JPS5939712A - パタ−ニングされたシリコン薄膜の製造方法 - Google Patents

パタ−ニングされたシリコン薄膜の製造方法

Info

Publication number
JPS5939712A
JPS5939712A JP14935082A JP14935082A JPS5939712A JP S5939712 A JPS5939712 A JP S5939712A JP 14935082 A JP14935082 A JP 14935082A JP 14935082 A JP14935082 A JP 14935082A JP S5939712 A JPS5939712 A JP S5939712A
Authority
JP
Japan
Prior art keywords
thin film
silicon thin
substrate
silicon
grid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14935082A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6367554B2 (enExample
Inventor
Kazunobu Tanaka
田中　一宜
Akihisa Matsuda
彰久 松田
Keiji Kumagai
熊谷　啓二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tonen General Sekiyu KK
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Toa Nenryo Kogyyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Toa Nenryo Kogyyo KK filed Critical Agency of Industrial Science and Technology
Priority to JP14935082A priority Critical patent/JPS5939712A/ja
Publication of JPS5939712A publication Critical patent/JPS5939712A/ja
Publication of JPS6367554B2 publication Critical patent/JPS6367554B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Silicon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
JP14935082A 1982-08-30 1982-08-30 パタ−ニングされたシリコン薄膜の製造方法 Granted JPS5939712A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14935082A JPS5939712A (ja) 1982-08-30 1982-08-30 パタ−ニングされたシリコン薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14935082A JPS5939712A (ja) 1982-08-30 1982-08-30 パタ−ニングされたシリコン薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS5939712A true JPS5939712A (ja) 1984-03-05
JPS6367554B2 JPS6367554B2 (enExample) 1988-12-26

Family

ID=15473197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14935082A Granted JPS5939712A (ja) 1982-08-30 1982-08-30 パタ−ニングされたシリコン薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS5939712A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4866006A (en) * 1985-06-03 1989-09-12 Toyo Boseki Kabushiki Kaisha Process for producing hydrogenated amorphous silicon film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4866006A (en) * 1985-06-03 1989-09-12 Toyo Boseki Kabushiki Kaisha Process for producing hydrogenated amorphous silicon film

Also Published As

Publication number Publication date
JPS6367554B2 (enExample) 1988-12-26

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