JPS5973342U - プラズマ処理を施す装置 - Google Patents

プラズマ処理を施す装置

Info

Publication number
JPS5973342U
JPS5973342U JP16798082U JP16798082U JPS5973342U JP S5973342 U JPS5973342 U JP S5973342U JP 16798082 U JP16798082 U JP 16798082U JP 16798082 U JP16798082 U JP 16798082U JP S5973342 U JPS5973342 U JP S5973342U
Authority
JP
Japan
Prior art keywords
plasma
glass tube
reaction chamber
ports
axial direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16798082U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6217455Y2 (cg-RX-API-DMAC7.html
Inventor
賢治 福田
金子　隆興
芳信 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Original Assignee
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyota Motor Corp filed Critical Toyota Motor Corp
Priority to JP16798082U priority Critical patent/JPS5973342U/ja
Publication of JPS5973342U publication Critical patent/JPS5973342U/ja
Application granted granted Critical
Publication of JPS6217455Y2 publication Critical patent/JPS6217455Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP16798082U 1982-11-08 1982-11-08 プラズマ処理を施す装置 Granted JPS5973342U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16798082U JPS5973342U (ja) 1982-11-08 1982-11-08 プラズマ処理を施す装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16798082U JPS5973342U (ja) 1982-11-08 1982-11-08 プラズマ処理を施す装置

Publications (2)

Publication Number Publication Date
JPS5973342U true JPS5973342U (ja) 1984-05-18
JPS6217455Y2 JPS6217455Y2 (cg-RX-API-DMAC7.html) 1987-05-06

Family

ID=30367360

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16798082U Granted JPS5973342U (ja) 1982-11-08 1982-11-08 プラズマ処理を施す装置

Country Status (1)

Country Link
JP (1) JPS5973342U (cg-RX-API-DMAC7.html)

Also Published As

Publication number Publication date
JPS6217455Y2 (cg-RX-API-DMAC7.html) 1987-05-06

Similar Documents

Publication Publication Date Title
EP0366876A1 (en) Exhaust gas treating apparatus
JP4495263B2 (ja) プラズマガス処理
CN109499284A (zh) 一种基于双面微孔道介质阻挡放电的废物处理装置
US5292396A (en) Plasma processing chamber
JPS5973342U (ja) プラズマ処理を施す装置
KR100599461B1 (ko) 대기압 플라즈마 발생장치 및 이를 이용한 플라즈마프로세스 시스템
BR112021002331A2 (pt) gerador de plasma de admissão para sistemas e métodos
CN112791558B (zh) 旋转式气体吸附装置及其工作方法
JPH07283203A (ja) 表面処理装置
JPH0364026A (ja) 堆積物除去装置
JPH02227117A (ja) 排ガス処理装置
JPS5816195A (ja) 分岐配管における管内付着物の除去方法
CN101242706A (zh) 介质阻挡分区放电通道系统
KR880014844A (ko) 플라즈마 처리장치
JPH0425222Y2 (cg-RX-API-DMAC7.html)
JPS62290054A (ja) マイクロ波によるガスのイオン化方法およびイオン源装置
JPH069490Y2 (ja) 半導体ウエハのプラズマアツシング装置
JPH01165120A (ja) エツチング装置
JPS634997Y2 (cg-RX-API-DMAC7.html)
JPS62126362U (cg-RX-API-DMAC7.html)
JPS62129061U (cg-RX-API-DMAC7.html)
SU1084567A1 (ru) Устройство дл СВЧ сушки сыпучих материалов
JPS62210051A (ja) プラズマ処理装置
CN108905489A (zh) 一种微波裂解有害气体的装置
JPS61281881A (ja) ドライエツチング装置