JPS5932549B2 - 塩素−アルカリ電解槽用の陰極 - Google Patents

塩素−アルカリ電解槽用の陰極

Info

Publication number
JPS5932549B2
JPS5932549B2 JP52015575A JP1557577A JPS5932549B2 JP S5932549 B2 JPS5932549 B2 JP S5932549B2 JP 52015575 A JP52015575 A JP 52015575A JP 1557577 A JP1557577 A JP 1557577A JP S5932549 B2 JPS5932549 B2 JP S5932549B2
Authority
JP
Japan
Prior art keywords
cathode
water
temperature
reducing agent
complexing agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52015575A
Other languages
English (en)
Japanese (ja)
Other versions
JPS52110282A (en
Inventor
マイケル・クラムペルト
ロバ−ト・パウル・マイランド
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Corp
Original Assignee
BASF Wyandotte Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF Wyandotte Corp filed Critical BASF Wyandotte Corp
Publication of JPS52110282A publication Critical patent/JPS52110282A/ja
Publication of JPS5932549B2 publication Critical patent/JPS5932549B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Chemically Coating (AREA)
JP52015575A 1976-02-17 1977-02-17 塩素−アルカリ電解槽用の陰極 Expired JPS5932549B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65853876A 1976-02-17 1976-02-17
US000000658538 1976-02-17

Publications (2)

Publication Number Publication Date
JPS52110282A JPS52110282A (en) 1977-09-16
JPS5932549B2 true JPS5932549B2 (ja) 1984-08-09

Family

ID=24641660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52015575A Expired JPS5932549B2 (ja) 1976-02-17 1977-02-17 塩素−アルカリ電解槽用の陰極

Country Status (7)

Country Link
JP (1) JPS5932549B2 (sl)
CA (1) CA1074952A (sl)
DE (1) DE2706577A1 (sl)
FR (1) FR2341671A1 (sl)
GB (1) GB1566194A (sl)
IT (1) IT1082690B (sl)
NL (1) NL7701589A (sl)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6166549U (sl) * 1984-10-04 1986-05-07

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4384928A (en) * 1980-11-24 1983-05-24 Mpd Technology Corporation Anode for oxygen evolution
JPS58136787A (ja) * 1982-02-04 1983-08-13 Kanegafuchi Chem Ind Co Ltd 耐蝕性電解槽
FR2590595B1 (fr) * 1985-11-22 1988-02-26 Onera (Off Nat Aerospatiale) Bain a l'hydrazine pour le depot chimique de nickel et/ou de cobalt, et procede de fabrication d'un tel bain.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6166549U (sl) * 1984-10-04 1986-05-07

Also Published As

Publication number Publication date
FR2341671A1 (fr) 1977-09-16
IT1082690B (it) 1985-05-21
GB1566194A (en) 1980-04-30
FR2341671B3 (sl) 1980-12-19
CA1074952A (en) 1980-04-08
NL7701589A (nl) 1977-08-19
DE2706577A1 (de) 1977-08-25
JPS52110282A (en) 1977-09-16

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