JPS599006Y2 - Vacuum deposition equipment - Google Patents

Description

[Detailed Description of the Invention] The present invention relates to a vacuum evaporation apparatus that performs evaporation treatment on various samples in a sealed vacuum evaporation space.

For example, as shown in FIG. 1, a conventional vacuum evaporation apparatus of this type includes a substantially cylindrical chamber a with one side open, and a thick plate-like chamber hinged to the opening of the chamber a so as to be openable and closable. A vacuum evaporation space C is formed which is sealed by a door b, and an electrode d for evaporating the raw material, a sample holding frame e, etc. are housed in this evaporation space C, and the sample holding frame e holds them. It is now possible to perform vapor deposition treatment on various types of samples.

However, in this type of device, since the depth of chamber a is long, opening door b allows electrodes d arranged in chamber a to be accessed.
There is a problem in that it is difficult to set the raw material in the sample holding frame C or to replace the sample held in the sample holding frame C.

Therefore, in recent years, it has been considered that the vapor deposition mechanism f such as the electrode d and the sample holding frame e is all supported inside the door b.

That is, by doing this, when the door b is opened, the vapor deposition mechanism f is taken out of the chamber a and exposed to the outside, making it easier to set the raw materials and replace the sample as described above. In addition, there is an advantage that work efficiency can be greatly improved by adopting a two-door system as described later.

However, in a conventional apparatus having a deep chamber a and a thick plate-shaped door b, when the vapor deposition mechanism f is supported by the door b, it is necessary to make the chamber a unduly large. There is an inconvenience that the vapor deposition mechanism f interferes with the opening edge of the chamber a when opening the chamber b.

This invention was developed with a focus on these circumstances.
The above-mentioned inconvenience can be solved by making the chamber and the door into semi-cylindrical shapes so that when the door is closed, the door and the chamber form a cylindrical vapor deposition space. An object of the present invention is to provide a vacuum evaporation apparatus that can solve these problems.

An embodiment of the present invention will be described below with reference to FIGS. 2 to 4.

A chamber 2 is fixedly installed on a base 1.

The chamber 2 includes a rectangular opening frame 2a and a rectangular opening frame 2a.
It has a semi-cylindrical shape, consisting of a semi-circular top wall part 2b and a semi-circular bottom wall part 2C fixed to the upper and lower edges of a, respectively, and a peripheral wall part 2d curved in a semi-circular arc shape. 2d
has an exhaust port 2e connected to an exhaust system (not shown) having a vacuum pump.

Further, a pair of doors 3, 3 are hinged to both side edges of the opening frame 2a of the chamber 2 via hinges 4, respectively, so that any one of these doors 3, 3 can be selectively connected to the other. The lid can be attached to the opening frame portion 2a of the chamber 2 at the same time.

Each door 3 includes a rectangular opening frame 3a and a semicircular ceiling wall 3b fixed to the upper and lower edges of the opening frame 3a, respectively.
and a bottom wall portion 3C, and a peripheral wall portion 3 curved in a semicircular arc shape.
It has a semi-cylindrical shape and has a viewing window 3e on its peripheral wall 3d.

No matter which door 3 is attached to the chamber 2, a sealed cylindrical vapor deposition space 5 is formed by the door 3 and the chamber 2.

A vapor deposition mechanism 6 to be housed in the vapor deposition space 5 is provided inside each door 3.

That is, each vapor deposition mechanism 6 has a disk-shaped substrate 7 whose one half is fixed to the upper surface of the bottom wall 3C of the door 3, and can horizontally rotate on this substrate 7 via guide rollers 8 and 9. Supported ring-shaped turntable 11 and turntable 1
A pair of electrodes 12.12 are located in the axial center hollow part of the base plate 7 and are fixed on the substrate 7, and the tip portions 12a..., 12b... and a rectangular sample holding frame 14 placed on the turntable 11 so as to surround both the electrodes 1.
2.12 tip portions 12a..., 12b...
. . . so that raw materials such as aluminum (not shown) can be evaporated by heat emitted from the evaporation sources 15 and 16 stretched between them, and a vapor deposition process can be performed on the sample such as glass held in the sample holding frame 14. It has become.

Reference numeral 21 denotes a drive disk that is rotationally driven by a motor 22 provided on the chamber 2, and a drive pin 21a protruding from the lower surface of the drive disk 21 allows the sample holding frame 1 to be rotated by a drive pin 21a.
The sample holding frame 14 can be rotated together with the turntable 11 by pressing a driven pin 14a protruding from the upper surface of the sample holding frame 14.

Further, 23 is a clamp member for closing the door 3 to the chamber 2.

With such a structure, one half of the vapor deposition mechanism 6 will be completely exposed to the outside when the door 3 is opened, so if the vapor deposition mechanism is installed in a deep chamber, In comparison, tasks such as setting raw materials and exchanging samples are much easier.

Moreover, if the chamber 2 and the door 3 are both semi-cylindrical, even if the vapor deposition mechanism 6 is supported by the door 3,
When the door 3 is opened, the rotation locus of the vapor deposition mechanism 6 bulges out more than the rotation locus of the door 3, thereby preventing the vapor deposition mechanism 6 from interfering with the opening edge of the chamber 2.

Therefore, there is an advantage that the vapor deposition mechanism 6 can be supported by the door 3 without causing an unreasonable increase in the size of the chamber 2.

In the above embodiment, a pair of doors are hinged to a single chamber so that these doors can be used selectively, but the present invention is not necessarily limited to such a structure. Of course, it is possible to apply this to a chamber in which a single door is hinged to the chamber, for example.

However, if a two-door system like the one in the above embodiment is adopted, while one door is connected to the chamber and vapor deposition is being carried out, the vapor deposition mechanism held by the other door can be used for sample exchange, etc. Since the work can be carried out, the work efficiency is high and productivity can be greatly improved.

[Brief explanation of the drawing]

FIG. 1 is a schematic sectional view showing a conventional example. Figures 2 to 4 show an embodiment of the present invention, with Figure 2 being a perspective view, Figure 3 being a partially cutaway plan view, and Figure 4 being a sectional view taken along line IV-IV in Figure 3. There is. 2...chamber, 3...door, 5...
...Deposition space.

Claims (1)

[Scope of utility model registration request] In a vacuum evaporation apparatus comprising a chamber having an opening and a door hinged to the opening of the chamber so as to be openable and closable, the chamber and the door each have a semi-cylindrical shape, and the door 1. A vacuum evaporation apparatus characterized in that when the door is closed, a cylindrical evaporation space is defined by the door and the chamber.