JPS5937360B2 - Metal surface treatment equipment - Google Patents

Metal surface treatment equipment

Info

Publication number
JPS5937360B2
JPS5937360B2 JP684577A JP684577A JPS5937360B2 JP S5937360 B2 JPS5937360 B2 JP S5937360B2 JP 684577 A JP684577 A JP 684577A JP 684577 A JP684577 A JP 684577A JP S5937360 B2 JPS5937360 B2 JP S5937360B2
Authority
JP
Japan
Prior art keywords
cathode
anode
metal surface
surface treatment
electrolyte
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP684577A
Other languages
Japanese (ja)
Other versions
JPS5393126A (en
Inventor
荘太郎 土岐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP684577A priority Critical patent/JPS5937360B2/en
Publication of JPS5393126A publication Critical patent/JPS5393126A/en
Publication of JPS5937360B2 publication Critical patent/JPS5937360B2/en
Expired legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Description

【発明の詳細な説明】 この発明は金属表面処理装置に係ク、とくに、電気化学
的に金属表面を処理する装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a metal surface treatment apparatus, and more particularly to an apparatus for electrochemically treating a metal surface.

電気化学反応を利用した金属表面の処理技術は 20電
気メッキ、電鋳、陽極酸化等種々の分野に応用されてい
る。これらは、電解液中に陽極と陰極とを浸漬し、両極
間に電流を通じることによつておこなわれる。この金属
の表面処理を効率よ<おこなうために、従来、種々の工
夫がこらされている。31例えば、電気メッキにおいて
は、厚みむらや異常析出を伴わない良好な電着物を得る
ために電解液を攪拌することがおこなわれている。
Metal surface treatment technology that utilizes electrochemical reactions has been applied to various fields such as electroplating, electroforming, and anodic oxidation. These are performed by immersing an anode and a cathode in an electrolytic solution and passing an electric current between the two electrodes. In order to efficiently perform this metal surface treatment, various efforts have been made in the past. 31 For example, in electroplating, the electrolytic solution is stirred in order to obtain a good electrodeposit without uneven thickness or abnormal deposition.

この攪拌によつて、電解液を陰極に均一に接触させるこ
とができ、また陰極へ絶えず電解液を供給し得るた 3
め高電流密度で操作がおこなえる。従来、電解液の攪拌
は空気攪拌、電解液の循環、被メッキ体である陰極の揺
動等によつておこなわれている。
By this stirring, the electrolyte can be brought into uniform contact with the cathode, and the electrolyte can be constantly supplied to the cathode.
It can be operated at high current density. Conventionally, stirring of the electrolytic solution has been carried out by air stirring, circulation of the electrolytic solution, rocking of the cathode that is the object to be plated, and the like.

しかしながら、空気攪拌法では気泡が被メッキ面に付着
したDして、これがメッキ面のむらの原因となることが
あり、電解液循壌法では電解液の流れに基因するむらが
生じたクする。現在のところ最も有効な方法は陰極の揺
動方法である。この方法はカソードロッカ−として知ら
れ、固定した陽極の面に平行な方向に陰極を左右に揺動
させるものである。このカソードロッカ−法によれば電
解液が均一に陰極と接触する結果厚みむらのない電着物
が得られ、また、ピット防止剤等の表面活性剤を添加し
た電解液に適用しても泡立ちが生じないという利点があ
る。しかしながら、カソードロッカ−法では、陰極と電
解液との接触が比較的緩慢なため、高電液密度での操作
が困難であり、また、陽極近傍における電解液の撹拌が
ほとんどおこなわれないため、陽極の溶解が悪くそのた
め電解液中の金属イオンを消費し、例えば電解液として
の一・ルフアミン酸ニッケルから遊離したスルファミン
酸のため電解液のpHが低下してしまうといウ欠点があ
つた。
However, in the air stirring method, air bubbles may adhere to the surface to be plated, which may cause unevenness on the plated surface, and in the electrolyte circulation method, unevenness may occur due to the flow of the electrolyte. Currently, the most effective method is the cathode rocking method. This method is known as a cathode rocker, and involves rocking the cathode from side to side in a direction parallel to the plane of a fixed anode. According to this cathode rocker method, the electrolyte comes into contact with the cathode uniformly, resulting in an electrodeposit with an even thickness, and even when applied to an electrolyte containing a surface active agent such as a pit preventive agent, no foaming occurs. It has the advantage that it does not occur. However, in the cathode rocker method, the contact between the cathode and the electrolyte is relatively slow, making it difficult to operate at high electrolyte densities, and the electrolyte is hardly stirred near the anode. This has the disadvantage that the anode is poorly dissolved and the metal ions in the electrolyte are consumed, and the pH of the electrolyte is lowered due to sulfamic acid liberated from, for example, nickel monosulfamate as the electrolyte.

この発明は上記背景に基づいてなされたものであり、上
記欠点の生じることがな<、とくに、高電流密度で操作
することのできる金属表面処理装置を提供することを目
的とする。この発明の金属表面処理装置は一定間隔をも
つて平行に対面・固定した陽極および陰極と、この陽極
あるいは陰極の面に垂直な方向にこれら陽極および陰極
を往復揺動させるための機構を具備したことを特徴とす
るものである。
The present invention has been made based on the above background, and it is an object of the present invention to provide a metal surface treatment apparatus that does not suffer from the above-mentioned drawbacks and can be operated at high current density. The metal surface treatment apparatus of the present invention includes an anode and a cathode that face each other and are fixed in parallel at a constant interval, and a mechanism for reciprocating the anode and cathode in a direction perpendicular to the surface of the anode or cathode. It is characterized by this.

以下この発明を電気メッキに適用した例について添付図
面に沿つて説明する。
An example in which the present invention is applied to electroplating will be described below with reference to the accompanying drawings.

第1図はこの発明装置の電極構造を示している。FIG. 1 shows the electrode structure of the device of this invention.

それぞれ平板の陽極1と陰極2は一定間隔をもつて平行
に対面している。陽極1と陰極2とはその下端において
、例えば、アクリル樹脂等のプラスチック性の固定棒3
、3によつて固定されている。陽極1と陰極2の上端に
はこれら極に通電するための銅製のブスバ一4,4が設
置されておジ、これらブスバ一4,4はその両端におい
て固定棒3,3と同様の固定棒5,5によつて固定され
ている。第2図には6第1図に示した電極を、例えばス
ルフアミン酸ニツケル等のメツキ液7を収容したメツキ
槽6に設置した構成が示されている。メツキに際しては
、適当な揺動機構8によう電極1,2をその面に垂直な
方向、すなわち図中矢印で示す方向に通常毎分30ない
し300往復させる。メツキ液はこの揺動によジ電極1
,2に垂直方向に衝突することにな勺撹拌効果をあげる
ことができる。すなわち、陰極2全面に同じ圧で同時に
電解液が接触するため厚みむらや異常析出のない均一な
電着皮膜を得ることができる。
An anode 1 and a cathode 2, each of which is a flat plate, face each other in parallel with a constant interval. The anode 1 and the cathode 2 have a fixing rod 3 made of plastic such as acrylic resin at their lower ends.
, 3. Copper busbars 4, 4 are installed at the upper ends of the anode 1 and cathode 2 for supplying electricity to these electrodes, and these busbars 4, 4 have fixed rods similar to the fixed rods 3, 3 at both ends thereof. It is fixed by 5,5. FIG. 2 shows a configuration in which the electrodes shown in FIG. 1 are installed in a plating tank 6 containing a plating liquid 7 such as nickel sulfamate. During plating, the electrodes 1 and 2 are normally moved back and forth 30 to 300 times per minute by a suitable swinging mechanism 8 in a direction perpendicular to the surface thereof, that is, in the direction shown by the arrow in the figure. This oscillation causes the plating liquid to
, 2 in the vertical direction, a stirring effect can be achieved. That is, since the electrolytic solution is brought into contact with the entire surface of the cathode 2 at the same time under the same pressure, a uniform electrodeposited film without uneven thickness or abnormal deposition can be obtained.

また、陰極2面に発生する水素ガスもこの揺動によう陰
極2に吸着することなく、ピツトの発生が防止できる。
さらに、電解液との接触が多くなる結果陰極近傍へ絶え
ず新しいしたがつて金属イオン濃度の大きいメツキ液を
供給することができるため、メツキを高電流密度でおこ
なうことができるのである。ちなみに、従来のカソート
ロッカ−法によるニツケルメツキでは20A/Dm2が
その限界電流密度であつたが、この発明装置を用いると
その2ないし3倍あるいはそれ以上の電流密度でメツキ
することができる。また、この発明装置では陽極1も同
時に揺動するので、陽極1近傍のメツキ液の撹拌も士分
におこなわれ、陽極1の醇解が促進される結果、メツキ
液中の金属イオンを消費することによつて遊離した酸の
ためメツキ液のPHが低下することがなく、黒色スケー
ルの発生も抑制される。
Moreover, the hydrogen gas generated on the surface of the cathode 2 is not adsorbed to the cathode 2 due to this oscillation, thereby preventing the formation of pits.
Furthermore, as a result of increased contact with the electrolytic solution, a new plating solution with a high metal ion concentration can be constantly supplied to the vicinity of the cathode, so plating can be performed at a high current density. Incidentally, in conventional nickel plating using the cathode rocker method, the limiting current density was 20 A/Dm2, but with the device of the present invention, plating can be performed at a current density two to three times or more than that. In addition, in this device of the present invention, since the anode 1 is also oscillated at the same time, the plating solution near the anode 1 is stirred, and as a result, the dissolution of the anode 1 is promoted, and as a result, the metal ions in the plating solution are consumed. As a result, the pH of the plating solution does not decrease due to the released acid, and the generation of black scale is also suppressed.

なお、第1図に示すように、陽極1に径が数mlないし
数傭の透孔9を多数設けることによ7!)電極1,2間
のメツキ液の入換えが容易におこなえ、絶えず新しいメ
ツキ液中でメツキすることができる。
In addition, as shown in FIG. 1, by providing the anode 1 with a large number of through holes 9 each having a diameter of several milliliters to several centimeters, 7! ) The plating solution between the electrodes 1 and 2 can be easily exchanged, and plating can be constantly performed using new plating solution.

以上述べた例はこの発明装置を電気メツキに適用したも
のであるが、これに限らず、広く一般の金属表面処理例
えば電濤、陽極酸化、電解脱脂、電解研磨、電解腐食等
にこの発明を適用することができる。
The above-mentioned example is an application of the device of the present invention to electroplating, but the present invention is not limited to this and can be applied to a wide range of general metal surface treatments such as electroplating, anodizing, electrolytic degreasing, electrolytic polishing, and electrolytic corrosion. Can be applied.

なお、いうまでもないが、透孔の設けられる電極は処理
されない方の電極である。以下この発明の実施例を記す
。実施例 この実施例は、スルフアミン酸ニツケル浴(浴組織:ス
ルJャAミン酸二ツケル6009/T,塩化ニツケル10
9/T,ホウ酸309/T,ラウリル硫酸ナトリウム0
.059/T.l,3,6−ナフタレントリスルフオン
酸ナトリウム59/t)を用いた厚み60μの光沢ニツ
ケル箔製造にこの発明を適用した例を示すものである。
It goes without saying that the electrode provided with the through hole is the one that is not treated. Examples of this invention will be described below. Example This example uses a nickel sulfamic acid bath (bath structure: nickel sulfamic acid 6009/T, nickel chloride 10
9/T, boric acid 309/T, sodium lauryl sulfate 0
.. 059/T. This figure shows an example in which the present invention was applied to the production of a glossy nickel foil with a thickness of 60 μm using sodium l,3,6-naphthalene trisulfonate (59/t).

面積500X5001!のステンレス鋼板よジなる陰極
とこれと同一寸法のAp−ニツケル板よ勺なる陽極(1
c1rLの透孔を多数有する)とを10(:l!Lの間
隔で平行に対面させその上端にブスバ一を設置しそして
下端をポリ塩化ピニル製の固定棒で固定した電極セツト
を用い、浴温60のC,pH4.0電極セツトの揺動数
60回往復/分の条件で電鋳をおこなつた。
Area 500x5001! A cathode made of a stainless steel plate and an anode made of an Ap-nickel plate of the same size (1
Using an electrode set in which the electrodes (having a large number of through holes of c1rL) were placed facing each other in parallel at intervals of 10(:l!L), a busbar was installed at the upper end, and the lower end was fixed with a fixing rod made of polyvinyl chloride, the electrode set was Electroforming was carried out at a temperature of 60 C, a pH of 4.0 electrode set, and an oscillation rate of 60 times/min.

限界電流密度は100A/Dm2であ勺、通常カソート
ロッカ−法に比べて5倍の早さで電鋳できた。
The limiting current density was 100 A/Dm2, and electroforming could be performed five times faster than the normal cathode rocker method.

陰極から剥離して得たニツケル はピツトや異常析出が
全くなく、光沢にもむらがなかつた。また、厚みの誤差
も±0.5μの範囲内におさまジ、均一な電着被膜が得
られたことがわかつた。さらに、上記と同一条件下でニ
ツケル箔を50回繰返したが、この間メツキ浴のPHお
よびニツケルイオン濃度の低下は全くみられず、陽極を
同時に揺動することによつて陽極近傍のメツキ浴の撹拌
が士分におこなわれ、陽極がよく?解したことを示して
いた。
The nickel obtained by peeling from the cathode had no pits or abnormal precipitation, and its gloss was even. It was also found that the error in thickness was kept within the range of ±0.5μ, and a uniform electrodeposited film was obtained. Furthermore, the nickel foil was repeated 50 times under the same conditions as above, but no decrease in the pH or nickel ion concentration of the plating bath was observed during this period. Is the stirring done by the master and the anode well? It showed that he understood.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の金属表面処理装置に用いられる陽極
と陰極のセツトを示す斜視図、そして第2図はこの発明
の金属表面処理装置の概略側面図。 1・・・・・・陽極、2・・・・・・陰極、3,4・・
・・・・固定棒、9・・・・・・透孔。
FIG. 1 is a perspective view showing a set of anode and cathode used in the metal surface treatment apparatus of the present invention, and FIG. 2 is a schematic side view of the metal surface treatment apparatus of the present invention. 1... Anode, 2... Cathode, 3, 4...
...Fixing rod, 9...Through hole.

Claims (1)

【特許請求の範囲】 1 一定間隔をもつて平行に対面固定した陽極および陰
極と、この陽極あるいは陰極の面に垂直な方向にこれら
陽極および陰極を往復揺動させるための機構を具備した
ことを特徴とする金属表面処理装置。 2 陽極または陰極が透孔を有することを特徴とする特
許請求の範囲第1項記載の金属表面処理装置。
[Claims] 1. An anode and a cathode that are fixed facing each other in parallel with a certain interval, and a mechanism for reciprocating the anode and cathode in a direction perpendicular to the surface of the anode or cathode. Characteristic metal surface treatment equipment. 2. The metal surface treatment apparatus according to claim 1, wherein the anode or the cathode has a through hole.
JP684577A 1977-01-26 1977-01-26 Metal surface treatment equipment Expired JPS5937360B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP684577A JPS5937360B2 (en) 1977-01-26 1977-01-26 Metal surface treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP684577A JPS5937360B2 (en) 1977-01-26 1977-01-26 Metal surface treatment equipment

Publications (2)

Publication Number Publication Date
JPS5393126A JPS5393126A (en) 1978-08-15
JPS5937360B2 true JPS5937360B2 (en) 1984-09-08

Family

ID=11649568

Family Applications (1)

Application Number Title Priority Date Filing Date
JP684577A Expired JPS5937360B2 (en) 1977-01-26 1977-01-26 Metal surface treatment equipment

Country Status (1)

Country Link
JP (1) JPS5937360B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58176965U (en) * 1982-05-18 1983-11-26 トヨタ自動車株式会社 Electrodeposition coating equipment
CN103590079A (en) * 2012-08-14 2014-02-19 亚洲电镀器材有限公司 Electroplating method

Also Published As

Publication number Publication date
JPS5393126A (en) 1978-08-15

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