JPS5946738A - Photoelectric conversion target and its manufacturing method - Google Patents

Photoelectric conversion target and its manufacturing method

Info

Publication number
JPS5946738A
JPS5946738A JP57157691A JP15769182A JPS5946738A JP S5946738 A JPS5946738 A JP S5946738A JP 57157691 A JP57157691 A JP 57157691A JP 15769182 A JP15769182 A JP 15769182A JP S5946738 A JPS5946738 A JP S5946738A
Authority
JP
Japan
Prior art keywords
layer
dense layer
dense
porous
sb2s3
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57157691A
Other languages
Japanese (ja)
Other versions
JPH0129297B2 (en
Inventor
Junta Yamamoto
山本 準太
Takeshi Ichibagase
一番ケ瀬 剛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP57157691A priority Critical patent/JPS5946738A/en
Publication of JPS5946738A publication Critical patent/JPS5946738A/en
Publication of JPH0129297B2 publication Critical patent/JPH0129297B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/10Screens on or from which an image or pattern is formed, picked up, converted or stored
    • H01J29/36Photoelectric screens; Charge-storage screens
    • H01J29/39Charge-storage screens
    • H01J29/45Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen
    • H01J29/451Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen with photosensitive junctions
    • H01J29/456Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen with photosensitive junctions exhibiting no discontinuities, e.g. consisting of uniform layers

Abstract

PURPOSE:To reduce baking and residual image events under low illumination and obtain a good spectral sensitivity characteristic by joining the Sb2S3 area with different Sb concentrations and gradually varying the Sb concentration of a porous layer. CONSTITUTION:A photoelectric conversion target is comprised with a transparent conductive layer 2 applied and formed on a substrate 1, the first dense layer 3 made of Sb2S3 or Sb2S3 with excessive Sb applied and formed on the transparent conductive layer 2, the second dense layer 4 whose primary component is the Sb2S3 with excessive Sb applied and formed on the first dense layer 3, porous layers 5 and 6 whose primary component is the Sb2S3 formed on the second dense layer 4, and the third dense layer 7 whose primary component is the Sb2S3 with excessive Sb applied and formed on the porous layers 5 and 6. In addition, the Sb concentration of the said porous layers 5 and 6 is gradually or continuously increased as the layers go to the third dense layer 7.

Description

【発明の詳細な説明】 産業上の利用分野 この発明は、カラーテレビジョンカメラ等に使用される
撮像管の光電変換列−ゲソトおよびぞの製造方法に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a photoelectric conversion array for an image pickup tube used in a color television camera, etc., and a method for manufacturing the same.

従来例の構成とその問題点 一般に、カラーテレビジョンカメラに用いられるビジコ
ン形カラー撮像管の光電変換ターゲッ;・は、三硫化ア
ンチモン(Sb2Ss)からなる光導電膜を備える。か
かる光導電膜は、sb、、s5の稠密層とSb2S3の
多孔質層とを交互に積層した多層構造となすことによっ
て良好な特性を得ることができるが、光入射によって、
生じた荷電ギヤリアのつ°]ノの市・化が5b2s5の
多化′lノ(層に抽う1(される/・−め、とくに焼付
、留像およびγ特性の点で満足すべきものではなかった
。とぐに、低照度下において強い光が入射した場合、黒
に強く焼き付くので、画質が非常に悪くなる。まだ、γ
値が過大となりやすく、暗所での色信号出力が不足勝ち
となる。
Conventional Structure and Problems Generally, the photoelectric conversion target of a vidicon type color image pickup tube used in a color television camera includes a photoconductive film made of antimony trisulfide (Sb2Ss). Such a photoconductive film can obtain good characteristics by forming a multilayer structure in which dense layers of sb, s5 and porous layers of Sb2S3 are alternately laminated.
The resulting charge gearing is not particularly satisfactory in terms of printing, image retention, and gamma characteristics. There was no.If strong light enters under low illumination, the black will be strongly burned in, resulting in very poor image quality.
The value tends to be excessive, resulting in insufficient color signal output in dark places.

発明の目的 この発明は、とくに単撮像管形カラーテレビ/ヨンカメ
ラに組み込まれるカラー撮像管に適した分光感度特性を
有し、低照度下ま/ζは中照度1:における焼料現象が
少なく、留像特性も優れていて、しかも広い照度範囲下
で十分な色再現性がイNられる撮像管用の光電変換ター
ゲットおよ0・その製造方法を提供するものである2 発明の構成 この発明の光電変換ターゲットは、基板上に被着形成さ
れた透明導電層と、この透明導電層」二に被着形成され
たSb2S3またはsb過剰の5b2s3からなる第1
稠密層と、この第1稠密層上に被着形成されたSb過剰
のSb2S3を主成分とする第241開缶層と、この第
2稠密層」二に被着形成された8b2S5を主成分とす
る多孔質層と、この多孔質層上に被着形成されたsb過
剰の5b283を主成分とする第3稠密層とを備えたも
のにおいて、・前記多孔質層ゞsb濃度を前記第3稠密
層側へ行くに従−て段階的または連続的匠高くしたこと
を特徴とするものであって、その詳細]および製造方法
は、図示しだ実施例とともに以下に詳細に詳明する。
Purpose of the Invention The present invention has spectral sensitivity characteristics particularly suitable for color image pickup tubes incorporated in single-type image pickup tube type color televisions/yeon cameras, and has less printing phenomenon at low or medium illuminance. The present invention provides a photoelectric conversion target for an image pickup tube that has excellent image retention characteristics and has sufficient color reproducibility under a wide illuminance range, and a method for manufacturing the same. The photoelectric conversion target consists of a transparent conductive layer deposited on a substrate, and a first layer made of Sb2S3 or 5b2s3 with excess sb deposited on the transparent conductive layer.
a dense layer, a 241st open can layer containing Sb-excess Sb2S3 as a main component and formed on this first dense layer, and a 241st open can layer containing 8b2S5 as a main component and formed on this second dense layer. and a third dense layer formed on the porous layer and containing 5b283 with excess sb as a main component, the porous layer has a sb concentration of It is characterized by having a stepwise or continuous height increase as it approaches the layer side, and its details and manufacturing method will be explained in detail below along with illustrated embodiments.

実施例の説明 本発明を実施した光電変換ターゲットの断面を示す第1
図にお贋て、ガラス円盤からなる4(Oj、1は、その
一方の面上に透明導電層2を有している。
DESCRIPTION OF EMBODIMENTS A first diagram showing a cross section of a photoelectric conversion target in which the present invention is implemented.
In the figure, a glass disk 4 (Oj, 1) has a transparent conductive layer 2 on one surface thereof.

透明導電層2は、たとえば酸化インジウム(I n20
3)をスパッタにより500人〜1000人の層厚に被
着形成したものであって、透明導電層2上には、sbを
過剰に含んだ5b2Sxの第1稠密層3が被着4 形成されている。第1稠密層3は、1×10Torr以
下の真空度のもとて形成できるが、不純物や欠陥を含ま
ない良好な層を得るためには、5×166以下の真空度
下で形成するのが好まレバ。
The transparent conductive layer 2 is made of, for example, indium oxide (In20
3) is deposited to a thickness of 500 to 1000 layers by sputtering, and a first dense layer 3 of 5b2Sx containing an excess of sb is deposited on the transparent conductive layer 2. ing. The first dense layer 3 can be formed under a vacuum level of 1 x 10 Torr or less, but in order to obtain a good layer that does not contain impurities or defects, it is recommended to form it under a vacuum level of 5 x 166 Torr or less. I like lever.

第1稠密層3上には、sbを過剰に含んだ5b23゜か
らなる第2稠密層4が被着形成されており、この第2稠
密層4も、5 X 10−’ Torr以下の真空度下
で形成するのが好ましい。
A second dense layer 4 made of 5b23° containing an excess of sb is formed on the first dense layer 3, and this second dense layer 4 is also formed under a vacuum degree of 5 x 10-' Torr or less. Preferably, it is formed below.

第1および第2稠密層3,4は、光電変換感度に大きく
寄与する感度領域であり、Sbを過剰に添加することに
より、約60011 mの光波長を中心にした広い範囲
で増感作用営ませることができる。sbを過剰に添加す
ることにより、P型半導体としての性質が強まることが
実験の結果判明した。このため、sb濃度の異なる2つ
のSb2S5領域を接合すると、弱い整流性接合が得ら
れる。
The first and second dense layers 3 and 4 are sensitivity regions that greatly contribute to photoelectric conversion sensitivity, and by adding excessive Sb, sensitization can be performed in a wide range centered on the optical wavelength of approximately 60011 m. You can do it. As a result of experiments, it was found that by adding an excessive amount of sb, the properties as a P-type semiconductor are strengthened. Therefore, when two Sb2S5 regions having different sb concentrations are joined together, a weak rectifying junction is obtained.

第2図はこの整流性接合の電圧−′電流特性を示すもの
で、過剰のsbを異なる割合で添加した21狂(域を接
合し、添加5b(1)多い力を負とする極性ケご直流電
圧を印加すると、その逆の極性に直流電圧を印加した場
合に比して電流が流れにくい。そして、前記2領域のs
bの濃度差が大きいほど11J記整流性の傾向が太きい
Figure 2 shows the voltage-' current characteristics of this rectifying junction. When a DC voltage is applied, it is difficult for current to flow compared to when a DC voltage is applied with the opposite polarity.
The greater the difference in concentration of b, the greater the tendency of the 11J rectification.

また、第3図aに示すように、電流が流れにくい方向へ
直流電圧を印加する逆バイアスでは、前記2領域A、B
の接合面に集中して内部電圧が発生するのであって、こ
の様子を第3図すに示す。
Furthermore, as shown in FIG.
An internal voltage is generated concentrated at the junction surface of the wafer, and this situation is shown in Fig. 3.

これより明らかなように、前記2領域のSb濃度を均一
にした場合、内部に作用する電界は一様となるのに対し
、前記2領域のsb濃度を異ならせた場合は、接合面に
集中して電界が生じる。
As is clear from this, when the Sb concentrations in the two regions are made uniform, the electric field acting inside is uniform, whereas when the Sb concentrations in the two regions are made different, the electric field is concentrated at the junction surface. An electric field is generated.

このような集中電界形成領域を、充電変換部に設けると
、前記領域では、光入射により生じた荷電キャリアが力
1j速きれる。したがって、正負のキャリアは再結合す
ることなく速やかに両電極に達することになり、感度が
向上する。そして、そのためには、第18’il密層3
よりも第2稠密層4のsb濃度を市くする必要がある。
When such a concentrated electric field forming region is provided in the charge conversion section, charge carriers generated by light incidence are broken at a speed of force 1j in the region. Therefore, positive and negative carriers quickly reach both electrodes without recombining, improving sensitivity. And for that purpose, the 18'il dense layer 3
It is necessary to make the sb concentration of the second dense layer 4 more moderate than that of the second dense layer 4.

第1および第2稠密層3,4のSbG度の差が大きい(
・1ど内i’i1% l電界が強くなり、感度に関して
は有利である。・しかし、sbの特定波長光増感作用に
より、分光感度に変化をきたすから、sb濃度には分光
感度面からの制約がある。
The difference in SbG content between the first and second dense layers 3 and 4 is large (
・I'i1% l The electric field becomes stronger, which is advantageous in terms of sensitivity. -However, the spectral sensitivity changes due to the photosensitizing action of sb at a specific wavelength, so there are restrictions on the sb concentration from the perspective of spectral sensitivity.

第1稠密層3は、主としてずr色光に対して、−Jlい
感度を有する必要があり、このためにはsbは少ないほ
ど有利である。しかし、N型半導体である透明導電層2
との境界に電界を形成する目的から、第1稠密層3のs
bは71.68〜76重量%とする。また、第2稠密層
4には、第1稠密層3よりも高濃度にsbを含ませ、強
い電界を形成するのが41利であるが、sbが高濃度に
なりすぎると、分光感度のピークが赤色側へ移動し、単
管式カラー撮像管の光電変換ターゲットに適さなくなる
The first dense layer 3 needs to have -Jl high sensitivity mainly to achromatic light, and for this purpose, it is more advantageous to have a smaller value of sb. However, the transparent conductive layer 2 which is an N-type semiconductor
s of the first dense layer 3 for the purpose of forming an electric field at the boundary with
b is 71.68 to 76% by weight. Furthermore, it is advantageous to include sb in the second dense layer 4 at a higher concentration than in the first dense layer 3 to form a strong electric field, but if the sb concentration becomes too high, the spectral sensitivity will decrease. The peak shifts to the red side, making it unsuitable as a photoelectric conversion target for single-tube color image pickup tubes.

このため、第2稠密層4のsbとしては、76〜80重
量%が限度である。また、第1および第2稠密層3,4
の各層厚は、いずれが大きくても分光感度のピークが赤
色側へ移動する。単管式カラー撮像管の光電変換ターゲ
ットに使用する場合は、宵色感度が1・、hい方が好ま
しいので、どちらの層厚も小さい方が分光感度面では有
利である。(7かし、あまシ薄すぎると全体の感度が低
下するので、第1および第2稠密層3,4の各層厚は1
00人〜1000人が適当である。
Therefore, the limit for sb of the second dense layer 4 is 76 to 80% by weight. In addition, the first and second dense layers 3 and 4
No matter which layer thickness is larger, the peak of spectral sensitivity shifts toward the red side. When used as a photoelectric conversion target for a single-tube color image pickup tube, it is preferable that the evening color sensitivity is 1.h, so it is advantageous in terms of spectral sensitivity that both layer thicknesses are smaller. (7) However, if the thickness is too thin, the overall sensitivity will decrease, so the thickness of each layer of the first and second dense layers 3 and 4 should be 1
00 to 1000 people is appropriate.

第2稠密層4を形成したのち、Ar、 N2. Neま
たはHe等の不活性ガス中で、sbを過剰に含んだSb
2S3を蒸発、凝縮させ、sb、、s3からなる第1お
よび第2多孔質層6,6を形成する。多孔質層5.6は
密度が低いため、見かけ上の誘電率は小さく、ターゲッ
ト全体の静電容肝が小さくなる。
After forming the second dense layer 4, Ar, N2. Sb containing excess sb in an inert gas such as Ne or He
2S3 is evaporated and condensed to form first and second porous layers 6, 6 made of sb, s3. Since the porous layer 5.6 has a low density, its apparent dielectric constant is small, and the capacitance of the entire target becomes small.

丑だ、多孔JiQ層は、電子を通過させるが止孔を捕獲
する性質があるので、多孔質層5,6を形成したことに
より、全体の静電容置が小ざくなって残像特性が著しく
改善され、しかも、光電変換により生じた多数の正孔の
うち電子走査側へ向う止孔が吸収される。そして、光照
射後にも残るn一孔が吸収されることとなり、留像現象
が低減される。
Unfortunately, the porous JiQ layer has the property of allowing electrons to pass through but trapping holes, so by forming the porous layers 5 and 6, the overall electrostatic capacity becomes smaller and the afterimage characteristics are significantly improved. Furthermore, out of the large number of holes generated by photoelectric conversion, those holes directed toward the electron scanning side are absorbed. Then, the remaining n holes even after light irradiation are absorbed, and the image retention phenomenon is reduced.

しか[−1多孔質層で捕獲された正孔は、透明導電層2
側へ逆電界を生じ、感度領域である第1および第2稠密
層3,4の電界を相殺するから、光入射した部分の感度
に低下をきたし、負の焼付現象を生じる。また、多孔質
層5,6内に捕獲された正孔は、電子の走査側から徐々
に注入される電子と結合して消滅するから、この部分に
おける暗電流が減少し、低照度下において強い光が入射
した場合、強い負の焼付現象を生じる。
However, the holes captured in the porous layer are transferred to the transparent conductive layer 2.
Since a reverse electric field is generated toward the side and cancels out the electric fields of the first and second dense layers 3 and 4, which are sensitive regions, the sensitivity of the portion where light is incident is lowered and a negative image-printing phenomenon occurs. In addition, the holes captured in the porous layers 5 and 6 combine with electrons gradually injected from the electron scanning side and disappear, so the dark current in this part decreases and is strong under low illuminance. When light is incident, a strong negative burn-in phenomenon occurs.

そこで、この発明では、5b2s、を主体とする多孔質
層のsb濃度を均一とぜず、階段的または連続的に変化
させて内部電界を生じさせ、捕獲された正孔を前記内部
電界で引きはがすことにより、前記焼付現象を軽減させ
る。なお、多孔質層を形成する場合、真空度が1x l
o−’ Torr未満では完全な多孔質とならず、稠密
層に近いものとなる。
Therefore, in this invention, the sb concentration of the porous layer mainly composed of 5b2s is not uniformly changed, but is changed stepwise or continuously to generate an internal electric field, and the trapped holes are drawn by the internal electric field. By peeling it off, the above-mentioned seizure phenomenon is reduced. In addition, when forming a porous layer, the degree of vacuum is 1x l
If it is less than o-' Torr, it will not become completely porous and will become close to a dense layer.

まだ、真空度がI X 10’−”i:orr を越え
ると、多孔質性が強くなり、止孔の通過W、が減少しす
ぎて感度を低下させるので、多孔質層を形成する場合の
真空度は、1 ×I Q−’ Torr 〜I X 1
σ’ Torrの範囲内に設定すべきである。ただし、
前記不活性ガスに02を添加すると、多孔質性が若干強
くなることを考慮すべきである。また、真空度が1X1
0  Torr  に近づくと、正孔の通過用°が減少
するのみならず、入射光量に対する信号の比γ値に減少
をきだすことがある。
However, if the degree of vacuum exceeds I x 10'-"i:orr, the porosity becomes strong and the passage W through the stopper hole decreases too much, reducing the sensitivity. Therefore, when forming a porous layer, The degree of vacuum is 1 × I Q-' Torr ~ I X 1
It should be set within the range of σ' Torr. however,
It should be taken into account that the addition of 02 to the inert gas slightly increases the porosity. Also, the degree of vacuum is 1X1
As the value approaches 0 Torr, not only the hole passage degree decreases, but also the ratio γ value of the signal to the amount of incident light may decrease.

したがって真空度は、これらを勘案して設定する。多孔
質層の層厚はγ値に影響するので、第1および第2多孔
質層6,6の各層厚は、100人〜4000人の範囲が
ら選ぶめがよい。第1多孔質層5に比して第2稠密層4
のsb濃度が低いど、第1多質層6と第2稠密層4との
間に内部電界が形成されず、感度の向上が望めず、暗電
流が大となる。まだ、第1多孔質層5に多量のsbを添
加すると・ Sb2S3とsbとが分離してしまう。第
2多孔質層6に対しては第1多孔質層5よりも高濃度に
sbを添加する必要性があるので、第1多孔質層5にお
ける実用的なsb@度は、sbが76〜80重量%であ
る。
Therefore, the degree of vacuum is set taking these into consideration. Since the thickness of the porous layer affects the γ value, the thickness of each of the first and second porous layers 6, 6 is preferably selected from a range of 100 to 4000 layers. Second dense layer 4 compared to first porous layer 5
When the sb concentration is low, no internal electric field is formed between the first multilayer layer 6 and the second dense layer 4, and no improvement in sensitivity can be expected, resulting in a large dark current. If a large amount of sb is added to the first porous layer 5, Sb2S3 and sb will separate. Since it is necessary to add sb to the second porous layer 6 at a higher concentration than the first porous layer 5, the practical sb@ degree in the first porous layer 5 is sb of 76 to It is 80% by weight.

第2多孔質層6には、第1多孔質層5よりも高濃度にs
bを含ませる必要があり、Sb濃度は、sbが80〜9
oN量チの範囲内が適当である。
The second porous layer 6 has a higher concentration of s than the first porous layer 5.
It is necessary to contain Sb, and the Sb concentration is 80 to 9.
It is appropriate to keep the oN amount within the range.

第2多孔′貫層6上にsbを過剰に含んだ5b2s。5b2s containing an excess of sb on the second porous through layer 6;

からなる第3稠密層7を形成するのであるが、第3稠密
層7は、第2稠密層4と同じく完全な稠密層となすため
に、I X 10−’ Torr以F、好ましくけ5×
1σ’Torr以下の真空中で形成する。第3NjM密
層7のSb濃度よりも低いと暗電流が増大するので、第
2多孔質層6と同等またはそれ以上のSb濃度に設定す
る。また、Sb濃度が高すぎると、sb、、 sbとs
bとが分離するので、第3稠菖′層7のsb添加坩は8
0〜90重品係が適当である。
In order to make the third dense layer 7 a complete dense layer like the second dense layer 4, the third dense layer 7 has a temperature of I x 10-' Torr or more, preferably 5 x
It is formed in a vacuum of 1σ' Torr or less. If the Sb concentration is lower than that of the third NjM dense layer 7, the dark current will increase, so the Sb concentration is set to be equal to or higher than that of the second porous layer 6. Also, if the Sb concentration is too high, sb, sb and s
Since sb and b are separated, the sb-added crucible in the third iris layer 7 is 8
0-90 Heavy goods section is appropriate.

第3稠密層7の層厚が太きすぎると、赤色感度か若干増
力[]する。しかし、厚すぎると残像が増ツノ目し、逆
に薄すぎると電子走査側からの電子が第1および第2多
孔質層5,6へ進入し、多孔質層の肪性が損なわれるの
で、第3稠密層70層1+、4は1000人〜6000
人が適当である。
If the third dense layer 7 is too thick, the red sensitivity will be slightly increased. However, if it is too thick, the afterimage will increase, and if it is too thin, electrons from the electron scanning side will enter the first and second porous layers 5 and 6, impairing the fatness of the porous layer. 3rd dense layer 70 layer 1+, 4 1000 to 6000 people
The person is appropriate.

以上のようにして形成された光電変換ターゲットを、真
空装置内または撮像管の真空外囲器内に封入したのち、
50〜200℃の温度下で30分以上熱処理する。この
真空熱処理の所要面間t」2、高温下であれば短かく、
低温下であれば長く設定する。この真空熱処理によって
、各層の接触面におけるなじみが良くなり、かつ、粒子
状構造に変化を生じ、感度が向上するとともに、信号電
流の不所望な時間的変動を防ぐことができる。
After the photoelectric conversion target formed as described above is enclosed in a vacuum device or a vacuum envelope of an image pickup tube,
Heat treatment is performed at a temperature of 50 to 200°C for 30 minutes or more. The required surface distance t''2 for this vacuum heat treatment is shorter if the temperature is high;
Set it longer if the temperature is low. This vacuum heat treatment improves the conformability of the contact surfaces between the layers, changes the grain structure, improves sensitivity, and prevents undesired temporal fluctuations in the signal current.

第1多孔質層6と第2多孔質層6との層厚配分を変える
と、中照度下での焼付および低照度下での焼付のいずれ
か一方をとくに効果的に軽減させることができる。すな
わち、第1多孔質層5のJ層厚比率を小さくすると、と
くに中照度下での焼イ」現象が軽減され、第2多孔質層
6の層厚比率を小さくすると、とくに低照度下での焼料
現象がΦY減される。捷だ、笛体については、前記層厚
比の大小に関係なく、従来のものよりも軽減きれる。次
表は、その具体的数値例を示すものである。
By changing the thickness distribution of the first porous layer 6 and the second porous layer 6, it is possible to particularly effectively reduce either the seizure under medium illuminance or the seizure under low illuminance. In other words, when the J layer thickness ratio of the first porous layer 5 is reduced, the "burning" phenomenon is reduced, especially under medium illuminance, and when the layer thickness ratio of the second porous layer 6 is reduced, it is reduced, especially under low illuminance. The firing phenomenon is reduced by ΦY. As for the flute body, it can be reduced more than the conventional one, regardless of the size of the layer thickness ratio. The following table shows specific numerical examples.

いずれの測定も、パターンの撮像および光の照射などを
15秒間行なったのちの焼料および留1象を示し、多孔
質層の層厚配分を適当に選ぶと、中照度焼付、低照度焼
付および留1象を従来のものよりも軽減できることが判
る。とくに従来、画質を著しく悪くしていた低照度下で
の焼付が効果的に改善される。まだ、不活性ガスの圧力
を適当に選ぶことによって、γ特性を任意に選択するこ
とができ、広い照度範囲下で十分な色信号をと9出すこ
とができる。しだがって、とくに単管用カラー撮像管の
光電変換ターゲットに使用した場合、良好な色再現特性
をtifることかできる。
All measurements show the firing rate after 15 seconds of pattern imaging and light irradiation, and if the layer thickness distribution of the porous layer is appropriately selected, medium illuminance firing, low illumination firing and It can be seen that the problem of 1st problem can be reduced compared to the conventional method. In particular, burn-in under low illumination, which conventionally caused image quality to deteriorate significantly, is effectively improved. However, by appropriately selecting the pressure of the inert gas, the γ characteristic can be arbitrarily selected, and a sufficient color signal can be produced under a wide illuminance range. Therefore, particularly when used as a photoelectric conversion target for a single-tube color image pickup tube, good color reproduction characteristics can be achieved.

なお、前記実施例では、多孔質層を第1お上ひ第2の2
層に形成したが、これは3層以」二であってもよく、捷
だ、Sb濃度を第3稠密層側へ行くに従って段階的に高
める代りに、連続的に商めてもよい。さらに、Sb2S
3の各層に若干の不純物を混入させてもよい。
In addition, in the above embodiment, the porous layer is placed between the first layer and the second layer.
Although it is formed in layers, it may be formed in three or more layers, and instead of increasing the Sb concentration stepwise toward the third dense layer, it may be increased continuously. Furthermore, Sb2S
A small amount of impurity may be mixed into each layer of 3.

発明の効果 この発明の光電変換ターゲットi↓、前!ホのよりに構
成てれるので、低照度下や中照度下での焼付現象および
留像現象を軽減させることができ、しかも、良好な分光
感度特性が得られるのみならずγ特性を任意に設定でき
るので、とくに、カラー撮像管に適用して広い照度範囲
下で満足すべき色信号出力をとり出すことができる。
Effects of the invention Photoelectric conversion target i↓ of this invention, front! Since it is constructed with a double-sided structure, it is possible to reduce the image sticking phenomenon and image retention phenomenon under low or medium illuminance, and not only can good spectral sensitivity characteristics be obtained, but also the γ characteristics can be set arbitrarily. Therefore, it can be particularly applied to a color image pickup tube to obtain a satisfactory color signal output under a wide illuminance range.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明を実施しだ光電変換ターゲットの断面
図、第2図はsb濃度の異なる2つのSb2S5領域の
接合面における整流特性を示す図、第3図(a)は逆バ
イアスされた611記接合面を示す図、第3図(1))
は前記接合面における内部電圧を示す図である。 代理人の氏名 弁理士 中 尾 敏 IJ3  +・1
か1名第1図 第2図 3 図 ハ   B
Figure 1 is a cross-sectional view of a photoelectric conversion target in which the present invention is implemented, Figure 2 is a diagram showing the rectification characteristics at the junction surface of two Sb2S5 regions with different sb concentrations, and Figure 3 (a) is a diagram showing the rectification characteristics at the junction surface of two Sb2S5 regions with different sb concentrations. 611, a diagram showing the joint surface, Fig. 3 (1))
is a diagram showing the internal voltage at the junction surface. Name of agent: Patent attorney Satoshi Nakao IJ3 +・1
Figure 1 Figure 2 Figure 3 Figure C B

Claims (2)

【特許請求の範囲】[Claims] (1)基板上に被着形成された透明導電層と、この透明
導電層上に被着形成されたSb2S5まだはsb過剰の
Sb2S3からなる第1稠密層と、この第1稠密層上に
被着形成されたsb過剰のSb2S3を主成分とする第
2稠密層と、この第2稠密層上に被着形成された5b2
s3を主成分とする多孔質層と、この多孔質層」二に被
着形成されたsb過剰のSb、、S3を主成分とする第
3稠密層とを備え、前記多孔質層のSb濃度は前記第3
稠密層側へいくに従って段階的または連続的に高いこと
を特徴とする光電変換ターゲット。
(1) A transparent conductive layer deposited on a substrate, a first dense layer made of Sb2S5 but still Sb excess Sb2S3 deposited on the transparent conductive layer, and a first dense layer deposited on the first dense layer. A second dense layer containing excess Sb2S3 as a main component, and a 5b2 layer formed on the second dense layer.
A porous layer containing S3 as a main component, and a third dense layer containing S3 as a main component with an excess of Sb adhered to the porous layer, the Sb concentration of the porous layer being is the third
A photoelectric conversion target characterized by increasing its height stepwise or continuously toward the dense layer side.
(2)  Sbが71.6.8〜76N量係の5b2s
 3を1×10−’Tor、r以下の真空中で透明導電
層上に蒸着し、層厚が100人〜1ooO人の第1稠密
層を形成する段階と、sbが76〜80重搦2%のSb
2S5をI X 10” Torr以下の真空中でAt
I記第1稠密層上に蒸着し、前記第1稠密層よりもSb
濃度が高く層厚が100人〜1000人の第2稠密層を
形成する段階と、Sbが76〜80重i1j、’ %の
Sb+) 83 f I X 10 ’ Tor r以
上のガス雰囲気中で前記第2稠密層上に蒸着し、層1’
r%が100人〜4000人の第1多孔質層を形成する
段階と、Sbが80〜90M量係ノ5b2s3ヲ前記ガ
ス雰囲気中で前記第1多孔質層上に蒸着し、前記第1多
子−質層よりもSb濃度が篩り)必I1.°が100人
〜4ooO人の・152多化7ji層ろ一形成する段階
と、sbが80〜90重jt%tvsb2s。 をlX10  Torr以下の真空中で前記第2多孔質
層上に蒸着し、層厚が1000A〜6000人の第3稠
密層を形成する段階とを備えでなることを特徴とする光
電変換ターゲットの製造方法。
(2) 5b2s with Sb of 71.6.8~76N
3 on the transparent conductive layer in a vacuum of 1 x 10-' Tor, r or less to form a first dense layer with a layer thickness of 100 to 100 people, and sb of 76 to 80 %Sb
2S5 in a vacuum of less than I x 10" Torr
I. Sb is deposited on the first dense layer, and Sb is deposited on the first dense layer.
The step of forming a second dense layer with a high concentration and a layer thickness of 100 to 1000 layers, and the step of forming a second dense layer with a Sb content of 76 to 80% Sb+) in a gas atmosphere of 83 f I X 10' Tor r or more Deposited on the second dense layer, layer 1'
forming a first porous layer with r% of 100 to 4000, and depositing Sb on the first porous layer in the gas atmosphere; (The Sb concentration is higher than that of the stroma layer) Must be I1. ° is 100 to 4ooO people / 152 multilayered 7ji layer formation stage, and sb is 80 to 90 folds jt% tvsb2s. and forming a third dense layer having a layer thickness of 1000 A to 6000 A by vapor-depositing it on the second porous layer in a vacuum of 1×10 Torr or less. Method.
JP57157691A 1982-09-09 1982-09-09 Photoelectric conversion target and its manufacturing method Granted JPS5946738A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57157691A JPS5946738A (en) 1982-09-09 1982-09-09 Photoelectric conversion target and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57157691A JPS5946738A (en) 1982-09-09 1982-09-09 Photoelectric conversion target and its manufacturing method

Publications (2)

Publication Number Publication Date
JPS5946738A true JPS5946738A (en) 1984-03-16
JPH0129297B2 JPH0129297B2 (en) 1989-06-09

Family

ID=15655273

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57157691A Granted JPS5946738A (en) 1982-09-09 1982-09-09 Photoelectric conversion target and its manufacturing method

Country Status (1)

Country Link
JP (1) JPS5946738A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009099933A (en) * 2007-09-28 2009-05-07 Fujifilm Corp Radiograph detector

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD905647S1 (en) * 2018-07-20 2020-12-22 Heatscape.Com, Inc. Combination heat pipe and heat sink

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50146214A (en) * 1974-05-13 1975-11-22
JPS5534979A (en) * 1978-09-05 1980-03-11 Nakatarou Mochizuki Reciprocating feeder for wood working machine

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50146214A (en) * 1974-05-13 1975-11-22
JPS5534979A (en) * 1978-09-05 1980-03-11 Nakatarou Mochizuki Reciprocating feeder for wood working machine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009099933A (en) * 2007-09-28 2009-05-07 Fujifilm Corp Radiograph detector

Also Published As

Publication number Publication date
JPH0129297B2 (en) 1989-06-09

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