JPS5931941B2 - Droplet jet recording device - Google Patents
Droplet jet recording deviceInfo
- Publication number
- JPS5931941B2 JPS5931941B2 JP3604079A JP3604079A JPS5931941B2 JP S5931941 B2 JPS5931941 B2 JP S5931941B2 JP 3604079 A JP3604079 A JP 3604079A JP 3604079 A JP3604079 A JP 3604079A JP S5931941 B2 JPS5931941 B2 JP S5931941B2
- Authority
- JP
- Japan
- Prior art keywords
- jet recording
- recording
- droplet jet
- recording device
- ink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010438 heat treatment Methods 0.000 claims description 31
- 239000011241 protective layer Substances 0.000 claims description 30
- 239000007788 liquid Substances 0.000 claims description 24
- 239000010410 layer Substances 0.000 claims description 13
- 238000007789 sealing Methods 0.000 claims description 3
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- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 238000012644 addition polymerization Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
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- 239000013522 chelant Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
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- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 2
- 229920003192 poly(bis maleimide) Polymers 0.000 description 2
- 229920002480 polybenzimidazole Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
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- 239000002952 polymeric resin Substances 0.000 description 2
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- 229920002050 silicone resin Polymers 0.000 description 2
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- 229920001187 thermosetting polymer Polymers 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- YWBHROUQJYHSOR-UHFFFAOYSA-N $l^{1}-selanylbenzene Chemical compound [Se]C1=CC=CC=C1 YWBHROUQJYHSOR-UHFFFAOYSA-N 0.000 description 1
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- UBUCNCOMADRQHX-UHFFFAOYSA-N N-Nitrosodiphenylamine Chemical compound C=1C=CC=CC=1N(N=O)C1=CC=CC=C1 UBUCNCOMADRQHX-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- UQVOJETYKFAIRZ-UHFFFAOYSA-N beryllium carbide Chemical compound [Be][C][Be] UQVOJETYKFAIRZ-UHFFFAOYSA-N 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- VGBAECKRTWHKHC-UHFFFAOYSA-N cyclopenta-1,3-diene;1-ethenylcyclopenta-1,3-diene;iron(2+) Chemical compound [Fe+2].C=1C=C[CH-]C=1.[CH2-]C=C1C=CC=C1 VGBAECKRTWHKHC-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000001017 electron-beam sputter deposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- YUWFEBAXEOLKSG-UHFFFAOYSA-N hexamethylbenzene Chemical compound CC1=C(C)C(C)=C(C)C(C)=C1C YUWFEBAXEOLKSG-UHFFFAOYSA-N 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- YTYSNXOWNOTGMY-UHFFFAOYSA-N lanthanum(3+);trisulfide Chemical compound [S-2].[S-2].[S-2].[La+3].[La+3] YTYSNXOWNOTGMY-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- CUONGYYJJVDODC-UHFFFAOYSA-N malononitrile Chemical compound N#CCC#N CUONGYYJJVDODC-UHFFFAOYSA-N 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- GYVGXEWAOAAJEU-UHFFFAOYSA-N n,n,4-trimethylaniline Chemical compound CN(C)C1=CC=C(C)C=C1 GYVGXEWAOAAJEU-UHFFFAOYSA-N 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- VLZLOWPYUQHHCG-UHFFFAOYSA-N nitromethylbenzene Chemical compound [O-][N+](=O)CC1=CC=CC=C1 VLZLOWPYUQHHCG-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- BEZDDPMMPIDMGJ-UHFFFAOYSA-N pentamethylbenzene Chemical compound CC1=CC(C)=C(C)C(C)=C1C BEZDDPMMPIDMGJ-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- ORQWTLCYLDRDHK-UHFFFAOYSA-N phenylselanylbenzene Chemical compound C=1C=CC=CC=1[Se]C1=CC=CC=C1 ORQWTLCYLDRDHK-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- VUXGXCBXGJZHNB-UHFFFAOYSA-N praseodymium(3+);trisulfide Chemical compound [S-2].[S-2].[S-2].[Pr+3].[Pr+3] VUXGXCBXGJZHNB-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
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- 229910052682 stishovite Inorganic materials 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- NLDYACGHTUPAQU-UHFFFAOYSA-N tetracyanoethylene Chemical group N#CC(C#N)=C(C#N)C#N NLDYACGHTUPAQU-UHFFFAOYSA-N 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 238000007651 thermal printing Methods 0.000 description 1
- YUKQRDCYNOVPGJ-UHFFFAOYSA-N thioacetamide Chemical compound CC(N)=S YUKQRDCYNOVPGJ-UHFFFAOYSA-N 0.000 description 1
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- 239000000080 wetting agent Substances 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1604—Production of bubble jet print heads of the edge shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1623—Manufacturing processes bonding and adhesion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Description
【発明の詳細な説明】
本発明は、一般に、インクと呼ばれる記録液体を微細オ
リフィスから小滴として吐出飛翔させ、この小滴の被記
録面への付着を以て記録を行なう液滴噴射記録装置、特
に、従来にない新規なインク吐出原理に基づく液滴噴射
記録装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention generally relates to a droplet jet recording apparatus that ejects a recording liquid called ink as small droplets from a fine orifice and performs recording by adhering the droplets to a recording surface. , relates to a droplet jet recording device based on a novel ink jetting principle that has never existed before.
現在、知られる各種、記録方式の中でも、記録時に、騒
音の発生がほとんどないノンインパクト記録方式であつ
て、且つ、高速記録が可能であり、しかも、普通紙に特
別の定着処理を必要とせずに記録の行なえる所謂インク
ジェット記録法は、極めて有用な記録方式であると認め
られている。このインクジェット記録法に就いては、こ
れ迄にも様々な方式が提案され、改良が加えられて商品
化されたものもあれば、現在もなお、実用化への努力が
続けられているものもある。インクジェット記録法は、
インクと称される記録液体の液滴(dropleを)を
種々の作用原理で飛翔させ、それを紙等の被記録部材に
付着させて記録を行うものである。Among the various recording methods currently known, it is a non-impact recording method that generates almost no noise during recording, is capable of high-speed recording, and does not require special fixing treatment on plain paper. The so-called inkjet recording method, which can perform recording on images, is recognized as an extremely useful recording method. Various methods have been proposed for this inkjet recording method, some have been improved and commercialized, and others are still being worked on to put them into practical use. be. The inkjet recording method is
Recording is performed by causing droplets of a recording liquid called ink to fly based on various operating principles and making them adhere to a recording material such as paper.
そして、本件出願人も、斯かるインクジェット記録法に
係る新規方式に就いて既に提案を行なつている。この新
規方式は、特願昭52−118798号に於て提案され
ており、その基本原理は次に概説する通りである。つま
り、この新規イックジェット記録方式は、記録液体を収
容することのできる液室中に導入された記録液体に対し
て、情報信号として熱的パルスを与え、前記液体が状態
変化をおこすことによつて生じる作用力に従つて、先の
液室に付設したオリフイスより、前記液体を小液滴とし
て吐出・飛翔せしめ、これを被記録部材に付着させて記
録を行なう方式である。ところで、この新規方式には、
実施装置の構成が従来のそれに比べて簡略であり、マル
チアレー構成にして高速記録に適合させ易いと言う大き
な長所がある反面、実施装置の耐久性が然程高くないと
言う不利が認められた。The present applicant has also already proposed a new system related to such an inkjet recording method. This new system was proposed in Japanese Patent Application No. 118798/1982, and its basic principle is as outlined below. In other words, this new ic-jet recording method applies a thermal pulse as an information signal to the recording liquid introduced into a liquid chamber that can contain the recording liquid, and causes the liquid to change its state. In this method, the liquid is ejected and flown as small droplets from an orifice attached to the liquid chamber according to the acting force generated by the liquid chamber, and the liquid is attached to the recording member to perform recording. By the way, this new method has
The structure of the implementation device is simpler than the conventional one, and while it has the great advantage of being easily adaptable to high-speed recording with a multi-array configuration, it has been recognized as a disadvantage that the durability of the implementation device is not very high. .
即ち、この実施装置に於ては、記録液体に熱的パルスを
入力する手段として発熱体を採用しているため、これが
記録液体に接した状態で繰返し使用されている間に酸化
され、劣化してしまつたり、この発熱体に記録液体がコ
ゲ付いたり、記録液体が電気分解されて、所期の液滴吐
出を妨害する等の不都合がしばしば認められた。そこで
、本発明では、上記、特願昭52一118798号に開
示されたイックジェット記録方式に見られた重大欠点を
完全に解消すると共に、なお一層の改善を施してなる新
規構成の液滴噴射記録装置を提案する。That is, since this implementation device employs a heating element as a means for inputting thermal pulses to the recording liquid, it is possible that the heating element will be oxidized and deteriorated during repeated use in contact with the recording liquid. Inconveniences have often been observed, such as the recording liquid burning on the heating element, or the recording liquid being electrolyzed, which interferes with the intended ejection of droplets. Therefore, in the present invention, we completely eliminate the serious drawbacks found in the quick jet recording method disclosed in Japanese Patent Application No. 52-118798, and also provide a new structure for droplet jetting that is further improved. Suggest a recording device.
つまり、本発明に於ては、その使用寿命が長期に亘る液
滴噴射記録装置を提供することを主目的とする。That is, the main object of the present invention is to provide a droplet jet recording device that has a long service life.
又、本発明に於いては、構造的に簡略であると共に、熱
作用による記録液体の安定的吐出を長時間に亘り保障す
る液滴噴射記録装置を提供することも他の目的とする。Another object of the present invention is to provide a droplet jet recording device that is structurally simple and that ensures stable ejection of recording liquid over a long period of time due to thermal action.
叙上の目的を達成する本発明は、要するに、吐出オリフ
イスに連絡している室内に導入される記録液体を、入力
信号に従つて前記オリフイスから小滴として吐出、飛翔
させ、この小滴の被記録面への付着を以て記録を行なう
液滴噴射記録装置であつて、前記小滴吐出の作用力の発
生源として、発熱抵抗体と該発熱抵抗体が記録液体と接
触するのを防止する被覆保護層とからなる電気・熱変換
体を上記室の少なくとも一部に内設したことを特徴とす
る液滴噴射記録装置である。以下、図示、具体例に従つ
て本発明に就き詳述する。In short, the present invention achieves the above-mentioned objects by ejecting and flying a recording liquid introduced into a chamber communicating with an ejection orifice as a droplet from the orifice in accordance with an input signal, and causing the droplet to be covered. A droplet jet recording device that performs recording by adhering to a recording surface, which includes a heating resistor as a source of the acting force for ejecting the droplets, and a coating protection that prevents the heating resistor from coming into contact with the recording liquid. This is a droplet jet recording device characterized in that an electric/thermal converter consisting of a layer is provided inside at least a part of the chamber. Hereinafter, the present invention will be described in detail with reference to illustrations and specific examples.
第1図において、本発明の記録装置主要部の概要が示さ
れている。FIG. 1 shows an outline of the main parts of the recording apparatus of the present invention.
即ち、発熱体設置基板1の表面に発熱体2が設けられて
いる。That is, the heating element 2 is provided on the surface of the heating element installation board 1.
又、基板3の材料としては、ガラス、セラミツクス或い
は耐熱性プラスチツク等が用いられる。基板3には、吐
出前のインクを収容する室4′及び吐出オリフイス5を
構成する長尺溝4が予め形成されており、基板3と発熱
体設置基板1とは、発熱体2と溝4の位置合せをした後
、接着剤によつて接合して一体化される。次に、この図
示装置に係る液体吐出原理に就いて簡単に述べる。第2
図は、溝4の軸線に沿つた断面図である。記録用インク
は図中、矢印で示される様に室41内へ供給されている
。今、室41内の1部に付設された発熱体2に対して外
部から信号が印加されると、発熱体2は発熱し、その近
傍のインクに熱エネルギーを与える。熱エネルギーを受
けたインクは体積膨張或いは気泡の発生等の状態変化を
起こして圧力変化を生じ、この圧力変化が吐出オリフイ
ス5の方向に伝わり、インクが小滴10となつて吐出さ
れる。そして、この小滴10が不図示の紙等、任意の被
記録材に付着することによつて記録が為される。第2図
に於ては、発熱体2の詳細構造が図示されており、この
発熱体2は、アルミナ等の基板6上に、蓄熱層7、発熱
抵抗体11、電極8および保護層9及び9′の順に薄膜
形成技術によつて積層してある。そして、この発熱体2
は溝4内に露出する構成となつている。発熱体設置基板
1において、インクが直接接するのは保護層9′である
が、これ等の保護層9,9′は共に発熱抵抗体11およ
び電極8がインクと接触して酸化されたり、反対にイン
クを電気分解するのを防いでいる。本発明では、これ等
、保護層9,9′を介して熱エネルギーがインクに伝達
されるので、その厚さは、インタ滴吐出の熱応答性およ
び印字エネルギー効率に大きい影響を与える。つまり、
本発明では保護層9,9′が薄いほど熱伝導が良いため
熱応答性が良く、印字エネルギーも少なくてすむ。しか
し、所謂、サーマルヘツドの製造に際して従来行なわれ
ているように、真空蒸着法やスパツタ一法によつて保護
薄膜を形成する限りでは、それが薄ければ薄い程、電極
8と抵抗体11との段差の部分が露出したり、その保護
薄膜自体にピンホール等の欠損部を残し易い。従つて、
従来は、熱伝導性を多少、犠性にしてでも電極8や抵抗
体11が露出しない程度の厚さは必要であると考えられ
て来た。しかしながら、本発明に於ては、鋭意・工夫の
結果、保護層全体の厚さが極めて薄いものであるにも拘
らず、発熱体2を構成する電極8や発熱抵抗体11がイ
ンクと接触するのを完壁な迄に防止することができる。Further, as the material of the substrate 3, glass, ceramics, heat-resistant plastic, etc. are used. The substrate 3 is pre-formed with a chamber 4' for accommodating the ink before ejection and a long groove 4 constituting the ejection orifice 5. After alignment, they are joined and integrated with adhesive. Next, the liquid ejection principle related to this illustrated device will be briefly described. Second
The figure is a sectional view taken along the axis of the groove 4. Recording ink is supplied into the chamber 41 as indicated by the arrow in the figure. Now, when a signal is applied from the outside to the heating element 2 attached to a part of the chamber 41, the heating element 2 generates heat and gives thermal energy to ink in the vicinity thereof. The ink that has received thermal energy undergoes a change in state such as volumetric expansion or generation of bubbles, resulting in a pressure change, and this pressure change is transmitted in the direction of the ejection orifice 5, and the ink is ejected in the form of small droplets 10. Recording is then performed by the droplets 10 adhering to an arbitrary recording material such as paper (not shown). In FIG. 2, the detailed structure of the heating element 2 is illustrated, and the heating element 2 consists of a heat storage layer 7, a heating resistor 11, an electrode 8, a protective layer 9 and a substrate 6 made of alumina or the like. They are laminated in the order of 9' using a thin film forming technique. And this heating element 2
is exposed in the groove 4. In the heating element installation substrate 1, the protective layer 9' is in direct contact with the ink, but both of these protective layers 9 and 9' prevent the heating resistor 11 and the electrode 8 from being oxidized or adversely affected by contact with the ink. This prevents the ink from being electrolyzed. In the present invention, thermal energy is transferred to the ink through the protective layers 9, 9', so their thickness has a large effect on the thermal responsiveness of inter-droplet ejection and the printing energy efficiency. In other words,
In the present invention, the thinner the protective layers 9, 9', the better the thermal conductivity, the better the thermal response, and the less printing energy required. However, as long as the protective thin film is formed by a vacuum evaporation method or a sputtering method, as is conventionally done in the manufacture of so-called thermal heads, the thinner the protective thin film is, the more difficult it is to connect the electrode 8 and the resistor 11. The step part is likely to be exposed, and the protective thin film itself is likely to have defects such as pinholes. Therefore,
Conventionally, it has been thought that the thickness needs to be such that the electrode 8 and the resistor 11 are not exposed even if the thermal conductivity is sacrificed to some extent. However, in the present invention, as a result of careful consideration and ingenuity, the electrode 8 and the heating resistor 11 that constitute the heating element 2 come into contact with the ink even though the thickness of the entire protective layer is extremely thin. can be completely prevented.
即ち、本発明では、電極8及び抵抗体11を所定形状に
パターンニングした後、更に第1保護層9として、酸化
ベリリウム、酸化ケイ素、酸化マグネシウム、酸化アル
ミニウム、酸化タンタル、酸化ジルコニウム等を例とす
る酸化物、又は炭化ベリリウムを例とする炭化物、又は
窒化タンタル、窒化アルミニウム、窒化ホウ素を例とす
る窒化物、又は、ホウ化ベリリウムを例とするホウ化物
、又は、硫化ランタン、硫化プラセオジム、硫化ネオジ
ム、硫化イツテルビウムを例とする硫化物等を、電子ビ
ーム蒸着法、スパツタリング等の手法で0.01μm〜
1μm程度の薄膜にして積層する。That is, in the present invention, after patterning the electrode 8 and the resistor 11 into a predetermined shape, the first protective layer 9 is further formed using beryllium oxide, silicon oxide, magnesium oxide, aluminum oxide, tantalum oxide, zirconium oxide, or the like. or carbides such as beryllium carbide, or nitrides such as tantalum nitride, aluminum nitride, and boron nitride, or borides such as beryllium boride, or lanthanum sulfide, praseodymium sulfide, and sulfide. Sulfides such as neodymium and yzterbium sulfide are deposited to a size of 0.01 μm or more using techniques such as electron beam evaporation and sputtering.
Laminated in a thin film of about 1 μm.
第1保護層9としては、又この他にシリコーン樹脂、フ
ツ素樹脂、芳香族ポリアミド、付加重合型ポリイミド、
ポリベンズイミダゾール、金属キレート重合体、チタン
酸エステル、エポキシ樹脂、フタル酸樹脂、熱硬化性フ
エノール樹脂、P−ビニルフエノール樹脂、ザイロツク
樹脂、トリアジン樹脂、BT樹脂(トリアジン樹脂とビ
スマレイミド付加重合樹脂)等を例とする耐熱性樹脂類
をスプレー塗布、回転塗布、浸漬塗布等の手法を用いて
0.01μm〜1μmの厚みに成膜しても良い。なお、
この第1保護層9は、単層構成に限らず、重ね塗り等し
て重層構成にしても勿論良い。所謂、感熱記録に適用さ
れるサーマルヘツドにおいては、保護層は、液体と接す
ることがないために、上述した保護層9のピンホールに
関しては検討を全く行なう必要はなかつた。しかし本発
明に係るイックジェット記録方式のように保護層が液体
と直接接する場合には第1保護層9のピンホール防止策
は記録装置の耐久性を考える上で重要な問題となるわけ
である。上記第1保護層9に、必然的に生じたピンホー
ル等の、膜欠損部は、更にその上に、各種樹脂を、第2
保護層9′として積層し、それを充填することによつて
、ほぼ完壁に補填される。In addition to this, the first protective layer 9 may be made of silicone resin, fluorine resin, aromatic polyamide, addition polymerization type polyimide,
Polybenzimidazole, metal chelate polymer, titanate ester, epoxy resin, phthalate resin, thermosetting phenol resin, P-vinylphenol resin, Zylock resin, triazine resin, BT resin (triazine resin and bismaleimide addition polymer resin) A film of heat-resistant resins such as the above may be formed to a thickness of 0.01 μm to 1 μm using techniques such as spray coating, spin coating, and dip coating. In addition,
The first protective layer 9 is not limited to a single-layer structure, but may of course be formed into a multilayer structure by overcoating. In a thermal head applied to so-called heat-sensitive recording, the protective layer does not come into contact with liquid, so there was no need to consider the pinholes in the protective layer 9 described above. However, when the protective layer is in direct contact with the liquid as in the ic-jet recording method according to the present invention, measures to prevent pinholes in the first protective layer 9 become an important issue when considering the durability of the recording device. . Film defects such as pinholes that inevitably occur in the first protective layer 9 are covered with a second layer of various resins.
By laminating the protective layer 9' and filling it, almost complete coverage is achieved.
即ち、本発明に於ける第2保護層9′は第1保護層9に
対する、所謂、目止層として機能するものである。第2
保護層9′として本発明に使用され得る樹脂としては、
1成膜性が良いこと、2緻密な構造でかつピンホールが
少ないこと、3使用インクに対し膨張、溶解しないこと
、4第1保護層との接着性が良いこと、5耐熱性が高い
こと等の物性を具備することが望ましく、例えば、シリ
コーン樹脂、フツ素樹脂、芳香族ポリアミド、付加重合
型ポリイミド、ポリベンズイミダゾール、金属キレート
重合体、チタン酸エステル、エポキシ樹脂、フタル酸樹
脂、熱硬化性フエノール樹脂、P−ビニルフエノール樹
脂、ザイロツク樹脂、トリアジン樹脂、BT樹脂(トリ
アジン樹脂とビスマレイミド付加重合樹脂)等が最も望
ましい。又、この他に、ポリキシリレン樹脂及び、その
誘導体を蒸着によつて成膜する方法も望ましい。That is, the second protective layer 9' in the present invention functions as a so-called sealing layer for the first protective layer 9. Second
Resins that can be used in the present invention as the protective layer 9' include:
1. Good film forming properties, 2. Dense structure with few pinholes, 3. Does not swell or dissolve in the ink used, 4. Good adhesion with the first protective layer, 5. High heat resistance. For example, silicone resin, fluororesin, aromatic polyamide, addition polymerization type polyimide, polybenzimidazole, metal chelate polymer, titanate ester, epoxy resin, phthalate resin, thermosetting resin, etc. Most preferred are polyphenolic resins, P-vinylphenol resins, Zyloc resins, triazine resins, BT resins (triazine resins and bismaleimide addition polymer resins), and the like. In addition to this, it is also desirable to form a film using a polyxylylene resin or a derivative thereof by vapor deposition.
更に、種々の有機化合物モノマー、例えばチオウレア、
チオアセトアミド、ビニルフエロセン、1,3,5,一
トリクロロベンゼン、クロロベンゼン、スチレン、フエ
ロセン、ピコリン、ナフタレン、ペンタメチルベンゼン
、ニトロトルエン、アクリロニトリル、ジフエニルセレ
ナイド、P−トルイジン、P−キシレン、N,N−ジメ
チル−P−トルイジン、トルエン、アニリン、ジフエニ
ルマーキユリ一、ヘキサメチルベンゼン、マロノニトリ
ル、テトラシアノエチレン、チオフエン、ベンゼンセレ
ノール、テトラフルオロエチレン、エチレン、N−ニト
ロソジフエニルアミン、アセチレン、1,2,4,一ト
リタロロベンゼン、プロパン、をプラズマ重合法により
、第2保護層9′として成膜しても良い。前述の耐熱性
樹脂を、第2保護層9′として成膜するには、該樹脂を
、溶剤で希釈した後、第1保護層9の上に、回転塗布、
スプレー塗布、浸漬塗布等の手法を用いて塗布した後、
乾燥硬化させれば良い。この耐熱性樹脂の厚さは、イン
ク吐出の熱応答性、或は、エネルギー効率の良否を左右
するものであるから、薄い方が望ましい。Furthermore, various organic compound monomers such as thiourea,
Thioacetamide, vinylferrocene, 1,3,5,1-trichlorobenzene, chlorobenzene, styrene, ferrocene, picoline, naphthalene, pentamethylbenzene, nitrotoluene, acrylonitrile, diphenylselenide, P-toluidine, P-xylene, N,N- Dimethyl-P-toluidine, toluene, aniline, diphenylmeryl, hexamethylbenzene, malononitrile, tetracyanoethylene, thiophene, benzene selenol, tetrafluoroethylene, ethylene, N-nitrosodiphenylamine, acetylene, 1,2 , 4,-tritalolobenzene, or propane may be formed as the second protective layer 9' by plasma polymerization. In order to form the above-mentioned heat-resistant resin as the second protective layer 9', the resin is diluted with a solvent, and then spin-coated on the first protective layer 9.
After applying using methods such as spray coating and dip coating,
Just let it dry and harden. The thickness of this heat-resistant resin influences the thermal response of ink ejection or the quality of energy efficiency, so it is desirable that it be thin.
本発明では、乾燥後の膜厚で通常は0.01μm〜10
μm好適には0.1μm〜5μm1最適には0.1μm
〜3μmである。又、本発明に於て、水溶媒を用いた導
電性インクを適用する場合には、発熱抵抗体や電極がイ
ンクを通して短絡しないように、上記、第1保護層9、
第2保護層9′の何れか、又は両者を、その比抵抗が5
X105Ω?以上となるように形成するのが望ましい。In the present invention, the film thickness after drying is usually 0.01 μm to 10 μm.
μm Preferably 0.1 μm to 5 μm1 Optimally 0.1 μm
~3 μm. In addition, in the present invention, when applying a conductive ink using an aqueous solvent, the first protective layer 9,
Either or both of the second protective layers 9' have a specific resistance of 5.
X105Ω? It is desirable to form it so that it becomes the above.
本発明による効果は、以下に詳述する実施例によつて、
更に明確に理解されるであろう。The effects of the present invention are demonstrated by the examples detailed below.
will be more clearly understood.
実施例 1〜9 先ず発熱体設置基板を以下の要領で作成した。Examples 1 to 9 First, a heating element installation board was created in the following manner.
第3図aには該基板の拡大斜視図が示されてい 。アル
ミナ基板12上にSlO2蓄熱層13(厚さ数μ)、Z
rB2発熱抵抗層14(厚さ800λ)及びアルミニウ
ム電極層15(厚さ5000人)を形成した後、選択エ
ツチングにより幅60μm1長さ75μmの発熱抵抗体
14′を形成した。又、エツチングにより選択電極15
a及び共通電極15bを形成した。更に第3図bに示す
様に、電極層15上にはSlO2保護層16(厚さ0.
01μm)が積層される。更に、このSiO2保護層1
6の上面に犬々、下表に示すとおりの耐熱性樹脂を液状
にして表記の膜厚に塗工し、真空含浸させた後、下表、
1に記載どおりの条件で焼付け乾燥を行なつて、実施例
1〜9の発熱体設置基板を作成した。FIG. 3a shows an enlarged perspective view of the substrate. On the alumina substrate 12, a SlO2 heat storage layer 13 (thickness of several μ), Z
After forming the rB2 heating resistor layer 14 (thickness 800λ) and the aluminum electrode layer 15 (thickness 5000mm), a heating resistor 14' having a width of 60 μm and a length of 75 μm was formed by selective etching. In addition, the selective electrode 15 is etched.
a and a common electrode 15b were formed. Furthermore, as shown in FIG. 3b, a SlO2 protective layer 16 (thickness 0.5 mm) is formed on the electrode layer 15.
01 μm) are laminated. Furthermore, this SiO2 protective layer 1
6, apply the heat-resistant resin shown in the table below in liquid form to the indicated film thickness, vacuum impregnate it, and then apply the resin shown in the table below.
The heating element installed substrates of Examples 1 to 9 were prepared by baking and drying under the same conditions as described in Section 1.
又、これ等とは別に、ガラス板17に第4図に示すよう
な、複数本の溝18(巾70μm1深さ60μm)と共
通インク室19となる溝とをマイクロカツタ一を用いて
切削形成してなる溝付きプレート20も作成した。Separately, a plurality of grooves 18 (width: 70 μm, depth: 60 μm) and a groove that will become a common ink chamber 19 are formed by cutting the glass plate 17 using a microcutter, as shown in FIG. A grooved plate 20 was also created.
このようにして作成した、各発熱体設置基板と溝付きプ
レートとを、発熱体と溝との位置合せをした上で接合し
、更に、不図示のインク供給部から共通インク室19に
インクを導入するためのインク導入管21も接続して第
5図に示すような記録ヘツドプロツク22を一体的に完
成した。Each heating element installation board and grooved plate created in this way are joined after aligning the heating elements and the grooves, and then ink is supplied from an ink supply section (not shown) to the common ink chamber 19. An ink introduction tube 21 for introducing ink was also connected to complete a recording head block 22 as shown in FIG. 5.
更に、このプロツク22には前述の選択電極、及び共通
電極に接続されている電極リード(共通電極リード、及
び選択電極リード)を有するりード基板が付設された。
吐出実験例としては
インク組成としては
上記吐出実験条件およびインクを用いてインク滴吐出実
験を行なつたところ、下表に示すとおり、耐久性におい
て優れた結果を得た。Further, this block 22 was attached with a lead board having the aforementioned selection electrode and electrode leads (a common electrode lead and a selection electrode lead) connected to the common electrode.
As an example of an ejection experiment, an ink droplet ejection experiment was conducted using the ink composition and the above-mentioned ejection experimental conditions, and as shown in the table below, excellent results were obtained in terms of durability.
また記録性においても優れていた。なお、これ等の実施
例に於ける耐久性の評価は、次のとおり、電気パルスの
繰返し印加可能回数により行なつた。It was also excellent in recording performance. The durability of these Examples was evaluated based on the number of times electric pulses could be repeatedly applied, as follows.
実施例 10〜23
実施例1〜9に於けるSlO2保護層16を下表、2に
記載の材料(膜厚)に換えて成膜すると共に、更にその
上面に夫々、下表、2記載の耐熱性樹脂を被覆した後、
焼付け乾燥を行なつて、実施例10〜23の発熱体設置
基板を実施例1〜9と同様な手法で作成した。Examples 10 to 23 The SlO2 protective layer 16 in Examples 1 to 9 was replaced with the material (film thickness) listed in Table 2 below, and the materials (film thickness) listed in Table 2 below were formed on the upper surface, respectively. After coating with heat-resistant resin,
Baking and drying was performed to produce heating element installed substrates of Examples 10 to 23 in the same manner as Examples 1 to 9.
その後、実施例1〜9と同様にインク滴吐出実験を行な
い、記録装置の耐久性の評価をした。Thereafter, an ink droplet ejection experiment was conducted in the same manner as in Examples 1 to 9 to evaluate the durability of the recording apparatus.
その評価基準は、実施例1〜9の場合と同等であり、結
果をまとめて表、2に示す。因に、以上に示した発熱体
としては、従来、広く、感熱記録の分野に於て用いられ
る感熱印字ヘツド(つまり、サーマル・ヘツド)を適用
することができる。The evaluation criteria were the same as in Examples 1 to 9, and the results are summarized in Table 2. Incidentally, as the above-mentioned heating element, a thermal printing head (that is, a thermal head) widely used in the field of thermal recording can be used.
それらは、作成方法、発熱抵抗体等の差異により、厚膜
へツド、薄膜ヘツド、半導体ヘツドに分類されるが、本
発明においてはそれらの全てが使用可能である。但し特
に高速、高解像力の記録を行うときは、薄膜ヘツドを利
用するのが今のところ望ましい。又、本発明に於て用い
る記録用インタは、水、エタノール等のアルコール、或
は、トルエン等を例とする主溶媒に、エチレングリコー
ル等を例とする湿潤剤、界面活性剤、及び各種染料等を
溶解或は分散させて作成される。They are classified into thick film heads, thin film heads, and semiconductor heads depending on the manufacturing method, heating resistor, etc., but all of them can be used in the present invention. However, especially when performing high speed, high resolution recording, it is currently desirable to utilize thin film heads. Furthermore, the recording interface used in the present invention contains a main solvent such as water, alcohol such as ethanol, or toluene, a wetting agent such as ethylene glycol, a surfactant, and various dyes. It is created by dissolving or dispersing etc.
なお、オリフイスを詰らさないために、作成後フイルタ
一で口過したり、インク流路中にフイルタを設けたりす
る工夫は既存のイックジェット記録法の場合と同様に有
効なことである。以上、詳説したとおり、本発明によれ
ば、常にインク吐出が安定的に行なわれ、高速度で良品
位の記録画を与える高性能の液滴噴射記録装置を提供す
ることができる。Note that in order to prevent clogging of the orifice, it is effective to pass the ink through a filter after preparation or to provide a filter in the ink flow path, as in the case of existing quick-jet recording methods. As described in detail above, according to the present invention, it is possible to provide a high-performance droplet jet recording device that always performs stable ink discharge and provides high-quality recorded images at high speed.
第1図及び第2図は共に、本発明の一実施例を説明する
ため、液滴噴射記録装置の主要部のみを描いた略図、第
3図a1第3図b1第4図及び第5図は、夫々、本発明
の他の実施例を説明するための略図である。
図に於て、1は発熱体設置基板、2は発熱体、4/は室
、5は吐出オリフイス、8,15,15a,15bは電
極、9,9′,16は保護層、11,14,14′は発
熱抵抗体、18は溝、19は共通インク室、20は溝付
きプレート、22は記録ヘツドプロツクである。Both FIG. 1 and FIG. 2 are schematic diagrams depicting only the main parts of a droplet jet recording device in order to explain one embodiment of the present invention, FIG. 3 a1 FIG. 3 b1 FIG. 4 and 5 are schematic diagrams for explaining other embodiments of the present invention, respectively. In the figure, 1 is a heating element installation board, 2 is a heating element, 4/ is a chamber, 5 is a discharge orifice, 8, 15, 15a, 15b are electrodes, 9, 9', 16 are protective layers, 11, 14 , 14' are heating resistors, 18 is a groove, 19 is a common ink chamber, 20 is a grooved plate, and 22 is a recording head block.
Claims (1)
録液体を、入力信号に従つて前記オリフィスから小滴と
して吐出、飛翔させ、この小滴の被記録面への付着を以
て記録を行なう液滴噴射記録装置であつて、前記小滴吐
出の作用力の発生源として、発熱抵抗体と該発熱抵抗体
が記録液体と接触するのを防止する被覆保護層とからな
る電気・熱変換体を上記室の小なくとも一部に内設した
ことを特徴とする液滴噴射記録装置。 2 前記保護層が、少なくともその一部に記録液体の浸
透を防止する目止層を含む重層構造を有することを特徴
とする特許請求の範囲第1項に記載の液滴噴射記録装置
。 3 前記保護層を構成する少なくとも一層の比抵抗が5
×10^5Ωcm以上である特許請求の範囲第2項に記
載の液滴噴射記録装置。 4 前記目止層の層厚が0.01〜10μmである特許
請求の範囲第2項に記載の液滴噴射記録装置。[Claims] 1. A recording liquid introduced into a chamber communicating with an ejection orifice is ejected as small droplets from the orifice in accordance with an input signal and caused to fly, and the droplets adhere to a recording surface. The droplet jet recording device performs recording, and as a source of the acting force for ejecting the droplets, an electrical conductor consisting of a heating resistor and a protective coating layer that prevents the heating resistor from coming into contact with the recording liquid is used. A droplet jet recording device characterized in that a heat converter is provided inside at least a small portion of the chamber. 2. The droplet jet recording apparatus according to claim 1, wherein the protective layer has a multilayer structure including, at least in part, a sealing layer that prevents penetration of recording liquid. 3 The specific resistance of at least one layer constituting the protective layer is 5.
The droplet jet recording device according to claim 2, wherein the droplet jet recording device has a resistance of 10^5 Ωcm or more. 4. The droplet jet recording device according to claim 2, wherein the sealing layer has a layer thickness of 0.01 to 10 μm.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3604079A JPS5931941B2 (en) | 1979-03-27 | 1979-03-27 | Droplet jet recording device |
DE3051228A DE3051228C2 (en) | 1979-03-27 | 1980-03-27 | Ink jet printing head mfg. method |
DE19803011919 DE3011919A1 (en) | 1979-03-27 | 1980-03-27 | METHOD FOR PRODUCING A RECORDING HEAD |
US06/309,411 US4392907A (en) | 1979-03-27 | 1981-10-07 | Method for producing recording head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3604079A JPS5931941B2 (en) | 1979-03-27 | 1979-03-27 | Droplet jet recording device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55128466A JPS55128466A (en) | 1980-10-04 |
JPS5931941B2 true JPS5931941B2 (en) | 1984-08-06 |
Family
ID=12458588
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3604079A Expired JPS5931941B2 (en) | 1979-03-27 | 1979-03-27 | Droplet jet recording device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5931941B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2106039A (en) * | 1981-08-14 | 1983-04-07 | Hewlett Packard Co | Thermal ink jet printer |
JPS5833472A (en) * | 1981-08-24 | 1983-02-26 | Canon Inc | Liquid jet recording head |
US4513298A (en) * | 1983-05-25 | 1985-04-23 | Hewlett-Packard Company | Thermal ink jet printhead |
-
1979
- 1979-03-27 JP JP3604079A patent/JPS5931941B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS55128466A (en) | 1980-10-04 |
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