JPS5949312B2 - How to pattern enamel products - Google Patents

How to pattern enamel products

Info

Publication number
JPS5949312B2
JPS5949312B2 JP57077298A JP7729882A JPS5949312B2 JP S5949312 B2 JPS5949312 B2 JP S5949312B2 JP 57077298 A JP57077298 A JP 57077298A JP 7729882 A JP7729882 A JP 7729882A JP S5949312 B2 JPS5949312 B2 JP S5949312B2
Authority
JP
Japan
Prior art keywords
glaze
layer
upper glaze
pattern
enamel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57077298A
Other languages
Japanese (ja)
Other versions
JPS58193366A (en
Inventor
孝一 仲道
修治 狭間
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toto Ltd
Original Assignee
Toto Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toto Ltd filed Critical Toto Ltd
Priority to JP57077298A priority Critical patent/JPS5949312B2/en
Publication of JPS58193366A publication Critical patent/JPS58193366A/en
Publication of JPS5949312B2 publication Critical patent/JPS5949312B2/en
Expired legal-status Critical Current

Links

Description

【発明の詳細な説明】 本発明はホーロー製品の模様付け方法に関する。[Detailed description of the invention] The present invention relates to a method for patterning enamel products.

従来、ホーロー製品に模様を付ける方法としては1特公
昭56−41699号公報の方法、2特開昭54−71
109号公報の方法、3特開昭53−80413号公報
の方法がある。まず、上記1の方法について説明すると
、下軸層を湿式法により0.05〜0.20%の厚さに
形成すると共にその上に2層以上の上軸層をその上層の
上軸よりも焼成温度において小なる粘度、および表面張
力を有する上軸を隣接する下軸に用いて総厚みが1.0
〜1.5’Xiの範囲に乾式法により形成することによ
り、再沸現象を利用して大理石の結晶模様に類似した模
様を表出せしめるものである。また上記2の方法は乾式
法にて形成した下軸層の表面に下釉薬層とは異色のホー
ロー粉末をスクリーンを介して斑点状にふりかけ、この
異色ホーローを下釉薬層焼成の余熱で下軸層表面に融着
させて立体感のあるまりも斑点模様を形成するものであ
り、上記□の方法は湿式法にて形成した下軸層の表面に
、模様を打抜いたシートでマスキングを介して下軸層と
は異色のホーロー釉薬を塗布することにより下軸層表面
にマスキングシートに打抜いた模様を形成するものであ
る。
Conventionally, as a method for attaching patterns to enamel products, methods such as 1 Japanese Patent Publication No. 1983-41699 and 2 Japanese Patent Application Laid-open No. 54-71 have been used.
There are a method disclosed in Japanese Patent Publication No. 109 and a method disclosed in Japanese Patent Application Laid-open No. 3-80413. First, to explain method 1 above, a lower axis layer is formed with a thickness of 0.05 to 0.20% by a wet method, and two or more upper axis layers are formed on top of it using a wet method. The total thickness is 1.0 by using the upper shaft which has a small viscosity and surface tension at the firing temperature as the adjacent lower shaft.
By forming it by a dry method in the range of ~1.5'Xi, a pattern resembling the crystalline pattern of marble is produced by utilizing the reboiling phenomenon. In addition, in method 2 above, enamel powder of a different color from the lower glaze layer is sprinkled in spots on the surface of the lower shaft layer formed by a dry method through a screen, and the different colored enamel is heated with the residual heat of firing the lower glaze layer. It is fused to the surface of the layer to form a marimo spot pattern with a three-dimensional effect.The above method □ involves masking the surface of the bottom layer formed by a wet method with a sheet with a pattern punched out. The lower shaft layer is a layer in which a pattern punched into a masking sheet is formed on the surface of the lower shaft layer by applying a different colored enamel glaze.

これに対して、本発明は下軸及び上軸第1層は湿式法に
よるフラット(均一)状態の施釉方法、上軸第2層は湿
式法によるステイツプル状の施釉方法というように上記
従来方法とは全〈異なる施釉方法を用い、更に再沸現象
を利用してホーロー製品に上記従来方法によつて得られ
る大理石の結晶模様に類似した模様や、立体感のあるま
りも斑点模様、あるいはアスキングシートの打抜き模様
やツートンカラー等とは別異の・・・所謂窯変調の不均
一な模様を連続的に表出させることが出来る新規な方法
を提供することを目的とするものである。
In contrast, the present invention uses a flat (uniform) glaze application method for the lower and upper shaft first layers using a wet method, and a staple-like glaze application method using a wet method for the upper shaft second layer. By using different glazing methods and using the reboiling phenomenon, we can create enamel products with patterns similar to the marble crystal patterns obtained by the above conventional method, marimo speckled patterns with a three-dimensional effect, or asking sheets. The purpose of this invention is to provide a new method that can continuously display a so-called kiln-modulated non-uniform pattern, which is different from the punching patterns and two-tone colors.

而して、斯る目的は本発明によれば、金属基体上に、下
軸層および上軸層を順次に設け、各層毎に焼成してホー
ロー製品を製造するに際して、上釉層を2層の積層構造
とし、下釉層を0.05〜0.15%のフラツト施釉、
この下釉層に隣接して設けられる上釉第1層を0.15
%以上の7ラツト状の施釉、前記上釉第1層の表面に設
けられる上釉第2層を0.03X以上のステイツプル状
の施釉による夫々湿式法により形成すると共に上記上釉
第1層には表面張力、粘性及び比重が焼成温度において
上釉第2層の上釉よりいずれも小さな上釉を用いること
を特徴とするホーロー製品の模様付け方法により達成さ
れる。以下、この発明を図面を参照しつつ更に詳細に説
明する。
According to the present invention, such an object is to provide a lower glaze layer and an upper glaze layer in sequence on a metal substrate, and when producing an enamel product by firing each layer, two upper glaze layers are formed. Laminated structure with 0.05-0.15% flat glaze on the lower glaze layer,
The first layer of upper glaze provided adjacent to this lower glaze layer is 0.15
A second layer of upper glaze provided on the surface of the first layer of upper glaze is formed by a wet method using a staple-shaped glaze of 0.03X or more, and a second layer of upper glaze is applied to the first layer of upper glaze. This is achieved by a method for patterning an enamel product, which is characterized by using a top glaze whose surface tension, viscosity, and specific gravity are all smaller at the firing temperature than the top glaze of the second layer. Hereinafter, the present invention will be explained in more detail with reference to the drawings.

第1図は本発明により模様付けされたホーロー製品の正
面図であり、第2図は要部の拡大断面図である。
FIG. 1 is a front view of a enamel product patterned according to the present invention, and FIG. 2 is an enlarged sectional view of the main parts.

ホーロー製品は浴槽、洗面器、シンク等の浴室、キツチ
ン関係用品その他あらゆる分野の製品が含まれるが、こ
こではパネル状のものとして示しており、第2図に示さ
れる通り、鋼板等よりなる金属基体1上に、下釉層2を
設け、更にこの下釉層2の上に上釉第1層3a、上釉第
2層3bからなる上釉層3を設け、上釉第2層3b表面
に上釉第1層3aの上釉の沸き上がりにより生ずる再沸
模様4を形成している。
Enamel products include bathtubs, washbasins, sinks, and other bathroom products, kitchen-related products, and other products in all fields, but here they are shown as panel-shaped products, and as shown in Figure 2, they are metal products made of steel plates, etc. A lower glaze layer 2 is provided on the base 1, and an upper glaze layer 3 consisting of a first upper glaze layer 3a and a second upper glaze layer 3b is provided on the lower glaze layer 2, and the surface of the second upper glaze layer 3b is A reboiling pattern 4 is formed by boiling of the upper glaze of the first upper glaze layer 3a.

下釉および上釉を形成する釉薬の基本組成は、従来より
ホーロー製品の製造に用いられている範囲で選択するこ
とができるが、上釉第1層3aの釉薬は焼成温度での比
重、粘度、表面張力を、土ネ釉第2層3bの釉薬のそれ
らの値よりも低い値のものとする。
The basic composition of the glaze forming the lower glaze and upper glaze can be selected within the range conventionally used in the production of enamel products, but the glaze of the upper glaze first layer 3a has a specific gravity and viscosity at the firing temperature. , the surface tension is lower than those of the glaze of the clay glaze second layer 3b.

以下、本発明のホーロー製品の窯変調の模様付けの方法
を詳細に説明する。
Hereinafter, the method of patterning kiln modulation of the enamel product of the present invention will be explained in detail.

先ず、アルカリ脱脂、酸洗、ニツケル処理、中和、乾燥
等の通常の前処理を施した例えば鋼板よりなる金属基体
1の処理面上に湿式法により下釉をフラツト状に施釉し
て乾燥させ、800〜900℃で3〜15分焼成して0
.05〜0.15〜の下釉層2を形成する。
First, a lower glaze is applied in a flat shape by a wet method onto the treated surface of a metal substrate 1 made of, for example, a steel plate, which has undergone conventional pretreatments such as alkaline degreasing, pickling, nickel treatment, neutralization, and drying, and is then dried. , baked at 800-900℃ for 3-15 minutes.
.. A lower glaze layer 2 of 0.05 to 0.15 is formed.

続いて、上記下釉層2の表面に下釉施釉と同様湿式法に
より上釉をフラツト状に施釉して乾燥させ800〜90
0℃で3〜15分焼成して0.15%以上の上釉第1層
3aを形成する。
Next, an upper glaze is applied to the surface of the lower glaze layer 2 in a flat shape using a wet method similar to the application of the lower glaze, and dried to a temperature of 800 to 900 ml.
The first layer 3a of upper glaze having a content of 0.15% or more is formed by firing at 0° C. for 3 to 15 minutes.

次に、上釉第1層3aの上にこの上釉第1層3aの釉薬
よりは比重、粘度、表面張力がいずれも大きい釉薬より
なる上釉を湿式法によりステイツブル状に施釉し、乾燥
後800〜900℃で3〜15分焼成して、上釉第2層
3bを0.03S以上の厚さに形成する。
Next, on the first upper glaze layer 3a, an upper glaze made of a glaze having a higher specific gravity, viscosity, and surface tension than the glaze of the first upper glaze layer 3a is applied in a stable state by a wet method, and after drying. Baking is performed at 800 to 900°C for 3 to 15 minutes to form the second upper glaze layer 3b with a thickness of 0.03S or more.

尚、下釉及び上釉を形成する釉薬の基本組成は、従来よ
りホーロー製品の製造に用いられている範囲で選択する
ことができる。
The basic composition of the glaze forming the lower glaze and upper glaze can be selected within the range conventionally used in the production of enamel products.

この上釉第2層3b焼成時に上釉第1層3aに再沸現象
が起こり、冷却後第2図に示す如き窯変調の再沸模様が
表出する。
When the second upper glaze layer 3b is fired, a reboiling phenomenon occurs in the first upper glaze layer 3a, and after cooling, a kiln-modulated reboiling pattern as shown in FIG. 2 appears.

上釉第1層3aの厚さと上釉第2層3bのステイツプル
の度合との関係による模様発生の状況は、下表の通りで
ある。
The table below shows how patterns are formed depending on the relationship between the thickness of the first upper glaze layer 3a and the degree of staples of the second upper glaze layer 3b.

尚、上釉第1層3aの厚さが0.15%未満例えば0.
04〜0.05〜だとステイツプルの大きさにかかわり
なく窯変模様は発生しない。
Note that the thickness of the first upper glaze layer 3a is less than 0.15%, for example, 0.15%.
If the temperature is between 0.04 and 0.05, kiln deformation patterns will not occur regardless of the size of the states pull.

また、上釉第2層3bのステイツプル施釉時、1ステイ
ツプル施釉前の素地を50〜150℃で5〜15分子熱
する、2リシンガン等で施釉する場合スリツプの比重を
1.7〜2.0の範囲で極力高くする等の手段をとるこ
とによりステイップルをより効果的に出すことができる
In addition, when applying the staple pull glaze for the second upper glaze layer 3b, heat the base material before the staple pull glaze for 5 to 15 molecules at 50 to 150°C, and when applying the glaze with a reshin gun, etc., the specific gravity of the slip should be 1.7 to 2.0. By taking measures such as increasing the height as much as possible within the range of , staples can be produced more effectively.

更に窯変模様は温度800〜900℃、時間3〜15分
の焼成条件で生じるが、この範囲内において出来るだけ
高温で長時間焼成した方がより効果的な模様を得ること
ができる。
Further, although the kiln pattern is produced under firing conditions of 800 to 900° C. and 3 to 15 minutes, a more effective pattern can be obtained by firing at as high a temperature as possible for a long time within this range.

上述したように本発明によれば上釉第1層3aを湿式法
によるフラツト状の施釉、上釉第2層3bを湿式法によ
るステイツプル状の施釉にし、再沸模様を形成すること
により、ホーロー製品に所謂窯変調の模様を得ることが
できる。
As described above, according to the present invention, the first upper glaze layer 3a is applied with a flat glaze using a wet method, and the second upper glaze layer 3b is applied with a staple glaze using a wet method to form a reboiled pattern. It is possible to obtain a so-called kiln modulation pattern on the product.

以下、実施例により本発明を更に具体的に説明する。Hereinafter, the present invention will be explained in more detail with reference to Examples.

上記組成の下釉および上釉を用いてホーロー用脱炭鋼板
にてプレス成形した浴槽本体にホーローを成形した。
Using the lower glaze and upper glaze of the above composition, an enamel was formed into a bathtub body which was press-formed from a decarburized steel plate for enamel.

まず、アルカリ脱脂、酸洗、ニツケル処理、中和、乾燥
の順で前処理を施した鋼板1の表面に上記組成の下釉を
明治スプレーガンF75−Gl2によるフラツト状に施
釉し、110℃で10分間乾燥した後、840℃で5分
間焼成して厚さ0.10%の下釉層2を設けた。
First, a lower glaze of the above composition was applied in a flat shape using a Meiji spray gun F75-Gl2 on the surface of a steel plate 1 which had been pretreated in the order of alkaline degreasing, pickling, nickel treatment, neutralization, and drying. After drying for 10 minutes, it was fired at 840° C. for 5 minutes to provide a lower glaze layer 2 with a thickness of 0.10%.

次にこの下釉層2上に下釉施釉と同じ方法で上.記組成
の上釉第1層用上釉をフラツト状に施釉し、110℃で
10分間乾燥した後、840℃で5分間焼成して厚さ0
.20〜の上釉第1層3aを設ける後、上釉第1層3a
上に上記組成の上釉第2層用上釉を明治リシンガンAG
−2によりステイツブル状に施釉し、110℃で10分
間乾燥した後、840℃で10分間焼成して厚さ0.1
01!X.の上釉第2層3bを形成した。
Next, apply the upper glaze on top of this lower glaze layer 2 using the same method as applying the lower glaze. The upper glaze for the first layer of the above composition was applied in a flat shape, dried at 110°C for 10 minutes, and then fired at 840°C for 5 minutes to obtain a thickness of 0.
.. After providing the upper glaze first layer 3a from 20 to 20, the upper glaze first layer 3a
On top, apply the upper glaze for the second layer of the above composition using Meiji Rishingan AG.
-2 to a stable shape, dried at 110℃ for 10 minutes, and then fired at 840℃ for 10 minutes to a thickness of 0.1
01! X. A second upper glaze layer 3b was formed.

この結果、上釉第1層3aに再沸現象が生じ、表面には
その全面に亘たり所謂窯変調の不均一な模様が連続して
現出した。
As a result, a reboiling phenomenon occurred in the first upper glaze layer 3a, and an uneven pattern of so-called kiln modulation appeared continuously over the entire surface.

【図面の簡単な説明】 第1図は本発明により模様付けされたホーロー製品の正
面図、第2図は要部の拡大断面図である。 1・・・・・・金属基体、2・・・・・・下釉層、3・
・・・・・上釉層(3a・・・・・・上釉第1層、3b
・・・・・・上釉第2層)。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a front view of a enamel product patterned according to the present invention, and FIG. 2 is an enlarged sectional view of the main parts. 1...Metal base, 2...Lower glaze layer, 3.
...Top glaze layer (3a...Top glaze first layer, 3b
......second layer of upper glaze).

Claims (1)

【特許請求の範囲】[Claims] 1 金属基体上に、下釉層および上釉層を順次に設け、
各層毎に焼成してホーロー製品を製造するに際して、上
釉層を2層の積層構造とし、下釉層を0.05〜0.1
5m/mのフラット状に施釉、この下釉層に隣接して設
けられる上釉第1層を0.15m/m以上のフラット状
に施釉し、前記上釉第1層の表面に設けられる上釉第2
層を0.03m/m以上のステイツプル状に施釉し、夫
々湿式法により形成すると共に、上記上釉第1層には表
面張力、粘性及び比重が焼成温度において上釉第2層の
上釉よりいずれも小さな上釉を用いることを特徴とする
ホーロー製品の窯変調の模様付け方法。
1. A lower glaze layer and an upper glaze layer are sequentially provided on a metal substrate,
When manufacturing enamel products by firing each layer, the upper glaze layer has a two-layer laminated structure, and the lower glaze layer has a 0.05 to 0.1
Glaze is applied in a flat shape of 5 m/m, the first layer of upper glaze provided adjacent to this lower glaze layer is applied in a flat shape of 0.15 m/m or more, and the upper glaze is provided on the surface of the first layer of upper glaze. Glaze 2nd
The layers are glazed in the form of staples of 0.03 m/m or more, and each layer is formed by a wet method. Both methods use kiln modulation patterns for enamel products, which are characterized by the use of small overglazes.
JP57077298A 1982-05-07 1982-05-07 How to pattern enamel products Expired JPS5949312B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57077298A JPS5949312B2 (en) 1982-05-07 1982-05-07 How to pattern enamel products

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57077298A JPS5949312B2 (en) 1982-05-07 1982-05-07 How to pattern enamel products

Publications (2)

Publication Number Publication Date
JPS58193366A JPS58193366A (en) 1983-11-11
JPS5949312B2 true JPS5949312B2 (en) 1984-12-01

Family

ID=13629981

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57077298A Expired JPS5949312B2 (en) 1982-05-07 1982-05-07 How to pattern enamel products

Country Status (1)

Country Link
JP (1) JPS5949312B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6419219U (en) * 1987-07-24 1989-01-31

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH071606B2 (en) * 1985-11-13 1995-01-11 シャープ株式会社 Linear motor for optical disk device
JP2778032B2 (en) * 1988-01-27 1998-07-23 ソニー株式会社 Optical pickup device
JP4946873B2 (en) * 2008-01-07 2012-06-06 船井電機株式会社 Disk unit

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54162713A (en) * 1978-06-15 1979-12-24 Kawatetsu Kinzoku Kogyo Production of enamel product having irregular* largeesize stipple pattern
JPS5520274A (en) * 1978-08-02 1980-02-13 Kawatetsu Kinzoku Kogyo Kk Production of natural stone-like enameled product with pattern of irregularly and sparsely arranged large and small specks, which have complicatedly intertwined feeling
JPS5641699A (en) * 1979-09-10 1981-04-18 Toshiba Electronic Systems Flash lamp starter

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54162713A (en) * 1978-06-15 1979-12-24 Kawatetsu Kinzoku Kogyo Production of enamel product having irregular* largeesize stipple pattern
JPS5520274A (en) * 1978-08-02 1980-02-13 Kawatetsu Kinzoku Kogyo Kk Production of natural stone-like enameled product with pattern of irregularly and sparsely arranged large and small specks, which have complicatedly intertwined feeling
JPS5641699A (en) * 1979-09-10 1981-04-18 Toshiba Electronic Systems Flash lamp starter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6419219U (en) * 1987-07-24 1989-01-31

Also Published As

Publication number Publication date
JPS58193366A (en) 1983-11-11

Similar Documents

Publication Publication Date Title
US5396834A (en) Cooking vessel bottom and production method therefor
JPS5949312B2 (en) How to pattern enamel products
JP3696279B2 (en) How to form decoration on kitchenware
JPS58193367A (en) Method of patterning enameled article
JPH055005Y2 (en)
JPH04130077A (en) Nonslip tile and its production
US2135544A (en) Faced building element
US9340054B2 (en) Method for producing a patterned insulation board used for exterior wall of building by using screen printing
JP2739695B2 (en) Manufacturing method of glazed products
JP2774860B2 (en) Manufacturing method of stone enameled products
US148986A (en) Improvement in the processes of ornamenting enameled surfaces
JPH01100294A (en) Production of enameled hot-dip aluminum plated steel sheet having excellent designability
JPS5912780A (en) Manufacture of decorative panel
JPS5989773A (en) Enamel product
RU2699128C1 (en) Method of producing decorative enamel coating on surface of metal article
KR870000184A (en) Na-chi coating metal decorative plate and manufacturing method
JP3668881B2 (en) Shelves for firing ceramics for electronics industry
AT411360B (en) Manufacture of colored glass tiles involves applying color glazing and application layer for adhesive to non-toughened glass panel, firing and cutting to size
JPS6191373A (en) Patterned enamelware and its manufacture
JPS60215775A (en) Transparent cloisonne and its production
JPH03293464A (en) Formation of yo-hen decoration on surface of ceramic product
JPS60172381A (en) Manufacture of face material having recess and protrusion
JPS61117267A (en) Production of ornamental plate
CN85100211B (en) Floating method for printing marble-like-pattern on the surface of article
JPS63103085A (en) Enameled panel and its production