JPS594541U - Retake - Google Patents

Retake

Info

Publication number
JPS594541U
JPS594541U JP1982098791U JP9879182U JPS594541U JP S594541 U JPS594541 U JP S594541U JP 1982098791 U JP1982098791 U JP 1982098791U JP 9879182 U JP9879182 U JP 9879182U JP S594541 U JPS594541 U JP S594541U
Authority
JP
Japan
Prior art keywords
pattern
sample
reference mark
retake
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1982098791U
Other languages
Japanese (ja)
Inventor
宮原 温
Original Assignee
富士通株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士通株式会社 filed Critical 富士通株式会社
Priority to JP1982098791U priority Critical patent/JPS594541U/en
Publication of JPS594541U publication Critical patent/JPS594541U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案による一実施例のレティクルを示しaは
平面図ζ−bは一部断面を示す正面図、第2図は本考案
による一実施例の基準マークの拡大図を示す。 図において1はレティクル、11は角形基板、12は所
望のパターン、13は基準マーク、Aは基準マークの線
巾寸法。
FIG. 1 shows a reticle according to an embodiment of the present invention, a is a plan view, ζ-b is a partially sectional front view, and FIG. 2 is an enlarged view of a reference mark according to an embodiment of the present invention. In the figure, 1 is a reticle, 11 is a square substrate, 12 is a desired pattern, 13 is a reference mark, and A is the line width dimension of the reference mark.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 透明体からなる基板と、該基板上に遮光性の膜で形成さ
れたパターンと、該パターンとは別に設けられた前記パ
ターンの評価用の基準マークを有し、該基準マークは該
パターンを試料上に投影した時に該試料上に結像しない
ような寸法にて形成されてなることを特徴とするレティ
クル。
It has a substrate made of a transparent material, a pattern formed with a light-shielding film on the substrate, and a reference mark for evaluating the pattern provided separately from the pattern, and the reference mark marks the pattern on the sample. A reticle characterized in that it is formed with dimensions such that an image is not formed on the sample when projected onto the sample.
JP1982098791U 1982-06-29 1982-06-29 Retake Pending JPS594541U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1982098791U JPS594541U (en) 1982-06-29 1982-06-29 Retake

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1982098791U JPS594541U (en) 1982-06-29 1982-06-29 Retake

Publications (1)

Publication Number Publication Date
JPS594541U true JPS594541U (en) 1984-01-12

Family

ID=30234397

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1982098791U Pending JPS594541U (en) 1982-06-29 1982-06-29 Retake

Country Status (1)

Country Link
JP (1) JPS594541U (en)

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