JPS596020B2 - Gas Hoden Panel Noseisaku Hohou - Google Patents

Gas Hoden Panel Noseisaku Hohou

Info

Publication number
JPS596020B2
JPS596020B2 JP50146244A JP14624475A JPS596020B2 JP S596020 B2 JPS596020 B2 JP S596020B2 JP 50146244 A JP50146244 A JP 50146244A JP 14624475 A JP14624475 A JP 14624475A JP S596020 B2 JPS596020 B2 JP S596020B2
Authority
JP
Japan
Prior art keywords
layer
gold
electrode
firing
deposited film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP50146244A
Other languages
Japanese (ja)
Other versions
JPS5270750A (en
Inventor
英男 山下
伝 篠田
康成 城内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP50146244A priority Critical patent/JPS596020B2/en
Publication of JPS5270750A publication Critical patent/JPS5270750A/en
Publication of JPS596020B2 publication Critical patent/JPS596020B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/40Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal all coatings being metal coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/151Deposition methods from the vapour phase by vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/30Aspects of methods for coating glass not covered above
    • C03C2218/32After-treatment
    • C03C2218/328Partly or completely removing a coating
    • C03C2218/33Partly or completely removing a coating by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Gas-Filled Discharge Tubes (AREA)

Description

【発明の詳細な説明】 本発明は、誘電体層で被覆された電極をガス放電空間に
対面させてなる間接放電型ガス放電パネルの製造方法に
係り、特に改良された電極製作工程を含むガス放電パネ
ルの製作力、法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an indirect discharge type gas discharge panel in which an electrode covered with a dielectric layer is faced to a gas discharge space, and particularly relates to a method for manufacturing an indirect discharge type gas discharge panel including an improved electrode manufacturing process. It concerns the manufacturing capabilities and methods of discharge panels.

この種間接放電型のガス放電パネル(P、D、Pと称す
)においては、透明なガラス基板の面上に電極群が形成
され、その上に全面的に透明な誘電体層(I 、F層と
称す)が積層される。
In this type of indirect discharge type gas discharge panels (referred to as P, D, P), an electrode group is formed on the surface of a transparent glass substrate, and a transparent dielectric layer (I, F) is formed on the entire surface of the electrode group. (referred to as layers) are laminated.

この誘電体層は、特定成分のガラスペーストを全面に塗
布し、それを焼成したものである。
This dielectric layer is made by applying a glass paste of specific components to the entire surface and firing it.

現状では電極材料として金(Au )などの貴金属が用
いられる。
Currently, noble metals such as gold (Au) are used as electrode materials.

この種貴金属の電極は、従来貴金属とガラス材を含むペ
ーストを調製し、これをP、D、Pの基板にスクリーン
印刷で所定パターンに塗布し、それから塗布ペーストを
焼成することにより形成されていた。
Conventionally, this type of noble metal electrode was formed by preparing a paste containing noble metal and glass material, applying this to P, D, and P substrates in a predetermined pattern by screen printing, and then firing the applied paste. .

この場合電極はそのガラス成分によりガラス基板と密着
する。
In this case, the electrode is in close contact with the glass substrate due to its glass component.

ところで、上記方法によれば、電極はペーストのスクリ
ーン印刷と焼成によって形成されるので、スクリーン印
刷には細線中の印刷限界があり又焼成により細線の縁か
にじんで拡がる性向があるため、ある限度以下の精密細
線パターンの電極を形成することは困難である。
By the way, according to the above method, the electrodes are formed by screen printing and baking a paste, so screen printing has a printing limit in thin lines, and the edges of the thin lines tend to bleed and spread due to baking, so there is a certain limit. It is difficult to form electrodes with the following precise fine line patterns.

然るに本発明の目的は、細線パターンの金電極を極めて
精度よく形成し得る電極製作法を提供することにある。
However, an object of the present invention is to provide an electrode manufacturing method that can form gold electrodes with fine line patterns with extremely high accuracy.

要するに本発明は前述のような間接放電型ガス放電パネ
ルの製作方法において、ガラス基板にチタンの下地層を
形成し、その上に金の蒸着膜を積層し、その上に所望パ
ターンのホトレジストを積層し、それから金メッキ処理
してホトレジストパターンの空隙に露出した金蒸着膜部
分に金メッキ層を積層し、次いでエツチング処理によっ
てチタン下地層、金蒸着膜層及び金メッキ層から成る電
極を形成し、該電極を真空中で焼成した後、誘電体層と
なる誘電体ペーストの積層と焼成等を行なう工程を含む
ことを特徴とするガス放電パネルの製作方法を提供する
ものである。
In short, the present invention is a method for manufacturing an indirect discharge type gas discharge panel as described above, in which a titanium base layer is formed on a glass substrate, a gold vapor-deposited film is laminated thereon, and a photoresist having a desired pattern is laminated thereon. Then, a gold plating process is performed to stack a gold plating layer on the parts of the gold vapor deposited film exposed in the voids of the photoresist pattern, and then an electrode consisting of a titanium base layer, a gold vapor deposit film layer, and a gold plating layer is formed by an etching process, and the electrode is The present invention provides a method for manufacturing a gas discharge panel, which includes the steps of laminating and firing a dielectric paste to become a dielectric layer after firing in a vacuum.

本発明によれば、第1図に示すように、ガラス基板1の
全面にガラスとも金ともよく密着する性質のチタス(T
i)の蒸着膜2の下地層を先ず形成し1その上に金(A
u )の蒸着膜3を形成する。
According to the present invention, as shown in FIG.
First, a base layer of the vapor deposited film 2 of i) is formed, and gold (A
A vapor deposited film 3 of u) is formed.

それからホトレジスト4により細線パターンを蒸着膜3
の上に形成し、その上に金メッキを施こし、ホトレジス
トの間隙パターンに従った金メッキ層5を形成する。
Then, a thin line pattern is formed on the deposited film 3 using photoresist 4.
A gold plating layer 5 is formed in accordance with the gap pattern of the photoresist by applying gold plating thereon.

このメッキにはシアン化金の液を用いた電解メッキ法が
1例として適用し得る。
For this plating, for example, an electrolytic plating method using a gold cyanide solution can be applied.

ホトレジストを取除き、全面を金のエツチング液につけ
ると、金蒸着膜3および金メッキ層5ともにエツチング
されるが、金蒸着膜3は薄いため結果的に金メツキ層5
領域だけが残る。
When the photoresist is removed and the entire surface is immersed in a gold etching solution, both the gold vapor deposited film 3 and the gold plating layer 5 are etched, but since the gold vapor deposited film 3 is thin, the gold plating layer 5 is etched.
Only the area remains.

続いてこの金メッキ層をレジストとしてTiの層2をエ
ツチングする。
Subsequently, the Ti layer 2 is etched using this gold plating layer as a resist.

これによって、図示の点線のように不要材料を除去でき
、結果として第1層にTiの層第?層にAuの蒸着層、
第3・層に金メッキ層を積層して成る細線パターンの電
極が形成される。
As a result, unnecessary material can be removed as shown by the dotted line in the figure, resulting in a Ti layer on the first layer. A vapor deposited layer of Au on the layer,
A thin line pattern electrode is formed by stacking a gold plating layer on the third layer.

この方法ではパターニング精度を高めればそれだけ高精
度の細線電極が得られる。
In this method, the higher the patterning accuracy, the more precisely fine wire electrodes can be obtained.

ところで、金メッキ層は空隙の多い層なので、これを焼
成しなければ良好な導電体にはならない。
By the way, since the gold plating layer has many voids, it will not become a good conductor unless it is fired.

そこでこの焼成を約5800で真空中で行なう。Therefore, this firing is performed in a vacuum at about 5,800 ℃.

もしも、この焼成を大気中で行なうと、第1層のチタン
層(Ti)が酸化され主として酸化チタンTiO2とな
り、金との密着性が阻害される。
If this firing is performed in the air, the first titanium layer (Ti) is oxidized and becomes mainly titanium oxide TiO2, which impedes the adhesion to gold.

これは電極の基板からのはく離の原因となる。This causes the electrode to peel off from the substrate.

ところで、上記電極焼成の後には、従来通り誘電体層6
を低隔点ガラスペーストの塗布と大気中焼成により形成
する。
By the way, after the electrode firing, the dielectric layer 6 is formed as usual.
is formed by applying a low point glass paste and firing in the atmosphere.

従って、この誘電体層6の焼成中にもし前述のT i
02が生成しておれば、電極のはく離した空隙から気泡
が激しく発生して誘電体層に気泡が残り、それがP、D
、Pの放電特性の均一性を阻害する。
Therefore, if during the firing of this dielectric layer 6, the above-mentioned T i
If 02 is generated, bubbles will be generated violently from the separated voids of the electrode and remain in the dielectric layer, which will lead to P and D.
, inhibits the uniformity of the discharge characteristics of P.

然るに、本発明方法によれば、放電特性が阻害されず、
しかも細線パターンの電極が高精度で以って得られるの
で本発明方法は、従来の方法に較べ電極パターン密度の
高いP、P、Dを製造するのに有利である。
However, according to the method of the present invention, the discharge characteristics are not inhibited, and
Moreover, since electrodes with fine line patterns can be obtained with high precision, the method of the present invention is advantageous in manufacturing P, P, and D with a higher electrode pattern density than conventional methods.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明方法に係るP、D、Pの基板積層構造を
示す断面説明図である。 図において、1は基板、2はチタンの下地層、3は金蒸
着層、4はホトレジスト層、5は金メッキ層、6は誘電
体層を示す。
FIG. 1 is an explanatory cross-sectional view showing a laminated structure of P, D, and P substrates according to the method of the present invention. In the figure, 1 is a substrate, 2 is a titanium underlayer, 3 is a gold vapor deposited layer, 4 is a photoresist layer, 5 is a gold plating layer, and 6 is a dielectric layer.

Claims (1)

【特許請求の範囲】[Claims] 1 誘電体層で被覆された電極をガス放電空間に対面さ
せてなるガス放電パネルの製作方法において、ガラス基
板にチタンの下地層を形成し、その上に金の蒸着膜を積
層し、それからその上にホトレジスト層を被着形成して
パターニングを台ない、それから金メッキ処理してホト
レンジストパターンの空隙に露出した金蒸着膜部分に金
メッキ層を積層し、次いでホトレジストに覆われた金属
部分をエツチングにより除去してチタン下地層、金蒸着
膜層及び金メッキ層から成る電極パターンを形成し、該
電極を真空中で焼成した後、誘電体ペーストの積層と焼
成を行なう工程を含むことを特徴とするガス放電パネル
の製作方法。
1. In a method for manufacturing a gas discharge panel in which an electrode covered with a dielectric layer faces a gas discharge space, a titanium base layer is formed on a glass substrate, a gold vapor-deposited film is laminated thereon, and then a titanium base layer is formed on a glass substrate. A photoresist layer is deposited on top to destroy the patterning, and then gold plating is performed, and a gold plating layer is laminated on the parts of the gold vapor deposited film exposed in the voids of the photoresist pattern, and then the metal parts covered with the photoresist are etched. to form an electrode pattern consisting of a titanium base layer, a gold vapor deposited film layer, and a gold plating layer, and then firing the electrode in a vacuum, followed by laminating and firing a dielectric paste. How to make a gas discharge panel.
JP50146244A 1975-12-10 1975-12-10 Gas Hoden Panel Noseisaku Hohou Expired JPS596020B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50146244A JPS596020B2 (en) 1975-12-10 1975-12-10 Gas Hoden Panel Noseisaku Hohou

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50146244A JPS596020B2 (en) 1975-12-10 1975-12-10 Gas Hoden Panel Noseisaku Hohou

Publications (2)

Publication Number Publication Date
JPS5270750A JPS5270750A (en) 1977-06-13
JPS596020B2 true JPS596020B2 (en) 1984-02-08

Family

ID=15403342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50146244A Expired JPS596020B2 (en) 1975-12-10 1975-12-10 Gas Hoden Panel Noseisaku Hohou

Country Status (1)

Country Link
JP (1) JPS596020B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2599743Y2 (en) * 1991-11-13 1999-09-20 大和製罐株式会社 Cup-shaped member supply device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2599743Y2 (en) * 1991-11-13 1999-09-20 大和製罐株式会社 Cup-shaped member supply device

Also Published As

Publication number Publication date
JPS5270750A (en) 1977-06-13

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