JPS5973342U - プラズマ処理を施す装置 - Google Patents
プラズマ処理を施す装置Info
- Publication number
- JPS5973342U JPS5973342U JP16798082U JP16798082U JPS5973342U JP S5973342 U JPS5973342 U JP S5973342U JP 16798082 U JP16798082 U JP 16798082U JP 16798082 U JP16798082 U JP 16798082U JP S5973342 U JPS5973342 U JP S5973342U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- glass tube
- reaction chamber
- ports
- axial direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Coating Apparatus (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16798082U JPS5973342U (ja) | 1982-11-08 | 1982-11-08 | プラズマ処理を施す装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16798082U JPS5973342U (ja) | 1982-11-08 | 1982-11-08 | プラズマ処理を施す装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5973342U true JPS5973342U (ja) | 1984-05-18 |
JPS6217455Y2 JPS6217455Y2 (enrdf_load_html_response) | 1987-05-06 |
Family
ID=30367360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16798082U Granted JPS5973342U (ja) | 1982-11-08 | 1982-11-08 | プラズマ処理を施す装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5973342U (enrdf_load_html_response) |
-
1982
- 1982-11-08 JP JP16798082U patent/JPS5973342U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6217455Y2 (enrdf_load_html_response) | 1987-05-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2002280378A5 (enrdf_load_html_response) | ||
TW423042B (en) | Apparatus for manufacturing semiconductor | |
EP0366876A1 (en) | Exhaust gas treating apparatus | |
JP4495263B2 (ja) | プラズマガス処理 | |
JPS5973342U (ja) | プラズマ処理を施す装置 | |
KR100599461B1 (ko) | 대기압 플라즈마 발생장치 및 이를 이용한 플라즈마프로세스 시스템 | |
JPS62112791A (ja) | サ−キツトボ−ド等をエツチングするためのプラズマ反応器 | |
BR112021002331A2 (pt) | gerador de plasma de admissão para sistemas e métodos | |
JPH07283203A (ja) | 表面処理装置 | |
SU1620118A1 (ru) | Адсорбер | |
JPH02227117A (ja) | 排ガス処理装置 | |
JPH02141576A (ja) | プラズマプロセス装置 | |
JPS5816195A (ja) | 分岐配管における管内付着物の除去方法 | |
CN101242706A (zh) | 介质阻挡分区放电通道系统 | |
JPH0425222Y2 (enrdf_load_html_response) | ||
CN214437817U (zh) | 一种电子发生器 | |
JPS634997Y2 (enrdf_load_html_response) | ||
JPS6224941U (enrdf_load_html_response) | ||
JPH0238468U (enrdf_load_html_response) | ||
JPH03211823A (ja) | 半導体製造装置 | |
JPS62126362U (enrdf_load_html_response) | ||
JPS62129061U (enrdf_load_html_response) | ||
SU1084567A1 (ru) | Устройство дл СВЧ сушки сыпучих материалов | |
CN108905489A (zh) | 一种微波裂解有害气体的装置 | |
JPS62210051A (ja) | プラズマ処理装置 |