JPS5924949A - Sphere polishing device - Google Patents
Sphere polishing deviceInfo
- Publication number
- JPS5924949A JPS5924949A JP13617182A JP13617182A JPS5924949A JP S5924949 A JPS5924949 A JP S5924949A JP 13617182 A JP13617182 A JP 13617182A JP 13617182 A JP13617182 A JP 13617182A JP S5924949 A JPS5924949 A JP S5924949A
- Authority
- JP
- Japan
- Prior art keywords
- spheres
- polished
- spiral groove
- ball
- rubber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B11/00—Machines or devices designed for grinding spherical surfaces or parts of spherical surfaces on work; Accessories therefor
- B24B11/02—Machines or devices designed for grinding spherical surfaces or parts of spherical surfaces on work; Accessories therefor for grinding balls
- B24B11/04—Machines or devices designed for grinding spherical surfaces or parts of spherical surfaces on work; Accessories therefor for grinding balls involving grinding wheels
- B24B11/06—Machines or devices designed for grinding spherical surfaces or parts of spherical surfaces on work; Accessories therefor for grinding balls involving grinding wheels acting by the front faces, e.g. of plane, grooved or bevelled shape
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Pinball Game Machines (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、樹脂球1m維強化樹脂球、金属球などの各種
球の研磨を行なう球研IF’) lA置に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a ball polishing IF') 1A apparatus for polishing various balls such as 1 m fiber-reinforced resin balls and metal balls.
球研磨装置で望まれることは1球の全面をきれいに研磨
し得ること、装置がコンパクトであること、研磨作業を
能率的に行なうこと、などである・従来、これら希望点
を全て満足させる球研磨装置はなかった@
本発明は上記希望点を全て満足し得る球研磨装置を提案
するもので、その特徴とするところは。What is desired in a ball polishing device is that the entire surface of a single ball can be polished cleanly, that the device is compact, and that the polishing work can be done efficiently. Conventionally, ball polishing devices that satisfy all of these desired points are desirable. There was no device @ The present invention proposes a ball polishing device that can satisfy all of the above desired points, and its characteristics are as follows.
下面にゴム体を取付けTこ上位円板と、上面にゴム体を
取イ」けた下位円板とを0両ゴム体を相対向して配設し
、前記上位ゴム体に、下面開放のりす巻き溝を形成する
と共に、このうす巻き溝の中心部に球投入孔を形成し、
前記両円板を縦軸心の固りに各別に回転可能に構成した
球研1r装置にある。An upper disk with a rubber body attached to its lower surface and a lower disk with a rubber body attached to its upper surface are arranged with the rubber bodies facing each other, and a rubber body with an open bottom surface is attached to the upper rubber body. A winding groove is formed, and a ball insertion hole is formed in the center of this thin winding groove,
There is a ball grinding device 1r in which both of the disks are configured to be rotatable individually around solid vertical axes.
かかる構成によると、うす巻き溝内に多数の球を位置さ
せた状態で両円板を夫々所定方向に回転させることによ
り、全ての球を自動させながら両ゴム体により研磨する
ことができ、その研磨は全面に亘ってきれいに行な、う
ことができる。また2枚の回転円板形式であることから
、装置全体はコンパクトに構成できる。さらに多数の球
を一挙に研磨することから、その研磨作業は能率的に行
なうことができる。According to this configuration, by rotating both disks in a predetermined direction with a large number of balls positioned in the thinly wound groove, all the balls can be polished automatically by both rubber bodies. Polishing can be done neatly over the entire surface. Furthermore, since it is of a two-rotating disk format, the entire device can be constructed compactly. Furthermore, since a large number of balls are polished at once, the polishing work can be carried out efficiently.
以下1本発明の一実施例を図面に基づいて説明する。第
1図において、(すは上方にホッパー(2)を有する第
1研磨装置、(3)は上方にホッパー(4)を有する第
2研磨装置で、これらは上下に振り分けて配設される。An embodiment of the present invention will be described below based on the drawings. In FIG. 1, (3) is a first polishing device having a hopper (2) above, and (3) is a second polishing device having a hopper (4) above, which are arranged vertically.
(5)は第1研磨装置(1)を囲む第1回収ホッパーで
、その吐出口は前記ホッパー(4)の上方に題目してい
る。(6)は第2研磨装置(3)を囲む第2回収ホッパ
ーである。(7)は第1液体タンクで、バルブ(8)を
介してホッパー(2]内に第1液体(9)を供給する。(5) is a first recovery hopper surrounding the first polishing device (1), and its discharge port is located above the hopper (4). (6) is a second collection hopper surrounding the second polishing device (3). (7) is a first liquid tank that supplies the first liquid (9) into the hopper (2) via a valve (8).
QQは第2液体タンクで、パWプQυを介してホッパー
(4)内に第2液体(ロ)を供給する。前記研゛磨装置
(1)(3)が第2図、第8図に示されている。すなわ
ち03は上位円板で、その下面にはゴム体aΦが取付け
である。仁のゴム体o4には下面開放のうす巻き溝QI
9が形成され、さらにうす巻き溝(ハ)のうす中心部に
は球投入孔o11が形成されている。この球投入孔o1
は上位円板OJも貫通し、その上端は、咳上位円板時の
上面に固着した筒軸αη内に連通している・また筒軸α
ηの上端は、前記ホッパー+21 (4)の下端取出口
に対向している。前記筒軸(17)は軸受(財)を介し
て機枠a9に支持され、以って上位円板03は上位縦軸
6四の固りに正逆回転可能となる。シVは下位円板で、
その上面にはフラットなゴム体(ハ)が取付けである。QQ is a second liquid tank, which supplies the second liquid (b) into the hopper (4) via pump Qυ. The polishing devices (1) and (3) are shown in FIGS. 2 and 8. That is, 03 is an upper disk, and a rubber body aΦ is attached to the lower surface of the upper disk. Jin's rubber body o4 has a thin winding groove QI with an open bottom surface.
9 is formed, and a ball insertion hole o11 is further formed in the thin center of the thinly wound groove (c). This ball insertion hole o1
also passes through the upper disk OJ, and its upper end communicates with the cylinder axis αη fixed to the upper surface of the upper disk.
The upper end of η faces the lower end outlet of the hopper +21 (4). The cylindrical shaft (17) is supported by the machine frame a9 via a bearing, so that the upper disk 03 can rotate forward and backward relative to the rigidity of the upper vertical shaft 64. SiV is the inferior disc;
A flat rubber body (c) is attached to the top surface.
前記下位円板91Jの下面から軸に)が垂設され、この
軸(財)は軸受(ハ)を介して機枠01に支持され、以
って下位円板91)は下位縦軸心に)の周りに回転可能
となる。(ホ)は球である。The lower disk 91J) is vertically disposed from the lower surface of the lower disk 91J to the shaft, and this shaft is supported by the machine frame 01 via a bearing (c), so that the lower disk 91) is centered on the lower vertical axis. ) can be rotated around. (E) is a ball.
以下に研磨作業を説明する。ここでは繊維強化樹脂製の
球(ホ)を研磨するものとする。したがって第1液体(
9)としては、クロロホルム、アセトン。The polishing work will be explained below. Here, it is assumed that a fiber-reinforced resin ball (E) is polished. Therefore, the first liquid (
9) Examples include chloroform and acetone.
強アルカリなどが使用され、また第2液体(6)として
は、水、シリコンエマルジョンなどが使用される。そし
て、第1研磨装!(1)に使用される研磨材は、アルミ
ナ、タンカル、シリカなどの硬質物であり、また第2研
磨装置(3)に使用される研磨材は。A strong alkali or the like is used, and water, silicone emulsion, etc. are used as the second liquid (6). And the first polishing device! The abrasive used in (1) is a hard material such as alumina, tantalum, or silica, and the abrasive used in the second polishing device (3) is.
ナイロン、 PE、木などの軟質物である。研磨作業を
行なうに際し、先ず上位円板口を第8図における矢印(
2)方向に回転させる。これにより前工程で研磨されて
ゴム体a11にある球(2)がうず巻外方向に移動し、
以って研磨装置I (1) (3)から取出されて回収
ホッパー(6) (6)に落下する。これと同時に、ホ
ッパー(2) (4)内から筒袖(ロ)内にある球(2
)がうす巻き溝に)内に取入れられる。うす巻き溝01
内の球(支)を置換した状態で、上位円板口を矢印の)
方向に回転させると共に、下位円板なりを矢印(4)方
向に回転させる。このとき上位円板。場の回転速度の方
が早いのであり、したがって球曽がうす巻き溝に)から
脱落することを防止し得る。これにより画ゴム体Q−1
)■により球曽を自転させながら研磨し得る。その際ニ
前述した子うな液体ならびに研磨材が供給されるのであ
り、したがって第1研磨装置(υにおいて表面劣化とな
り、そして第2研磨装置(3)においてみがきとなる。It is a soft material such as nylon, PE, or wood. When performing polishing work, first align the upper disk opening with the arrow in Figure 8 (
2) Rotate in the direction. As a result, the ball (2) polished in the previous step and located on the rubber body a11 moves in the spiral outward direction,
Therefore, it is taken out from the polishing device I (1) (3) and falls into the collection hopper (6) (6). At the same time, from inside the hopper (2) (4), the ball (2) in the sleeve (b)
) is incorporated into the thinly wound groove ). Thin winding groove 01
With the inner sphere (support) replaced, move the upper disk opening to the arrow mark)
At the same time, the lower disc is rotated in the direction of arrow (4). At this time, the upper disc. The rotational speed of the field is faster, so it is possible to prevent the ball from falling out of the thinly wound groove. As a result, the rubber body Q-1
)■ allows the ball to be polished while rotating. At this time, the above-mentioned liquid and abrasive material are supplied, so that the surface deteriorates in the first polishing device (υ) and is polished in the second polishing device (3).
上述したような研磨作業を成る時間行なったのち、最初
に述べたように上位円板口を矢印囚方向に回転させると
共に、下位円板aUを停止させて9球(2)の置換を行
なう。After carrying out the polishing work as described above for a certain period of time, the upper disk opening is rotated in the direction of the arrow as described above, and the lower disk aU is stopped to replace the 9 balls (2).
なお球(至)が樹脂製の場合には同様の作業でよいが・
金R製の場合には電解をかける。In addition, if the ball (to) is made of resin, the same procedure can be done.
If it is made of gold R, electrolysis is applied.
以上述べた本発明における球研磨装置によると。According to the ball polishing apparatus of the present invention described above.
うす巻き溝内に多数の球i位置させた状態で両円板を夫
々所定方向に回転させることにより・全ての球を自転さ
せながら両ゴム体により研磨することができ、その研磨
は全面に厩ってきれいに行なうことができる。また2枚
の回転円板形式であることから、装置全体はコンパクト
に構成できる。By rotating both discs in a predetermined direction with a large number of balls i positioned in the thinly wound groove, all the balls can be polished by both rubber bodies while rotating, and the polishing can be carried out over the entire surface. It can be done neatly. Furthermore, since it is of a two-rotating disk format, the entire device can be constructed compactly.
さらに多数の球を一挙に研磨することから、その研磨作
業は能率的に行なうことができる。Furthermore, since a large number of balls are polished at once, the polishing work can be carried out efficiently.
図面は本発明の一実施例を示し、第1図は一部切欠正面
図、第2図は要部の縦断正面図、第8図は上位ゴム体の
底面図である。
(1)°゛°第1研磨装置、(2)・・・ホッパー、(
3)・・・第2研磨装置、(4)・・・ホッパー、(9
)・・・@ 1 液体、 Us・・・第2肢体・斡°゛
°上位円板、a◆・・・ゴム体、 06・・・うす巻き
溝、Oト°・球投入孔、aη・・・筒軸、匈・・・」三
位縦軸心。
@υ・・・下位円板、W−・・ゴム体、(ホ)・・・下
位縦軸心、休t・・・球
代理人 森本義弘
第1闇
第z図The drawings show one embodiment of the present invention; FIG. 1 is a partially cutaway front view, FIG. 2 is a longitudinal sectional front view of the main part, and FIG. 8 is a bottom view of the upper rubber body. (1) °゛°first polishing device, (2)... hopper, (
3)...Second polishing device, (4)...Hopper, (9
)...@1 Liquid, Us...Second limb, 斡°゛°upper disc, a◆...Rubber body, 06...Thinly wound groove, Oto°, ball insertion hole, aη.・・Cylinder axis, 匈...” 3rd position vertical axis center. @υ...Lower disc, W-...Rubber body, (E)...Lower vertical axis center, rest t...Ball agent Yoshihiro Morimoto 1st Dark Diagram Z
Claims (1)
体を取付けた下位円板とを0両ゴム体を相対向して配設
し、前記上位ゴム体に、下面開放のりす巻き溝を形成す
ると共に、このう゛す巻き溝の中心部に球投入孔を形成
し、前記両円板を縦軸心の周りに各別に回転可能に構成
したことを特徴とする球研磨装置。1. An upper disk with a rubber body attached to the lower surface and a lower disk with a rubber body attached to the upper surface are arranged with both rubber bodies facing each other, and the upper rubber body is wrapped with a rice-wrap with an open bottom surface. A ball polishing device characterized in that a groove is formed, a ball insertion hole is formed in the center of the spiral groove, and both disks are configured to be rotatable individually around a vertical axis.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13617182A JPS5924949A (en) | 1982-08-03 | 1982-08-03 | Sphere polishing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13617182A JPS5924949A (en) | 1982-08-03 | 1982-08-03 | Sphere polishing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5924949A true JPS5924949A (en) | 1984-02-08 |
Family
ID=15168978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13617182A Pending JPS5924949A (en) | 1982-08-03 | 1982-08-03 | Sphere polishing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5924949A (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02269680A (en) * | 1989-02-07 | 1990-11-05 | Electrolux:Ab | Package of sweeping mop |
WO1996017712A1 (en) * | 1994-12-09 | 1996-06-13 | Sekisui Kagaku Kogyo Kabushiki Kaisha | Continuous sphere processing apparatus |
WO1999007514A3 (en) * | 1997-08-06 | 1999-06-10 | Teledyne Ind | Method and apparatus for shaping crystalline spheres and process for sintering |
JP2006167440A (en) * | 2004-11-16 | 2006-06-29 | Yuuho Ikeuchi | Pachinko ball polishing apparatus |
CN103567855A (en) * | 2013-10-10 | 2014-02-12 | 浙江工业大学 | Variable camber groove grinding-based high-precision ceramic ball machining equipment |
CN103567856A (en) * | 2013-10-10 | 2014-02-12 | 浙江工业大学 | High-precision sphere processing method based on variable curvature groove grinding |
CN103846779A (en) * | 2014-03-06 | 2014-06-11 | 浙江工商大学 | Grinding device capable of realizing continuous processing |
CN103991018A (en) * | 2014-05-21 | 2014-08-20 | 浙江工业大学 | High-accuracy sphere machining device based on eccentric variable-curvature V-shaped grooved disc |
CN103991025A (en) * | 2014-05-21 | 2014-08-20 | 浙江工业大学 | High-accuracy ball body machining method through eccentric type curvature-variable groove |
CN108312053A (en) * | 2018-02-14 | 2018-07-24 | 威海双格新材料科技有限公司 | A kind of inner air circulation ceramic balls high-precision intelligent grinding device |
EP3235595A4 (en) * | 2014-12-16 | 2018-10-10 | Tianjin University | Cylindrical-component grinding device, and workpiece advancing apparatus and grinding method thereof |
CN110340740A (en) * | 2019-07-18 | 2019-10-18 | 浙江科惠医疗器械股份有限公司 | The circulating magnetorheological polishing machine of artificial hip joint |
-
1982
- 1982-08-03 JP JP13617182A patent/JPS5924949A/en active Pending
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02269680A (en) * | 1989-02-07 | 1990-11-05 | Electrolux:Ab | Package of sweeping mop |
WO1996017712A1 (en) * | 1994-12-09 | 1996-06-13 | Sekisui Kagaku Kogyo Kabushiki Kaisha | Continuous sphere processing apparatus |
WO1999007514A3 (en) * | 1997-08-06 | 1999-06-10 | Teledyne Ind | Method and apparatus for shaping crystalline spheres and process for sintering |
JP2006167440A (en) * | 2004-11-16 | 2006-06-29 | Yuuho Ikeuchi | Pachinko ball polishing apparatus |
CN103567855A (en) * | 2013-10-10 | 2014-02-12 | 浙江工业大学 | Variable camber groove grinding-based high-precision ceramic ball machining equipment |
CN103567856A (en) * | 2013-10-10 | 2014-02-12 | 浙江工业大学 | High-precision sphere processing method based on variable curvature groove grinding |
CN103846779A (en) * | 2014-03-06 | 2014-06-11 | 浙江工商大学 | Grinding device capable of realizing continuous processing |
CN103991018A (en) * | 2014-05-21 | 2014-08-20 | 浙江工业大学 | High-accuracy sphere machining device based on eccentric variable-curvature V-shaped grooved disc |
CN103991025A (en) * | 2014-05-21 | 2014-08-20 | 浙江工业大学 | High-accuracy ball body machining method through eccentric type curvature-variable groove |
EP3235595A4 (en) * | 2014-12-16 | 2018-10-10 | Tianjin University | Cylindrical-component grinding device, and workpiece advancing apparatus and grinding method thereof |
CN108312053A (en) * | 2018-02-14 | 2018-07-24 | 威海双格新材料科技有限公司 | A kind of inner air circulation ceramic balls high-precision intelligent grinding device |
CN110340740A (en) * | 2019-07-18 | 2019-10-18 | 浙江科惠医疗器械股份有限公司 | The circulating magnetorheological polishing machine of artificial hip joint |
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