JPS5933541B2 - Compound with hexagonal layered structure represented by HoGaMnO↓4 and method for producing the same - Google Patents

Compound with hexagonal layered structure represented by HoGaMnO↓4 and method for producing the same

Info

Publication number
JPS5933541B2
JPS5933541B2 JP11833481A JP11833481A JPS5933541B2 JP S5933541 B2 JPS5933541 B2 JP S5933541B2 JP 11833481 A JP11833481 A JP 11833481A JP 11833481 A JP11833481 A JP 11833481A JP S5933541 B2 JPS5933541 B2 JP S5933541B2
Authority
JP
Japan
Prior art keywords
compound
layered structure
hogamno
structure represented
hexagonal layered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11833481A
Other languages
Japanese (ja)
Other versions
JPS5820727A (en
Inventor
昇 君塚
英治 高山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KAGAKU GIJUTSUCHO MUKIZAISHITSU KENKYUSHOCHO
Original Assignee
KAGAKU GIJUTSUCHO MUKIZAISHITSU KENKYUSHOCHO
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KAGAKU GIJUTSUCHO MUKIZAISHITSU KENKYUSHOCHO filed Critical KAGAKU GIJUTSUCHO MUKIZAISHITSU KENKYUSHOCHO
Priority to JP11833481A priority Critical patent/JPS5933541B2/en
Publication of JPS5820727A publication Critical patent/JPS5820727A/en
Publication of JPS5933541B2 publication Critical patent/JPS5933541B2/en
Expired legal-status Critical Current

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  • Inorganic Compounds Of Heavy Metals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Description

【発明の詳細な説明】 本発明は新規化合物であるHoGaMn04で示される
六方晶系の層状構造を有する化合物およびその製造法に
関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel compound HoGaMn04 having a hexagonal layered structure and a method for producing the same.

従来、YFe。Conventionally, YFe.

04で示される六方晶系の層状構造を有する化合物は知
られる。
A compound having a hexagonal layered structure represented by 04 is known.

この化合物はY3+Fe2+Fe3+OH−で示される
ように、鉄の2価イオンと3価イオンは5配位の酸素イ
オンに囲まれ、Yは6配位の酸素イオンをその周りに持
つている化合物であり、磁性を持つている。本発明は前
記Y3+Fe2+Fe3+OH−の化合 。物のY3+
の代りにHo3+、Fe″fの代りにMn2+を(Fe
3+の代りにGa3−に)置きかえた新規な化合物およ
びその製造法を提供するにある。本発明のHoGaMn
04で示される化合物は、この化合物中、ホルミウムは
Ho3+イオン、マンガンはMn2+、ガリウムは3価
イオンとして存在しており、Ho3+Ga3+Mn2+
川一として表わすことができる。この結晶は第1図に示
すような六方晶層状構造を持つている。最大の丸は酸素
、中丸はホルミウム、最小の黒丸はガリウムとマンガン
を示す。GaとMnはランダムに入つている。マンガン
の2価イオンとガリウムの3価イオンは5配位の酸素イ
オンによつて囲まれ、結晶学的には同一の位置を占めて
いる。また、Hoは6配位の酸素をその周りに持つてい
る。陰イオンである酸素は緻密構造をとつている。この
結晶の面指数(hkl)、面間隔(d入)(doは実測
、dcは計算値を示す)、X線に対する相対反射強度(
I%)は第1表の通りである。
This compound is a compound in which divalent and trivalent iron ions are surrounded by five-coordinated oxygen ions, and Y has six-coordinated oxygen ions around it, as shown by Y3+Fe2+Fe3+OH-. It has magnetism. The present invention is a compound of Y3+Fe2+Fe3+OH-. Things Y3+
Ho3+ instead of , Mn2+ instead of Fe″f (Fe
The object of the present invention is to provide a novel compound in which Ga3- is substituted for 3+, and a method for producing the same. HoGaMn of the present invention
In the compound shown by 04, holmium exists as Ho3+ ion, manganese exists as Mn2+, and gallium exists as trivalent ion, and Ho3+Ga3+Mn2+
It can be expressed as a river. This crystal has a hexagonal layered structure as shown in FIG. The largest circle indicates oxygen, the middle circle indicates holmium, and the smallest black circle indicates gallium and manganese. Ga and Mn are entered randomly. The divalent ions of manganese and the trivalent ions of gallium are surrounded by five-coordinated oxygen ions and occupy the same position crystallographically. Moreover, Ho has six-coordinated oxygen around it. Oxygen, an anion, has a dense structure. The plane index (hkl) of this crystal, the plane spacing (d included) (do is the actual measurement, dc is the calculated value), the relative reflection intensity for X-rays (
I%) are shown in Table 1.

そして空間群はR「mで、その晶癖は板状晶で、格子定
数は次の通りである。ao■ 34905±O、000
4(λ)Co■ 25.136±O、008(入)第1
表HoGaMnO4 この化合物は触媒材料ならびに半導体材料として有用な
ものである。
The space group is R'm, its crystal habit is plate-like, and its lattice constant is as follows: ao ■ 34905±O, 000
4(λ)Co■ 25.136±O, 008 (in) 1st
Table HoGaMnO4 This compound is useful as a catalytic material as well as a semiconductor material.

この化合物は次の方法によつて製造し得られる。This compound can be produced by the following method.

ホルミウム酸化物(HO2O3)、マンガン酸化物(M
nO)および酸化ガリウム(Ga2O3)を、モル比で
約1対2対1の割合で混合し、該混合物を非酸化性雰囲
気下で1000℃以上の温度で加熱することによつて製
造することができる。本発明に用いるホルミウム酸化物
は市囚pものをそのまま使用してもよいが、酸化物相互
の反応を速やかに進行させるためには、粒径が小さい程
よく、特に10μm以下であることが好ましい。
Holmium oxide (HO2O3), manganese oxide (M
nO) and gallium oxide (Ga2O3) in a molar ratio of about 1:2:1, and heating the mixture at a temperature of 1000 ° C. or higher in a non-oxidizing atmosphere. can. The holmium oxide used in the present invention may be used as it is, but in order to speed up the reaction between the oxides, the smaller the particle size, the better, particularly preferably 10 μm or less.

また、半導体材料として用いる場合は不純物の混入をき
らうので、原料は純度が高く、また、約1000℃で数
時間空気中で仮焼したものが望ましい。酸化マンガンは
通常の試薬特級程度のものでよい。
Furthermore, when used as a semiconductor material, contamination with impurities is avoided, so it is desirable that the raw material be of high purity and that it be calcined in air at about 1000° C. for several hours. Manganese oxide of ordinary reagent grade level may be used.

粒径は前記、ホルミウム酸化物と同様な理由で10μm
以下であることが好ましい。また、1000′Cで1日
間炭酸ガスと水素の混合ガス(混合比容量で1対1)中
で仮焼し、O℃に急冷させたものが反応が早くなるので
好ましい。酸化ガリウムは試薬特級程度のものでよい。
その粒径は前記と同様に10μm以下であることが好ま
しい。また800℃で1日間空気中で仮焼したものが好
ましい。これらの原料をそのまま、あるいはアルコール
類、アセトン等を入れ十分混合する。これらの混合割合
はHO2O3、MnO.Ga2O3をモル比で1対2対
1の割合である。この割合をはずれると目的とする層状
化合物を得ることができない。これらの混合物を石英ま
たは白金の容器に封入して非酸化性雰囲気下で加熱する
The particle size is 10 μm for the same reason as the holmium oxide mentioned above.
It is preferable that it is below. Further, it is preferable to calcinate in a mixed gas of carbon dioxide and hydrogen (mixing ratio: 1:1 by volume) at 1000'C for one day, and then rapidly cool to 0°C, as this will speed up the reaction. The gallium oxide may be of special reagent grade.
As mentioned above, the particle size is preferably 10 μm or less. Moreover, it is preferable to calcined in air at 800° C. for one day. These raw materials are thoroughly mixed as they are or with alcohol, acetone, etc. added. These mixing ratios are HO2O3, MnO. The molar ratio of Ga2O3 is 1:2:1. If this ratio is exceeded, the desired layered compound cannot be obtained. These mixtures are sealed in a quartz or platinum container and heated under a non-oxidizing atmosphere.

それはマンガンが2価の状態であるので、酸化性雰囲気
(例えば大気中)下ではマンガンが酸化されて3価にな
つてしまうので、非酸化性雰囲気下であることが必要で
ある。加熱温度は1000℃以上であればよく、また加
熱時間は10分以上、好ましくは1時間以上である。加
熱の際の昇温速度は制約はない。反応終了後はO′Cに
急冷するかあるいは大気中に急激に引出せばよい。得ら
れたHOGaMnO4化合物は黒色金属光沢を有し、粉
末X線回折法によつて結晶構造を有することが分つた。
Since manganese is in a divalent state, in an oxidizing atmosphere (for example, in the atmosphere), manganese will be oxidized and become trivalent, so it is necessary to be in a non-oxidizing atmosphere. The heating temperature may be 1000° C. or higher, and the heating time may be 10 minutes or more, preferably 1 hour or more. There are no restrictions on the rate of temperature increase during heating. After the reaction is completed, it may be rapidly cooled to O'C or rapidly drawn out into the atmosphere. The obtained HOGaMnO4 compound had a black metallic luster and was found to have a crystalline structure by powder X-ray diffraction.

試料重量を加熱の前後で精密に秤量し、得られた化合物
の化学量論数を決定した。実施例純度99.9%以上の
ホルミウム酸化物 (HO2O3)粉末、純度99,9%以上の酸化マンガ
ン(MnO)粉末および純度99.9%以上のガリウム
酸化物(Ga2O3)粉末をモル比で1対2対1の割合
に秤量し、乳鉢内でアセトンを加えて十分に混合して平
均粒径数μmの微粉末混合物を得た。
The weight of the sample was precisely weighed before and after heating, and the stoichiometric number of the obtained compound was determined. Example Holmium oxide (HO2O3) powder with a purity of 99.9% or more, manganese oxide (MnO) powder with a purity of 99.9% or more, and gallium oxide (Ga2O3) powder with a purity of 99.9% or more in a molar ratio of 1 The mixture was weighed at a ratio of 2:1, and acetone was added in a mortar and mixed thoroughly to obtain a fine powder mixture with an average particle size of several μm.

該混合物を白金管(内径8m7fL)内に入れて溶封し
た。これを1300℃に設定された箱型のシリコニツト
炉内に入れ、約3日間加熱し、その後試料を取り出し、
室温まで急速に冷却した。得られたものはHOGaMn
O4の六方晶系の層状化合物であつた。その結晶の性状
は第1表に示す通りであつた。
The mixture was placed in a platinum tube (inner diameter 8 m7fL) and sealed. This was placed in a box-shaped siliconite furnace set at 1300°C and heated for about 3 days, after which the sample was taken out.
Cool rapidly to room temperature. What was obtained was HOGaMn
It was a hexagonal layered compound of O4. The properties of the crystal were as shown in Table 1.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本発明のHOGaMnO4の結晶の図である。 最大の丸は酸素、中丸はホルミウム、最小黒丸はガリウ
ムとマンガンを示す。
The drawing is a diagram of the HOGaMnO4 crystal of the present invention. The largest circle indicates oxygen, the middle circle indicates holmium, and the smallest black circle indicates gallium and manganese.

Claims (1)

【特許請求の範囲】 1 HoGaMnO_4で示される六方晶系の層状構造
を有する化合物。 2 ホルミウム酸化物(Ho_2O_3)、マンガン酸
化物(MnO)および酸化ガリウム(Ga_2O_3)
を、モル比で約1対2対1の割合で混合し、この混合物
を非酸化性雰囲気下で1000℃以上の温度で加熱する
ことを特徴とするHoGaMnO_4で示される六方晶
系の層状構造を有する化合物の製造法。
[Claims] 1. A compound having a hexagonal layered structure represented by HoGaMnO_4. 2 Holmium oxide (Ho_2O_3), manganese oxide (MnO) and gallium oxide (Ga_2O_3)
are mixed in a molar ratio of approximately 1:2:1, and this mixture is heated at a temperature of 1000°C or higher in a non-oxidizing atmosphere to form a hexagonal layered structure represented by HoGaMnO_4. A method for producing a compound having
JP11833481A 1981-07-28 1981-07-28 Compound with hexagonal layered structure represented by HoGaMnO↓4 and method for producing the same Expired JPS5933541B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11833481A JPS5933541B2 (en) 1981-07-28 1981-07-28 Compound with hexagonal layered structure represented by HoGaMnO↓4 and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11833481A JPS5933541B2 (en) 1981-07-28 1981-07-28 Compound with hexagonal layered structure represented by HoGaMnO↓4 and method for producing the same

Publications (2)

Publication Number Publication Date
JPS5820727A JPS5820727A (en) 1983-02-07
JPS5933541B2 true JPS5933541B2 (en) 1984-08-16

Family

ID=14734086

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11833481A Expired JPS5933541B2 (en) 1981-07-28 1981-07-28 Compound with hexagonal layered structure represented by HoGaMnO↓4 and method for producing the same

Country Status (1)

Country Link
JP (1) JPS5933541B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021020811A2 (en) 2019-07-26 2021-02-04 노욱래 Drug injection cartridge and drug injector comprising same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021020811A2 (en) 2019-07-26 2021-02-04 노욱래 Drug injection cartridge and drug injector comprising same

Also Published As

Publication number Publication date
JPS5820727A (en) 1983-02-07

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