JPS5944541U - Diffusion furnace type reduced pressure vapor phase growth equipment - Google Patents
Diffusion furnace type reduced pressure vapor phase growth equipmentInfo
- Publication number
- JPS5944541U JPS5944541U JP13733282U JP13733282U JPS5944541U JP S5944541 U JPS5944541 U JP S5944541U JP 13733282 U JP13733282 U JP 13733282U JP 13733282 U JP13733282 U JP 13733282U JP S5944541 U JPS5944541 U JP S5944541U
- Authority
- JP
- Japan
- Prior art keywords
- vapor phase
- reduced pressure
- phase growth
- diffusion furnace
- pressure vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来の拡散炉型気相成長装置の一例を示す概要
縦断面図、第２図は本考案による気相成長装置のサセプ
タ部分の側面図、第３図は第２図 ゛、を右方か
ら見た正面図である。
１・・・反応容器、２・・・給気部、３・・・排気部、
４・・・高周波誘導加熱コイル、５・・・ホルダ、６・
・・凹部、７・・・サセプタ、δ・・・試料、９・・・
ダミー試料、１゜・・・支持台ミ１１・・・連結棒。Fig. 1 is a schematic longitudinal cross-sectional view showing an example of a conventional diffusion furnace type vapor phase growth apparatus, Fig. 2 is a side view of the susceptor portion of the vapor phase growth apparatus according to the present invention, and Fig. 3 is a schematic longitudinal sectional view showing an example of a conventional diffusion furnace type vapor phase growth apparatus. It is a front view seen from the right side. 1... Reaction container, 2... Air supply section, 3... Exhaust section,
4... High frequency induction heating coil, 5... Holder, 6...
... recess, 7... susceptor, δ... sample, 9...
Dummy sample, 1°...Support stand 11...Connecting rod.
Claims (1)
共に互いに間隔を置いて設置された多数の導電性物質製
のサセプタにそれぞれ試料を装着し、前記サセプタを高
周波誘導ｐ口前コイルにより誘導加熱して試料を加熱す
るようにした拡散炉型減圧気相成長装置において、前記
各々のサセプタの周辺を２個所以上の位置で互いに保持
すると共に、各々のサセプタ間を導電性物質にて接続し
たことを特徴とする拡散炉型減圧気相成長装置。A sample is attached to each of a number of susceptors made of conductive material that are positioned perpendicularly to the longitudinal direction of the reaction vessel and spaced apart from each other, and the susceptors are induced by a high-frequency induction coil. In a diffusion furnace type reduced pressure vapor phase growth apparatus that heats a sample by heating, the periphery of each of the susceptors is held together at two or more positions, and the susceptors are connected with a conductive substance. A diffusion furnace type reduced pressure vapor phase growth apparatus characterized by the following.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13733282U JPS5944541U (en) | 1982-09-10 | 1982-09-10 | Diffusion furnace type reduced pressure vapor phase growth equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13733282U JPS5944541U (en) | 1982-09-10 | 1982-09-10 | Diffusion furnace type reduced pressure vapor phase growth equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5944541U true JPS5944541U (en) | 1984-03-24 |
Family
ID=30308502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13733282U Pending JPS5944541U (en) | 1982-09-10 | 1982-09-10 | Diffusion furnace type reduced pressure vapor phase growth equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5944541U (en) |
-
1982
- 1982-09-10 JP JP13733282U patent/JPS5944541U/en active Pending
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