JPS59226028A - Vacuum treating device - Google Patents

Vacuum treating device

Info

Publication number
JPS59226028A
JPS59226028A JP10141783A JP10141783A JPS59226028A JP S59226028 A JPS59226028 A JP S59226028A JP 10141783 A JP10141783 A JP 10141783A JP 10141783 A JP10141783 A JP 10141783A JP S59226028 A JPS59226028 A JP S59226028A
Authority
JP
Japan
Prior art keywords
positive electrode
electrode
electrodes
distance
vacuum processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10141783A
Other languages
Japanese (ja)
Other versions
JPS634859B2 (en
Inventor
Akio Tsumura
昭雄 津村
Noriharu Miyaake
宮明 稚晴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Electric Industrial Co Ltd filed Critical Nitto Electric Industrial Co Ltd
Priority to JP10141783A priority Critical patent/JPS59226028A/en
Publication of JPS59226028A publication Critical patent/JPS59226028A/en
Publication of JPS634859B2 publication Critical patent/JPS634859B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006Processes utilising sub-atmospheric pressure; Apparatus therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE:To improve the effect of plasma treatment, by providing a supporting part for positive electrode in a vacuum treating chamber with a liftable mechanism to adjust the distance between it and a negative electrode so that the distance between both the electrodes is adjusted depending upon the purpose of a material to be treated. CONSTITUTION:The rolled negative electrode 7 and the semicylindrical positive electrode 14 (liftable mechanism to adjust the distance between both the electrodes 7 and 14 is attached to the supporting part for the positive electrode) are set in the vacuum treating chamber 1, the material 26 to be treated such as vinyl chloride film, etc. is fed to the space between both the electrodes 7 and 14, so that the surface of the material to be treated is subjected to plasma treatment. The liftable mechanism preferably consists of the linear head 21 obtained by combining a rack-and-pinion mechanism with a driving means, and the stand 20 to support the linear head.

Description

【発明の詳細な説明】 この発明はプラスチック成形品、例えば塩化ビニル系フ
ィルムを真空状態でプラズマ処理する真空処理装置に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a vacuum processing apparatus for plasma processing a plastic molded article, such as a vinyl chloride film, in a vacuum state.

このグラスチック成形品とはプラスチックフィルム、プ
ラスチックシートなどである。
This glass molded product is a plastic film, a plastic sheet, etc.

この種の真空処理装置においては、被処理物の材質、厚
さ、真空処理室に導入するガスの種類などに対応して陽
電極と陰電極の間隔を調整する必要がある。
In this type of vacuum processing apparatus, it is necessary to adjust the distance between the positive electrode and the negative electrode depending on the material and thickness of the object to be processed, the type of gas introduced into the vacuum processing chamber, and the like.

このような陽電極と陰電極の間隔を調整するものとして
特開昭57−195737号公報に記載された発明があ
る0この公知の発明は、偏心リングカートリッジをエア
シリンダによシ回動じて棒状の陽電極を偏心させ、゛陰
電極との間隔を調整するように構成しているため、電極
間の間隔調整範囲が小さく、エアシリンダによる操作の
場合、任意の中間位ll7(での正確な位置決めが困#
Ieであシ、さらに陽電極が棒状であるため、放′IE
空間(領域)が拡が)処理効果が落ち、あるいは処理効
率が悪いという問題がある。
There is an invention described in Japanese Unexamined Patent Application Publication No. 195737/1983 that adjusts the interval between the positive electrode and the negative electrode. This known invention is a device that adjusts the distance between the positive electrode and the negative electrode. Since the positive electrode is eccentric and the distance between it and the negative electrode is adjusted, the range of adjustment of the distance between the electrodes is small. Difficult to position
In addition, since the positive electrode is rod-shaped, the radiation
There is a problem that as the space (area) expands, the processing effect decreases or the processing efficiency is poor.

また、特開昭57−195751号公報記載の発明は、
クランク状に屈曲した棒状の陽電極を回動して陰電極と
の間隔を調整するように購成したものであシ、この41
q成のものも間19h調整距離が短かく、手操作である
ため調整に手数がかがシ、陽電極が棒状であるため、放
電空間(領域)が拡がり、処理効果が落ちるという問題
がある。
In addition, the invention described in Japanese Patent Application Laid-open No. 57-195751 is
This 41 was purchased so that the distance between it and the negative electrode could be adjusted by rotating the rod-shaped positive electrode bent into a crank shape.
The Q-configuration type also has the problem that the adjustment distance is short, the adjustment is time consuming because it is manual operation, and the positive electrode is rod-shaped, so the discharge space (area) expands and the processing effect decreases. .

この発明は、上記のような公知の装置の問題点を解消す
るためになされたもので、陰電極と陽電極の間隔が容易
に調”i窪でき、しかも調・1多範囲が大きい間隔、1
1整装置1”fを有する真空処理装置を提供することを
目的とする。
This invention was made in order to solve the problems of the known devices as described above, and the distance between the negative electrode and the positive electrode can be easily adjusted. 1
An object of the present invention is to provide a vacuum processing apparatus having a single adjustment device 1"f.

即ち、この発ツJは半円状陽電極の支持部に両1れ(メ
の間隔を調整する昇降機構を設けたことを特徴とするも
のである。
That is, this starter J is characterized in that the supporting part of the semicircular positive electrode is provided with an elevating mechanism for adjusting the interval between the two arms.

以下、この発明の一実施例を図面に基づいて説明する。Hereinafter, one embodiment of the present invention will be described based on the drawings.

第1図、第2図の1は真空処理室で、その両側にフィル
ム供給室2とフィルム巻取室3を夫々設けである。
1 and 2 is a vacuum processing chamber, and a film supply chamber 2 and a film winding chamber 3 are provided on both sides of the vacuum processing chamber, respectively.

該処理室lの底部には真空ポンプに通じる排気管4を設
け、同処理室lの−t111にはパルプ5を有するガス
導入管6を設けである0 7はロール状の陰電極で、その断面は第2図の通シであ
る。この図において、8は処理室lの側壁を気密を保っ
て貫通した中空回転軸で、この軸の外側に中空の陰電極
7を固定しである。
An exhaust pipe 4 leading to a vacuum pump is provided at the bottom of the processing chamber 1, and a gas introduction pipe 6 containing pulp 5 is provided at -t111 of the processing chamber 1.07 is a roll-shaped negative electrode; The cross section is as shown in FIG. In this figure, reference numeral 8 denotes a hollow rotating shaft that penetrates the side wall of the processing chamber 1 in an airtight manner, and a hollow cathode 7 is fixed to the outside of this shaft.

この電極7は二重壁となシ、回転軸8内に設けた内管9
から導入された水などの電極表面温度調節用媒体はIh
 sの先端の入口12から電極7の内周と内壁10間に
設けた螺旋状の媒体流路調整板11により形成された螺
旋状の流路に沿う矢印のように流れ、IPII8の後部
の出口13から軸8の内周に沿って出ていくようにb1
シ路が形成されている。
This electrode 7 is double-walled and has an inner tube 9 provided inside the rotating shaft 8.
The electrode surface temperature regulating medium such as water introduced from Ih
s flows from the inlet 12 at the tip of the IP II 8 along the spiral flow path formed by the spiral medium flow path adjustment plate 11 provided between the inner periphery of the electrode 7 and the inner wall 10, and flows from the inlet 12 at the tip of the IP II 8 to the outlet at the rear of the IP II 8. b1 so as to go out from 13 along the inner circumference of the shaft 8.
A seaway is formed.

14は半円筒状同電極で、この電極14も中空であシ、
第3図のように内部に複数の媒体流路調整板15を固定
して一端の入口16から流入した電極表面温度調整用媒
体、例えば水が矢印のようにジグザグ状に流れて出口1
7から出ていくようになっている。
14 is a semi-cylindrical electrode, and this electrode 14 is also hollow;
As shown in FIG. 3, a plurality of medium flow path adjustment plates 15 are fixed inside, and a medium for adjusting the electrode surface temperature, for example, water, which flows in from the inlet 16 at one end, flows in a zigzag shape as shown by the arrow, and flows into the outlet 1.
It is supposed to go out from 7 onwards.

この半円筒状陽電極14が昇降機構により昇降するよう
になっている。
This semi-cylindrical anode 14 is moved up and down by a lifting mechanism.

即ち、この電極14の上部中央に固定した連接棒18が
シールホルダー19を通って気密を保ちつつ処理室l上
に突出している。
That is, a connecting rod 18 fixed to the center of the upper part of this electrode 14 passes through a seal holder 19 and protrudes above the processing chamber l while maintaining airtightness.

20は処理室l上に固定した支持台で、その上にリニア
ヘッド21が設けである。このリニアヘッド21は連接
棒18を昇降させるだめのもので図示例の場合、ラック
ピニオン機構となっている。
Reference numeral 20 denotes a support stand fixed above the processing chamber l, on which a linear head 21 is provided. This linear head 21 serves to raise and lower the connecting rod 18, and in the illustrated example, it is a rack and pinion mechanism.

即ち、モータ22によシ減速機23を介して駆動される
ピニオンギヤがヘッド21内にあシ、このピニオンギヤ
に連接棒18の側面に形成したラックギヤが噛合し、モ
ータ22の正逆回転によって連接棒18が昇降し、電極
7.14間の間隔を調整するようになっている。
That is, a pinion gear driven by the motor 22 via a speed reducer 23 is mounted in the head 21, and a rack gear formed on the side surface of the connecting rod 18 meshes with this pinion gear, and the forward and reverse rotation of the motor 22 causes the connecting rod to 18 is raised and lowered to adjust the spacing between the electrodes 7.14.

24はフィルム供給室2内の巻軸、25はフィルム巻取
室3内に設けた巻取軸で、巻軸24に巻いたフィルム2
6が搬送用シールロール27間を通シ、処理室l内のガ
イドロール28を経て前記ロール状陰電極7の上半分を
半周したのち、ガイドロール29を経て引取用シールロ
ール30間を通シ、巻取軸25に巻取られるようになっ
ている。
24 is a winding shaft in the film supply chamber 2, 25 is a winding shaft provided in the film winding chamber 3, and the film 2 wound on the winding shaft 24 is
6 passes between seal rolls 27 for conveyance, goes half way around the upper half of the roll-shaped negative electrode 7 through guide rolls 28 in the processing chamber l, passes through guide rolls 29 and passes between seal rolls 30 for take-up. , and is adapted to be wound around a winding shaft 25.

なお、各室2.3にも排気管31,32を設ける。Note that exhaust pipes 31 and 32 are also provided in each chamber 2.3.

第1図の33は処理室l外に設けたインピーダンス整合
用のマツチングボックスで前記陰電極7に電気的に接続
され、このボックス33の他端は通過型電力計34を介
して高周波電源35に接続されている。
Reference numeral 33 in FIG. 1 denotes a matching box for impedance matching provided outside the processing chamber l, which is electrically connected to the cathode 7, and the other end of this box 33 is connected to a high-frequency power source 35 via a pass-through wattmeter 34. It is connected to the.

この高周波電源35の他端は、前記陽電極14およびア
ース36に接続されている。
The other end of this high frequency power source 35 is connected to the positive electrode 14 and ground 36.

この発明は上記の構造であシ、排気管4.31゜32か
らの排気により処理室1および供給室2、巻取室3を真
空排気し、パルプ5を開いてガス導入管6から所定のガ
スを処理室l内に導入し、回転軸8によシロール状陰電
極7を第1図矢印方向に駆動し、同時に巻軸24、巻取
軸25も駆動して電極7に沿って第1図の矢印方向に移
動するフィルム26の表面に真空処理を施す。
This invention has the above structure, and the processing chamber 1, the supply chamber 2, and the winding chamber 3 are evacuated by exhaust gas from the exhaust pipe 4. Gas is introduced into the processing chamber l, and the rotary shaft 8 drives the roll-shaped negative electrode 7 in the direction of the arrow in FIG. Vacuum treatment is applied to the surface of the film 26 moving in the direction of the arrow in the figure.

この発明は、上記のような構成と作用を有するものであ
るから、下記のような効果が得られる。
Since the present invention has the above-described configuration and operation, the following effects can be obtained.

陽電極の支持部に両′覗極間Ω間隔をA整する昇降機構
を設けて陽電極を大rljに昇降させるようにしたから
両電極間の間隔調整が極めて容易に行なえる。このため
、被処理物の材質、厚さ、真空処理室内へ導入さ扛るガ
ス圧などが異なった場合でも被処理物の目的に応じて電
極間隔を調整し、処理効果を向上させることができる。
Since an elevating mechanism is provided on the support portion of the anode electrode to adjust the Ω distance between both viewing electrodes to A, and the anode is raised and lowered by a large distance rlj, the distance between the two electrodes can be adjusted very easily. Therefore, even if the material, thickness, and pressure of the gas introduced into the vacuum processing chamber differ, the electrode spacing can be adjusted according to the purpose of the workpiece to improve the processing effect. .

また、リニアヘッドにより電極間隔を自動的にかつ遠隔
操作ができ、任意の位置での位置決めが容易である。
Furthermore, the electrode spacing can be controlled automatically and remotely using the linear head, making it easy to position at any desired position.

陽電極が半円状であるため放電空間(領域)が拡がらず
処理効果が向上し、あるいは処理効率が良くなる。
Since the positive electrode is semicircular, the discharge space (area) does not expand, improving the processing effect or improving the processing efficiency.

なお、この発明においては真空処理室外周にマグネット
を設置し、放電領域へ電圧と直交する磁界(普通20〜
100ガウス)をかけることにょシ放電領域における電
圧のピンチ効果を促進し、電力密反を大きくすることが
でき、処理効果を向上させることができる。
In addition, in this invention, a magnet is installed around the outer periphery of the vacuum processing chamber, and a magnetic field perpendicular to the voltage (usually 20 to
By applying a voltage of 100 Gauss), the pinch effect of the voltage in the discharge region can be promoted, the power density can be increased, and the processing effect can be improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明を実施した真空処理装置の縦断正面図
、第2図は第1図のA−A線の拡大縦断側面図、第3図
は第1図のB−B線の平面図であるO 1・−・真空処理室、7・・・ロール状陰極、11・・
・媒体流路調整板、14・・・半円筒状陽極板15・・
・媒体流路調整板、20・・・支持台、21・・・リニ
アヘッド、26・・・フィルム特許出願人      
    日東電気工業株式会社代理人    弁理士和
1)昭
Fig. 1 is a vertical sectional front view of a vacuum processing apparatus embodying the present invention, Fig. 2 is an enlarged longitudinal sectional side view taken along line A-A in Fig. 1, and Fig. 3 is a plan view taken along line BB in Fig. 1. O 1... Vacuum processing chamber, 7... Roll-shaped cathode, 11...
- Medium flow path adjusting plate, 14... semi-cylindrical anode plate 15...
- Medium flow path adjusting plate, 20... Support stand, 21... Linear head, 26... Film patent applicant
Nitto Electric Industry Co., Ltd. Agent Patent Attorney Kazu1) Akira

Claims (4)

【特許請求の範囲】[Claims] (1)真空処理室内にロール状陰電極と半円筒陽電極と
を設け、両電極間に被処理物を送シ込むことによって被
処理物の表面を処理するように構成した真空処理装置に
おいて、前記半円筒状陽電極の支持部に、両電極間の間
隔を調整する昇降機構を設けたことを特徴とする真空処
理装置。
(1) In a vacuum processing apparatus configured to provide a rolled negative electrode and a semi-cylindrical positive electrode in a vacuum processing chamber, and to process the surface of the object by feeding the object between the two electrodes, A vacuum processing apparatus characterized in that a support portion of the semi-cylindrical positive electrode is provided with an elevating mechanism for adjusting the distance between the two electrodes.
(2)前記昇降機構は2ツクピニオン機構とその駆動手
段を組合せたリニアヘッドと、このリニアヘッドを支持
する支持台によ多構成したことを特徴とする特許請求の
範囲第1項記載の真空処理装置。
(2) The vacuum processing according to claim 1, wherein the elevating mechanism includes a linear head that is a combination of a two-pinion mechanism and its driving means, and a support base that supports the linear head. Device.
(3)  前記ロール状陰極内に電極表面温度調節用媒
体流路を設け、この流路中に温度調整用媒体を流すよう
に構成したことを特徴とする特許請求の範囲第1項記載
の真空処理装置。
(3) The vacuum according to claim 1, characterized in that a flow path for a medium for adjusting the electrode surface temperature is provided in the rolled cathode, and the temperature adjusting medium is configured to flow through the flow path. Processing equipment.
(4)前記半円筒状陽電極内に電極表面温度調節用媒体
流路を設け、この流路中に温度調節用媒体を流すように
構成した仁とを特徴とする特許請求の範囲第1項記載の
真空処理装置。
(4) An electrode surface temperature adjusting medium flow path is provided in the semi-cylindrical positive electrode, and the temperature adjusting medium is configured to flow into the flow path. The vacuum processing apparatus described.
JP10141783A 1983-06-06 1983-06-06 Vacuum treating device Granted JPS59226028A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10141783A JPS59226028A (en) 1983-06-06 1983-06-06 Vacuum treating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10141783A JPS59226028A (en) 1983-06-06 1983-06-06 Vacuum treating device

Publications (2)

Publication Number Publication Date
JPS59226028A true JPS59226028A (en) 1984-12-19
JPS634859B2 JPS634859B2 (en) 1988-02-01

Family

ID=14300125

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10141783A Granted JPS59226028A (en) 1983-06-06 1983-06-06 Vacuum treating device

Country Status (1)

Country Link
JP (1) JPS59226028A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6410047U (en) * 1987-07-06 1989-01-19
JP2006351437A (en) * 2005-06-17 2006-12-28 National Institute Of Advanced Industrial & Technology Device and method for treating surface

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6410047U (en) * 1987-07-06 1989-01-19
JP2006351437A (en) * 2005-06-17 2006-12-28 National Institute Of Advanced Industrial & Technology Device and method for treating surface

Also Published As

Publication number Publication date
JPS634859B2 (en) 1988-02-01

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