JPH0526983Y2 - - Google Patents
Info
- Publication number
- JPH0526983Y2 JPH0526983Y2 JP1986153560U JP15356086U JPH0526983Y2 JP H0526983 Y2 JPH0526983 Y2 JP H0526983Y2 JP 1986153560 U JP1986153560 U JP 1986153560U JP 15356086 U JP15356086 U JP 15356086U JP H0526983 Y2 JPH0526983 Y2 JP H0526983Y2
- Authority
- JP
- Japan
- Prior art keywords
- sensor chip
- pressure
- semiconductor
- sensor
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 41
- 239000000758 substrate Substances 0.000 claims description 27
- 230000005540 biological transmission Effects 0.000 claims description 4
- 238000005259 measurement Methods 0.000 description 12
- 238000010586 diagram Methods 0.000 description 9
- 230000008646 thermal stress Effects 0.000 description 9
- 239000000463 material Substances 0.000 description 5
- 238000009413 insulation Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000002210 silicon-based material Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 239000006023 eutectic alloy Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Landscapes
- Measuring Fluid Pressure (AREA)
Description
【考案の詳細な説明】
(産業上の利用分野)
本考案は半導体圧力センサに関するものであ
る。[Detailed Description of the Invention] (Field of Industrial Application) The present invention relates to a semiconductor pressure sensor.
更に詳述すれば、本考案は、半導体圧力センサ
の温度特性、リニアリテイの改良に関するもので
ある。 More specifically, the present invention relates to improving the temperature characteristics and linearity of a semiconductor pressure sensor.
(従来の技術)
第6図は従来より一般に使用されている従来例
の構成説明図である。(Prior Art) FIG. 6 is a diagram illustrating the configuration of a conventional example that has been commonly used.
図において、1はダイヤフラム部11と導圧室
12とを有する半導体よりなる、この場合はシリ
コン材よりなるセンサチツプである。2はダイア
フラム部11に設けられたピエゾ抵抗ゲージであ
る。3は導圧室12に連通する導圧孔31を有す
る半導体基板で、センサチツプ1に低融点ガラス
4を介して接続されている。5は導圧孔21に接
着剤6により一端が接続された金属性の導圧パイ
プで、この場合は基準圧Psが導入される。 In the figure, reference numeral 1 denotes a sensor chip made of a semiconductor material, in this case made of silicon material, and having a diaphragm portion 11 and a pressure chamber 12. 2 is a piezoresistance gauge provided on the diaphragm portion 11. Reference numeral 3 denotes a semiconductor substrate having a pressure guiding hole 31 communicating with the pressure chamber 12, and is connected to the sensor chip 1 via a low melting point glass 4. Reference numeral 5 denotes a metal pressure guiding pipe whose one end is connected to the pressure guiding hole 21 with an adhesive 6, and in this case, a reference pressure Ps is introduced.
以上の構成において、導圧室12には基準圧
Psが導入され、ダイアフラム部11の外表面に
は測定圧Pmが加えられ、測定圧Pmに対応した
抵抗変化がピエゾ抵抗ゲージ2より得られること
により、測定圧Pmを測定することができる。 In the above configuration, the pressure impulse chamber 12 has a reference pressure
Ps is introduced, a measurement pressure Pm is applied to the outer surface of the diaphragm portion 11, and a resistance change corresponding to the measurement pressure Pm is obtained from the piezoresistance gauge 2, so that the measurement pressure Pm can be measured.
(考案が解決しようとする問題点)
しかしながら、このようなものにおいては、
半導体基板3と金属性の導圧パイプ5の熱膨
張係数が異なるために、温度変化によつて熱応
力を生じる。熱応力は、半導体基板3に外乱と
なる力を加えるので、半導体圧力センサに温度
による外乱を与え、温度特性を悪くする。(Problems to be Solved by the Invention) However, in such a device, since the semiconductor substrate 3 and the metal pressure guiding pipe 5 have different coefficients of thermal expansion, thermal stress is generated due to temperature changes. Thermal stress applies a force that causes disturbance to the semiconductor substrate 3, so it gives a disturbance due to temperature to the semiconductor pressure sensor and deteriorates the temperature characteristics.
半導体基板3と金属からなる導圧パイプ5の
剛性率は異なる。したがつて、半導体圧力セン
サの外側から圧力が加わつて変形する場合に、
半導体基板3と導圧パイプ5の変形の仕方が異
なるので(金属に比して、半導体の方が剛性が
低く、柔かい)、半導体基板3が導圧パイプ5
との接合面から応力を受け、外乱になり、線形
性を悪くする。 The rigidity of the semiconductor substrate 3 and the pressure guiding pipe 5 made of metal are different. Therefore, when pressure is applied from outside the semiconductor pressure sensor and it deforms,
Since the semiconductor substrate 3 and the pressure guiding pipe 5 deform in different ways (semiconductors have lower rigidity and are softer than metals), the semiconductor substrate 3 is different from the pressure guiding pipe 5.
Stress is received from the bonding surface, which causes disturbance and worsens linearity.
本考案は、この問題点を解決するものである。 The present invention solves this problem.
本考案の目的は、簡単な構成により、安価で、
温度特性、直線性の良好な半導体圧力センサを提
供するにある。 The purpose of this invention is to have a simple configuration, low cost,
The object of the present invention is to provide a semiconductor pressure sensor with good temperature characteristics and linearity.
(問題点を解決するための手段)
この目的を達成するために、本考案は、半導体
からなるセンサチツプと、該センサチツプに設け
られダイアフラムを形成する凹部と、前記ダイア
フラムに設けられたピエゾ抵抗ゲージと、前記セ
ンサチツプに取り付けられ前記凹部と導圧室を構
成する基板とを具備する半導体圧力センサにおい
て、
前記基板の前記センサチツプの取り付け面側と
センサチツプの取り付け面側の反対面側とから設
けられ前記センサチツプを中心に該センサチツプ
の取り付け面より外側に同心閉曲線状に設けられ
力の伝達を防止する絶縁溝を具備したことを特徴
とする半導体圧力センサを構成したものである。(Means for solving the problem) In order to achieve this object, the present invention includes a sensor chip made of a semiconductor, a recess provided in the sensor chip forming a diaphragm, and a piezoresistance gauge provided in the diaphragm. , a semiconductor pressure sensor comprising a substrate attached to the sensor chip and constituting the recess and a pressure chamber, wherein the sensor chip is provided from a side of the substrate on which the sensor chip is attached and a side opposite to the side where the sensor chip is attached. This semiconductor pressure sensor is characterized by having an insulating groove formed in a concentric closed curve on the outside of the mounting surface of the sensor chip to prevent force transmission.
(作用)
以上の構成において、ダイアフラムの一方側に
基準圧が加えられ、他方側に測定圧が加えられる
と、測定圧に対応した抵抗変化がピエゾ抵抗ゲー
ジより得られることにより、測定圧を測定するこ
とができる。(Function) In the above configuration, when the reference pressure is applied to one side of the diaphragm and the measurement pressure is applied to the other side, the measurement pressure is measured by obtaining a resistance change corresponding to the measurement pressure from the piezoresistive gauge. can do.
而して、外部からの熱応力や変形に基づく応力
は絶縁溝により遮断されて、センサチツプには伝
達されない。 Therefore, external thermal stress and stress due to deformation are blocked by the insulating groove and are not transmitted to the sensor chip.
以下、実施例に基づき詳細に説明する。 Hereinafter, a detailed explanation will be given based on examples.
(実施例)
第1図は、本考案の一実施例の構成説明図であ
る。(Embodiment) FIG. 1 is an explanatory diagram of the configuration of an embodiment of the present invention.
図において、第6図と同一記号は同一機能を示
す。 In the figure, the same symbols as in FIG. 6 indicate the same functions.
以下、第6図と相違部分のみ説明する。 Hereinafter, only the differences from FIG. 6 will be explained.
7はセンサチツプ1に取付けられたシリコン材
よりなる半導体基板である。71は、第2図に示
す如く、基板7に設けられ、センサチツプ1を中
心に同心円状に設けられ力の伝達を防止する絶縁
溝である。絶縁溝7は半導体基板7にエツチング
等により形成される。半導体基板7の絶縁溝7の
形成部分の板厚は、ダイアフラム部11の板厚よ
り厚くし、ダイアフラム部11の感度を下げない
ようにする。8は半導体基板7の外縁部に固定さ
れたセラミツク等よりなる筐体部である。 Reference numeral 7 denotes a semiconductor substrate made of silicon material attached to the sensor chip 1. As shown in FIG. 2, 71 is an insulating groove provided on the substrate 7 and arranged concentrically around the sensor chip 1 to prevent the transmission of force. The insulating groove 7 is formed in the semiconductor substrate 7 by etching or the like. The thickness of the portion of the semiconductor substrate 7 where the insulating groove 7 is formed is made thicker than the thickness of the diaphragm portion 11 so as not to reduce the sensitivity of the diaphragm portion 11. Reference numeral 8 denotes a housing made of ceramic or the like fixed to the outer edge of the semiconductor substrate 7.
以上の構成におい、導圧室12には基準圧Ps
が導入され、ダイアフラム部11の外表面には測
定圧Pmが加えられ、測定圧Pmに対応した抵抗
変化がピエゾ抵抗ゲージ2より得られることによ
り、測定圧Pmを測定することができる。 In the above configuration, the pressure chamber 12 has a reference pressure Ps
is introduced, a measurement pressure Pm is applied to the outer surface of the diaphragm portion 11, and a resistance change corresponding to the measurement pressure Pm is obtained from the piezoresistance gauge 2, so that the measurement pressure Pm can be measured.
而して、周囲温度変化等の温度変化が生じた場
合には、センサチツプ1と半導体基板7はシリコ
ン材よりなるので、熱膨張係数は同じである。し
たがつて、センサチツプ1と半導体基板7は温度
変化による熱応力を受けない。また、半導体基板
7と筐体部8とはできるかぎり熱膨張係数が近い
ものが望ましいが、絶縁性やコスト等の点で熱膨
張係数の異なる材質、たとえば、セラミツク等を
使用せざるを得ない。この場合、半導体基板7と
筐体部8との間には、熱膨張係数差に起因する熱
応力が生ずることになる。この熱応力は絶縁溝7
1により緩和される。したがつて、センサチツプ
1には、この熱応力は伝達されない。 Therefore, when a temperature change such as a change in ambient temperature occurs, the sensor chip 1 and the semiconductor substrate 7 have the same coefficient of thermal expansion since they are made of silicon material. Therefore, the sensor chip 1 and the semiconductor substrate 7 are not subjected to thermal stress due to temperature changes. Further, it is desirable that the semiconductor substrate 7 and the housing part 8 have as close a coefficient of thermal expansion as possible, but due to insulation, cost, etc., it is necessary to use materials with different coefficients of thermal expansion, such as ceramics. . In this case, thermal stress is generated between the semiconductor substrate 7 and the housing portion 8 due to the difference in coefficient of thermal expansion. This thermal stress
1. Therefore, this thermal stress is not transmitted to the sensor chip 1.
次に、筐体部8には、測定圧Pmによる曲げが
生じるが、第3図に示す如く、半導体基板7の絶
縁溝71により緩和され、センサチツプ1には、
この変形は伝わらない。一方、センサチツプ1と
半導体基板2は同じ材質であるので剛性率は等し
く、変形のし仕は同じである。 Next, the housing portion 8 is bent due to the measurement pressure Pm, but as shown in FIG.
This transformation is not transmitted. On the other hand, since the sensor chip 1 and the semiconductor substrate 2 are made of the same material, they have the same rigidity and the same deformation behavior.
この結果、周囲温度等の変化によつて生ずる熱
応力あるいは測定圧力による変形が絶縁溝71に
より緩和されるので、温度特性の良い、直線性の
良い半導体圧力センサが実現できる。また、基本
的には絶縁溝71を設けるのみでよいので、構造
が簡単で、信頼性の高い半導体圧力センサが得ら
れる。 As a result, thermal stress caused by changes in ambient temperature or the like or deformation due to measurement pressure is alleviated by the insulating groove 71, so that a semiconductor pressure sensor with good temperature characteristics and good linearity can be realized. Moreover, since basically only the insulating groove 71 needs to be provided, a semiconductor pressure sensor with a simple structure and high reliability can be obtained.
第4図は、本考案の他の実施例の要部構成説明
図である。 FIG. 4 is an explanatory diagram of the main part configuration of another embodiment of the present invention.
本実施例においては半導体基板7の両面に複数
個の絶縁溝71を設けたものである。 In this embodiment, a plurality of insulating grooves 71 are provided on both sides of the semiconductor substrate 7.
第5図は、本考案の別の実施例の要部構成説明
図である。 FIG. 5 is an explanatory diagram of the main part configuration of another embodiment of the present invention.
本実施例においては、半導体基板7の片面に複
数個の絶縁溝71を設けたものである。 In this embodiment, a plurality of insulating grooves 71 are provided on one side of the semiconductor substrate 7.
なお、前述の実施例においては、半導体基板7
と筐体部8は接着剤により接着されていると説明
したが、これに限ることはなく、たとえば、共晶
合金、ガラス等でもよいことは勿論である。 Note that in the above embodiment, the semiconductor substrate 7
Although it has been described that the housing portion 8 is bonded with an adhesive, the present invention is not limited to this, and of course, for example, a eutectic alloy, glass, etc. may be used.
また、半導体基板7の材質はセンサチツプ1と
同じものである必要はなく、熱膨張係数、剛性率
がセンサチツプ1に近いものであればよい。 Further, the material of the semiconductor substrate 7 does not need to be the same as that of the sensor chip 1, and it is sufficient if the material has a coefficient of thermal expansion and a modulus of rigidity close to that of the sensor chip 1.
また、絶縁溝71はエツチングにより形成する
ものに限るものではなく、たとえば、機械加工等
により形成してもよいことは勿論である。 Further, the insulating groove 71 is not limited to being formed by etching, and may of course be formed by, for example, machining.
(考案の効果)
以上説明したように、本考案は、半導体からな
るセンサチツプと、該センサチツプに設けられダ
イアフラムを形成する凹部と、前記ダイアフラム
に設けられたピエゾ抵抗ゲージと、前記センサチ
ツプに取り付けられ前記凹部と導圧室を構成する
基板とを具備する半導体圧力センサにおいて、
前記基板の前記センサチツプの取り付け面側と
センサチツプの取り付け面側の反対面側とから設
けられ前記センサチツプを中心に該センサチツプ
の取り付け面より外側に同心閉曲線状に設けられ
力の伝達を防止する絶縁溝を具備したことを特徴
とする半導体圧力センサを構成した。(Effects of the Invention) As explained above, the present invention includes a sensor chip made of a semiconductor, a recess provided in the sensor chip forming a diaphragm, a piezoresistance gauge provided in the diaphragm, and a piezoresistance gauge attached to the sensor chip. In a semiconductor pressure sensor comprising a recess and a substrate constituting a pressure chamber, the sensor chip is attached from a side of the substrate on which the sensor chip is attached and a side opposite to the side where the sensor chip is attached, and the sensor chip is attached around the sensor chip. A semiconductor pressure sensor is constructed, which is characterized by having an insulating groove provided outside the surface in a concentric closed curve shape to prevent force transmission.
この結果、
(1) 周囲温度等の変化によつて生ずる熱応力或い
は測定圧力による変形が絶縁溝により緩和され
るので、温度特性がよい、直線性が良い半導体
圧力センサを実現することができる。 As a result, (1) thermal stress caused by changes in ambient temperature or the like or deformation due to measurement pressure is alleviated by the insulating grooves, so it is possible to realize a semiconductor pressure sensor with good temperature characteristics and good linearity.
(2) 基板にのみ絶縁溝を設けるのみで良いので、
構造が簡単である。(2) Since it is only necessary to provide insulation grooves on the board,
The structure is simple.
(3) 絶縁溝は、基板のセンサチツプの取り付け面
側と、センサチツプの取り付け面側の反対面側
とから設けられているので、力の絶縁が確実に
でき、信頼性の高い半導体圧力センサが得られ
る。(3) Since the insulation groove is provided from the side of the board on which the sensor chip is attached and the side opposite to the side on which the sensor chip is attached, force insulation is ensured and a highly reliable semiconductor pressure sensor can be obtained. It will be done.
第1図は本考案の一実施例の構成説明図、第2
図は第1図の要部構成説明図、第3図は第1図の
動作説明図、第4図は本考案の他の実施例の要部
構成説明図、第5図は本考案の別の実施例の要部
構成説明図、第6図は従来より一般に使用されて
いる従来例の構成説明図である。
1……センサチツプ、11……ダイアフラム
部、12……導圧部、2ピエゾ抵抗ゲージ、31
……導圧孔、4……低融点ガラス、6……接着
剤、7……半導体基板、71……絶縁溝、8……
筐体部。
Figure 1 is an explanatory diagram of the configuration of one embodiment of the present invention;
The figure is an explanatory diagram of the main part configuration of FIG. 1, FIG. 3 is an explanatory diagram of the operation of FIG. 1, FIG. 4 is an explanatory diagram of the main part configuration of another embodiment of the present invention, and FIG. FIG. 6 is a diagram illustrating the configuration of a conventional example that has been generally used. 1... Sensor chip, 11... Diaphragm section, 12... Pressure conduction section, 2 Piezo resistance gauge, 31
... Pressure conducting hole, 4 ... Low melting point glass, 6 ... Adhesive, 7 ... Semiconductor substrate, 71 ... Insulating groove, 8 ...
Housing part.
Claims (1)
プに設けられダイアフラムを形成する凹部と、前
記ダイアフラムに設けられたピエゾ抵抗ゲージ
と、前記センサチツプに取り付けられ前記凹部と
導圧室を構成する基板とを具備する半導体圧力セ
ンサにおいて、 前記基板の前記センサチツプの取り付け面側と
センサチツプの取り付け面側の反対面側とから設
けられ前記センサチツプを中心に該センサチツプ
の取り付け面より外側に同心閉曲線状に設けられ
力の伝達を防止する絶縁溝 を具備したことを特徴とする半導体圧力センサ。[Claims for Utility Model Registration] A sensor chip made of a semiconductor, a recess provided on the sensor chip forming a diaphragm, a piezoresistance gauge provided on the diaphragm, and a piezoresistance gauge attached to the sensor chip forming a pressure chamber with the recess. A semiconductor pressure sensor comprising a substrate, the semiconductor pressure sensor having a concentric closed curved line extending from the sensor chip mounting surface side of the substrate and the opposite surface of the sensor chip mounting surface side, with the sensor chip as the center and outward from the sensor chip mounting surface. 1. A semiconductor pressure sensor characterized by having an insulating groove provided in the groove to prevent force transmission.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986153560U JPH0526983Y2 (en) | 1986-10-06 | 1986-10-06 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986153560U JPH0526983Y2 (en) | 1986-10-06 | 1986-10-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6358731U JPS6358731U (en) | 1988-04-19 |
JPH0526983Y2 true JPH0526983Y2 (en) | 1993-07-08 |
Family
ID=31072557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1986153560U Expired - Lifetime JPH0526983Y2 (en) | 1986-10-06 | 1986-10-06 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0526983Y2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001011329A1 (en) * | 1999-08-05 | 2001-02-15 | Fujikin Incorporated | Pressure detector mounting structure |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE525538C2 (en) * | 2003-07-18 | 2005-03-08 | Radi Medical Systems | Sensor and control wire device for intravascular measurement of physiological variables |
JP2004045424A (en) * | 2003-09-22 | 2004-02-12 | Tadahiro Omi | Mounting structure of pressure detector |
JP4840098B2 (en) * | 2006-11-20 | 2011-12-21 | トヨタ自動車株式会社 | Pressure sensor |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52141594A (en) * | 1977-01-31 | 1977-11-25 | Hitachi Ltd | Semiconductor type pressure transmittor |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53109483U (en) * | 1977-02-08 | 1978-09-01 |
-
1986
- 1986-10-06 JP JP1986153560U patent/JPH0526983Y2/ja not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52141594A (en) * | 1977-01-31 | 1977-11-25 | Hitachi Ltd | Semiconductor type pressure transmittor |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001011329A1 (en) * | 1999-08-05 | 2001-02-15 | Fujikin Incorporated | Pressure detector mounting structure |
Also Published As
Publication number | Publication date |
---|---|
JPS6358731U (en) | 1988-04-19 |
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