circuit board - Google Patents

Method of producing nonoxide ceramic circuit board

Info

Publication number
JPS60109292A
JPS60109292A JP21688783A JP21688783A JPS60109292A JP S60109292 A JPS60109292 A JP S60109292A JP 21688783 A JP21688783 A JP 21688783A JP 21688783 A JP21688783 A JP 21688783A JP S60109292 A JPS60109292 A JP S60109292A
Authority
JP
Japan
Prior art keywords
parts
weight
powder
producing
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21688783A
Other languages
Japanese (ja)
Inventor
堀部 芳伸
宮 好宏
上山 守
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP21688783A priority Critical patent/JPS60109292A/en
Publication of JPS60109292A publication Critical patent/JPS60109292A/en
Pending legal-status Critical Current

Links

Landscapes

  • Structure Of Printed Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は非酸化物系セラミック配線板(以下配線板とい
う)の製造法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a non-oxide ceramic wiring board (hereinafter referred to as wiring board).

セラミックスのメタライズ法には厚膜法、薄膜法、メッ
キ法、高融点金属焼付法等がある。酸化物系セラミック
スのメタライズ法としては9例えば金、金−白金、銀、
銀−白金、銀−パラジウム等の貴金属粉にガラス及び結
合剤、溶剤を添加してペースト化したメタライズペース
トをセラミックス上に塗布し、空気中で焼付けするのが
一般的であった。しかし物理的、化学的に安定な非酸化
物系セラミックスに、上記のようなペーストを用いて上
記に示すような方法でメタライズを行なうと、導体部に
泡等が発生し、導体部と基板との満足な接着強度や気密
性が得られない。まだ面j半田性やボンディング性の面
でも満足すべきものではなかった。
Ceramic metallization methods include a thick film method, a thin film method, a plating method, and a high melting point metal baking method. Examples of metallization methods for oxide ceramics include gold, gold-platinum, silver,
It has been common practice to apply metallization paste, which is made by adding glass, a binder, and a solvent to precious metal powder such as silver-platinum or silver-palladium powder, onto ceramics and then bake it in air. However, when metallizing physically and chemically stable non-oxide ceramics using the above paste and the method shown above, bubbles etc. will occur in the conductor part and the conductor part and the substrate will become disconnected. Satisfactory adhesive strength and airtightness cannot be obtained. The surface solderability and bonding properties were still unsatisfactory.

本発明は上記の点に鑑みてなされたものであり。The present invention has been made in view of the above points.

導体部に泡等が発生せず、良好な接着強度及び気密性を
有し、耐半田性やボンディング性の面で満足できうる配
線板を提供することを目的とするものである。
The object of the present invention is to provide a wiring board that does not generate bubbles or the like in conductor parts, has good adhesive strength and airtightness, and is satisfactory in terms of solder resistance and bonding properties.

本発明は非酸化物系セラミック焼結体(以下焼結体とい
う)K粒径が0.2〜8μmの貴金属粉100重量部に
軟化点が400〜900℃のガラス粉末を0.2〜5重
量部、結合剤及び溶剤を添加してなる非酸化物系セラミ
ックス用メタライズペーストを塗布し、ついで焼成する
配線板の製造法に関する。
The present invention is a non-oxide ceramic sintered body (hereinafter referred to as a sintered body) in which 100 parts by weight of noble metal powder with a particle size of 0.2 to 8 μm is mixed with 0.2 to 5 parts of glass powder with a softening point of 400 to 900°C. The present invention relates to a method for producing a wiring board, in which a metallizing paste for non-oxide ceramics, which is made by adding parts by weight, a binder and a solvent, is applied and then fired.

なお9本発明において非酸化物系セラミック焼結体は炭
化珪素焼結体、窒化珪素焼結体等が用いられ、また貴金
属粉としては、金粉、金−白金粉。
In the present invention, silicon carbide sintered bodies, silicon nitride sintered bodies, etc. are used as the non-oxide ceramic sintered bodies, and examples of the noble metal powders include gold powders and gold-platinum powders.

銀粉、銀−白金粉、銀−パラジウム粉等が使用され特に
制限はないが9粒径は0.2〜8μmの範囲であること
が必要であり、好ましくは0.5〜5μmである。貴金
属粉の粒径が0.2μm未満では焼成中に泡等が発生し
、接着強度が弱く、8μmを越えると焼結があまり進ま
ずやはり接着強度が弱い。
Silver powder, silver-platinum powder, silver-palladium powder, etc. are used, and although there are no particular restrictions, the particle size must be in the range of 0.2 to 8 μm, preferably 0.5 to 5 μm. If the particle size of the noble metal powder is less than 0.2 μm, bubbles etc. will be generated during firing and the adhesive strength will be weak, and if it exceeds 8 μm, sintering will not proceed much and the adhesive strength will also be weak.

ガラス粉末の組成は特に制限はないが、?なう珪酸系、
亜鉛−鉛系のガラス又はジルコニア、アルミナ、シリカ
等の酸化物を含むガラスを用いることが好ましい。しか
しその軟化点は400〜900℃の範囲である必要があ
り、好ましくは500〜800℃である。軟化点が40
0℃未満では、ふくれ等が発生し、900℃を越えると
接着強度が弱くなる。更に熱膨張係数が2〜6 X 1
0−6/ 6cのガラス粉末を使用すれば安定した接着
強度が得られるので好ましい。
There are no particular restrictions on the composition of glass powder, but? Now silicic acid system,
It is preferable to use zinc-lead glass or glass containing an oxide such as zirconia, alumina, or silica. However, its softening point must be in the range of 400-900°C, preferably 500-800°C. Softening point is 40
If the temperature is less than 0°C, blistering etc. will occur, and if it exceeds 900°C, the adhesive strength will become weak. Furthermore, the coefficient of thermal expansion is 2 to 6 x 1
It is preferable to use a glass powder of 0-6/6c because stable adhesive strength can be obtained.

またガラス粉末の添加量は、0.2〜5重量部であるこ
とが必要であり、0.2重量部未満では接着強度が非常
に弱く、5重量部を越えると泡、ふくれ等が発生し、接
着強度が弱い。
The amount of glass powder added must be 0.2 to 5 parts by weight; if it is less than 0.2 parts by weight, the adhesive strength will be very weak, and if it exceeds 5 parts by weight, bubbles and blisters will occur. , the adhesive strength is weak.

なお9本発明において結合剤としては、エチルセルロー
ス、ニトロセルロース、アクリルfljBW。
9 In the present invention, examples of the binder include ethyl cellulose, nitrocellulose, and acrylic fljBW.

エポキシ樹脂等が、溶剤としては、テルピネオール、カ
ルピトールアセテート等が使用されるが。
Epoxy resins and the like are used as solvents such as terpineol and carpitol acetate.

これらの組成、配合量等については特に制限はない。There are no particular restrictions on the composition, amount, etc. of these.

ペーストの塗布方法はスクリーン印刷法、珀塗り法等の
方法で行なわれ、また焼成条件については特に制限はな
いが、温度750〜1050℃でN9雰囲気中、大気中
の芥囲気中で焼成することが好ましい。
The paste is applied by a screen printing method, a square coating method, etc., and there are no particular restrictions on the firing conditions, but the paste must be fired at a temperature of 750 to 1050°C in an N9 atmosphere or in an air atmosphere. is preferred.

以下実施例により本発明を説明する。The present invention will be explained below with reference to Examples.

実施例1 第1表に示す粒径の異なる銀粉80重量部と粒径の異な
るパラジウム粉20重量部との混合粉に第1表に示す各
種のガラス粉末を0〜10重量部。
Example 1 0 to 10 parts by weight of various glass powders shown in Table 1 were added to a mixed powder of 80 parts by weight of silver powder having different particle sizes shown in Table 1 and 20 parts by weight of palladium powder having different particle sizes.

更に結合剤としてエチルセルロース6M景部、テルピネ
オール40重量部添加して、らいかい機にて均一に混合
してメタライズペーストを得た。
Furthermore, 6M ethyl cellulose and 40 parts by weight of terpineol were added as binders, and the mixture was uniformly mixed in a sieve machine to obtain a metallized paste.

次に炭化珪素焼結体(相対密度90%以上)及び窒化珪
素焼結体(相対密度90チ以上)に前記で得たメタライ
ズペーストをスクリーン印刷し。
Next, the metallization paste obtained above was screen printed on a silicon carbide sintered body (relative density of 90% or more) and a silicon nitride sintered body (relative density of 90% or more).

ついで750〜1100℃の範囲の温度で焼成して本発
明になる配線板を得た。その後、直径0.8mmの銅線
に錫メッキを施したリード線をはんだ付けし、それを引
剥して接着強度試験を行なった。
Then, the wiring board of the present invention was obtained by firing at a temperature in the range of 750 to 1100°C. Thereafter, a tin-plated lead wire was soldered to a copper wire having a diameter of 0.8 mm, and the lead wire was peeled off to conduct an adhesive strength test.

また外観の観察も行なった。その試験結果も合わせて第
1表に示す。第1表において外観とは、焼成後のメタラ
イズ部分を顕微鏡観察したものである。
The external appearance was also observed. The test results are also shown in Table 1. In Table 1, the appearance refers to the microscopic observation of the metallized portion after firing.

υ、下余白 実施例2 第2表に示す粒径の異なる金粉100重量部に第2表に
示す各種のガラスを1.0〜7.0重量部添加し、以下
実施例1と同様の配合組成及び同様の方法でメタライズ
ペーストを得た。
υ, lower margin Example 2 1.0 to 7.0 parts by weight of the various glasses shown in Table 2 were added to 100 parts by weight of gold powder with different particle sizes shown in Table 2, and the same composition as in Example 1 was prepared. A metallized paste was obtained with the same composition and method.

次に炭化珪素焼結体(相対密度90チ以上)及び窒化珪
素焼結体(相対密度90%以上)に前記で得たメタライ
ズペーストをスクリーン印刷し。
Next, the metallization paste obtained above was screen printed on a silicon carbide sintered body (relative density of 90% or more) and a silicon nitride sintered body (relative density of 90% or more).

ついで750〜1100℃の範囲の温度で焼成して本発
明になる配線板を得た。その後実施例1と同様の方法で
接着強度試験及び外観1の観察を行なった。その試験結
果及び外観の観察の結果も合わせて第2表に示す。
Then, the wiring board of the present invention was obtained by firing at a temperature in the range of 750 to 1100°C. Thereafter, an adhesive strength test and appearance 1 were observed in the same manner as in Example 1. The test results and the results of appearance observation are also shown in Table 2.

第1表及び第2表かられかるように1本発明の実施例に
なる配線板は接着強度及び外観が良好であることがわか
る。
As can be seen from Tables 1 and 2, it can be seen that the wiring board of Example 1 of the present invention has good adhesive strength and appearance.

本発明の配線板は、焼結体に粒径が0.2〜8μmの貴
金属粉100重量部、軟化点が400〜900℃のガラ
ス粉末0.2〜5重量部、結合剤及び溶剤を混合してな
る非酸化物系セラミックス用メタライズペーストを塗布
し、ついで焼成するので導体部に泡等が発生せず、良好
な接着強度及び気密性を有し、it半田性やボンディン
グ性においても満足すべきものとなる。
The wiring board of the present invention includes a sintered body mixed with 100 parts by weight of noble metal powder with a particle size of 0.2 to 8 μm, 0.2 to 5 parts by weight of glass powder with a softening point of 400 to 900°C, a binder, and a solvent. Since the metallizing paste for non-oxide ceramics is applied and then fired, no bubbles are generated in the conductor part, and it has good adhesive strength and airtightness, and also satisfies IT solderability and bonding properties. Become a kimono.

Claims (1)

【特許請求の範囲】[Claims] 1、非酸化物系セラミック焼結体に粒径が0.2〜8μ
mの貴金属粉100重量部、軟化点が400〜900℃
のガラス粉末0.2〜5重量部、結合剤及び溶剤を添加
混合してなる非酸化物系セラミック用メタライズペース
トを塗布し、ついで焼成することを特徴とする非酸化物
系セラミック配線板の製造法。
1. Particle size of non-oxide ceramic sintered body is 0.2~8μ
100 parts by weight of noble metal powder with a softening point of 400 to 900°C
1. Production of a non-oxide ceramic wiring board characterized by applying a non-oxide ceramic metallizing paste made by adding and mixing 0.2 to 5 parts by weight of glass powder, a binder and a solvent, and then firing it. Law.
JP21688783A 1983-11-17 1983-11-17 Method of producing nonoxide ceramic circuit board Pending JPS60109292A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21688783A JPS60109292A (en) 1983-11-17 1983-11-17 Method of producing nonoxide ceramic circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21688783A JPS60109292A (en) 1983-11-17 1983-11-17 Method of producing nonoxide ceramic circuit board

Publications (1)

Publication Number Publication Date
JPS60109292A true JPS60109292A (en) 1985-06-14

Family

ID=16695463

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21688783A Pending JPS60109292A (en) 1983-11-17 1983-11-17 Method of producing nonoxide ceramic circuit board

Country Status (1)

Country Link
JP (1) JPS60109292A (en)

Similar Documents

Publication Publication Date Title
EP0453858B1 (en) Process for brazing metallized components to ceramic substrates
US5165986A (en) Copper conductive composition for use on aluminum nitride substrate
JPH05235497A (en) Copper conductive paste
JPH0574166B2 (en)
US5138426A (en) Ceramic joined body
US4963187A (en) Metallizing paste for circuit board having low thermal expansion coefficient
JPH0492497A (en) Silver series wiring ceramic board
KR100585909B1 (en) Thick Film Conductor Compositions for Use on Aluminum Nitride Substrates
JPS60264383A (en) Manufacture of non-oxide ceramic distributing board
JPS60109292A (en) Method of producing nonoxide ceramic circuit board
JPS59164686A (en) Metallizing paste composition for non-oxide ceramics
JPH05156303A (en) Metallizing metal powder composition and production of metallized substrate using the composition
JPH05144316A (en) Conductive paste composition
JP3053454B2 (en) Gold conductor composition
JP2559238B2 (en) Electric circuit board
JP2652014B2 (en) Composite ceramic substrate
JP2892163B2 (en) Low temperature firing glass ceramic body
JPH06342965A (en) Ceramic circuit board and manufacture thereof
JP2836847B2 (en) Metallized paste
JPS60109293A (en) Method of producing nonoxide ceramic circuit board
JPH0723273B2 (en) Method for metallizing aluminum nitride substrate
JP2632325B2 (en) Electric circuit board
JPH07101565B2 (en) Copper paste composition for inner layer
JPS63115393A (en) High heat-conductivity circuit board
JPH0368485B2 (en)