JPS5924446A - Production of magnetic recording medium - Google Patents
Production of magnetic recording mediumInfo
- Publication number
- JPS5924446A JPS5924446A JP13344982A JP13344982A JPS5924446A JP S5924446 A JPS5924446 A JP S5924446A JP 13344982 A JP13344982 A JP 13344982A JP 13344982 A JP13344982 A JP 13344982A JP S5924446 A JPS5924446 A JP S5924446A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- tension
- winding
- roll
- winding shaft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/85—Coating a support with a magnetic layer by vapour deposition
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、高分子成形物基板上に、金属薄膜から成る強
磁性層を形成する方法に関し、特に、広↓
幅で、且つ長尺の基板を用いのに適した方法を提供する
ものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming a ferromagnetic layer made of a thin metal film on a polymer molded substrate, and is particularly suitable for using a wide and long substrate. The present invention provides a method.
巻き取り蒸着は、装飾分野、コンデンサ分野では既知で
あるが、磁気テープの製省に適用されたのけごく最近で
、その処理規模は、まだ、装飾。Winding deposition is known in the decorative field and capacitor field, but it has only recently been applied to the production of magnetic tape, and its processing scale is still limited to decoration.
コンデンサ等の殉以下である。This is less than the loss of capacitors, etc.
従来の分野では、蒸着材料はAノが殆んどで、蒸発源も
、誘導加熱源か抵抗加熱源のいずれかであっただめ、蒸
着された基板を回転支持体からひき離すのに、大きな張
力を必要としなかった。従って、巻径が60CrfLと
か1oOC1rLになっても、巻取リールからの張力に
より基板を回転支持体からひき離すに際して、巻きしま
りの発生することはなかったし、例え巻きしまりがあっ
ても製品の性能には影響がなかった。In the conventional field, most of the evaporation materials were A, and the evaporation source was either an induction heating source or a resistance heating source, so it took a long time to separate the evaporated substrate from the rotating support. No tension was required. Therefore, even if the winding diameter was 60CrfL or 1oOC1rL, no curling occurred when the board was separated from the rotating support due to the tension from the take-up reel, and even if there was a curling, the product Performance was not affected.
しかし、蒸発源に磁気テープの製造に適している電子ビ
ーム加熱を用いると、二次電子2反射電子等の影響で、
静電引力が関与し、回転支持体から、蒸着された基板を
ひき離すのに大きな張力を必要とするようになる。However, when electron beam heating, which is suitable for manufacturing magnetic tape, is used as an evaporation source, due to the effects of secondary electrons, 2 reflected electrons, etc.
Electrostatic attraction is involved, requiring large tension forces to separate the deposited substrate from the rotating support.
この張力を従来のように巻き取り軸にljえる回転トル
りから得る方式では、次の不都合が生じた。The conventional method of obtaining this tension from a rotational torque applied to the winding shaft has the following disadvantages.
そのひとつは、巻き取り時の張力が過大となるため、蒸
着型の磁気テープ用の基板のように平均表面粗さが10
0Å以下になるような平滑板であって、フィルム間のス
ベリが悪い場合には、巻き取られたテープの端部がせり
上る、いわゆる耳立ちの現像が生じ、これにより生じる
シワで不良が発生することである。また、著しく長尺の
場合には、巻取った状態で内部の方でブロッキングが発
生することである。これらはいずれも、処理規模の上限
を決める要因となり、大量生産時の隘路となるものであ
った。One of them is that the tension at the time of winding is excessive, so the average surface roughness of the substrate for vapor-deposited magnetic tape is 10.
If the plate is smooth and has a thickness of 0 Å or less, and the film does not slide smoothly, the edge of the wound tape rises up, creating a so-called ridged appearance, and the resulting wrinkles cause defects. That's true. Furthermore, if the length is extremely long, blocking may occur inside the rolled-up state. All of these are factors that determine the upper limit of the processing scale and become bottlenecks in mass production.
本発明は従来技術における上記欠点を解消することを目
的とするもので、回転支持体と巻取り軸との間にテープ
剥離用のローラを配してトルク駆動し、所定の張力で、
静電力に打ちかつて、基板を回転支持体よりひき離した
後、その張力より小さな張力で巻取り軸に巻き取るもの
である。The purpose of the present invention is to solve the above-mentioned drawbacks in the prior art.A tape peeling roller is disposed between a rotary support and a winding shaft, and is driven by torque, so that
After the substrate is separated from the rotating support by the electrostatic force, it is wound onto the winding shaft with a tension smaller than that tension.
以下に図面を用い本発明の詳細な説明する。The present invention will be described in detail below using the drawings.
第1図は本発明を実施するために用いた、巻取り蒸着装
置の要部構成例を示す。なお同図では、真空容器をはじ
め、巻取り蒸着の実施に不可欠ではあっても本発明に直
接関連のない他の公知の要素については簡略化し省いで
ある。FIG. 1 shows an example of the main part configuration of a winding vapor deposition apparatus used to carry out the present invention. In this figure, other well-known elements, including the vacuum container, which are essential for carrying out the roll-up deposition but are not directly related to the present invention, are simplified and omitted.
図に示すように高分子成形物基板1は、回転支へ移動す
るよう構成される。6は5定トルクで駆動されるローラ
ーである。材質1表面粗す等は適宜選択される。6はニ
ップローラであり、ローラー6との間に基板1を挾み張
力を与える。7は電子ビーム蒸発源を模式的に示したも
ので、8は入射規制のマスクである。As shown in the figure, the polymer molded substrate 1 is configured to move to a rotating support. 6 is a roller driven by 5 constant torque. Material 1 surface roughening etc. are selected as appropriate. 6 is a nip roller, which pinches the substrate 1 between the roller 6 and applies tension. 7 schematically shows an electron beam evaporation source, and 8 is a mask for regulating incidence.
ローラー已により基板1に与えられる張力は、基板1を
回転支持体2より引き離すのに十分な大きさであるが、
巻き取り軸4は、送られてくる基板1を巻取るだけであ
るため、極めて小さい張ノJを与えるだけで良い。した
がって、基板1が不良の発生する恐れのないように十分
緩く巻取られるよう設定することができる。The tension applied to the substrate 1 by the roller blades is sufficient to pull the substrate 1 away from the rotating support 2;
Since the winding shaft 4 only winds up the substrate 1 that is sent, it is only necessary to give it an extremely small tension J. Therefore, it is possible to set the board 1 to be wound up sufficiently loosely so that there is no possibility of defects occurring.
次により具体的な実施例を以下に示す。Next, more specific examples will be shown below.
先−t’19000口のポリエチレンテレフタレートフ
ィルム(厚さ8.5μm 2幅s o cm )を準備
し、2X10 Torrの酸素中で最小入射角46゜
で厚さ0.1μmc08ONi20から成る磁性層を電
子ビーム蒸着により形成した。- Prepare a polyethylene terephthalate film (thickness 8.5 μm, 2 width so cm) with a thickness of 19,000 mm, and expose a magnetic layer made of C08ONi20 with a thickness of 0.1 μm at a minimum incident angle of 46° in oxygen at 2×10 Torr with an electron beam. It was formed by vapor deposition.
この基板を回転支持体より、ひきはなすために剥離用ロ
ーラから与えられた張力は5にノ、巻取り張力は2.5
Kffであった。この時の巻き取り状況は何ら問題なか
った。The tension applied by the peeling roller to separate this substrate from the rotating support was 5.5 mm, and the winding tension was 2.5 mm.
It was Kff. There was no problem with the winding condition at this time.
これに対して、本発明によらず、巻取り軸からの張力に
より基板を引き離した場合、途中のローラー系(案内の
ためだけの)でのロスがあるために、回転支持体からひ
きはなすところでsK9の張力を保つには、巻取り軸付
近で7Kyの張力が必要であった。そのため3700m
の長さのものを巻き取った時点で、耳立ちがはじまった
。On the other hand, when the substrate is separated by tension from the winding shaft without the present invention, there is a loss in the roller system (only for guiding) in the middle of the process, so when the substrate is separated from the rotating support, In order to maintain the tension of sK9, a tension of 7 Ky was required near the winding shaft. Therefore 3700m
When I wound up the length of , the ears started to stand out.
なお、回転支持体より基板を剥離する手段としては、上
記のようなローラー6とニップローラー6との組合せに
限らず、他の機械的手段や空気流との組合せ等、状況に
応じた手段を用いることができる。Note that the means for peeling the substrate from the rotating support is not limited to the combination of the roller 6 and nip roller 6 as described above, but also other mechanical means or combinations with air flow, etc., depending on the situation. Can be used.
以」二のように本発明によれば、短波長記録に適した金
属薄膜型磁気記録媒体の蒸着処理の規模を不良−の発生
なしに充分量産規模に至らしめることが可能となる。As described above, according to the present invention, it is possible to sufficiently increase the scale of the vapor deposition process of a metal thin film type magnetic recording medium suitable for short wavelength recording to a mass production scale without occurrence of defects.
図は本発明を実施するために用いた巻取蒸着装置の要部
構成例を示す図である・
1・・・・・・基板、2・・・・・・回転支持体、4・
・・・・・巻取り軸、5・・・・・・トルク駆動ローラ
ー、6゛川・・ニップローラー、7・・・・・電子ビー
ム蒸発源。The figure is a diagram showing an example of the main part configuration of a winding vapor deposition apparatus used to carry out the present invention. 1... Substrate, 2... Rotating support body, 4...
... Winding shaft, 5 ... Torque drive roller, 6... Nip roller, 7 ... Electron beam evaporation source.
Claims (1)
子ビーム蒸着にて磁性層を形成するとともに、前記回転
支持体と巻取軸の間に設けられた剥離手段により磁性層
形成後の基板を前記回転支持体よりひき離した後、前記
剥離手段による張力よりも小さい張力をもって前記巻取
軸に巻取ることを特徴とする磁気記録媒体の製造方法。A magnetic layer is formed by electron beam evaporation on a polymer molded substrate that moves along a rotating support, and a peeling means provided between the rotating support and the winding shaft is used to remove the magnetic layer after the magnetic layer is formed. A method for manufacturing a magnetic recording medium, comprising the step of separating the substrate from the rotating support and then winding the substrate onto the winding shaft with a tension smaller than the tension applied by the peeling means.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13344982A JPS5924446A (en) | 1982-07-29 | 1982-07-29 | Production of magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13344982A JPS5924446A (en) | 1982-07-29 | 1982-07-29 | Production of magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5924446A true JPS5924446A (en) | 1984-02-08 |
Family
ID=15105030
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13344982A Pending JPS5924446A (en) | 1982-07-29 | 1982-07-29 | Production of magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5924446A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0203582A2 (en) * | 1985-05-31 | 1986-12-03 | Hitachi Maxell Ltd. | Method and apparatus for making magnetic recording medium |
JPH027228A (en) * | 1988-06-25 | 1990-01-11 | Sony Corp | Production of magnetic recording medium |
JPH0214423A (en) * | 1988-06-30 | 1990-01-18 | Sony Corp | Vacuum deposition device for producing magnetic recording medium |
-
1982
- 1982-07-29 JP JP13344982A patent/JPS5924446A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0203582A2 (en) * | 1985-05-31 | 1986-12-03 | Hitachi Maxell Ltd. | Method and apparatus for making magnetic recording medium |
US4847109A (en) * | 1985-05-31 | 1989-07-11 | Hitachi Maxell, Ltd. | Method of a making magnetic recording medium |
JPH027228A (en) * | 1988-06-25 | 1990-01-11 | Sony Corp | Production of magnetic recording medium |
JPH0214423A (en) * | 1988-06-30 | 1990-01-18 | Sony Corp | Vacuum deposition device for producing magnetic recording medium |
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