JPS5968146A - How to determine front and rear of flat mask - Google Patents
How to determine front and rear of flat maskInfo
- Publication number
- JPS5968146A JPS5968146A JP17630682A JP17630682A JPS5968146A JP S5968146 A JPS5968146 A JP S5968146A JP 17630682 A JP17630682 A JP 17630682A JP 17630682 A JP17630682 A JP 17630682A JP S5968146 A JPS5968146 A JP S5968146A
- Authority
- JP
- Japan
- Prior art keywords
- flat mask
- eddy current
- current type
- type non
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000006073 displacement reaction Methods 0.000 claims abstract description 21
- 238000000034 method Methods 0.000 claims abstract description 11
- 238000010894 electron beam technology Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/42—Measurement or testing during manufacture
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明はフラットマスクの表裏判別方法に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a method for determining whether a flat mask is front or back.
カラー・ブラウン管に内装されるシャドウマスクは両生
面に感光膜が被着形成されたマスク用の金属板の一方よ
り大孔部用のネガパターンを有するネガ原板、他方より
小孔部用のネガパターンを有するネガ原板をそれぞれ密
接させ、露光、現像、エツチング工程を経てフラットマ
スクを形成し、このフラットマスクをプレス加工機によ
りほぼ球面状に形成して使用している。The shadow mask installed in a color cathode ray tube consists of a metal plate for the mask with a photoresist film adhered to both surfaces, one of which is a negative original plate with a negative pattern for large holes, and the other side is a negative original plate that has a negative pattern for small holes. A flat mask is formed by placing the negative original plates having the same values in close contact with each other through exposure, development, and etching steps, and this flat mask is formed into a substantially spherical shape by a press machine and used.
シャドウマスクに設けられる電子ビーム通過孔部には第
１図に示すシャドウマスク（１，）のようにドツト状（
２１）のものと、第２図に示すシャドウマスク（１２）
のように矩形状（２２）のものとがある。またこれら電
子ビーム通過孔部（２１）（２２）はシャドウマスクを
組込むカラーブラウン管の管種によって異なるものがあ
るが、いずれもプレスした時、電子銃側か小孔部、蛍光
面側が大孔部になるように写真蝕刻法を利用して穿設さ
れるようになっている。即ぢ、例えば小孔部が１５０μ
ｍφ、大孔部が３００μｍというように大孔部は小孔部
の１．５〜２６５倍の大きさとなっている。The electron beam passage hole provided in the shadow mask has a dot shape (1,) as shown in the shadow mask (1,) shown in FIG.
21) and the shadow mask (12) shown in Figure 2.
There is also a rectangular shape (22) like this. In addition, these electron beam passage holes (21) and (22) differ depending on the type of color cathode ray tube into which the shadow mask is installed, but in any case, when pressed, the electron gun side has a small hole, and the phosphor screen side has a large hole. The holes are now made using photo-etching to achieve the desired results. For example, the diameter of the small hole is 150μ.
The large hole is 1.5 to 265 times larger than the small hole, such as mφ and 300 μm.
この様なフラットマスクの大孔部側を裏ζこしてプレス
型に入れる関係上大孔部側を裏、小孔部側を表と云う。Since the large hole side of such a flat mask is put into a press mold by straining it back, the large hole side is called the back side and the small hole side is called the front side.
従来、このようなフラットマスクの表裏判別方法として
は主として視覚によって行なわれているが、この表裏を
間違えてプレス加工機に装着し、シャドウマスクを形成
してもカラーブラウン管には使用不可能となる問題点が
あった。Conventionally, the method of distinguishing the front and back sides of such a flat mask is mainly done visually, but if the front and back sides are mistakenly attached to a press processing machine and a shadow mask is formed, it cannot be used for color cathode ray tubes. There was a problem.
本発明は前述した問題点に鑑みなされたものであり、フ
ラットマスクの表裏を非接触で確実に判別することが可
能であり、また判別した後に自動的にプレス機に送り込
み、シャドτクマスクヲ製造することが可能なフラット
マスクの表裏判別方法を提供することを目的としている
。The present invention was made in view of the above-mentioned problems, and it is possible to reliably distinguish the front and back sides of a flat mask without contact, and after the discrimination, it is automatically sent to a press machine to manufacture a shadow mask. The purpose of this invention is to provide a method for distinguishing between the front and back sides of a flat mask.
即ち本発明はフラットマスクの表裏を非接触で判別する
フラットマスクの表裏判別方法において、渦電流型非接
触変位計をフラットマスクの面から所定距離はなして配
設し、この渦電流型非接触変位計の出力電圧の大小によ
りフラットマスクの表裏を判別するようになされている
ことを特徴とするフラットマスクの表裏判別方法である
。That is, the present invention provides a method for determining the front and back sides of a flat mask in a non-contact manner, in which an eddy current type non-contact displacement meter is placed at a predetermined distance from the surface of the flat mask, and the eddy current type non-contact displacement meter is disposed at a predetermined distance from the surface of the flat mask. This method is characterized in that the front and back sides of the flat mask are determined based on the magnitude of the output voltage of the meter.
先ず、第３図及び第４図により渦電流型非接触変位計（
３）の特性を説明すると被測定部材（４）と変位計（３
）の距離間と変位計出力（至）との間には直線（５）に
示す関係があり距離（３）が犬となると変位計出力間は
犬となるようになっている。本実施例はこの関係を基（
こしてなされたものである。First, as shown in Figures 3 and 4, an eddy current type non-contact displacement meter (
To explain the characteristics of 3), the member to be measured (4) and the displacement meter (3)
) and the displacement meter output (to) there is a relationship shown by a straight line (5), so that when the distance (3) is a dog, the distance between the displacement meter outputs is a dog. This example is based on this relationship (
This is what was done.
即チ、第５図に示すフラットマスク（６）の小孔部（７
）を有する面（表）が渦電流型非接触変位計（３）と、
ある一定な距離（ｄ）をもって対設されている場合の一
定面積中の孔面積率チ）はｍ６図に示すフラットマスク
（６）の大孔部（８）を有する面（裏）が渦電流型非接
触変位計（３）とある一定な距離（ｄ）をもって対設さ
れている場合の一定面積中の孔面積率（＠より小さくな
るため第７図に示す第４図の直線（５）と同様な直線０
暖上では第５図に示すような表測定時には変位計出力が
例えば４２２ｖとすると裏測定時には変位計出力が例え
ば５４０■となり、渦電流型非接触変位計の出力電圧の
大きさにより簡単にフラットマスクの表裏を判別するこ
とが可能となる。In other words, the small holes (7) of the flat mask (6) shown in FIG.
) with an eddy current type non-contact displacement meter (3);
The hole area ratio (chi) in a certain area when they are placed opposite each other at a certain distance (d) is the surface (back) of the flat mask (6) with the large hole (8) shown in the m6 diagram, which is subject to eddy current. When the type non-contact displacement meter (3) is installed oppositely at a certain distance (d), the hole area ratio in a certain area (@ is smaller than the straight line (5) in Fig. 4 shown in Fig. 7). straight line 0 similar to
When warming up, the output of the displacement meter is, for example, 422 V when measuring the front as shown in Figure 5, and the output of the displacement meter becomes, for example, 540 V when measuring the back, which can easily be flattened due to the magnitude of the output voltage of the eddy current type non-contact displacement meter. It becomes possible to distinguish between the front and back sides of the mask.
このフラットマスクの表裏判別方法をフラットマスクを
プレス機に挿入する工程に入れることにより自動的に表
裏を判別した上でプレス加工しシャドウマスクを成形す
ることが可能となる。By incorporating this method for determining the front and back sides of a flat mask into the process of inserting the flat mask into a press machine, it becomes possible to automatically determine the front and back sides and then perform press processing to form a shadow mask.
前記実施例は、ある管種に使用されるフラットマスクの
表裏判別方法について述べたが、同じ電子ビーム通過孔
部でも小孔部、大孔部の寸法、形状の異なるものがあり
、この場合ｌこは表裏と共にフラットマスクの種類をも
判別することができる。The above embodiment described a method for distinguishing the front and back sides of a flat mask used for a certain type of tube, but even if the electron beam passing hole is the same, there are cases where the size and shape of the small hole and large hole are different, and in this case, l This allows you to determine the type of flat mask as well as the front and back sides.
上述のように本発明番こよればフラットマスクの表裏を
簡単に判別することが可能であり、また非接触で測定で
きるのでフラットマスクを傷つけることもなく確実に判
別できるし、またフラットマスクの種類をも判別するこ
とができるのでその工業的価値は大である。As mentioned above, according to the present invention, it is possible to easily distinguish between the front and back sides of a flat mask, and since the measurement can be performed without contact, it is possible to reliably distinguish the flat mask without damaging it, and it is also possible to distinguish between the different types of flat masks. It is of great industrial value because it can also be used to identify
第１図はドツト状電子ビーム通過孔部を有するシャドウ
マスクの平面図、第２図は短形状電子ビーム通過孔部を
有するシャドウマスクの平面図、第３図及び第４図は被
測定物と渦電流型非接触変位計の距離による変位計出力
の関係を示す図であり、第３図は位置関係を示す説明図
、第４図は距離と出力の関係を示すグラフ、第５図乃至
第７図は本発明の一実施例を説明するための図であり、
第５図は表測定時を示す説明図、第４６１図は裏測定時
を示す説明図、第７図は表裏による渦電流型非接触変位
計の出力の変化を示すグラフである。
１、、１２・シャドウマスク ２．．２． ・電子ビ
ーム通過孔部３・・渦電流型非接触変位計 ６ フラ
ットマスク７・・小孔部 ８・・・大孔部代
理人 弁理士 井 ト − 男Fig. 1 is a plan view of a shadow mask having a dot-shaped electron beam passage hole, Fig. 2 is a plan view of a shadow mask having a rectangular electron beam passage hole, and Figs. 3 and 4 show the object to be measured. FIG. 3 is an explanatory diagram showing the positional relationship, FIG. 4 is a graph showing the relationship between distance and output, and FIGS. FIG. 7 is a diagram for explaining one embodiment of the present invention,
FIG. 5 is an explanatory diagram showing when measuring the front side, FIG. 461 is an explanatory diagram showing when measuring the back side, and FIG. 7 is a graph showing changes in the output of the eddy current type non-contact displacement meter depending on the front side and the back side. 1,,12・Shadow mask 2. ．． 2.・Electron beam passage hole 3...Eddy current type non-contact displacement meter 6 Flat mask 7...Small hole 8...Large hole Agent Patent attorney Ito - Male
Claims (1)
クの表裏判別方法において、渦電流゛型非接触変位計を
前記フラットマスクの面から所定距離はなして配設し、
前記渦電流型非接触変位計の出力電圧の大小により前記
フラットマスクの表裏を判別するようになされているこ
とを特徴とするフラットマスクの表裏判別方法。In a method for determining the front and back sides of a flat mask in a non-contact manner, an eddy current type non-contact displacement meter is arranged at a predetermined distance from the surface of the flat mask,
A method for determining the front and back sides of a flat mask, characterized in that the front and back sides of the flat mask are determined based on the magnitude of the output voltage of the eddy current type non-contact displacement meter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17630682A JPS5968146A (en) | 1982-10-08 | 1982-10-08 | How to determine front and rear of flat mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17630682A JPS5968146A (en) | 1982-10-08 | 1982-10-08 | How to determine front and rear of flat mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5968146A true JPS5968146A (en) | 1984-04-18 |
Family
ID=16011273
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17630682A Pending JPS5968146A (en) | 1982-10-08 | 1982-10-08 | How to determine front and rear of flat mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5968146A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109778114A (en) * | 2017-11-14 | 2019-05-21 | 大日本印刷株式会社 | For manufacture deposition mask metal plate and metal plate manufacturing method and deposition mask and deposition mask manufacturing method |
-
1982
- 1982-10-08 JP JP17630682A patent/JPS5968146A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109778114A (en) * | 2017-11-14 | 2019-05-21 | 大日本印刷株式会社 | For manufacture deposition mask metal plate and metal plate manufacturing method and deposition mask and deposition mask manufacturing method |
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