JPS5938584A - 照射加熱炉の運転方法 - Google Patents
照射加熱炉の運転方法Info
- Publication number
- JPS5938584A JPS5938584A JP57149055A JP14905582A JPS5938584A JP S5938584 A JPS5938584 A JP S5938584A JP 57149055 A JP57149055 A JP 57149055A JP 14905582 A JP14905582 A JP 14905582A JP S5938584 A JPS5938584 A JP S5938584A
- Authority
- JP
- Japan
- Prior art keywords
- incandescent
- heating furnace
- irradiation
- bulb
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 title claims description 78
- 238000000034 method Methods 0.000 title claims description 25
- 230000001678 irradiating effect Effects 0.000 title claims description 3
- 230000008569 process Effects 0.000 claims description 12
- 238000012546 transfer Methods 0.000 description 25
- 230000007246 mechanism Effects 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000011017 operating method Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 241000270666 Testudines Species 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003340 mental effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000010137 moulding (plastic) Methods 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
- F27B9/062—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated electrically heated
- F27B9/066—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated electrically heated heated by lamps
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/0033—Heating devices using lamps
- H05B3/009—Heating devices using lamps heating devices not specially adapted for a particular application
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Recrystallisation Techniques (AREA)
- Tunnel Furnaces (AREA)
- Furnace Details (AREA)
- Control Of Resistance Heating (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57149055A JPS5938584A (ja) | 1982-08-30 | 1982-08-30 | 照射加熱炉の運転方法 |
| US06/527,474 US4508960A (en) | 1982-08-30 | 1983-08-29 | Light-radiant furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57149055A JPS5938584A (ja) | 1982-08-30 | 1982-08-30 | 照射加熱炉の運転方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5938584A true JPS5938584A (ja) | 1984-03-02 |
| JPS618356B2 JPS618356B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-03-13 |
Family
ID=15466672
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57149055A Granted JPS5938584A (ja) | 1982-08-30 | 1982-08-30 | 照射加熱炉の運転方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4508960A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
| JP (1) | JPS5938584A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02309629A (ja) * | 1989-05-24 | 1990-12-25 | Sony Corp | ランプアニール装置 |
| JP2002176001A (ja) * | 2000-12-05 | 2002-06-21 | Semiconductor Energy Lab Co Ltd | 熱処理装置 |
| JP2002176000A (ja) * | 2000-12-05 | 2002-06-21 | Semiconductor Energy Lab Co Ltd | 熱処理装置及び半導体装置の製造方法 |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4689008A (en) * | 1985-03-11 | 1987-08-25 | Hailey Robert W | Heating and handling system for metal consolidation process |
| DE3720912A1 (de) * | 1986-07-03 | 1988-01-07 | Licentia Gmbh | Verfahren und anordnung zum reflow-loeten und reflow-entloeten von leiterplatten |
| DE3787367T2 (de) * | 1987-05-14 | 1994-04-14 | Processing Technologies Inc Ag | Heizapparat für Halbleiter-Wafer. |
| US5517005A (en) * | 1988-05-19 | 1996-05-14 | Quadlux, Inc. | Visible light and infra-red cooking apparatus |
| US5345534A (en) * | 1993-03-29 | 1994-09-06 | Texas Instruments Incorporated | Semiconductor wafer heater with infrared lamp module with light blocking means |
| US5864119A (en) * | 1995-11-13 | 1999-01-26 | Radiant Technology Corporation | IR conveyor furnace with controlled temperature profile for large area processing multichip modules |
| US5960158A (en) * | 1997-07-11 | 1999-09-28 | Ag Associates | Apparatus and method for filtering light in a thermal processing chamber |
| US5990454A (en) * | 1997-09-23 | 1999-11-23 | Quadlux, Inc. | Lightwave oven and method of cooking therewith having multiple cook modes and sequential lamp operation |
| US5958271A (en) * | 1997-09-23 | 1999-09-28 | Quadlux, Inc. | Lightwave oven and method of cooking therewith with cookware reflectivity compensation |
| US6013900A (en) * | 1997-09-23 | 2000-01-11 | Quadlux, Inc. | High efficiency lightwave oven |
| US5930456A (en) * | 1998-05-14 | 1999-07-27 | Ag Associates | Heating device for semiconductor wafers |
| US5970214A (en) * | 1998-05-14 | 1999-10-19 | Ag Associates | Heating device for semiconductor wafers |
| US6114664A (en) * | 1998-07-08 | 2000-09-05 | Amana Company, L.P. | Oven with combined convection and low mass, high power density heating |
| US6210484B1 (en) | 1998-09-09 | 2001-04-03 | Steag Rtp Systems, Inc. | Heating device containing a multi-lamp cone for heating semiconductor wafers |
| US6771895B2 (en) * | 1999-01-06 | 2004-08-03 | Mattson Technology, Inc. | Heating device for heating semiconductor wafers in thermal processing chambers |
| WO2002034012A1 (de) * | 2000-10-18 | 2002-04-25 | Advanced Photonics Technologies Ag | Bestrahlungsanordnung |
| US20120085281A1 (en) * | 2010-10-07 | 2012-04-12 | Sandvik Thermal Process, Inc. | Apparatus with multiple heating systems for in-line thermal treatment of substrates |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5339136A (en) * | 1976-09-22 | 1978-04-10 | Ricoh Co Ltd | Fixing temperature controlling method |
| US4221956A (en) * | 1978-06-21 | 1980-09-09 | General Electric Company | Apparatus for practising temperature gradient zone melting |
| US4400612A (en) * | 1981-05-06 | 1983-08-23 | Nordson Corporation | Oven for skin packaging machine |
-
1982
- 1982-08-30 JP JP57149055A patent/JPS5938584A/ja active Granted
-
1983
- 1983-08-29 US US06/527,474 patent/US4508960A/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02309629A (ja) * | 1989-05-24 | 1990-12-25 | Sony Corp | ランプアニール装置 |
| JP2002176001A (ja) * | 2000-12-05 | 2002-06-21 | Semiconductor Energy Lab Co Ltd | 熱処理装置 |
| JP2002176000A (ja) * | 2000-12-05 | 2002-06-21 | Semiconductor Energy Lab Co Ltd | 熱処理装置及び半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4508960A (en) | 1985-04-02 |
| JPS618356B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-03-13 |
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