JPS5923417B2 - Exhaust system for electron microscopes, etc. - Google Patents

Exhaust system for electron microscopes, etc.

Info

Publication number
JPS5923417B2
JPS5923417B2 JP12335179A JP12335179A JPS5923417B2 JP S5923417 B2 JPS5923417 B2 JP S5923417B2 JP 12335179 A JP12335179 A JP 12335179A JP 12335179 A JP12335179 A JP 12335179A JP S5923417 B2 JPS5923417 B2 JP S5923417B2
Authority
JP
Japan
Prior art keywords
valve
main
pump
vacuum
air lock
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12335179A
Other languages
Japanese (ja)
Other versions
JPS5648046A (en
Inventor
長光 吉村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP12335179A priority Critical patent/JPS5923417B2/en
Publication of JPS5648046A publication Critical patent/JPS5648046A/en
Publication of JPS5923417B2 publication Critical patent/JPS5923417B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/18Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Resistance To Weather, Investigating Materials By Mechanical Methods (AREA)

Description

【発明の詳細な説明】 本発明は主真空ポンプからの油の逆流事故を最少に抑え
ることのできる電子顕微鏡等用排気システムに関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an exhaust system for an electron microscope, etc., which can minimize backflow accidents of oil from a main vacuum pump.

電子顕微鏡のような高真空電子光学装置においては、主
ポンプの油(蒸気)逆流事故が生じ、鏡筒内が油で汚れ
ると検鏡に重大な支障を来たすと共に鏡筒を洗浄し、装
置を正常な状態に戻すには多大の時間と費用を要す。
In high-vacuum electron optical equipment such as electron microscopes, backflow of oil (steam) from the main pump may occur, and if the inside of the lens barrel gets dirty with oil, this will seriously impede the operation of the microscope and require cleaning the lens barrel and restarting the equipment. It takes a lot of time and money to restore normal conditions.

そこで、従来から油の逆流防止の対策が採られていたが
、従来の方式は、高真空部(例えば鏡筒部)或いは主ポ
ンプの背圧側に真空ゲージを取り付け、該ゲージが主ポ
ンプの油逆流が増大するような異常圧力を検出したとき
、排気系の高真空弁を閉じ、鏡筒内・\の油の流入を防
止しようとするものであった。
Therefore, countermeasures have been taken to prevent oil backflow, but the conventional method is to attach a vacuum gauge to the high vacuum section (for example, the barrel section) or the back pressure side of the main pump, and the gauge When an abnormal pressure that would increase backflow was detected, the high vacuum valve in the exhaust system was closed to prevent oil from flowing into the lens barrel.

しかし乍ら、斯る方式においては、1真空ゲージが異常
圧力を検知するのにある時間遅れを生ずる。
However, in such a system, there is a certain time delay for one vacuum gauge to detect abnormal pressure.

(特に一般に使用されているビラニーゲージのような熱
伝導形ゲージはレスポンスが遅い。
(Thermal conduction gauges, such as the commonly used Villany gauge, have a slow response.

)2安全系を構成するリレー等の電気回路の動作に遅れ
を生ずる。
)2 Delays occur in the operation of electrical circuits such as relays that make up the safety system.

3高真空弁が駆動を開始し、気密が確立するまでの機械
的動作に時間遅れが生ずる。
3. There is a time delay in mechanical operation until the high vacuum valve starts operating and airtightness is established.

等の原因により、真空ゲージの信号により弁が閉じられ
ても、その時には既に主ポンプの油が鏡等内に進入し、
鏡筒内を汚すことが多々ある。
Due to such reasons, even if the valve is closed by the vacuum gauge signal, oil from the main pump has already entered the mirror etc.
This often contaminates the inside of the lens barrel.

本発明は上記欠点を解決するもので、エアーロック室の
リークや粗引時等の主真空ポンプの背圧を高くする可能
性のある動作変化の直前に少くとも主弁を閉じ、危険状
態がなくなるまでのわずかの時間経過後、該主弁を開く
如くなし、更に、主ポンプの背圧を検出し、その値が異
常のとき、他の動作に拘りなく主弁を閉じるようになし
た排気方式に特徴がある。
The present invention solves the above-mentioned drawbacks by closing at least the main valve immediately before a change in operation that may increase the back pressure of the main vacuum pump, such as when there is a leak in the air lock chamber or during roughing, thereby preventing a dangerous situation. After a short period of time has passed, the main valve is opened, and the back pressure of the main pump is detected, and if the value is abnormal, the main valve is closed regardless of other operations. The method is distinctive.

以下図面に示す実施例に基づき本発明を詳述する。The present invention will be described in detail below based on embodiments shown in the drawings.

第1図は本発明の一実施例を示す排気系統図で、1は顕
微鏡カラムを示す。
FIG. 1 is an exhaust system diagram showing an embodiment of the present invention, and 1 indicates a microscope column.

該カラムは電子銃室、集束レンズ部、試料室部。The column has an electron gun chamber, a focusing lens section, and a sample chamber section.

結像レンズ部から構成されており、試料室部には試料交
換用のエアー町ンク室2が結合される。
It consists of an imaging lens section, and an air chamber 2 for sample exchange is connected to the sample chamber section.

又、カラA 1の下にはカメラ室3が結合されており、
前記カラムとエアーロック室2及びカメラ室との間には
エアーロック弁■1.v2が夫々設けである。
Also, a camera room 3 is connected under the collar A1.
An air lock valve is provided between the column and the air lock chamber 2 and camera chamber ■1. v2 is provided respectively.

4は油拡散ポンプ等の主ポンプ、5は油回転ポンプ等の
補助ポンプで、両者は排気管6により接続されている。
4 is a main pump such as an oil diffusion pump, 5 is an auxiliary pump such as an oil rotary pump, and both are connected by an exhaust pipe 6.

上記カラムやカメラ室3と主ポンプ4は排気管7で又、
補助ポンプ5とカラム1゜エアーロック室2.カメラ室
3等は排気管8で接続されている。
The column, camera room 3 and main pump 4 are connected to the exhaust pipe 7.
Auxiliary pump 5 and column 1° air lock chamber 2. The camera room 3 and the like are connected through an exhaust pipe 8.

前記排気管6の途中には遮断弁v3が設けられ、又主ポ
ンプ4とカラム1及びカメラ室3を繋ぐ排気管7の途中
に主弁v4及び■5が設けられ、更に補助ポンプ5とカ
ラム1゜エアーロック室2及びカメラ室3とを結ぶ排気
管8の途中には粗引弁V6.V7及び■8が設けである
A cutoff valve v3 is provided in the middle of the exhaust pipe 6, and main valves v4 and 5 are provided in the middle of the exhaust pipe 7 that connects the main pump 4, the column 1, and the camera room 3, and furthermore, the auxiliary pump 5 and the column 1° A roughing valve V6 is installed in the middle of the exhaust pipe 8 connecting the air lock chamber 2 and camera chamber 3. V7 and ■8 are provided.

■9 、■1o、■11は夫々カラムリーク弁。エアー
ロック室リーク弁、カメラ室リーク弁を示しである。
■9, ■1o, and ■11 are column leak valves, respectively. The air lock chamber leak valve and camera chamber leak valve are shown.

この様なバルブとしては例えば制御のしやすい電磁弁が
使用され、制御装置9から答弁の駆動部に駆動用電流が
供給される。
As such a valve, for example, a solenoid valve that is easy to control is used, and a driving current is supplied from the control device 9 to the driving section of the answering valve.

一方、主ポンプ4の背圧側、つまり排気管6にはビラニ
ーゲージ等の真空ゲージ10が設けてあり、主ポンプの
背圧を常時監視している。
On the other hand, a vacuum gauge 10 such as a Villany gauge is provided on the back pressure side of the main pump 4, that is, on the exhaust pipe 6, and constantly monitors the back pressure of the main pump.

このゲージの出力信号は制御回路11に送られ、異常か
どうか判定される。
The output signal of this gauge is sent to the control circuit 11, and it is determined whether or not there is an abnormality.

もし、その信号が異常値、即ち、主ポンプ4の背圧が臨
界背圧に近い値であったならば、該制御回路から主弁V
4.■5の駆動部に該弁を閉じる電流が供給される。
If the signal is an abnormal value, that is, the back pressure of the main pump 4 is close to the critical back pressure, the main valve V
4. (2) A current is supplied to the drive unit 5 to close the valve.

そして前記異常状態が解除された場合、両生弁・\の電
流供給が停止され、該弁■4.■5は開かれる。
When the above-mentioned abnormal condition is canceled, the current supply to the two-way valve \ is stopped, and the current supply to the two-way valve \ is stopped. ■5 is opened.

この様な系における答弁の制御について以下に説明する
The control of answers in such a system will be explained below.

(1)エアー町ンク室2をリークする場合(2)エアー
ロック室2を粗引する場合 以−りの弁操作は制御装置9によって自動的に制御され
るわけであるが、この流れ図かられかるように主弁■4
及び若しくは弁5の閉動作を主ポンプ4の背圧を上昇せ
しめる動作変化、つまりり−ク弁■1o、■1、の開動
作、粗引弁V7tV8の開動作に関連し、その直前に行
っており、しかも、該弁■1oV10.V7.■8の開
動作の後、数〜十数秒後に前記主弁V4 、V、を開け
る如くなしであるので、該主弁V、、V5の閉じている
時間を適切に選定しておけは、主ポンプ4の背圧が上昇
する可能性のある間は主ポンプと真空室(カラl、1や
カメラ室3)が遮断されるので、油の逆流事故が発生し
たとしても真空室・\の進入は阻止される。
(1) In the case of leaking the air lock chamber 2 (2) In the case of rough evacuation of the air lock chamber 2, the valve operations are automatically controlled by the control device 9. The main valve ■4
and/or the closing operation of the valve 5 is performed immediately before the change in operation that increases the back pressure of the main pump 4, i.e., in relation to the opening operation of the leakage valves ■1o, ■1, and the opening operation of the roughing valves V7tV8. Moreover, the valve ■1oV10. V7. ■Since the main valves V4, V will not be opened several to ten seconds after the opening operation in step 8, it is important to appropriately select the time during which the main valves V, V5 are closed. Since the main pump and the vacuum chamber (color 1, camera room 3) are shut off while there is a possibility that the back pressure of pump 4 may increase, even if an oil backflow accident occurs, the vacuum chamber/\ will not be able to enter. is prevented.

一方、前述した様に主ポンプ4の背圧はゲージ10によ
り常時監視されており、該背圧が一定値以上になったと
き主弁V4及びV、を閉じる如(制御しているので、前
記リーク時や粗引時に主ポンプの背圧が上昇すれはそれ
に基づき主弁V4゜v5は強制的に閉状態にされる。
On the other hand, as mentioned above, the back pressure of the main pump 4 is constantly monitored by the gauge 10, and when the back pressure exceeds a certain value, the main valves V4 and V are closed (controlled). When the back pressure of the main pump increases during leakage or rough evacuation, the main valves V4 and V5 are forcibly closed based on this.

即ち、制御装置9により前記シーケンスに従ってv4.
v5を閉じている間に異常圧力が生ずると、ゲージ10
による糸によって主弁■4.V5に閉信号が送られ、異
常圧力がな(なるまでその状態を維持する。
That is, the control device 9 performs v4.v4 according to the above sequence.
If abnormal pressure occurs while V5 is closed, gauge 10
Main valve by thread ■4. A close signal is sent to V5, and this state is maintained until there is no abnormal pressure.

以」−の如くなせは、リーク時、V7 、■8の気密が
不充分であっても、又粗引時v3の気密が不充分であっ
ても、そのとき主弁■4 、■5が必ず閉じているので
、主ポンプの油がカラム1やカメラ室3内に逆流するこ
とはなくなる。
As stated above, even if the airtightness of V7 and ■8 is insufficient at the time of a leak, or even if the airtightness of V3 is insufficient during rough evacuation, the main valves ■4 and ■5 will be Since it is always closed, oil from the main pump will not flow back into the column 1 or camera chamber 3.

第2図は本発明の他の実施例を示すもので、主ポンプを
2台(4aと4b)使用し、カスケード接続して差動排
気するようになしたものに応用した例である。
FIG. 2 shows another embodiment of the present invention, in which two main pumps (4a and 4b) are used and are connected in cascade for differential pumping.

この例で主ポンプ4aは比較的低い真空度、4bは比較
的高い真空度まで到達するもので、4aはカメラ室に接
続されると共に4bの背圧側に接続され、又4bはカラ
ム1に接続されている。
In this example, the main pump 4a reaches a relatively low vacuum, and the main pump 4b reaches a relatively high vacuum. 4a is connected to the camera room and the back pressure side of 4b, and 4b is connected to column 1. has been done.

第1図の実施例の説明から明らかな如く、主弁v4は高
々十秒前後閉じているのみであるから、この弁の外にポ
ンプ4bの背圧側に弁■、2を設け、この弁を閉じるよ
うになしたものである。
As is clear from the description of the embodiment in FIG. 1, the main valve v4 is only closed for about ten seconds at most, so valves ① and 2 are provided on the back pressure side of the pump 4b in addition to this valve. It was designed to close.

この場合、制御装置9による制御と、制御回路11によ
る制御とを■1□によって行なっても良い。
In this case, the control by the control device 9 and the control by the control circuit 11 may be performed by ■1□.

このように弁v1□により主ポンプ4aとカラム1とを
遮断すると、他の主ポンプ4bによってカラム1内が排
気された状態を維持するため、カラム1内の真空度を下
げることなく、主ポンプの油逆流防止動作を遂行できる
When the main pump 4a and the column 1 are shut off by the valve v1□ in this way, the main pump 4a and the column 1 are kept evacuated by the other main pump 4b. Can perform oil backflow prevention operation.

第3図に示す実施例は、二つの主ポンプ4a。The embodiment shown in FIG. 3 has two main pumps 4a.

4bを並列に接続し、差動排気を構成する系に応用した
もので、■4.V1□の動作は第2図と同様である。
4b is connected in parallel and applied to a system that configures differential pumping. ■4. The operation of V1□ is similar to that in FIG.

尚上記は電子顕微鏡を例に説明したが、走査電子顕微鏡
やX線分析装置更には電子線露光装置等の高精度電子光
学装置にそのまま応用できるものである。
Although the above description has been made using an electron microscope as an example, the present invention can be directly applied to high-precision electron optical devices such as a scanning electron microscope, an X-ray analyzer, and even an electron beam exposure device.

【図面の簡単な説明】 第1図乃至第3図は夫々本発明の実施例を示す排気系統
図である。 1:カラム、2:エアーロック室、3:カメラ室、4:
主ポンプ、5:補助ポンプ、6,7及び8:排気管、9
:制御装置、10:真空ゲージ、11:制御回路、Vl
、V2 :エフ−0ツク弁、■3:遮断弁、■4.■
5:主弁、■6.V7゜■8 :粗引弁、V9 、Vl
o、V、、:リーク弁。
BRIEF DESCRIPTION OF THE DRAWINGS FIGS. 1 to 3 are exhaust system diagrams showing embodiments of the present invention. 1: Column, 2: Airlock room, 3: Camera room, 4:
Main pump, 5: Auxiliary pump, 6, 7 and 8: Exhaust pipe, 9
: Control device, 10: Vacuum gauge, 11: Control circuit, Vl
, V2: F-0 check valve, ■3: Shutoff valve, ■4. ■
5: Main valve, ■6. V7゜■8: Roughing valve, V9, Vl
o, V,: Leak valve.

Claims (1)

【特許請求の範囲】[Claims] 1 高真空室と該高真空室に隔離弁を介して連通された
エアーロック室と、油拡散ポンプやターボ分子ポンプ等
の主真空ポンプと、その背圧側を排気する補助ポンプと
、該高真空ポンプ間に設けられた主弁と、エアーロック
室と主真空ポンプとの間の弁と、エアーロック室にガス
を導入するリーク弁と、エアーロック室と補助ポンプと
の間に設けた粗引弁とを備えた装置にあって、前記主真
空ポンプの背圧側の真空度を検出するための検出器と、
前記エアーロック室のリークや粗引に伴う弁の駆動の直
前に自動的に前記主弁を閉状態にすると共に、該閉にし
た状態で検出器よりの出力信号を監視して前記主真空ポ
ンプの背圧側の圧力が基準値より低けれは一定時間抜液
主弁を開状態になすと共に、該圧力が該基準値より高い
場合には該主弁を開状態にする動作を取り止めるように
制御する制御手段を具備していることを特徴とする電子
顕微鏡等用排気システム。
1. A high vacuum chamber, an air lock chamber connected to the high vacuum chamber via an isolation valve, a main vacuum pump such as an oil diffusion pump or a turbomolecular pump, an auxiliary pump that exhausts its back pressure side, and the high vacuum A main valve installed between the pumps, a valve between the air lock chamber and the main vacuum pump, a leak valve that introduces gas into the air lock chamber, and a rough vacuum valve installed between the air lock chamber and the auxiliary pump. a detector for detecting the degree of vacuum on the back pressure side of the main vacuum pump;
Immediately before the valve is driven due to leakage or rough evacuation of the air lock chamber, the main valve is automatically closed, and in the closed state, the output signal from the detector is monitored to control the main vacuum pump. If the back pressure side pressure is lower than the reference value, the main valve for draining liquid is kept open for a certain period of time, and if the pressure is higher than the reference value, the operation of opening the main valve is stopped. An exhaust system for an electron microscope, etc., characterized by comprising a control means.
JP12335179A 1979-09-26 1979-09-26 Exhaust system for electron microscopes, etc. Expired JPS5923417B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12335179A JPS5923417B2 (en) 1979-09-26 1979-09-26 Exhaust system for electron microscopes, etc.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12335179A JPS5923417B2 (en) 1979-09-26 1979-09-26 Exhaust system for electron microscopes, etc.

Publications (2)

Publication Number Publication Date
JPS5648046A JPS5648046A (en) 1981-05-01
JPS5923417B2 true JPS5923417B2 (en) 1984-06-01

Family

ID=14858411

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12335179A Expired JPS5923417B2 (en) 1979-09-26 1979-09-26 Exhaust system for electron microscopes, etc.

Country Status (1)

Country Link
JP (1) JPS5923417B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58107560U (en) * 1982-01-19 1983-07-22 日本電子株式会社 Electron microscope exhaust system

Also Published As

Publication number Publication date
JPS5648046A (en) 1981-05-01

Similar Documents

Publication Publication Date Title
US5417236A (en) Automated process gas supply system for evacuating a process line
US5138643A (en) Exposure apparatus
EP0510656A2 (en) Evacuation system and method therefor
JP4164030B2 (en) Test gas leak detector
JPS5923417B2 (en) Exhaust system for electron microscopes, etc.
JPH01166457A (en) Analyzer using charged particle
JP3789478B2 (en) Rapid decompression method and equipment for equipment, especially hydrogen-cooled generators
JP2959579B2 (en) X-ray exposure equipment
JP3116830B2 (en) Helium leak detector
JP3776467B2 (en) Exhaust network
JPH0915082A (en) Helium leak detector
JP3399587B2 (en) Vacuum apparatus baking method and baking apparatus
JP2503234B2 (en) High vacuum exhaust control device
JP2658643B2 (en) Semiconductor manufacturing equipment
KR200169515Y1 (en) Backflow prevention device of chamber
KR20230059926A (en) Explosion protection system and method for operating thereof
JP3493874B2 (en) Helium leak test equipment
JPS6342459Y2 (en)
JPH0424599Y2 (en)
JPH0449614A (en) X-ray exposure apparatus
JP3588198B2 (en) Leak detecting device and leak detecting method for valve device
JPH0449613A (en) X-ray exposure apparatus
JPH10132198A (en) Gas blast-circuit breaker
JPS61175285A (en) Vacuum pump monitor
KR100211657B1 (en) Load/lock vacuum apparatus of process chamber for fabricating semiconductor