JPS5925969A - Decomposition device by glow discharge - Google Patents

Decomposition device by glow discharge

Info

Publication number
JPS5925969A
JPS5925969A JP57136519A JP13651982A JPS5925969A JP S5925969 A JPS5925969 A JP S5925969A JP 57136519 A JP57136519 A JP 57136519A JP 13651982 A JP13651982 A JP 13651982A JP S5925969 A JPS5925969 A JP S5925969A
Authority
JP
Japan
Prior art keywords
drums
drum
conductive
glow discharge
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57136519A
Other languages
Japanese (ja)
Inventor
Masanori Fujiwara
正典 藤原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Minolta Co Ltd
Original Assignee
Minolta Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minolta Co Ltd filed Critical Minolta Co Ltd
Priority to JP57136519A priority Critical patent/JPS5925969A/en
Publication of JPS5925969A publication Critical patent/JPS5925969A/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
  • Light Receiving Elements (AREA)

Abstract

PURPOSE:To enable inexpensive and continuous mass production of amorphous photoconductive layers with a simple constitution and good reproducibility, by placing plural pieces of conductive drums opposite to each other in a reaction chamber, and generating glow discharge by a high frequency electric power source between the conductive drums. CONSTITUTION:A formed gas is fed into introducing pipes 14 in the stage of forming, for example, amorphous Si photoconductive layers on the circumferential surfaces of respective conductive drums 12. The inside of a reaction chamber 10 is beforehand evacuated to a vacuum state and the drums 12 are beforehand heated to about 100-400 deg.C prior to said feeding. High frequency electric power is applied from a high frequency power source 17 to two rows of the drums 12a, 12b at the center; at the same time, the formed gas is ejected from the ejection holes 13 of the pipes 14. Then glow discharge is generated between the drums 12a, 12b and the drums 12c, 12d at the two end rows to decompose the formed gas, whereby amorphous Si photoconductive layers are formed on the drums 12 and the drums 12 themselves are the finished products.

Description

【発明の詳細な説明】 技術分野 本発明ハアモルファスシリコンやゲルマニウム■−の光
導電層を有する感光体の連続量産に適した容気結合型の
グロー放雷分解装置に関する。
DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a capacitively coupled glow lightning decomposition apparatus suitable for continuous mass production of photoreceptors having a photoconductive layer of amorphous silicon or germanium.

従来技術 近年、感光体ドラムとして、導電、性ドラムの周面にア
モルファスシリコン(amorphouss il i
 con、以下a−3iと略す)やアモルファスシリコ
ン−ゲルマニウム(a −3i :Ge )等の光導′
小局を生IJ!41゜てなるものが開発されるに至って
いる。このような感光体ドラムは様々な方法により製造
するこ吉ができるが、中でも放電効率が優れていること
より容量結合型グロー放電分解法が広く採用されていも
Prior Art In recent years, amorphous silicon has been used as a photoreceptor drum for the circumferential surface of a conductive drum.
A light guide such as amorphous silicon-germanium (a-3i:Ge) or amorphous silicon-germanium (a-3i: Ge)
Live IJ of small stations! 41° has been developed. Such photoreceptor drums can be manufactured by various methods, but among them, the capacitively coupled glow discharge decomposition method is widely adopted because of its excellent discharge efficiency.

この方法全実施するための容箪結合型グロー放電分解装
置として第1図に示すMli成のものが提“案されてい
る。図中、(1)は減圧可能な反応室でそれ自体、ステ
ンレスのような導体で414成されている。
As a tank-coupled glow discharge decomposition apparatus for carrying out all of this method, an Mli structure shown in Fig. 1 has been proposed. It is made of 414 conductors such as.

反応室σ)内の中央部にはa −8i、 a −8i:
Ge等の元導雷1層が形成されるアルミニウムのような
導電性ドラム(llが回転軸(3)により回転n」能V
l;1ilj 1iG−iされており、図示しかい加熱
手段により200〜3000C程度に加熱されている。
In the central part of the reaction chamber σ), a -8i, a -8i:
A conductive drum such as aluminum on which a layer of conductive material such as Ge is formed is rotated by a rotating shaft (3).
1; 1ilj 1iG-i, and is heated to about 200 to 3000C by a heating means only shown in the figure.

この導電性ドラム(2)の周囲に1l−1:該ドラム(
2)と同形で円筒型であるとともにそれよりは直径が大
である導電性の電極ドラム(4)が包囲する関係に設け
られている。該市極ドラム(41p−+尋′出1イ1ド
ラム(2)表面と等間隔となるよう配設されるとともに
、その両1則部にけ光導′串、層生成ガスケ図示する矢
印方向に噴出する噴出孔が列状に対18、的に形11に
、されている。
1 l-1 around this conductive drum (2): this drum (
A conductive electrode drum (4) having a cylindrical shape similar to that of 2) and having a larger diameter is provided in a surrounding relationship. The pole drum (41p- + bottom 1) is arranged at equal intervals with the surface of the drum (2), and a light guiding skewer and a layer forming gasket are placed on both sides of the drum (2) in the direction of the arrow shown in the figure. The jetting holes are arranged in rows in pairs 18 and shaped like squares 11.

これら1¥−1出仕を電極ドラム(4)の外周面から遮
蔽し且つ:)’C4’i4i’、 、1響生成カス源に
連絡する関係に管(5)、(6)が配へされており、光
導電層生成ガスはこれら宅1を通して噴出孔により4褐
性ドラム(2)面に吹きイ」けられるようにZ?つてい
る。捷た、上記管(5)は導体で111日戊されるとと
もに高周波S源(7)に接・枕されており、電極トラム
(4)に高周波電力か印加されるようになっている。尚
、導電性ドラム(2)は電気的に接地されているn 以上のI’:A 1jljに丸・いて、嘗(5)?介し
て高周波電力を’M54%ドラム(4)に印加しマ導軍
性ドラム(2)との間G(グロー IIk i市を生し
させるとともに噴出孔上り光導′1Jf1層生+IV、
ガスを噴出させプラズマを牛しさせてa −8i、 a
 −8i:Ge等の光導電層を形成する。
The pipes (5) and (6) are arranged in a relationship that shields these 1 yen-1 discharges from the outer circumferential surface of the electrode drum (4) and communicates with the source of the 1-sound generation scum. The gas generated from the photoconductive layer is blown out through these holes 1 onto the surface of the brown drum (2) by the nozzle holes. It's on. The spun tube (5) is connected to a conductor for 111 days and connected to a high-frequency S source (7), so that high-frequency power is applied to the electrode tram (4). Incidentally, the conductive drum (2) is electrically grounded at I':A1jlj of n or more, and is circled (5)? High-frequency power is applied to the 'M54% drum (4) through the M54% drum (2) to produce G (glow IIk i city) and to guide light up the eruption hole '1Jf1 layer +IV;
Blow out gas and generate plasma a -8i, a
-8i: Form a photoconductive layer of Ge or the like.

ところかこの様なグロー放電分解装置−にあってPi様
々な問題が牛しる。第1に光導電層生成ガスが電極ドラ
ム(4)の内周面に粉末状あるいυ」、腺とな原 って付着し装置の汚染の#囚となる。4.1に11イ璽
−13孔の周縁へのイ」着は異常クロー放′山の原因と
なる。
However, in such a glow discharge decomposition device, there are various problems with Pi. First, the photoconductive layer-generating gas adheres to the inner circumferential surface of the electrode drum (4) in the form of powder or glands, contaminating the apparatus. 4. In 1.1, 11 and 13, the attachment to the periphery of holes causes abnormal claw discharge.

そして繰り返して使用したとき、膜かにかノーたりもし
、いろいろな不都合が起こる。このような(;J’*t
”fは導電性ドラム(2)が加熱されているのに対し?
i電極ドラム加熱されておらず低温度であることに起因
する。結果的に製造毎に製造条件に変化ケラにたし再現
性に著るしく欠け、場合によっては上記粉末状となった
生成ガスが多量に光導箱、層中に混入することかある。
When used repeatedly, the film may crack or fail, causing various inconveniences. Like this (;J'*t
``f is the conductive drum (2) being heated whereas?
This is due to the fact that the i-electrode drum is not heated and is at a low temperature. As a result, the manufacturing conditions vary with each manufacturing process, and reproducibility is severely lacking, and in some cases, a large amount of the powdered gas may be mixed into the light guide box and layer.

従って製造毎にrM掃しなげノ)はならないという不都
合がある。
Therefore, there is an inconvenience that rM must be cleaned every time it is manufactured.

第2に上記製造装置にあっては、管(5)ケ介して宮、
イシドラム(4)に高周波軍、力を印加するようになっ
ているが、反応室(1)が上述の通り導体で(・111
°1成されているため電極ドラム自体ケア−スジールド
する必要があり、さもないとその部分て放市有〜起こし
再現性のある製造ができない。しかもアース/−ルドは
かなりの手間を要し電極トラム分砧掃する毎に必要とな
る。
Secondly, in the above manufacturing apparatus, the pipe (5)
The high-frequency force is applied to the isidrum (4), but the reaction chamber (1) is a conductor (・111) as mentioned above.
Since the electrode drum itself is made up of 100% carbon dioxide, it is necessary to take care of the electrode drum itself, otherwise, that part will be left unused and reproducible manufacturing will not be possible. Moreover, the grounding/grounding requires considerable effort and is required every time the electrode tram is cleaned.

第3に上、−1I′、製造装置「−tにおいては、感光
体の連続量産が極めて困難である。つ才り第1図の装置
を)i注型とするに(・よ、重接ドラム(4)全複数個
並列的Qて配設することが考えられるが、この場合、製
造すべき感光体毎Q′こ電極ドラム(4)ヲ設けなけれ
はならず装置fGf自体か極めて大がかりなものとなり
、捷だ非常に高価となる。
Third, it is extremely difficult to continuously mass-produce photoreceptors using the manufacturing equipment ``-1'' and ``-t''. It is conceivable to arrange a plurality of drums (4) in parallel, but in this case, one electrode drum (4) must be provided for each photoreceptor to be manufactured, and the device fGf itself would be extremely large. However, it is very expensive.

発(月の目的 不発1す1は以十・、・)月1実に話みて成されたもの
で、その目的とするところは、安1i11+ K Lで
連続量産を容易に行うことができ、構l戊的に簡素であ
るとともに、製造阿現性にイ沙れた容媚結合型のグロー
放電分解装置jl’、j k 4A1供することにある
(The purpose of the month The misfire 1-1 was created based on the discussion on the first day of the month). The object of the present invention is to provide a glow discharge decomposition device jl', jk 4A1 which is extremely simple and has an attractive coupling type that is easy to manufacture.

実施例 ε)1□2図及び第3 f’71は本発明に係る容部結
合型グロー放電分解装置゛の如、略1・1に成ケ示し、
第2図は平面図、第3図−l:lノr面図である。図中
、(10)は減圧可能な反応室でその一部には例えは石
英ガラスで構成される観察窓(1])が形成されている
。反応室(10)内部には適当な支杓台上に光導電、層
が形成されるべき例えはアルミニウム、NESAガラス
等の導電性ドラム(12)が回転可能に載、1−されて
いる。同図においては、1列に6イ1^1の導電性ドラ
ム(12)が4列計24個平行に載置されている。以−
1−1中央2夕11のドラムk(12a)、(12b)
、端2列f (]、2c)、(12d)とする〇尚、後
述からもり」らかとなるが、不発Q、lは最低2個の導
電性ドラム(12)の載11μで実施できる。′!l:
た図示し々いか上記各導電、性ドラム(12)に加熱手
段によって約100〜400°C1好ましく’+415
0〜300’Cの温度に均一加熱される。
Embodiment ε) 1 □ 2 and 3 f'71 is a container-coupled glow discharge decomposition device according to the present invention, which is constructed as approximately 1.1,
FIG. 2 is a plan view, and FIG. 3 is a plane view of l:l. In the figure, (10) is a reaction chamber that can be depressurized, and a part thereof is formed with an observation window (1]) made of, for example, quartz glass. Inside the reaction chamber (10), a conductive drum (12) of, for example, aluminum or NESA glass, on which a photoconductive layer is to be formed, is rotatably mounted on a suitable support. In the figure, a total of 24 conductive drums (12) in 4 rows of 6 x 1^1 are placed in parallel. From now on
1-1 central 2nd evening 11th drum k (12a), (12b)
, the two end rows f (], 2c), (12d).Although it will be explained later, misfire Q, l can be implemented with at least two conductive drums (12) of 11μ. ′! l:
As shown in the figure, each conductive drum (12) is heated to about 100 to 400° C. preferably +415° C. by heating means.
It is uniformly heated to a temperature of 0 to 300'C.

中央2列の導電性ドラム(12a )N21i)間Kd
: l’l 1″PI型でその周面に多数の生成カス噴
出孔(13)か形IJψされた生成ガス導入管(14)
が複数本ドラム(12)と平行に設けられている。該生
成ガス導入管(14)6;j、ドラムと略その高さが同
じマー光導市層生lik、ガスがJスられてくることに
よって噴出孔(13)より牛11v、カスを噴出する。
Kd between the central two rows of conductive drums (12a)N21i)
: l'l 1″ PI type product gas inlet pipe (14) with many product gas ejection holes (13) or IJψ shape on its circumferential surface
A plurality of drums (12) are provided in parallel. The product gas inlet pipe (14) 6;j, which has approximately the same height as the drum, causes the gas to flow through the drum, thereby ejecting waste from the ejection hole (13).

尚、(15)、(16)は生成ガス排気管である。Note that (15) and (16) are generated gas exhaust pipes.

第3し1に示すように、上2.4 @性ドラム(12)
のうち、中央2列のドラム(12a )、(12b)U
 (1,05−2,0PQvO高周波軍力(周波数1〜
50■(2)が印加される高周波電源(17)に接続さ
れる一方、端2列のドラム(12c)、四2d)は電気
的に接地されている。これに関連し中央2列のドラムは
端2列のドラムより電気的に絶縁されるように載1市′
される。これは例えば反応室内の中央2列のドラム(1
2a)、(]、2b)が載陀される部分あるい妊ドラム
載置台全絶縁体で構成しドラムに直接γF、゛力を印加
するようにする。この場合、ドラム(]、2a)、(1
2b)の上端部も反応室上壁面と当接するときに妊1、
その部分も絶縁処理する必要がある。
As shown in 3rd and 1, upper 2.4 @ sex drum (12)
Of these, the center two rows of drums (12a) and (12b) U
(1,05-2,0PQvO high frequency military power (frequency 1~
50 (2) is connected to the high frequency power supply (17) to which the drums (12c) and 42d) are electrically grounded. In this regard, the two rows of drums in the center are mounted so that they are electrically insulated from the drums in the two end rows.
be done. This is, for example, the two central rows of drums (1
The part on which 2a), (], 2b) are placed or the fertile drum mounting table is entirely constructed of insulators so that γF and force can be directly applied to the drum. In this case, drum (], 2a), (1
2b) When the upper end also comes into contact with the upper wall surface of the reaction chamber, the
That part also needs to be insulated.

以上の(・7h II1の客用結合型グロー散布分解装
置に1、・いて、例えばa−8i光導電層を各導電性ド
ラムCl2)の周面上に生成するに際しでに1、図示し
ないタンクよすH2、Ar、He等ゲキャリャガスとす
るSiH<ガス(あるいi: Si 2Hfl、5i3
I(6等)、更に必要に応して!I−,1「開II(、
’ 56−15(’1834号公幸1φに示されるよう
に暗抵抗向」二のためにI3□H6ガスと02ガスケ併
せて生成ガス導大戦(14)に送り込む。これにともな
って反応室(10)内部(は0.5〜2.OTorr程
度の真空状態に、捷た導電性ドラム(12)は予じめ1
00〜400°Cに加熱しておく。そして中央2列の導
7ド性ドラム(12a)、41.21))K 高周波%
を源(17) ヨ’) 周2JfE a 0.05〜2
.OKWσ)1:に高周波電力が印加されるとともに、
勺三l&ノjスzJ¥ノ(管(14)の噴出孔(13)
より生成ガス力’−11j:i、’ iljされる。
In the above (・7h II1 customer-use combined glow dispersion and disassembly device), when producing, for example, an A-8I photoconductive layer on the circumferential surface of each conductive drum Cl2, a tank (not shown) is installed. H2, Ar, He, etc. SiH < gas (or i: Si 2Hfl, 5i3
I (6th grade), more if necessary! I-, 1 “Open II (,
'56-15 (as shown in '1834 Koyuki 1φ, for dark resistance' 2, I3□H6 gas and 02 gasket are sent to the generated gas induction war (14). Along with this, the reaction chamber (10 ) inside (is in a vacuum state of about 0.5 to 2.0 Torr), and the conductive drum (12) that has been cut is
Heat to 00-400°C. And the central two rows of conductive drums (12a), 41.21))K High frequency%
Source (17) Yo') Zhou2JfE a 0.05~2
.. While high frequency power is applied to OKWσ)1:,
勺三l&ノjスzJ¥ノ(Pipe (14) spout hole (13)
The generated gas force '-11j:i,'ilj is generated.

コiK 、): リ中央2 列ノ各)” ラム(12a
)−(12+))とb:j、、 2列ノ各ドア ム(1
2C)、(12d)との間でり゛口hk ’r15/+
;イ1し、生成ガスが分解され各ドラム上にa −8i
つ゛乙倶’6 +、l、’ Ii”1が形成される。即
ち、グロー放’N=i iJ、高)占1波′11.ノノ
ブン・印加される中央2列のドラム(12A)、(IZ
b)とそ71うと対向する接地側の端2列のドラム(1
2c)、(12d )と117)1;11で起こり、生
成ガスが分触′シて回’+i #−る肴トラム上に光導
電層か形成される。従って:21(す〔:lすIに」7
・(ρては、導電性ドラム(12)自体が互いに’fl
−1’、 I’にとして機能し且つドラム自体が製造光
1+ν、 1st’]となる。こ71により従来の如く
ドラムとは別個に′トb極(i′″6(・しする必要d
、なく、製造装置の小型化と連Ml’、相性k I]J
’ fi!セとする。しかも電極として機能する谷ドラ
ム(12)日:全て加熱されているので生LIIy、、
ガス旧1とんとvy末化することはなく、常に安定した
製Jθ条(’l−σ)1〜に光導電層?生成することが
できる。
koiK,): each of the central 2 rows)” Ram (12a
)−(12+)) and b:j,, each door in the second row is (1
2C), (12d)
;A1, the generated gas is decomposed and a-8i is deposited on each drum.
tsu ゛゛〶'6 +,l,'Ii''1 is formed. That is, glow emission'N=i iJ, high) 1 wave'11.Nonobun-applied central two rows of drums (12A), (IZ
b) Two rows of drums (1
2c), (12d) and 117) 1; 11, the resulting gas is separated and a photoconductive layer is formed on the snack tram. Therefore: 21 (su[:lsuIni'' 7
・(ρ) The conductive drums (12) themselves are
-1', I', and the drum itself becomes the production light 1+ν, 1st']. With this 71, it is necessary to separate the poles from the drum as in the past.
, but the miniaturization of manufacturing equipment and the compatibility k I]J
'fi! Let's say. Moreover, the valley drum that functions as an electrode (12) days: Since it is all heated, it is raw LIIy,,
The photoconductive layer never deteriorates when the gas is used, and the photoconductive layer is always stable. can be generated.

本発明に係る容置結合型グロー散布分解装置は第2図及
び第3図に;ie した構成に限定されることはなく、
様々な変更が用能である。つ捷り導電、性ドラム(12
)&ま最低2個でよく一方に高周波電力♀印加、他方を
接地する構成とする。更に各導電性ドラム酎1自転する
ようki・1されているが、それに加えて例えば第2図
において、電力印加側の2個のドラムと接地側の2個の
ドラム計4個のドラムt1組として矢印方向に公転させ
るようにしてもよい。これdll嗅厚ムラのない光導電
1層を形成する上で有効である。このとき、ドラムの電
力印加側より接地側への切換え及びその逆への切換えが
公転により必要となるが、これは例えば各ドラムケ円賭
レール」二に移!ω1用能にI敗ji’t L/、接地
側1より電力印加側に至る部分を・不連続とすることに
よって行うことができる。
The container-coupled glow dispersion and decomposition device according to the present invention is not limited to the configuration shown in FIGS. 2 and 3;
Various modifications are possible. Thread conductive, sex drum (12
) & M. It is best to use at least two of them, and the configuration is such that high-frequency power is applied to one and the other is grounded. Furthermore, each conductive drum is ki・1 so that it rotates, but in addition, for example, in FIG. It may also be made to revolve in the direction of the arrow. This is effective in forming a single photoconductive layer without unevenness in dll olfactory thickness. At this time, it is necessary to switch from the power application side of the drum to the ground side and vice versa due to the revolution, but this can be done, for example, on each drum. This can be done by making the part from the ground side 1 to the power application side discontinuous.

切1 里 以上の説l用からIlらかなように、不発1す」に係る
グロー /& ’i14分解装置1!′イによれは、製
造完成品となる導電)性ドラム自体が′Flf極として
作用するので、製造装置1町が安価に小型化することか
でき、しかも)112続量産が回部となる。捷た、牛1
戊ガスが粉末状となることもなく装置の汚染もほとんど
なく、1・・Rめて可脱・性に優れている。更に構成も
%゛1素である笠、多くの効果を有する。
Glow related to 'Unexploded 1' from the theory of more than 1 village! Since the conductive drum itself, which is the finished product, acts as the Flf pole, one manufacturing device can be made smaller and cheaper, and moreover, 112 consecutive mass production cycles are required. Cut the cow 1
The gas does not turn into powder, there is almost no contamination of the equipment, and it has excellent removability and properties. Furthermore, the structure is %1 element, and it has many effects.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従沫の容柘結合型グロー放霜1分屑゛す、ji
、’、1の概略構成、を示す図、第2図及び第3図dA
q酩り1に係るグロー放電分解装置ヲ示す1v、1で夫
々断111I平面図、側面図である。 (10) ・・・反応宇、(12,) 、(12a) 
、(12b)、(12c)、(12d)  導電性ドラ
ム、(14)・・・生成ガス導入πイ、(1γ) 高周
波電源。 出願人  ミノルタカメラ株式会社 第1 図 第2r41 第3図
Figure 1 shows the combination type glow frosting for 1 minute.
,',A diagram showing the schematic configuration of 1, Figures 2 and 3 dA
111I is a plan view and a side view, respectively, showing the glow discharge decomposition device according to Q-Drinking 1, taken along lines 1v and 1. (10) ... reaction u, (12,) , (12a)
, (12b), (12c), (12d) conductive drum, (14)...generated gas introduction πi, (1γ) high frequency power source. Applicant Minolta Camera Co., Ltd. Figure 1 Figure 2r41 Figure 3

Claims (1)

【特許請求の範囲】[Claims] (1)容量結合型グロー放電分解法により、減圧可能な
反応室内で導電性ドラム上に生成ガスを分解して光導牝
゛層を形成するグロー放電分解装置において、前記反応
室内に前記導電性ドラムを少なくとも2以上回転可能に
対向載置し、一方を高周波電1源に接続するとともに他
方を接地し、導電性ドラム間でグロー放電を生じさせる
ことを特徴とするグロー放電1公解装置(′1゜
(1) In a glow discharge decomposition device that uses a capacitively coupled glow discharge decomposition method to decompose generated gas on a conductive drum in a reaction chamber that can be depressurized to form a photoconducting layer, the conductive drum is placed in the reaction chamber. A glow discharge device (' 1゜
JP57136519A 1982-08-04 1982-08-04 Decomposition device by glow discharge Pending JPS5925969A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57136519A JPS5925969A (en) 1982-08-04 1982-08-04 Decomposition device by glow discharge

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57136519A JPS5925969A (en) 1982-08-04 1982-08-04 Decomposition device by glow discharge

Publications (1)

Publication Number Publication Date
JPS5925969A true JPS5925969A (en) 1984-02-10

Family

ID=15177069

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57136519A Pending JPS5925969A (en) 1982-08-04 1982-08-04 Decomposition device by glow discharge

Country Status (1)

Country Link
JP (1) JPS5925969A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59213439A (en) * 1983-05-18 1984-12-03 Kyocera Corp Capacity coupling type glow discharge decomposition apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59213439A (en) * 1983-05-18 1984-12-03 Kyocera Corp Capacity coupling type glow discharge decomposition apparatus
JPH0438449B2 (en) * 1983-05-18 1992-06-24

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