JPS61124569A - Rotary substrate supporting device - Google Patents

Abstract

PURPOSE:To form stably a thin film whose film thickness and film quality are uniform, on a substrate by heating directly the holder of a thin film forming substrate, measuring a temperature, and making the substrate rotatable, in various thin film forming devices. CONSTITUTION:In a vacuum tank 6 of a vacuum vapor-depositing device, a spatter device and other thin film forming device, a heating use heater 4 and a temperature measuring device 5 are embedded into the holder 2 of the substrate 1 for forming a thick film. Also, the substrate holder 2 rotates in reverse the rotating direction at every one rotation by a pulse motor 31. The lead wire 41 of the substrate 1 heating use heater 4, and the lead wire 51 of the temperature measuring device 5 can follow the inverted rotation by a slight twist and with a sufficient allowance, direct heating can be executed, the substrate 2 can be heated with an excellent thermal efficiency, and also a thin film whose film thickness and film quality are uniform can be formed on the substrate.

Description

DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a rotary substrate support device used in forming various thin films.

Conventional technology In various thin film forming apparatuses such as vacuum evaporation equipment, sputtering equipment, 9-molecular beam epitaxy equipment, and chemical vapor deposition equipment, the substrate is heated to obtain good film quality, as well as to eliminate unevenness in film thickness and film composition. For this reason, it is common practice to rotate the substrate.

The conventional technology will be explained below with reference to the drawings.

FIG. 2 is a sectional view schematically showing a rotary substrate support device having a conventional heating mechanism. In this figure, 1 is a substrate, 2 is a substrate holder, 3 is a rotating mechanism, 4 is a heating mechanism (heater), 6 is a temperature measuring mechanism, and 6 is a vacuum container. In the above configuration, the substrate holder 2 has a motor 311 rotating shaft 32.
It is composed of a gear 33. Driven by the rotation mechanism 3,
Continuous rotation around an axis perpendicular to the substrate surface. On the other hand, the heating mechanism 4 is fixed to the vacuum container 6 in order to take out the lead wire 41 to the outside, and indirectly heats the substrate holder 2 by thermal radiation.

Further, a temperature measuring mechanism 6 is also fixed to the vacuum container 6 and measures the temperature in the vicinity of the substrate holder 2.

Problems to be Solved by the Invention In the above-mentioned configuration, heating is indirect, resulting in poor thermal efficiency, and it is necessary to maintain the heating mechanism at a temperature much higher than the desired substrate temperature.

Therefore, the power required is large and the substrate temperature is limited.

There are problems such as a lot of gas being released and a decrease in the degree of vacuum, and since the temperature measurement is indirect, it is not possible to measure the true substrate temperature, making it difficult to control the substrate temperature at a constant level. Therefore, there is also the problem that the film quality is unstable.

In view of these conventional problems, the present invention provides a mechanism that can rotate the substrate while directly heating and measuring the temperature of the substrate holder, thereby stably forming a thin film with uniform thickness and quality. The purpose is to form.

Means for Solving the Problems The present invention fixes a heating mechanism and a temperature measuring mechanism fixed to a vacuum container to a substrate holder equipped with a rotation mechanism, respectively, and rotates the rotation direction of the substrate holder at a preset angle. By reversing each time, it is possible to rotate the substrate while directly heating and measuring the temperature of the substrate holder.

Operation By using the above means, it is possible to directly heat and measure the temperature of the substrate while maintaining the same substrate rotation effect as in the prior art.

Embodiment FIG. 1 is a sectional view schematically showing a rotary substrate support device according to an embodiment of the present invention. In this figure, the numbers of the components common to the prior art are the same as in FIG. 2. In this embodiment, a pulse motor is used as the motor 31, and the direction of rotation of the substrate holder 2 is reversed every rotation. Further, the heating mechanism 4 and the temperature measurement mechanism 6 are embedded in the substrate holder 2, and directly perform heating and temperature measurement. This mechanism smells.

Since the substrate holder performs a reciprocating rotational movement every rotation, the lead wires 41°51 of the heating mechanism and temperature measuring mechanism are only slightly twisted and can follow the rotation with sufficient margin. Can be taken outside.

In this example, the board is reversed using a pulse motor and its drive circuit, but other methods may be used, such as detecting when the board has rotated to a fixed position using a limit switch, etc., and immediately reversing the motor. It goes without saying that a method such as letting it happen may also be used.

Effects of the Invention As described above, the present invention makes it possible to directly heat and measure the temperature of a substrate while maintaining the same rotation of the substrate as in the past by inverting the substrate holder at predetermined angles. As a result, it is possible to stably form a thin film with uniform film quality, the substrate can be heated to high temperatures with low power, and the excellent effect of reducing the degree of vacuum due to released gas is obtained. This is an invention that has great practical effects.

[Brief explanation of the drawing]

FIG. 1 is a sectional view showing the structure of a rotary substrate support device according to an embodiment of the present invention, and FIG. 2 is a sectional view showing the structure of a conventional rotary substrate support device. 1... Board, 2... Board holder, 3.
... Rotation mechanism, 31 ... Motor, 32
... Rotating axis, 33 ... Gear, 34 ...
...Motor series circuit device, 4...Heating mechanism, 5...Temperature measurement mechanism, 6...Vacuum container. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
figure

Claims (1)

[Claims] A rotary substrate support device, characterized in that a heating mechanism and a temperature measurement mechanism are fixed to a substrate holder equipped with a rotation mechanism, and the rotation direction of the substrate holder is reversed at every set rotation angle.