JPS597233A - Pressure sensor of semiconductor - Google Patents
Pressure sensor of semiconductorInfo
- Publication number
- JPS597233A JPS597233A JP11612382A JP11612382A JPS597233A JP S597233 A JPS597233 A JP S597233A JP 11612382 A JP11612382 A JP 11612382A JP 11612382 A JP11612382 A JP 11612382A JP S597233 A JPS597233 A JP S597233A
- Authority
- JP
- Japan
- Prior art keywords
- lead
- pedestal
- stem pedestal
- pressure sensor
- stem
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
- G01L19/0061—Electrical connection means
- G01L19/0084—Electrical connection means to the outside of the housing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
- G01L19/0007—Fluidic connecting means
- G01L19/0038—Fluidic connecting means being part of the housing
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
この発明は半導体圧力センサにかかり、特に電る半導体
圧力センサにおける外囲器のリード改良に関する。DETAILED DESCRIPTION OF THE INVENTION TECHNICAL FIELD OF THE INVENTION The present invention relates to semiconductor pressure sensors, and more particularly to an improvement in the lead of an envelope in an electric semiconductor pressure sensor.
半導体圧力センサの従来の構造の1例を第1図に示す。 An example of a conventional structure of a semiconductor pressure sensor is shown in FIG.
図において、(11はシリコン単結晶の起歪体部で、N
型のシリコン単結晶の1主面の周縁部(1a)を残し凹
に形成されてなる(ioo)面の受圧タ゛イヤフラム部
(1bX以降ダイヤフラム部と略称する)(!:、この
ダイヤフラム部にボロンを部分的に拡散して形成された
P型拡散層の歪ゲージ部(2)。In the figure, (11 is a silicon single crystal strain body part, N
A pressure-receiving diaphragm part (hereinafter referred to as the diaphragm part from 1bX) on the (ioo) surface formed in a concave manner, leaving the peripheral edge (1a) of one principal surface of the silicon single crystal of the mold (!: Boron is applied to this diaphragm part. Strain gauge part (2) of a P-type diffusion layer formed by partial diffusion.
(2)・・・を備えてなる。上記起歪休部(1,1はそ
のダイヤフラム部(1b)が非接触なるように周縁部で
シリコンと類似の熱膨張係数を有するステムの台座部(
3)に例えばシリコンゴム層(4)で密封されている。(2) It is equipped with... The pedestal part of the stem (1, 1 has a coefficient of thermal expansion similar to that of silicon) at the peripheral edge so that the diaphragm part (1b) is not in contact with the rest part (1, 1).
3) is sealed with, for example, a silicone rubber layer (4).
上記構成により、ダイヤフラム部の凹部と台座部によっ
て空間(5)が限定され、この空間は台座部に穿設され
た透孔(3a)によって所定の圧力、例えば大気圧に保
たれる。一方ダイヤフラムの反対(外向)主面側は台座
部に密封されたキャップ(6)の圧力導入パイプ(6a
)によってキャップ内を印加される圧力にするようにな
っている。この印加圧によってダイヤフラムの両面に差
圧を生じ、歪となる。ここでピエゾ抵抗効果により拡散
抵抗に増減を生じ、その値を台座部を貫通しかつ、台座
部にバーメチ゛ツクシールされたリード+71 、 (
71・・(以降リードの1本につき示す)によって導出
測定される。なお、リードは硬質ガラス(3b)によっ
てハーメチックシールされている。With the above configuration, a space (5) is defined by the concave portion of the diaphragm portion and the pedestal portion, and this space is maintained at a predetermined pressure, for example, atmospheric pressure, by the through hole (3a) formed in the pedestal portion. On the other hand, on the opposite (outward) main surface side of the diaphragm is the pressure introduction pipe (6a) of the cap (6) sealed in the pedestal.
) to apply pressure inside the cap. This applied pressure creates a pressure difference on both sides of the diaphragm, resulting in distortion. Here, the piezoresistance effect causes an increase or decrease in the diffusion resistance, and the value is changed to the lead +71, which passes through the pedestal and is barmetically sealed to the pedestal.
71... (hereinafter shown for each lead) is derived and measured. Note that the leads are hermetically sealed with hard glass (3b).
半導体圧力センサは使用にあたってそのリードを他の周
辺回路にはんだ接合したり、ソケットに挿入したりする
。ところが従来の構造では上記の如く、リードに力が加
わり、あるいは変形させた力がセンサの素子に印加され
てオフ・セット市川(通称ゼロ点と称される)が不安定
になってしまうことが多いという重大な欠点がある。When a semiconductor pressure sensor is used, its leads are soldered to other peripheral circuitry or inserted into a socket. However, with the conventional structure, as mentioned above, force is applied to the lead or deformation force is applied to the sensor element, making the offset point (commonly known as the zero point) unstable. There is a serious drawback that there are many.
〔発明の目的〕
この発明は上記従来の半導体圧力センサにおける構造の
問題点を解決するためになされたもので、リードに加え
られる外部応力によるゼロ点の変化を低減させる。[Object of the Invention] The present invention was made in order to solve the problems of the structure of the conventional semiconductor pressure sensor described above, and reduces the change in the zero point due to external stress applied to the lead.
この発明にかかる半導体圧力センサは単結晶シリコン板
の1主面をその周縁を除き凹に形成するとともに他の主
面に歪ゲージ部を有するダイヤフラム部と、シリコンと
膨張係数の近似した部材でなりダイヤフラム部をその1
主面の周縁で封着させたステム台座部と、ステム台座部
の周縁に封着してステム台座部とともに外囲器を構成す
るキャップと、キャップに設けられた圧力導入用パイプ
と、ステム台座部に貫設されハーメチックシールさイ1
.て歪ゲージ部を導出するリードとを具備したセンサに
おいて、外囲器の外側のリードの少くとも一部にステム
台座部におけるシール部分よりも径小または軟質の部分
を具備したことを特徴とする。The semiconductor pressure sensor according to the present invention includes a diaphragm portion in which one principal surface of a single crystal silicon plate is formed concave except for its periphery, and has a strain gauge portion on the other principal surface, and a member having an expansion coefficient similar to that of silicon. Diaphragm part 1
A stem pedestal sealed at the periphery of the main surface, a cap sealed to the periphery of the stem pedestal and forming an envelope together with the stem pedestal, a pressure introduction pipe provided in the cap, and a stem pedestal. A hermetic seal is installed through the part.
.. The sensor is characterized in that at least a part of the outer lead of the envelope has a smaller diameter or softer part than the seal part in the stem pedestal part. .
次に発明を1実施例につき従来との相違点につき図面を
参照して詳細に説明する。Next, the invention will be explained in detail with reference to the drawings regarding the differences from the conventional one for each embodiment.
第2図に示す圧力センサはリードの形状に改良を施した
もので、ステム台座(31,IJ−ド旧1は例えばコバ
ール(Fe :54tI)、Ni :29%、Co:1
7’l)でなり、ハーメチックシール部(3b)は硬質
ガラスである。そして、ハーメチックシール部リード(
lla)の径が0.75 arm、外囲器の外部リード
(ttb)の径が0.45 mmに形成されており、従
来の0.75市径のものに比してゼロ点変化の割合力月
/3以下に低減した。The pressure sensor shown in Fig. 2 has an improved lead shape, and the stem pedestal (31, IJ-do old 1 is made of, for example, Kovar (Fe: 54tI), Ni: 29%, Co: 1
7'l), and the hermetic seal portion (3b) is made of hard glass. Then, the hermetic seal lead (
The diameter of the outer lead (ttb) of the envelope is 0.45 mm, and the zero point change rate is lower than that of the conventional 0.75 arm diameter. Reduced to 3/3 or less.
次に第3図に示すリード(121はハーメチックシール
部リード(12a)は径、材質とも斜上と変わらないが
、外囲器の外部リード(12b)は径0.45 amの
銅線を銀ろう(12c)で接合している。口の方式によ
ればリードの製造工程が若干延長されるも、ゼロ点変化
の割合の低減に斜上の実施例よりも若干効果が大きい。Next, the leads shown in Fig. 3 (121 are the hermetic seal part leads (12a) are the same as those on the diagonal in terms of diameter and material, but the outer leads (12b) of the envelope are made of silver wire with a diameter of 0.45 am. They are joined with solder (12c).Although the lead manufacturing process is slightly longer with the opening method, it is slightly more effective in reducing the rate of zero point change than the diagonal embodiment.
次の第4図に示す圧力センサはステム台座03)につい
てリード(illをハーメチックシールするハーメチッ
クシール部(13b)が一体に形成された構造である。The pressure sensor shown in FIG. 4 has a structure in which a hermetic seal portion (13b) for hermetically sealing the lead (ill) is integrally formed with the stem pedestal (03).
そしてここにシールされるリード県;は@配薬2図にお
いて示されたリードと同じ形状のものである。また、上
記構造のステム台座に第3図にて示した外部リード部が
銅線でなるものを用いても同様に奏効する。The lead sealed here has the same shape as the lead shown in Figure 2. Further, the same effect can be achieved even if the stem pedestal having the above structure has an external lead portion made of copper wire as shown in FIG.
さらに、第5図に示すリードQ41はそのハーメチック
シール部(14a)とこのリードを歪測定回路に接続す
る予定域(先端部) (14b)とを同じ径0.75闘
とし、その間に径小部(14c) 0.45mm径を設
けている。このリードは第4図によって示されたステム
台座03)に適用できることはいうまでもない。さらに
このリードは回路への接続部分が従来のIJ−ドと全く
変わらないので、自動組立装置による場合に有利である
。Furthermore, the lead Q41 shown in FIG. Part (14c) has a diameter of 0.45 mm. It goes without saying that this lead can be applied to the stem pedestal 03) shown in FIG. Furthermore, since the connection part of this lead to the circuit is completely the same as that of a conventional IJ-dead, it is advantageous when used by automatic assembly equipment.
なお、このリードはステムの型式に関係なく自在に適用
できる。Note that this lead can be freely applied regardless of the type of stem.
この発明によれば高感度な半導体圧力センサの電気的特
性がこれを回路の配線やソケットに取着することによっ
てリードに発生する応力が歪ゲージの七口点を変化させ
るような悪影響を与えることが極減できるようになった
。すなわち、一般に取着によって生ずる千口点の変化が
500μ■のとき、この発明によれば200μV以下に
低減できた。斜上はリードを従来通り配設しリードに応
力を生じてモ、リードの径小部やリードの軟質部によっ
てほとんど吸収低減されるためである。これにより、圧
力センサの特性チェックや、梱包時にリードに変型を生
じ、後に斜上の取着によって応力を生ずる問題が解決で
き、特性の向上、歩留の向上が達成できるなどの顕著な
利点がある。According to the present invention, the electrical characteristics of a highly sensitive semiconductor pressure sensor prevents the stress generated in the leads when it is attached to circuit wiring or a socket to have an adverse effect such as changing the seventh point of the strain gauge. can now be reduced to a minimum. That is, when the change in the thousand-point point caused by attachment is generally 500 .mu.V, according to the present invention, it can be reduced to 200 .mu.V or less. This is due to the fact that when the leads are arranged in the conventional manner, stress is generated in the leads, and most of the stress is absorbed and reduced by the small-diameter portions of the leads and the soft portions of the leads. This makes it possible to check the characteristics of pressure sensors, solve the problem of deformation of the leads during packaging, and solve the problem of stress caused by later installation at an angle, and has significant advantages such as improved characteristics and yield. be.
第1図は従来の半導体圧力センサの断面図、第2図ない
しm5図はいずれも夫々がこの発明の実施例を示す断面
図である。
1 シリコン単結晶の起歪体部Ih
受圧ダイヤフラム部
2.2・・・ 歪ゲージ部(P型拡散層)3.13
台座部
3 h 、 1.3 b ステム台座部のハーメ
チックシール部11、 、 12 、 ] 4
リ − ド11a、12a、
14a ハーメチックリード部11b、12b
外部リード14b リー
ドの外部回路接続予定域
代理人 弁理士 井 上 −男
第 1 図
第 2 図
第 3 図
第 4 図FIG. 1 is a sectional view of a conventional semiconductor pressure sensor, and FIGS. 2 to 5 are sectional views each showing an embodiment of the present invention. 1 Silicon single crystal strain body part Ih
Pressure receiving diaphragm part 2.2... Strain gauge part (P-type diffusion layer) 3.13
Pedestal portion 3 h, 1.3 b Hermetic seal portion of stem pedestal portion 11, , 12, ] 4
Leads 11a, 12a,
14a Hermetic lead portions 11b, 12b
External lead 14b Lead external circuit connection area Representative Patent attorney Mr. Inoue Figure 1 Figure 2 Figure 3 Figure 4
Claims (1)
るとともに他の主面に歪ゲージ部を有する受圧ダイヤフ
ラム部と、シリコンと膨張係数の近似した部材でなり受
圧ダイヤフラム部を前記凹形成側主面の前記周縁で封着
させたステム台座部と、ステム台座部の周縁に封着して
ステム台座部とともに外囲器を構成するキャップき、キ
ャップに設けられた圧力導入用パイプと、ステム台座部
に貫設されハーメチックシールされて歪ゲージ部を導出
するリードとを具備した半導体圧力センサにおいて、外
囲器の外側のリードの少くとも一部にステム台座部にお
けるハーメチックシール部分よりも径小または軟質の部
分を具備したことを特徴とする半導体圧力センサ。a pressure receiving diaphragm portion formed into a concave shape on one principal surface of the single crystal silicon plate except for its periphery and having a strain gauge portion on the other principal surface; a stem pedestal sealed at the periphery of the side main surface, a cap sealed to the periphery of the stem pedestal and forming an envelope together with the stem pedestal, and a pressure introduction pipe provided on the cap; In a semiconductor pressure sensor equipped with a lead extending through a stem pedestal part and hermetically sealed to lead out a strain gauge part, at least a part of the lead outside the envelope has a diameter larger than that of the hermetic seal part in the stem pedestal part. A semiconductor pressure sensor characterized by having a small or soft part.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11612382A JPS597233A (en) | 1982-07-06 | 1982-07-06 | Pressure sensor of semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11612382A JPS597233A (en) | 1982-07-06 | 1982-07-06 | Pressure sensor of semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS597233A true JPS597233A (en) | 1984-01-14 |
Family
ID=14679261
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11612382A Pending JPS597233A (en) | 1982-07-06 | 1982-07-06 | Pressure sensor of semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS597233A (en) |
-
1982
- 1982-07-06 JP JP11612382A patent/JPS597233A/en active Pending
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