JPS6127878B2 - - Google Patents

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Publication number
JPS6127878B2
JPS6127878B2 JP56068539A JP6853981A JPS6127878B2 JP S6127878 B2 JPS6127878 B2 JP S6127878B2 JP 56068539 A JP56068539 A JP 56068539A JP 6853981 A JP6853981 A JP 6853981A JP S6127878 B2 JPS6127878 B2 JP S6127878B2
Authority
JP
Japan
Prior art keywords
heating chamber
frequency
reception port
heating
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56068539A
Other languages
Japanese (ja)
Other versions
JPS57182994A (en
Inventor
Shozo Kobayashi
Mitsuo Mochizuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP6853981A priority Critical patent/JPS57182994A/en
Publication of JPS57182994A publication Critical patent/JPS57182994A/en
Publication of JPS6127878B2 publication Critical patent/JPS6127878B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

この発明は高周波発振器から出力された高周波
を導波管を介して加熱室内へ導く例えば電子レン
ジ等の高周波加熱装置に関する。 一般に、電子レンジ等にあつては料理の仕上り
状態を良好なものにするために、加熱室中央の電
界を周囲よりも強くすることが行われている。と
ころで、第1図に示すようにマグネトロン(高周
波発振器)1から出力された高周波を導波管2を
介して加熱室3内へ導く構成のものにあつては、
加熱室3の天井板4の中央に高周波受入口5を形
成し、導波管2を通じて導かれた高周波を高周波
受入口5から加熱室3内へ放射することにより加
熱室3の中央の電界を強くするようにしていた。
しかしながら、上記従来構成のものにあつては、
高周波受入口5の大きさに応じて電波の指向性が
生じ、高周波の不要輻射が増加することが多く、
加熱室3の中央部位の電界を十分に強くすること
ができない問題があつた。そのため、加熱室3内
に放射される高周波の分布を良好な状態に調整す
ることができず、加熱室3内に載置されている食
品等に対し加熱ムラが生じ易いので、料理の仕上
り状態を安定化させにくく、調理時間の短縮が図
れない欠点があつた。 この発明は上記事情にもとづいてなされたもの
で、その目的は、高周波の不要輻射を低減するこ
とにより、加熱室の中央の電界を十分に強くする
ことができ、料理の仕上り状態を安定化するとと
もに、調理時間を短縮して調理性能の向上を図る
ことができ、加えて高周波受入口を閉塞する開口
カバーを確実に支持するこことができるととも
に、不要輻射の少ない位置に加熱室のインピーダ
ンスを移動することができる高周波加熱装置を提
供することにある。 以下、この発明を各実施例にもとづいて説明す
る。第2図乃至第10図はこの発明の第1の実施
例を示すものである。第2図中で、11は例えば
電子レンジの本体である。この本体11内には加
熱室12が形成されているとともに、マグネトロ
ン(高周波発振器)13が収納されている。加熱
室12の底部にはターンテーブル14が設けられ
ており、このターンテーブル14は加熱室12の
底板15の下面に取付けられている駆動モータ1
6によつて回転駆動されるようになつている。ま
た、加熱室12の天井板17の中央部位には矩形
の高周波受入口18が形成されている。さらに、
加熱室12の天井板17の上面には導波管19が
取付けられている。この導波管19の基端部には
マグネトロン13が取付けられている。また、導
波管19の先端部は高周波受入口18に連結され
ている。 一方、高周波受入口18の下方は例えばシリコ
ン板等からなる開口カバー20によつて閉塞さ
れ、この開口カバー20の下面には第3図に示す
ように離間対向配置された一対の反射板(反射
部)21,21が設けられている。これらの反射
板21,21はそれぞれ金属板によつて略L字形
に形成されたもので、高周波受入口18に加熱室
12の内方へ向けて突設された状態に対向配置さ
れ、ねじ止め等によつて開口カバー20とともに
天井板17に取付けられている。この場合、反射
板21,21は高周波受入口18における対向す
る一対の開口端縁部に沿つてそれぞれ配置されて
いる。さらに、これらの反射板21,21には第
4図および第5図に示すように開口カバー20と
の接合面側に突出片32…が切起こし成形されて
おり、これらの突出片32…が第6図に示すよう
に高周波受入口18内に突出された状態で取付け
られている。 そこで、上記構成のものにあつては、マグネト
ロン13から出力された高周波は導波管19を通
じて導かれ、高周波受入口18から加熱室12内
に供給される。この場合、高周波受入口18を通
過した高周波のうち、従来不要輻射として加熱室
12内に供給されていたものの大部分は一対の反
射板21,21によつて反射されて加熱室12の
中央に放射される。そのため、加熱室12内に供
給される不要輻射を従来に比べて低減することが
できる。なお、出願人はこのことを高周波受入口
18の下方の開口カバー20の下面に第7図に示
す一対の反射板21,21を設けた構成(本発明
の構成)のものと、高周波受入口18の下方の開
口カバー20の下面に反射板21,21を設けな
い構成(従来構成)のものをそれぞれ使用して行
なつた次の第1,第2の実験によつて確認した。 第1の実験は、第8図に示すように加熱室12
内のターンテーブル(直径L)14上に、それぞ
れ100c.c.の水を収容した5個の容器22a〜22
eを配置し、この状態でマグネトロン13を2分
間動作させて、各容器22a〜22e内の水の温
度上昇値を測定することにより、加熱室12内の
温度分布を調べるようにしたものである。また、
第2の実験は、第9図に示すようにターンテーブ
ル14上に15個の冷凍シユーマイ23…を配置
し、マグネトロン13を動作させて各冷凍シユー
マイ23…の解凍状態を測定するようにしたもの
である。 第1の実験の実験結果を第1表に、第2の実験
の実験結果を第2表にそれぞれ示す。
The present invention relates to a high-frequency heating device, such as a microwave oven, which guides high-frequency waves output from a high-frequency oscillator into a heating chamber through a waveguide. Generally, in microwave ovens and the like, the electric field in the center of the heating chamber is made stronger than in the surrounding area in order to improve the quality of the food. By the way, as shown in FIG. 1, in the case of a structure in which a high frequency wave outputted from a magnetron (high frequency oscillator) 1 is guided into a heating chamber 3 via a waveguide 2,
A high frequency reception port 5 is formed in the center of the ceiling plate 4 of the heating chamber 3, and the electric field at the center of the heating chamber 3 is reduced by radiating high frequency waves guided through the waveguide 2 from the high frequency reception port 5 into the heating chamber 3. I was trying to make it stronger.
However, in the case of the above conventional configuration,
Directivity of radio waves occurs depending on the size of the high frequency reception port 5, and unnecessary radiation of high frequencies often increases.
There was a problem in that the electric field at the center of the heating chamber 3 could not be made sufficiently strong. Therefore, it is not possible to adjust the distribution of the high frequency waves radiated into the heating chamber 3 to a good condition, which tends to cause uneven heating of the food placed in the heating chamber 3, resulting in poor quality of the finished food. It was difficult to stabilize the cooking time, and the cooking time could not be shortened. This invention was made based on the above circumstances, and its purpose is to make the electric field in the center of the heating chamber sufficiently strong by reducing unnecessary high-frequency radiation, thereby stabilizing the finished state of food. At the same time, it is possible to shorten cooking time and improve cooking performance.In addition, it is possible to reliably support the opening cover that closes the high-frequency reception port, and it is possible to set the impedance of the heating chamber in a position where there is less unnecessary radiation. The object of the present invention is to provide a high-frequency heating device that can be moved. The present invention will be explained below based on each embodiment. 2 to 10 show a first embodiment of the present invention. In FIG. 2, 11 is, for example, the main body of a microwave oven. A heating chamber 12 is formed within the main body 11, and a magnetron (high frequency oscillator) 13 is housed therein. A turntable 14 is provided at the bottom of the heating chamber 12, and this turntable 14 is driven by a drive motor 1 attached to the lower surface of the bottom plate 15 of the heating chamber 12.
6. Furthermore, a rectangular high-frequency reception opening 18 is formed in the center of the ceiling plate 17 of the heating chamber 12 . moreover,
A waveguide 19 is attached to the upper surface of the ceiling plate 17 of the heating chamber 12. A magnetron 13 is attached to the base end of this waveguide 19. Further, the tip of the waveguide 19 is connected to the high frequency reception port 18 . On the other hand, the lower part of the high-frequency reception port 18 is closed by an aperture cover 20 made of, for example, a silicon plate, and on the lower surface of this aperture cover 20, as shown in FIG. ) 21, 21 are provided. These reflecting plates 21, 21 are each formed into a substantially L-shape by a metal plate, and are arranged facing each other so as to protrude inward from the heating chamber 12 at the high-frequency receiving port 18, and are screwed together. It is attached to the ceiling plate 17 together with the opening cover 20 by means of, for example, the opening cover 20. In this case, the reflecting plates 21, 21 are respectively arranged along the edges of a pair of opposing openings in the high-frequency reception port 18. Furthermore, as shown in FIGS. 4 and 5, projecting pieces 32 are cut and formed on the surface of the reflecting plates 21, 21 that are connected to the opening cover 20, and these projecting pieces 32... As shown in FIG. 6, it is attached so as to protrude into the high frequency reception port 18. Therefore, in the case of the above configuration, the high frequency wave output from the magnetron 13 is guided through the waveguide 19 and supplied into the heating chamber 12 from the high frequency reception port 18. In this case, most of the high-frequency waves that have passed through the high-frequency reception port 18, which were previously supplied into the heating chamber 12 as unnecessary radiation, are reflected by the pair of reflection plates 21, 21 and are directed to the center of the heating chamber 12. radiated. Therefore, unnecessary radiation supplied into the heating chamber 12 can be reduced compared to the conventional case. The applicant has proposed a configuration in which a pair of reflecting plates 21, 21 are provided on the lower surface of the opening cover 20 below the high-frequency reception port 18 (configuration of the present invention) as shown in FIG. This was confirmed in the following first and second experiments using configurations in which the reflectors 21 and 21 are not provided on the lower surface of the opening cover 20 below the opening cover 18 (conventional configuration), respectively. The first experiment was carried out in a heating chamber 12 as shown in FIG.
Five containers 22a to 22 each containing 100 c.c. of water are placed on the inner turntable (diameter L) 14.
e, the magnetron 13 is operated for 2 minutes in this state, and the temperature rise value of the water in each container 22a to 22e is measured to investigate the temperature distribution in the heating chamber 12. . Also,
In the second experiment, as shown in FIG. 9, 15 frozen Shumai 23... were placed on the turntable 14, and the magnetron 13 was operated to measure the thawing state of each frozen Shumai 23... It is. The experimental results of the first experiment are shown in Table 1, and the experimental results of the second experiment are shown in Table 2.

【表】【table】

【表】 上記第1表から明らかなように従来構成のもの
に比べて本発明の構成のものは加熱室12の中央
部位に配置された容器22c内の水の温度上昇値
が著しく高くなつており、加熱室12の中央の電
界が強くなつていることがわかる。さらに、第2
表に示すように従来構成のものに比べて本発明の
構成のものはターンテーブル14上に載置された
各シユーマイ23…間の温度差が著しく小さくな
つており、加熱室12内の食品等が均一に加熱さ
れていることがわかる。したがつて、高周波受入
口18に反射板21,21を設けることにより、
高周波受入口18から加熱室12内に供給される
高周波は不要輻射が従来よりも少なくなるので、
加熱室12の中央の電界を強くすることができ
る。そのため、加熱室12内の電界分布が良好な
状態に調整されるので、加熱室12内に載置され
ている食品等に対し加熱ムラを少なくすることが
でき、その結果、料理の仕上り状態を安定化させ
ることができるとともに、調理時間の短縮を図る
ことができる。 さらに、反射板21,21には開口カバー20
との接合面側に突出片32…が切起こし成形され
ており、これらの各突出片32…によつて開口カ
バー20を押えることができるので、開口カバー
20を確実に支持することができる。また、反射
板21,21の各突出片32…は高周波受入口1
8内に突出された状態で取付けられているので、
各突出片32…によつて不要輻射の少ない位置に
加熱室12のインピーダンスを移動することがで
きる。なお、第10図は高周波の周波数を2450M
Hz、水負荷を2000c.c.とした場合におけるリーケ特
性を示すもので、Aは従来構成、Bは突出片32
…を設けた反射板21,21を高周波受入口18
に設けた場合の実験結果(インピーダンス)を示
すものである。この第10図からも明らかなよう
に不要輻射は43〓(従来)から35〓(本発明)
となり、6〜8〓程度の減衰効果を得ることがで
きる。 さらに、加熱室12のインピーダンスは加熱室
の大きさに応じて異なるため、例えば第11図、
第12図に示すように各インピーダンスに整合し
た突出片33…または34…を反射板35,36
に設ける構成にしてもよい。 また、第13図および第14図はその発明の第
2の実施例を示すものである。これは、加熱室1
2の上部に天井板17に沿つてSCホーロー板
(天井保護板)41を設け、このSCホーロー板4
1の前記高周波受入口18と対向する部位に開口
部42を形成するとともに、この開口部42に切
り起こし成形等によつて一対の反射板(反射部)
43,43を加熱室12の内方へ向けて突設した
ものである。前記SCホーロー板41は加熱時に
加熱室12内の熱によつて油汚れ等を自動的に分
解除去するものである。なお、第13図中、4
4,45は加熱室12の上,下にそれぞれ配設さ
れているヒータである。 そこで、上記構成のものを使用して前記第1の
実験と同じ実験を行なつた。この実験結果を第3
表に示す。
[Table] As is clear from Table 1 above, the temperature rise value of the water in the container 22c located at the center of the heating chamber 12 is significantly higher in the structure of the present invention than in the conventional structure. It can be seen that the electric field at the center of the heating chamber 12 has become stronger. Furthermore, the second
As shown in the table, compared to the conventional structure, the structure of the present invention has a significantly smaller temperature difference between each of the shumai 23 placed on the turntable 14, and the temperature difference between the foods, etc. in the heating chamber 12 is significantly smaller. It can be seen that it is heated evenly. Therefore, by providing the reflection plates 21, 21 in the high frequency reception port 18,
The high frequency supplied into the heating chamber 12 from the high frequency reception port 18 has less unnecessary radiation than before.
The electric field at the center of the heating chamber 12 can be strengthened. Therefore, the electric field distribution within the heating chamber 12 is adjusted to a favorable state, so that uneven heating of food, etc. placed within the heating chamber 12 can be reduced, and as a result, the finished state of the food can be improved. Not only can it be stabilized, but also the cooking time can be shortened. Further, an aperture cover 20 is provided on the reflectors 21, 21.
The protruding pieces 32 are cut and raised on the joint surface side, and the opening cover 20 can be held down by these protruding pieces 32, so that the opening cover 20 can be supported reliably. Further, each protruding piece 32 of the reflecting plates 21, 21 is connected to the high frequency reception port 1.
Since it is installed in a protruding state within 8,
The impedance of the heating chamber 12 can be moved to a position with less unnecessary radiation by each protruding piece 32. In addition, in Figure 10, the high frequency frequency is 2450M.
Hz, water load is 2000 c.c., A is the conventional configuration, B is the protruding piece 32.
The high frequency reception port 18 is connected to the reflection plates 21, 21 provided with...
This shows the experimental results (impedance) when the As is clear from Fig. 10, the unnecessary radiation ranges from 43〓 (conventional) to 35〓 (invention).
Therefore, a damping effect of about 6 to 8 can be obtained. Furthermore, since the impedance of the heating chamber 12 differs depending on the size of the heating chamber, for example, as shown in FIG.
As shown in FIG. 12, projecting pieces 33... or 34... matched to each impedance are attached to reflectors 35, 36.
It may also be configured such that it is provided in Further, FIGS. 13 and 14 show a second embodiment of the invention. This is heating chamber 1
An SC enamel board (ceiling protection board) 41 is provided along the ceiling board 17 on the top of the SC enamel board 4.
An opening 42 is formed in a portion facing the high frequency reception port 18 of No. 1, and a pair of reflecting plates (reflecting portions) are formed in this opening 42 by cutting and forming.
43, 43 are provided to protrude inward of the heating chamber 12. The SC enamel plate 41 automatically decomposes and removes oil stains and the like using the heat in the heating chamber 12 during heating. In addition, in Figure 13, 4
4 and 45 are heaters disposed above and below the heating chamber 12, respectively. Therefore, the same experiment as the first experiment was conducted using the above configuration. The results of this experiment are shown in the third
Shown in the table.

【表】 この第3表からも明らかなように、SCホーロ
ー板41に一対の反射板43,43を突設した構
成のものであつても、加熱室12の中央部位に配
置された容器22c内の水の温度上昇値が従来の
構成のものに比べて著しく高くなつており、加熱
室12の中央の電界が強くなつていることがわか
る。したがつて、このような構成のものにあつて
も前記第1の実施例と同様の効果を得ることがで
きる。また、上記構成のものにあつてはSCホー
ロー板41に反射板43,43を設けたことによ
り、従来構成のものに比べて開口カバー20に食
品カス等が付着しにくくすることができる。その
ため、従来のように開口カバー20に付着した食
品カス等が加熱時に炭化され、高周波が照射され
た場合にスパークが発生し、開口カバー20が焼
損するおそれを少なくすることができる。なお、
反射板43,43は第15図に示すようにSCホ
ーロー板41とは別体に設けてもよいことは勿論
である。 なお、この発明は上記実施例に限定されるもの
ではなく、この発明の要旨を逸脱しない範囲で
種々変形実施できることは勿論である。 以上説明したように、この発明によれば高周波
を反射する反射部を離間対向配置された一対の反
射板によつて形成し、これらの反射板を加熱室に
形成された矩形状の高周波受入口における対向す
る一対の開口端縁部に沿つてそれぞれ配置して加
熱室の内方へ向けて突設したので、高周波受入口
から加熱室内に供給される高周波のうち、従来不
要輻射として加熱室内に供給されていたものの大
部分を反射部によつて反射させて加熱室の中央に
放射させることができ、加熱室の中央の電界を十
分強くして料理の仕上り状態を安定化させ、調理
時間の短縮および調理性能の向上を図ることがで
きる。さらに、各反射板に高周波受入口内に突出
して高周波受入口の開口カバーを支持する突出片
を形成したので、各突出片によつてこの高周波受
入口を閉塞する開口カバーを確実に支持すること
ができるとともに、各突出片によつて不要輻射の
少ない位置に加熱室のインピーダンスを移動する
ことができる。
[Table] As is clear from Table 3, even if the SC enamel plate 41 has a pair of reflective plates 43, 43 protruding from it, the container 22c placed in the center of the heating chamber 12 It can be seen that the temperature rise value of the water inside the heating chamber 12 is significantly higher than that of the conventional structure, and that the electric field at the center of the heating chamber 12 is stronger. Therefore, even with such a configuration, the same effects as in the first embodiment can be obtained. Further, in the case of the above structure, by providing the reflectors 43, 43 on the SC enamel plate 41, it is possible to make it more difficult for food particles etc. to adhere to the opening cover 20 compared to the structure of the conventional structure. Therefore, it is possible to reduce the risk that food scraps and the like adhering to the opening cover 20 are carbonized during heating and sparks are generated when high frequency waves are irradiated, causing the opening cover 20 to burn out, as in the conventional case. In addition,
Of course, the reflecting plates 43, 43 may be provided separately from the SC enamel plate 41 as shown in FIG. It should be noted that the present invention is not limited to the above-mentioned embodiments, and it goes without saying that various modifications can be made without departing from the gist of the present invention. As explained above, according to the present invention, the reflection section that reflects high frequency waves is formed by a pair of reflection plates that are spaced apart from each other, and these reflection plates are connected to the rectangular high frequency reception port formed in the heating chamber. Since these are placed along the edges of a pair of opposing openings and protrude toward the inside of the heating chamber, out of the high frequency supplied into the heating chamber from the high frequency reception port, conventionally unnecessary radiation is absorbed into the heating chamber. Most of the food that was being fed can be reflected by the reflector and radiated to the center of the heating chamber, making the electric field in the center of the heating chamber strong enough to stabilize the finished state of the food and shorten the cooking time. It is possible to shorten the cooking time and improve cooking performance. Furthermore, since each reflecting plate is provided with a protruding piece that protrudes into the high-frequency receiving port and supports the opening cover of the high-frequency receiving port, each projecting piece can reliably support the opening cover that closes the high-frequency receiving port. At the same time, the impedance of the heating chamber can be moved to a position with less unnecessary radiation by each protruding piece.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来例を示す縦断面図、第2図乃至第
10図はこの発明の第1の実施例を示すもので、
第2図は全体の概略構成を示す縦断面図、第3図
は反射板を示す斜視図、第4図は同平面図、第5
図は同側面図、第6図は反射板の取付け状態を示
す要部の縦断面図、第7図は第1,第2の実験に
使用した反射板を示す斜視図、第8図は第1の実
験におけるターンテーブル上の容器の配置状態を
示す平面図、第9図は第2の実験におけるターン
テーブル上のシユーマイの配置状態を示す平面
図、第10図はリーケ特性を示すリーケ線図、第
11図および第12図は第1の実施例のそれぞれ
別の変形例を示す平面図、第13図および第14
図は第2の実施例を示すもので、第13図は全体
の概略構成を示す縦断面図、第14図はSCホー
ロー板を示す斜視図、第15図は第2の実施例の
の変形例を示す斜視図である。 12……加熱室、13……マグネトロン(高周
波発振器)、18……高周波受入口、19……導
波管、20……開口カバー、21,43……反射
板(反射部)、32,33,34……突出片。
FIG. 1 is a vertical sectional view showing a conventional example, and FIGS. 2 to 10 show a first embodiment of the present invention.
Fig. 2 is a vertical cross-sectional view showing the overall schematic configuration, Fig. 3 is a perspective view showing the reflector, Fig. 4 is a plan view of the same, and Fig. 5
The figure is a side view, Figure 6 is a vertical cross-sectional view of the main part showing how the reflector is attached, Figure 7 is a perspective view of the reflector used in the first and second experiments, and Figure 8 is the same side view. FIG. 9 is a plan view showing the arrangement of containers on the turntable in the first experiment, FIG. 9 is a plan view showing the arrangement of shumai on the turntable in the second experiment, and FIG. 10 is a Rieke diagram showing Rieke characteristics. , FIGS. 11 and 12 are plan views showing different modifications of the first embodiment, and FIGS. 13 and 14 are respectively plan views showing different modifications of the first embodiment.
The figures show the second embodiment; FIG. 13 is a vertical cross-sectional view showing the overall schematic configuration, FIG. 14 is a perspective view showing the SC enamel plate, and FIG. 15 is a modification of the second embodiment. It is a perspective view showing an example. 12... Heating chamber, 13... Magnetron (high frequency oscillator), 18... High frequency reception port, 19... Waveguide, 20... Opening cover, 21, 43... Reflection plate (reflection part), 32, 33 , 34...Protruding piece.

Claims (1)

【特許請求の範囲】 1 加熱室に矩形状の高周波受入口が形成され、
高周波発振器から出力された高周波が導波管を通
じて導かれ、前記高周波受入口から前記加熱室内
に供給される高周波加熱装置において、高周波を
反射する反射部を離間対向配置された一対の反射
板によつて形成し、これらの反射板を前記高周波
受入口における対向する一対の開口端縁部に沿つ
てそれぞれ配置して前記加熱室の内方へ向けて突
設するとともに、前記各反射板に前記高周波受入
口内に突出して前記高周波受入口の開口カバーを
支持する突出片を形成したことを特徴とする高周
波加熱装置。 2 反射部は加熱室の天井板に沿つて前記加熱室
内に配設され、加熱時に油汚れ等を自動的に分解
除去する天井保護板に形成されたものであること
を特徴とする特許請求の範囲第1項記載の高周波
加熱装置。
[Claims] 1. A rectangular high-frequency receiving port is formed in the heating chamber,
In a high-frequency heating device in which high-frequency waves outputted from a high-frequency oscillator are guided through a waveguide and supplied into the heating chamber from the high-frequency receiving port, a reflecting portion that reflects the high-frequency waves is formed by a pair of spaced apart reflecting plates arranged opposite to each other. These reflecting plates are respectively arranged along the edges of a pair of opposing openings in the high-frequency reception port and protrude toward the inside of the heating chamber. A high-frequency heating device characterized in that a protruding piece is formed that protrudes into the reception port and supports an opening cover of the high-frequency reception port. 2. The reflective part is disposed in the heating chamber along the ceiling plate of the heating chamber, and is formed on a ceiling protection plate that automatically decomposes and removes oil stains and the like during heating. The high frequency heating device according to scope 1.
JP6853981A 1981-05-07 1981-05-07 High frequency heater Granted JPS57182994A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6853981A JPS57182994A (en) 1981-05-07 1981-05-07 High frequency heater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6853981A JPS57182994A (en) 1981-05-07 1981-05-07 High frequency heater

Publications (2)

Publication Number Publication Date
JPS57182994A JPS57182994A (en) 1982-11-11
JPS6127878B2 true JPS6127878B2 (en) 1986-06-27

Family

ID=13376642

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6853981A Granted JPS57182994A (en) 1981-05-07 1981-05-07 High frequency heater

Country Status (1)

Country Link
JP (1) JPS57182994A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01225129A (en) * 1988-03-03 1989-09-08 Nec Corp Vessel for semiconductor wafer

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50135643A (en) * 1974-04-17 1975-10-28
JPS5313826A (en) * 1976-07-26 1978-02-07 Hitachi Ltd Horizontal adjuster for color television picture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50135643A (en) * 1974-04-17 1975-10-28
JPS5313826A (en) * 1976-07-26 1978-02-07 Hitachi Ltd Horizontal adjuster for color television picture

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01225129A (en) * 1988-03-03 1989-09-08 Nec Corp Vessel for semiconductor wafer

Also Published As

Publication number Publication date
JPS57182994A (en) 1982-11-11

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