JPS5990289A - Magnetic bubble memory element - Google Patents

Magnetic bubble memory element

Info

Publication number
JPS5990289A
JPS5990289A JP57199019A JP19901982A JPS5990289A JP S5990289 A JPS5990289 A JP S5990289A JP 57199019 A JP57199019 A JP 57199019A JP 19901982 A JP19901982 A JP 19901982A JP S5990289 A JPS5990289 A JP S5990289A
Authority
JP
Japan
Prior art keywords
conductor
pattern
magnetic
magnetic bubble
gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57199019A
Other languages
Japanese (ja)
Inventor
Hideki Fujiwara
英樹 藤原
Akira Hirano
明 平野
Niwaji Majima
庭司 間島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57199019A priority Critical patent/JPS5990289A/en
Publication of JPS5990289A publication Critical patent/JPS5990289A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C19/00Digital stores in which the information is moved stepwise, e.g. shift registers
    • G11C19/02Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements
    • G11C19/08Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure

Abstract

PURPOSE:To obtain a magnetic bubble memory element which has good operation characteristics by providing two kinds of gate and using them properly. CONSTITUTION:Two kinds of gate are provided on a crystal substrate 1. Namely, one gate has ''Permalloy'' first constitution which has a ''Permalloy'' pattern 6 under a conductor pattern 8 and has excellent operation characteristics without any step in the pattern 6, and the other has conductor first constitution which has the conductor pattern 4 under the pattern 6. Then, the ''Permalloy'' first constitution gate is used for a low-current replicator, etc., and the conductor first constitution is used for a high-current replicator, etc.; the gate are used properly to realize the magnetic bubble memory element which has the excellent operation characteristics.

Description

【発明の詳細な説明】 fi+  発明の技術分野 本発明は電子計算装置及びその端末機等の記憶装置に用
いられる磁気バブルメモリ素子に関するものである。
DETAILED DESCRIPTION OF THE INVENTION fi+ Technical Field of the Invention The present invention relates to a magnetic bubble memory element used in a storage device of an electronic computing device and its terminal.

(2)  技術の背景 一般に磁性薄膜は面内方向に磁区の磁化容易軸をもって
いるが、ある種の材料、例えばオルソフェライトや磁性
ガーネット等の単結晶はC軸方向にのみ磁化容易軸を有
する一軸異方性をもっている。このような材料の単結晶
薄膜に垂直に適箔な強度のバイアス磁界を加えると、膜
面に垂直な小さな円筒磁区(これをバブルと云う)がで
きる。
(2) Background of the technology In general, magnetic thin films have an easy axis of magnetization of magnetic domains in the in-plane direction, but some materials, such as single crystals such as orthoferrite and magnetic garnet, have an easy axis of magnetization only in the C-axis direction. It has anisotropy. When a bias magnetic field of suitable strength is applied perpendicularly to a single crystal thin film of such a material, small cylindrical magnetic domains (called bubbles) are formed perpendicular to the film surface.

このバブルは外部磁界を適描に変化させることにより移
動させることができる。磁気パズルメモリは前記単結晶
の薄膜上にパーマロイによる多数の薄膜微細・ぐターン
を形成してバブルの伝播路となし、この伝播路の微細i
9ターンにおけるパズルの有無を情報のst 1 n 
、 ts Ottに対応させてメモリとして使用するも
のである。
This bubble can be moved by suitably varying the external magnetic field. The magnetic puzzle memory is made by forming a large number of fine thin film patterns made of permalloy on the single-crystal thin film to serve as a bubble propagation path.
Information about the presence or absence of puzzles in turn 9 st 1 n
, ts Ott and is used as a memory.

(3)  従来技術と問題点 このような磁気バブルメモリ素子には、パーマロイパタ
ーンとコンダクタパターンと全組合わせて構成された例
えばバブル発生器とか、トランスファゲートなどのファ
ンクションゲートが設けられている。これらのダート構
成にはコンダクタ・ファースト構成とパーマロイ・ファ
ースト構成とがある。コンダクタ・ファーストとは先ず
コンダツタ・パターンを形成し、その上にノぐ−マロイ
ノぐターンを形成するものであり、ノぐ一マロイ・ファ
ーストはその逆である。
(3) Prior Art and Problems Such a magnetic bubble memory device is provided with a bubble generator or a function gate such as a transfer gate, which is constructed by combining a permalloy pattern and a conductor pattern. These dart configurations include conductor first configurations and permalloy first configurations. Conductor first is a method in which a conductor pattern is first formed and then a Nog-Malloy turn is formed thereon, and Noguichi Malloy first is the opposite.

従来は主としてコンダクタファースト構成が用いられて
いるが、この構FJy、は、コンダクタ・ノやターンに
よる段差がその上の・や−マロイノfクーンに段差を与
えないようにレジストリフトオフ法又は樹脂ブレーナ−
法によジ平坦化がはかられてはいるものの、高密度化の
ためノ々ターンサイズ及び・ぐプル径が小さくなってく
るとリフトオフが困難になムあるいは樹脂によってゆる
やかな段差でも特性に影響を与える。特にノぐ一マロイ
ノやターンが微小化するとその体積が小さくなり、従っ
て・ぐフ゛ルを駆動する力も小さくなるため・ぐフ゛ル
結晶との間のスペーサ全薄くする必要があるが、樹脂全
薄くすれば前記の段差の影響が大きくなるという欠点が
ある。
Conventionally, a conductor-first configuration has been mainly used, but in this structure FJy, a resist lift-off method or a resin braner is used to prevent the level difference due to the conductor or turn from causing a level difference to the upper layer or Maroino f Kuhn.
Although flattening has been achieved by the method, lift-off becomes difficult as the turn size and diameter become smaller due to higher density, or the characteristics deteriorate even with gentle steps due to the resin. influence In particular, as the nozzles and turns become smaller, their volume becomes smaller, and the force that drives the glass also decreases, so it is necessary to make the spacer between the glass and the glass thinner, but if the resin is made completely thin, There is a drawback that the influence of the above-mentioned level difference becomes large.

このためパーマロイ・ファースト構成を用いようとする
と、この構成では、コンタ゛クタ・ノやターンツキ−パ
ー効果のため、コンダクタに流す電流値を大きくしなけ
ればならないという欠点が生ずる。
Therefore, when attempting to use the permalloy first configuration, this configuration has the disadvantage that the value of current flowing through the conductor must be increased due to the contactor effect and turnskeeper effect.

(4)発明の目的 本発明は上記従来の欠点に鑑み、動作特性の良い磁気バ
ブルメモリ素子を提供すること全目的とするものである
(4) Object of the Invention In view of the above-mentioned drawbacks of the prior art, the entire object of the present invention is to provide a magnetic bubble memory device with good operating characteristics.

(5)発明の構成 そしてこの目的は本発明によれば、磁気パズル結晶の上
に、軟磁性材料により形成された薄膜・ぐターンと、導
体材料によシ形成された薄膜パターンと′f3:組合わ
せて構成されたゲート部を具備した磁気バブルメモリ素
子において、前記ケ゛−ト部は導体パターンを下にし軟
磁性・ぐターンを上にした構成と、軟磁性パターンを下
にし導体パターンを上にした構成の2種類のケ゛−トを
有することを特徴とする磁気バブルメモリ素子を提供す
ることによって達成される。
(5) Structure and object of the invention According to the invention, a thin film pattern formed of a soft magnetic material and a thin film pattern formed of a conductive material on a magnetic puzzle crystal; In a magnetic bubble memory device having a gate section configured in combination, the gate section has two configurations: one with the conductor pattern facing down and the soft magnetic pattern facing up, and the other with the soft magnetic pattern facing down and the conductive pattern facing up. This is achieved by providing a magnetic bubble memory element characterized by having two types of cases configured as follows.

(6)発明の実施例 以下本発明実施例を図面によって詳述する。(6) Examples of the invention Embodiments of the present invention will be described in detail below with reference to the drawings.

第1図乃至第7図は本発明による磁気バブルメモリ素子
全説明するための図である。同図において、1は結晶基
板、2はスペーサ、4及び8は導体ノリーン、6は軟磁
性の/e−マロイ/々ターン、5.7は絶縁層、9は保
護膜をそれぞれ示づ一0本実施例は第7図に示す如く、
導体/、oターン4の上に樹脂絶縁層5を介してノ々−
マロイノRター76全形成したコンダクタ−ファースト
構成のゲート部ト、バーマロイノやターン6の上に樹月
旨絶縁層7を介して導体ノリーン8を形成した・ぐ−マ
ロイ・ファースト構成のケ゛、−ト部とを同一基板上に
形成したものである。
1 to 7 are diagrams for explaining the entire magnetic bubble memory device according to the present invention. In the figure, 1 is a crystal substrate, 2 is a spacer, 4 and 8 are conductors, 6 is a soft magnetic /e-malloy/metal turn, 5.7 is an insulating layer, and 9 is a protective film. In this embodiment, as shown in Fig. 7,
The conductor/node is connected via the resin insulating layer 5 on the O-turn 4.
The gate part of the conductor-first structure in which the Maroino resistor 76 is completely formed, and the case of the Gu-Malloy-first structure in which the conductor Noreen 8 is formed on the barmalloin and the turn 6 through the insulating layer 7. Both parts are formed on the same substrate.

このように形成するには、先ず第1図の9口<結晶基板
lの上にス硬−サ2として5iO2kll)00Aの厚
さにス/ぐツタし、続いてAt−Cu  等の導体32
4oooAの厚さに蒸着する。次に第2図の如く導体膜
の上にホトレソストヲ塗布し、コンダクタ・ファースト
で形成するケ゛−ト音IXのみノぐターンをつ〈シ、続
いてイオンミリングで導体をエツチングして導体/f、
J−ン4を形成し、その後レジストを剥離する。次いで
第3図のクロくシI)コン系樹脂全塗布し、硬化して絶
縁層5を形成する。
To form this, first, a conductor 32 of At-Cu or the like is deposited on the crystal substrate l as shown in FIG.
Deposit to a thickness of 4oooA. Next, as shown in Fig. 2, a photoresist is applied on the conductor film, and a turn is formed with only the conductor IX formed by conductor first.Then, the conductor is etched by ion milling to form the conductor
J-n 4 is formed, and then the resist is peeled off. Next, the resin shown in FIG. 3 (I) is completely coated and cured to form the insulating layer 5.

次に第4図の如く軟磁性材料であるiR−マロイを40
0 OA蒸着L、ホトレソストヲ用いてノ9ターニング
しバーマロイノ?ターン6を形成する。この時に、マイ
ナー・ループのノぐ一マロイ*)jターンも形成すると
、ス被−サーが薄くなシ駆動力の点で有利である。次に
第5図の如くシリコン系樹月旨を塗布し、硬化して絶縁
層7を形成する。次に第6図の如(、kA−Cu等の導
体を400’OA蒸着し、第2図と同様にして)ぐ−マ
ロイ・ファーストで形成するケ゛−ト部にパターン8を
形成する。最後に第7図の如くシリコン系樹脂にて保護
膜9を形成して本発明の磁気・ぐプルメモリ素子を得る
ことカニできる。
Next, as shown in Figure 4, iR-Malloy, which is a soft magnetic material, was
0 OA evaporation L, 9 turns using photoresist and Vermaroino? Form turn 6. At this time, if a minor loop J-turn is also formed, it is advantageous in terms of driving force because the surface is thin. Next, as shown in FIG. 5, a silicon-based resin is applied and cured to form an insulating layer 7. Next, as shown in FIG. 6, a pattern 8 is formed on the case part formed of G-Malloy first (by vapor depositing a conductor such as kA-Cu at 400'OA and in the same manner as in FIG. 2). Finally, as shown in FIG. 7, a protective film 9 is formed of silicon resin to obtain the magnetic pulley memory element of the present invention.

このように構成される本実施例は、電流のあまシ袈しな
いところ、例えばレプリケータにはノぐ一マロイ・ファ
ース)Il[k用いて)9−マロイノ母ターンに段差を
与えないようにし、電流値の高いところ、例えばスワツ
ゾグートには従来通シコンダクタ・ファーストの構成を
用いることにより動作特性は良好となる。
In this embodiment, configured in this way, the current is controlled so that no step is applied to the replicator, for example, in the replicator. Where the value is high, for example, Swatzzogut, the operating characteristics can be improved by using the conventional conductor-first configuration.

(7)  発明の効果 以上、詳細に説明したように本発明の磁気バブルメモV
素子はり゛−ト電流値とり゛−ト部のパターン形状から
パーマロイ・ファースト構成としても動作するケ゛−ト
部のみパーマロイファースト構成とし、他のり゛−ト部
はコンダクタ・ファースト構成とすることによp良好な
動作特性が得られるといった効果大なるものである。
(7) Effects of the Invention As explained in detail above, the magnetic bubble memo V of the present invention
Due to the pattern shape of the element beam current value connecting part, only the gate part which also operates as a permalloy-first configuration is made into a permalloy-first configuration, and the other gate parts are made into a conductor-first configuration. This has a great effect in that good operating characteristics can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図乃至第6図は本発明による磁気パズルメモリ素子
の製造工程全説明するための図、第7図はその完成品の
断面を示す図である。 図面において、1は結晶基板、2はスペーサ、4及び8
は導体パターン、5及び7は樹脂絶縁層、6はパーマロ
イ・母ターく9は保穫膜をそれぞれ示す。 第1図 第2図 第3図 第4図
1 to 6 are diagrams for explaining the entire manufacturing process of the magnetic puzzle memory device according to the present invention, and FIG. 7 is a diagram showing a cross section of the completed product. In the drawing, 1 is a crystal substrate, 2 is a spacer, 4 and 8
1 shows a conductor pattern, 5 and 7 a resin insulating layer, 6 a permalloy matrix, and 9 a protective film. Figure 1 Figure 2 Figure 3 Figure 4

Claims (1)

【特許請求の範囲】[Claims] 1、 磁気バブル結晶の上に、軟磁性拐料によp形成さ
れた薄膜パターンと、導体材料により形成された#膜パ
ターンとを組合わせて構成されたケ゛−ト部金具偏した
磁気バブルメモリ素子において、前記ゲート部は、導体
パターンを下にし軟磁性パターンを上にした構成と、軟
磁性ノ?ターンを下にし導体パターンを上にした構成の
2@類のr−)を有することを特徴とする磁気バブルメ
モリ素子。
1. A magnetic bubble memory with a biased case on the magnetic bubble crystal, which is constructed by combining a thin film pattern made of a soft magnetic material and a # film pattern formed of a conductive material on a magnetic bubble crystal. In the device, the gate portion has a configuration in which the conductive pattern is on the bottom and the soft magnetic pattern is on the top, and a soft magnetic pattern on the top. 1. A magnetic bubble memory element having a structure in which the turns are on the bottom and the conductor pattern is on the top.
JP57199019A 1982-11-15 1982-11-15 Magnetic bubble memory element Pending JPS5990289A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57199019A JPS5990289A (en) 1982-11-15 1982-11-15 Magnetic bubble memory element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57199019A JPS5990289A (en) 1982-11-15 1982-11-15 Magnetic bubble memory element

Publications (1)

Publication Number Publication Date
JPS5990289A true JPS5990289A (en) 1984-05-24

Family

ID=16400765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57199019A Pending JPS5990289A (en) 1982-11-15 1982-11-15 Magnetic bubble memory element

Country Status (1)

Country Link
JP (1) JPS5990289A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2594252A1 (en) * 1986-02-07 1987-08-14 Hitachi Ltd MEMORY DEVICE WITH MAGNETIC BUBBLE.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2594252A1 (en) * 1986-02-07 1987-08-14 Hitachi Ltd MEMORY DEVICE WITH MAGNETIC BUBBLE.

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