JPS5986192A - High frequency heater - Google Patents
High frequency heaterInfo
- Publication number
- JPS5986192A JPS5986192A JP19631382A JP19631382A JPS5986192A JP S5986192 A JPS5986192 A JP S5986192A JP 19631382 A JP19631382 A JP 19631382A JP 19631382 A JP19631382 A JP 19631382A JP S5986192 A JPS5986192 A JP S5986192A
- Authority
- JP
- Japan
- Prior art keywords
- heating chamber
- magnetron
- high frequency
- opening
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Constitution Of High-Frequency Heating (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
産業上の利用分野
本発明はターンテーブルを備えた高周波加熱装置に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a high frequency heating device equipped with a turntable.
従来例の構成とその問題点
高周波加熱装置における焼けむら防止手段として、加熱
室内にスタラーファンやターンテーブルを設けることが
行なわれており、特にスタラーファン方式の場合、加熱
室内の前後左右の電界の均一性を得やすくする為、加熱
室天面略中央より給電することが行なわれている。この
方式の一例を図面に基づき説明すると、第1図は前記従
来の高周波加熱装置の縦断面図であシ、1は内部に加熱
室2を有する本体、3は高周波を発生するマグネトロン
であり導波管4と加熱室2天面の略中央に設けた開口6
を介して前記加熱室2へ供給される・6はスタラー軸7
で軸支されたスタラーファンでマグネトロン3作動時に
回転し前記開口6を通過した高周波を攪拌する。8は被
加熱物9を載置する皿受台、10は低誘電体から成る仕
切板である。Conventional structure and problems As a means to prevent uneven baking in high-frequency heating equipment, stirrer fans and turntables are installed in the heating chamber. Especially in the case of the stirrer fan method, the front, back, left and right sides of the heating chamber are In order to easily obtain uniformity of the electric field, power is supplied from approximately the center of the top surface of the heating chamber. An example of this method will be explained based on the drawings. FIG. 1 is a longitudinal cross-sectional view of the conventional high-frequency heating device, in which 1 is a main body having a heating chamber 2 inside, 3 is a magnetron that generates high-frequency waves, and is a guide. An opening 6 provided approximately in the center of the wave tube 4 and the top surface of the heating chamber 2
is supplied to the heating chamber 2 via the stirrer shaft 7.
A stirrer fan pivotally supported rotates when the magnetron 3 is activated and stirs the high frequency waves passing through the opening 6. Reference numeral 8 represents a dish holder on which the object to be heated 9 is placed, and 10 represents a partition plate made of a low dielectric material.
このように加熱室天面の略中央に前記開口6を設けるこ
とにより、加熱室内電界の前記左右の均衡が容易に保た
れるため、分布性能が向上することが知られている。It is known that by providing the opening 6 at approximately the center of the top surface of the heating chamber in this manner, the left and right balance of the electric field within the heating chamber can be easily maintained, thereby improving the distribution performance.
しかし、前記構成では下記の欠点が生じ易かった。However, the above configuration tends to have the following drawbacks.
(1)皿受台の中央上に被加熱物を置いて加熱処理する
場合、例えば牛乳びんや徳利にょる酒がんのように幅が
狭く高さ成分のある容器では、前記開口6に近い被加熱
物上部刊近は高周波が直接放射され強電界となり、局部
加熱が起きやすく使い勝手が悪い。(1) When heating the object by placing it on the center of the plate holder, for example, if the container is narrow and has a height component, such as a milk bottle or a sake bottle, it is close to the opening 6. High frequency waves are directly radiated near the upper part of the heated object, creating a strong electric field, which tends to cause local heating, making it difficult to use.
(2)前記(1)の欠点を補うためには、被加熱物の上
部にアルミホイルを巻く等の補助手段が必要であり1手
間がかかる。(2) In order to compensate for the drawback of (1) above, it is necessary to use auxiliary means such as wrapping aluminum foil over the object to be heated, which takes time and effort.
(3) 前記(2)の手間を省くためには、被加熱物
の上部の仕切板10近傍に直接高周波が放射されないよ
うに、金属から成る反射板を設ける構成も考えられるが
、誤使用により万一無負荷で作動させた場合、スタラー
ファン等とスパークする危険性がある。(3) In order to save the effort in (2) above, a configuration may be considered in which a reflective plate made of metal is provided so that high frequency waves are not directly radiated near the partition plate 10 above the object to be heated, but if misused If it is operated without load, there is a risk of sparking with the stirrer fan, etc.
発明の目的
本発明は上記従来の欠点を解消するもので、分布性能を
向上し使い勝手の良い高周波加熱装置を提供することを
目的とする。OBJECTS OF THE INVENTION The present invention eliminates the above-mentioned conventional drawbacks, and aims to provide a high-frequency heating device that improves distribution performance and is easy to use.
発明の構成
上記目的を達するため、本発明の高周波加熱装置は、加
熱室内底部にターンテーブルを設け、加熱室天面に設け
た開口の略中心は加熱室天面をマグネトロンに近い加熱
室側壁面と平行に三等分した時、マグネトロンから遠い
側に設ける構成であり、被加熱物の容器幅が狭く高さ成
分のある場合でも、補助手段無しで局部加熱が起こりに
くく、しかも導波管が長くなる構成であることからロン
グライン効果が生じ易く、軽負荷時の出力変動特性が向
上し、万一の誤使用による無負荷動作に際してもマグネ
トロンに対して悪影響を与えにぐいという効果を有する
ものである。Structure of the Invention In order to achieve the above object, the high frequency heating device of the present invention is provided with a turntable at the bottom of the heating chamber, and the approximate center of the opening provided on the top of the heating chamber is located between the top of the heating chamber and the side wall of the heating chamber near the magnetron. When divided into thirds parallel to the magnetron, it is installed on the far side from the magnetron.Even if the container width of the object to be heated is narrow and there is a height component, local heating is difficult to occur without auxiliary means, and the waveguide is Due to its long configuration, long-line effects are likely to occur, and the output fluctuation characteristics at light loads are improved, and even in the unlikely event of no-load operation due to misuse, it has the effect of preventing any negative effects on the magnetron. It is.
実施例の説明
以下、本発明の一実施例について、図面に基づいて説明
する。なお、従来例と同一機能部品については同一番号
を附すものとする。DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. Note that the same numbers are given to parts with the same functions as those of the conventional example.
第2図は本発明の高周波加熱装置の縦断面図であり、1
は内部に加熱室2を有する本体、3は高周波を発生する
マグネトロンで、導波管6と加熱室2天面に設けられた
開口6を介して加熱室2へ高周波は供給される。なお、
前記開口6の略中心は、加熱室2天面をマグネトロン3
に近い加熱室2側壁面と平行に三等分した時、マグネト
ロンから遠い側に設けである。10は前記開口6を閉塞
する低誘電体から成る仕切板、11は加熱室2内底部に
設けられ被加熱物9を載せた皿受台8を載置し回転する
ターンテーブル、12は加熱室2外より前記ターンテー
ブル11を駆動するターンテーブル駆動源である。13
は加熱室2の前記開口6側の側壁面に設けた凹型絞り部
である。FIG. 2 is a longitudinal cross-sectional view of the high-frequency heating device of the present invention.
3 is a main body having a heating chamber 2 therein; 3 is a magnetron that generates high frequency waves; the high frequency waves are supplied to the heating chamber 2 through a waveguide 6 and an opening 6 provided on the top surface of the heating chamber 2; In addition,
The approximate center of the opening 6 connects the top surface of the heating chamber 2 with the magnetron 3.
When the heating chamber 2 is divided into three equal parts parallel to the side wall surface near the magnetron, it is installed on the side far from the magnetron. 10 is a partition plate made of a low dielectric material that closes the opening 6; 11 is a turntable provided at the bottom of the heating chamber 2 on which a plate pedestal 8 on which the object to be heated 9 is placed is placed; and 12 is a heating chamber. 2 is a turntable drive source that drives the turntable 11 from outside. 13
is a concave constriction provided on the side wall surface of the heating chamber 2 on the opening 6 side.
上記構成において、マグネトロン2作動時にはターンテ
ーブル駆動源にも作動しターンテーブル11が回転する
。マグネトロン3で発生した高周波は、導波管4から前
記開口6を介して加熱室2へ供給されるが、この時前記
開口6の略中心は、マグネトロン3に近い加熱室2 j
lll壁面と−IL行に三等分した時、マグネトロン3
から遠い側に位置しているため、加熱室2に放射される
高周波は大手は前記凹型絞シ部13を有する加熱室側壁
面で乱反射された後に被加熱物9に吸収されるため均一
加熱されやすい。なお前記開口6の略中心を加熱室天面
略中央から外した場合、加熱室内の前後左右の電界は不
均一となるが、ターンテーブルにより被加熱物は周回移
動するため比較的均一な加熱処理ができる。In the above configuration, when the magnetron 2 is activated, the turntable drive source is also activated and the turntable 11 is rotated. The high frequency waves generated by the magnetron 3 are supplied from the waveguide 4 to the heating chamber 2 through the opening 6, but at this time, the approximate center of the opening 6 is located close to the magnetron 3 in the heating chamber 2.
When divided into three parts, the magnetron 3
Since the heating chamber 2 is located far from the heating chamber 2, the high frequency waves radiated into the heating chamber 2 are diffusely reflected on the heating chamber side wall surface having the concave diaphragm 13 and then absorbed by the heated object 9, so that the heating chamber 2 is uniformly heated. Cheap. Note that if the approximate center of the opening 6 is removed from the approximate center of the top surface of the heating chamber, the electric field in the front, rear, left, and right directions within the heating chamber will be non-uniform, but since the object to be heated is moved around by the turntable, the heating process is relatively uniform. I can do it.
そのため本実施例によれば、容器幅が狭く高さ成分を有
する1例えば牛乳びんや徳利による酒かんを皿受台8の
中央においても、前記開口5から放射される高周波は直
接前記被加熱物の上部に当たりにくくなり、局部加熱は
起こりにくい。この効果の一例を第1表に示す。Therefore, according to the present embodiment, even when a container having a narrow width and a height component, such as a milk bottle or a sake bottle, is placed in the center of the plate holder 8, the high frequency waves radiated from the opening 5 are directly transmitted to the object to be heated. It is difficult to hit the upper part of the body, and local heating is less likely to occur. An example of this effect is shown in Table 1.
牛乳びんにおける上下温度差比較
第 1 表
なお、皿受台8の周辺部に前記被加熱物9を置いた場合
、被加熱物9が前記開口5の真下を通過することも考え
られるが、被加熱物9が加熱室2を一周する時間と比較
して前記通過11.1間が短時間であることから分布性
能に影響するほどの問題は無い。i!た、前記の構成か
ら明らかなように、導波管4の長さが従来に比べ長くな
るため、ロングライン効果が生じ易く、負荷変動特性が
良くなシ第2表に示すように軽負荷での加熱処理時間が
短縮できる効果も有する。Comparison of upper and lower temperature differences in milk bottles Table 1 Note that when the object to be heated 9 is placed around the plate holder 8, it is possible that the object to be heated 9 passes directly under the opening 5; Since the time between the passages 11.1 and 11.1 is short compared to the time it takes for the heated material 9 to go around the heating chamber 2 once, there is no problem that would affect the distribution performance. i! In addition, as is clear from the above configuration, the length of the waveguide 4 is longer than the conventional one, so the long line effect is likely to occur, and the load fluctuation characteristics are good. It also has the effect of shortening the heat treatment time.
軽負荷における加熱調理時間比較(eoow出力)第
2 表
さらに、万一無負荷状態で本体を作動した場合でも、前
記ロングライン効果によりマグネトロンへの反射板によ
る異常発熱が緩和されスパーク等の危険性も少なくなる
効果を有する。Comparison of cooking time under light load (eoow output)
Table 2 Furthermore, even if the main body is operated in a no-load state, the long line effect reduces abnormal heat generation due to the reflector on the magnetron and reduces the risk of sparks and the like.
発明の効果
以上のように本発明、によれば次の効果を得ることがで
きる。Effects of the Invention As described above, according to the present invention, the following effects can be obtained.
(1)皿受台の中央上に被加熱物を置いて加熱処理する
場合、容器幅が狭く高さ成分を有する例えば牛乳ビンや
徳利による酒かん等において、局部加熱が生じにくい。(1) When heating an object by placing it on the center of a plate holder, local heating is less likely to occur in cases where the container has a narrow width and height component, such as a milk bottle or a sake can made from a sake bottle.
(2)前記(1)の効果により被加熱物の上部をアルミ
ホイルで覆う等の補助手段の必要性や、開口と被加熱物
との間に金属から成る反射板を介在させることによるス
パーク等の危険性も勲くなる。(2) Due to the effect of (1) above, it is necessary to use auxiliary means such as covering the top of the object to be heated with aluminum foil, and sparks can be generated by interposing a reflective plate made of metal between the opening and the object to be heated. The danger is also an honor.
(3) ロングライン効果が助長され易く負荷変動特
性が良<Z、a、実使用時における利用頻度の高い軽負
荷加熱処理時間が短縮でき効率が向上する。さらに無負
荷状態で本体を作動した場合、マグネトロ/への反射波
が緩和されマグネトロンが医護される。(3) The long-line effect is easily promoted and the load fluctuation characteristics are good <Z, a. The time for light-load heat treatment, which is frequently used in actual use, can be shortened and efficiency can be improved. Furthermore, when the main body is operated with no load, the reflected waves to the magnetron are alleviated and the magnetron is protected.
第1図は従来の高周波加熱装置の縦断面図、第2図は本
発明の一実施例でめる高周波加熱装置の縦断面図である
。
1・・・・・・本体、2・・・・・・加熱室、3・・・
・・・マグネトロン、4・・・・・・導波管、6・・・
・・・開口、8・・・・・・皿受台、9・・・・・・被
加熱物、11・・・・・・ターンテーブル、12・・・
・・・ターンテーブル駆動源、13・・・・・・加熱室
側壁面凹部絞り。
代理人の氏名 弁理士 中 尾 敏 男 /11か1名
第1図
第2図FIG. 1 is a vertical cross-sectional view of a conventional high-frequency heating device, and FIG. 2 is a vertical cross-sectional view of a high-frequency heating device according to an embodiment of the present invention. 1...Main body, 2...Heating chamber, 3...
... Magnetron, 4... Waveguide, 6...
... Opening, 8 ... Dish holder, 9 ... Heated object, 11 ... Turntable, 12 ...
... Turntable drive source, 13... Heat chamber side wall concave aperture. Name of agent: Patent attorney Toshio Nakao / 11 or 1 person Figure 1 Figure 2
Claims (2)
マグネトロンと、前記マグネトロ/で発生した高周波を
加熱室へ導く導波管と、前記高周波を加熱室内へ取り入
れるため加熱室天面に設けた開口と、加熱室内底部に配
設したターンテーブルと、前記ターンテーブルを加熱室
外底部より駆動する駆動源とを備え、υ’1 ?fLl
;開口の略中心は加熱室天面をマグネトロンに近い加熱
室側壁面と平行に三等分した時、マグネトロンから遠い
側に設ける構成とした高周波加熱装置。(1) A main body that has a heating chamber inside, a magnetron that emits high frequency waves, a waveguide that guides the high frequency waves generated by the magnetron to the heating chamber, and a waveguide installed on the top surface of the heating chamber to take the high frequency waves into the heating chamber. υ'1? fLl
; The high-frequency heating device is configured such that the approximate center of the opening is located on the side far from the magnetron when the top surface of the heating chamber is divided into three equal parts parallel to the side wall surface of the heating chamber near the magnetron.
ける構成とした特許請求の範囲第1項記載の高周波加熱
装置。(2) The high-frequency heating device according to claim 1, wherein a concave diaphragm is provided on a side wall surface of the heating chamber adjacent to the opening.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19631382A JPS5986192A (en) | 1982-11-08 | 1982-11-08 | High frequency heater |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19631382A JPS5986192A (en) | 1982-11-08 | 1982-11-08 | High frequency heater |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5986192A true JPS5986192A (en) | 1984-05-18 |
Family
ID=16355728
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19631382A Pending JPS5986192A (en) | 1982-11-08 | 1982-11-08 | High frequency heater |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5986192A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53106948A (en) * | 1977-02-28 | 1978-09-18 | Matsushita Electric Ind Co Ltd | High-frequency heating apparatus |
JPS5537774A (en) * | 1978-09-07 | 1980-03-15 | Sanyo Electric Co | Electronic range |
-
1982
- 1982-11-08 JP JP19631382A patent/JPS5986192A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53106948A (en) * | 1977-02-28 | 1978-09-18 | Matsushita Electric Ind Co Ltd | High-frequency heating apparatus |
JPS5537774A (en) * | 1978-09-07 | 1980-03-15 | Sanyo Electric Co | Electronic range |
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