JPS5949139A - 負イオン源 - Google Patents

負イオン源

Info

Publication number
JPS5949139A
JPS5949139A JP58139330A JP13933083A JPS5949139A JP S5949139 A JPS5949139 A JP S5949139A JP 58139330 A JP58139330 A JP 58139330A JP 13933083 A JP13933083 A JP 13933083A JP S5949139 A JPS5949139 A JP S5949139A
Authority
JP
Japan
Prior art keywords
ions
electrons
negative
extraction zone
energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58139330A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0360139B2 (cg-RX-API-DMAC10.html
Inventor
カノ・ロイング
ケネス・ダブリユ・エ−ラ−ズ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Government of the United States of America
Original Assignee
Government of the United States of America
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Government of the United States of America filed Critical Government of the United States of America
Publication of JPS5949139A publication Critical patent/JPS5949139A/ja
Publication of JPH0360139B2 publication Critical patent/JPH0360139B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/028—Negative ion sources
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
JP58139330A 1982-08-06 1983-07-29 負イオン源 Granted JPS5949139A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/405,963 US4486665A (en) 1982-08-06 1982-08-06 Negative ion source
US405963 1982-08-06

Publications (2)

Publication Number Publication Date
JPS5949139A true JPS5949139A (ja) 1984-03-21
JPH0360139B2 JPH0360139B2 (cg-RX-API-DMAC10.html) 1991-09-12

Family

ID=23605955

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58139330A Granted JPS5949139A (ja) 1982-08-06 1983-07-29 負イオン源

Country Status (5)

Country Link
US (1) US4486665A (cg-RX-API-DMAC10.html)
JP (1) JPS5949139A (cg-RX-API-DMAC10.html)
DE (1) DE3328423A1 (cg-RX-API-DMAC10.html)
FR (1) FR2531570B1 (cg-RX-API-DMAC10.html)
GB (1) GB2124824B (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04154026A (ja) * 1990-10-15 1992-05-27 Toshiba Corp イオン源用電極板

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2548830B1 (fr) * 1983-07-04 1986-02-21 Centre Nat Rech Scient Source d'ions negatifs
US4559477A (en) * 1983-11-10 1985-12-17 The United States Of America As Represented By The United States Department Of Energy Three chamber negative ion source
US4654183A (en) * 1984-02-13 1987-03-31 The United States Of America As Represented By The United States Department Of Energy Production of intense negative hydrogen beams with polarized nuclei by selective neutralization of negative ions
US4649279A (en) * 1984-05-01 1987-03-10 The United States Of America As Represented By The United States Department Of Energy Negative ion source
FR2580427B1 (fr) * 1985-04-11 1987-05-15 Commissariat Energie Atomique Source d'ions negatifs a resonance cyclotronique des electrons
EP0525927B1 (en) * 1991-07-23 1995-09-27 Nissin Electric Company, Limited Ion source having a mass separation device
US5198677A (en) * 1991-10-11 1993-03-30 The United States Of America As Represented By The United States Department Of Energy Production of N+ ions from a multicusp ion beam apparatus
US5365070A (en) * 1992-04-29 1994-11-15 The Regents Of The University Of California Negative ion beam injection apparatus with magnetic shield and electron removal means
DE4334357A1 (de) * 1993-10-08 1995-04-13 Zeiss Carl Fa Sattelfeldquelle
USD354296S (en) 1993-11-08 1995-01-10 Nordson Corporation Fluid dispensing module for dispensing heated fluids, such as hot melt adhesive
US5545257A (en) * 1994-06-13 1996-08-13 Electro-Graph, Inc. Magnetic filter apparatus and method for generating cold plasma in semicoductor processing
US5760405A (en) * 1996-02-16 1998-06-02 Eaton Corporation Plasma chamber for controlling ion dosage in ion implantation
US5661308A (en) * 1996-05-30 1997-08-26 Eaton Corporation Method and apparatus for ion formation in an ion implanter
DE19747100C5 (de) * 1997-08-26 2007-04-19 Röhrenwerk Gebr. Fuchs GmbH Verfahren zum Behandeln der Zementmörtelauskleidung von Rohren und Formstücken aus Stahl oder Gußeisen für Wasserleitungen
US6016036A (en) * 1998-01-28 2000-01-18 Eaton Corporation Magnetic filter for ion source
US6060718A (en) * 1998-02-26 2000-05-09 Eaton Corporation Ion source having wide output current operating range
US6294862B1 (en) 1998-05-19 2001-09-25 Eaton Corporation Multi-cusp ion source
DE10014034C2 (de) * 2000-03-22 2002-01-24 Thomson Tubes Electroniques Gm Plasma-Beschleuniger-Anordnung
JP4039834B2 (ja) * 2001-09-28 2008-01-30 株式会社荏原製作所 エッチング方法及びエッチング装置
JP3811776B2 (ja) * 2003-01-24 2006-08-23 独立行政法人 宇宙航空研究開発機構 高層中性大気の観測方法、及び高層中性大気の観測装置
JP2004281232A (ja) * 2003-03-14 2004-10-07 Ebara Corp ビーム源及びビーム処理装置
US7994474B2 (en) * 2004-02-23 2011-08-09 Andreas Hieke Laser desorption ionization ion source with charge injection
US7365340B2 (en) * 2005-07-20 2008-04-29 Varian Semiconductor Equipment Associates, Inc. Resonance method for production of intense low-impurity ion beams of atoms and molecules
WO2006127327A2 (en) * 2005-05-20 2006-11-30 Purser Kenneth H A resonance method for production of intense low-impurity ion beams of atoms and molecules
US7596197B1 (en) * 2005-08-05 2009-09-29 The Regents Of The University Of California Gamma source for active interrogation
US8294120B1 (en) * 2009-07-27 2012-10-23 Pamfiloff Eugene B Process for the extraction of electrons from atoms and molecules, the production of positive and negative ions and the composition and decomposition of molecules
US9655223B2 (en) 2012-09-14 2017-05-16 Oregon Physics, Llc RF system, magnetic filter, and high voltage isolation for an inductively coupled plasma ion source
US9362092B2 (en) * 2012-12-07 2016-06-07 LGS Innovations LLC Gas dispersion disc assembly
US12046443B2 (en) * 2021-11-22 2024-07-23 Applied Materials, Inc. Shield for filament in an ion source

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4233537A (en) * 1972-09-18 1980-11-11 Rudolf Limpaecher Multicusp plasma containment apparatus
US4140943A (en) * 1977-06-01 1979-02-20 The United States Of America As Represented By The United States Department Of Energy Plasma generating device with hairpin-shaped cathode filaments
US4329586A (en) * 1979-10-25 1982-05-11 The United States Of America As Represented By The United States Department Of Energy Electron energy recovery system for negative ion sources
US4377773A (en) * 1980-12-12 1983-03-22 The United States Of America As Represented By The Department Of Energy Negative ion source with hollow cathode discharge plasma

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04154026A (ja) * 1990-10-15 1992-05-27 Toshiba Corp イオン源用電極板

Also Published As

Publication number Publication date
US4486665A (en) 1984-12-04
JPH0360139B2 (cg-RX-API-DMAC10.html) 1991-09-12
GB2124824B (en) 1986-03-26
GB2124824A (en) 1984-02-22
DE3328423A1 (de) 1984-02-09
FR2531570A1 (fr) 1984-02-10
GB8318743D0 (en) 1983-08-10
FR2531570B1 (fr) 1988-01-15

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