JPS59226028A - Vacuum treating device - Google Patents

Abstract

PURPOSE:To improve the effect of plasma treatment, by providing a supporting part for positive electrode in a vacuum treating chamber with a liftable mechanism to adjust the distance between it and a negative electrode so that the distance between both the electrodes is adjusted depending upon the purpose of a material to be treated. CONSTITUTION:The rolled negative electrode 7 and the semicylindrical positive electrode 14 (liftable mechanism to adjust the distance between both the electrodes 7 and 14 is attached to the supporting part for the positive electrode) are set in the vacuum treating chamber 1, the material 26 to be treated such as vinyl chloride film, etc. is fed to the space between both the electrodes 7 and 14, so that the surface of the material to be treated is subjected to plasma treatment. The liftable mechanism preferably consists of the linear head 21 obtained by combining a rack-and-pinion mechanism with a driving means, and the stand 20 to support the linear head.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a vacuum processing apparatus for plasma processing a plastic molded article, such as a vinyl chloride film, in a vacuum state.

This glass molded product is a plastic film, a plastic sheet, etc.

In this type of vacuum processing apparatus, it is necessary to adjust the distance between the positive electrode and the negative electrode depending on the material and thickness of the object to be processed, the type of gas introduced into the vacuum processing chamber, and the like.

There is an invention described in Japanese Unexamined Patent Application Publication No. 195737/1983 that adjusts the interval between the positive electrode and the negative electrode. This known invention is a device that adjusts the distance between the positive electrode and the negative electrode. Since the positive electrode is eccentric and the distance between it and the negative electrode is adjusted, the range of adjustment of the distance between the electrodes is small. Difficult to position
In addition, since the positive electrode is rod-shaped, the radiation
There is a problem that as the space (area) expands, the processing effect decreases or the processing efficiency is poor.

In addition, the invention described in Japanese Patent Application Laid-open No. 57-195751 is
This 41 was purchased so that the distance between it and the negative electrode could be adjusted by rotating the rod-shaped positive electrode bent into a crank shape.
The Q-configuration type also has the problem that the adjustment distance is short, the adjustment is time consuming because it is manual operation, and the positive electrode is rod-shaped, so the discharge space (area) expands and the processing effect decreases. .

This invention was made in order to solve the problems of the known devices as described above, and the distance between the negative electrode and the positive electrode can be easily adjusted. 1
An object of the present invention is to provide a vacuum processing apparatus having a single adjustment device 1"f.

That is, this starter J is characterized in that the supporting part of the semicircular positive electrode is provided with an elevating mechanism for adjusting the interval between the two arms.

Hereinafter, one embodiment of the present invention will be described based on the drawings.

1 and 2 is a vacuum processing chamber, and a film supply chamber 2 and a film winding chamber 3 are provided on both sides of the vacuum processing chamber, respectively.

An exhaust pipe 4 leading to a vacuum pump is provided at the bottom of the processing chamber 1, and a gas introduction pipe 6 containing pulp 5 is provided at -t111 of the processing chamber 1.07 is a roll-shaped negative electrode; The cross section is as shown in FIG. In this figure, reference numeral 8 denotes a hollow rotating shaft that penetrates the side wall of the processing chamber 1 in an airtight manner, and a hollow cathode 7 is fixed to the outside of this shaft.

This electrode 7 is double-walled and has an inner tube 9 provided inside the rotating shaft 8.
The electrode surface temperature regulating medium such as water introduced from Ih
s flows from the inlet 12 at the tip of the IP II 8 along the spiral flow path formed by the spiral medium flow path adjustment plate 11 provided between the inner periphery of the electrode 7 and the inner wall 10, and flows from the inlet 12 at the tip of the IP II 8 to the outlet at the rear of the IP II 8. b1 so as to go out from 13 along the inner circumference of the shaft 8.
A seaway is formed.

14 is a semi-cylindrical electrode, and this electrode 14 is also hollow;
As shown in FIG. 3, a plurality of medium flow path adjustment plates 15 are fixed inside, and a medium for adjusting the electrode surface temperature, for example, water, which flows in from the inlet 16 at one end, flows in a zigzag shape as shown by the arrow, and flows into the outlet 1.
It is supposed to go out from 7 onwards.

This semi-cylindrical anode 14 is moved up and down by a lifting mechanism.

That is, a connecting rod 18 fixed to the center of the upper part of this electrode 14 passes through a seal holder 19 and protrudes above the processing chamber l while maintaining airtightness.

Reference numeral 20 denotes a support stand fixed above the processing chamber l, on which a linear head 21 is provided. This linear head 21 serves to raise and lower the connecting rod 18, and in the illustrated example, it is a rack and pinion mechanism.

That is, a pinion gear driven by the motor 22 via a speed reducer 23 is mounted in the head 21, and a rack gear formed on the side surface of the connecting rod 18 meshes with this pinion gear, and the forward and reverse rotation of the motor 22 causes the connecting rod to 18 is raised and lowered to adjust the spacing between the electrodes 7.14.

24 is a winding shaft in the film supply chamber 2, 25 is a winding shaft provided in the film winding chamber 3, and the film 2 wound on the winding shaft 24 is
6 passes between seal rolls 27 for conveyance, goes half way around the upper half of the roll-shaped negative electrode 7 through guide rolls 28 in the processing chamber l, passes through guide rolls 29 and passes between seal rolls 30 for take-up. , and is adapted to be wound around a winding shaft 25.

Note that exhaust pipes 31 and 32 are also provided in each chamber 2.3.

Reference numeral 33 in FIG. 1 denotes a matching box for impedance matching provided outside the processing chamber l, which is electrically connected to the cathode 7, and the other end of this box 33 is connected to a high-frequency power source 35 via a pass-through wattmeter 34. It is connected to the.

The other end of this high frequency power source 35 is connected to the positive electrode 14 and ground 36.

This invention has the above structure, and the processing chamber 1, the supply chamber 2, and the winding chamber 3 are evacuated by exhaust gas from the exhaust pipe 4. Gas is introduced into the processing chamber l, and the rotary shaft 8 drives the roll-shaped negative electrode 7 in the direction of the arrow in FIG. Vacuum treatment is applied to the surface of the film 26 moving in the direction of the arrow in the figure.

Since the present invention has the above-described configuration and operation, the following effects can be obtained.

Since an elevating mechanism is provided on the support portion of the anode electrode to adjust the Ω distance between both viewing electrodes to A, and the anode is raised and lowered by a large distance rlj, the distance between the two electrodes can be adjusted very easily. Therefore, even if the material, thickness, and pressure of the gas introduced into the vacuum processing chamber differ, the electrode spacing can be adjusted according to the purpose of the workpiece to improve the processing effect. .

Furthermore, the electrode spacing can be controlled automatically and remotely using the linear head, making it easy to position at any desired position.

Since the positive electrode is semicircular, the discharge space (area) does not expand, improving the processing effect or improving the processing efficiency.

In addition, in this invention, a magnet is installed around the outer periphery of the vacuum processing chamber, and a magnetic field perpendicular to the voltage (usually 20 to
By applying a voltage of 100 Gauss), the pinch effect of the voltage in the discharge region can be promoted, the power density can be increased, and the processing effect can be improved.

[Brief explanation of the drawing]

Fig. 1 is a vertical sectional front view of a vacuum processing apparatus embodying the present invention, Fig. 2 is an enlarged longitudinal sectional side view taken along line A-A in Fig. 1, and Fig. 3 is a plan view taken along line BB in Fig. 1. O 1... Vacuum processing chamber, 7... Roll-shaped cathode, 11...
- Medium flow path adjusting plate, 14... semi-cylindrical anode plate 15...
- Medium flow path adjusting plate, 20... Support stand, 21... Linear head, 26... Film patent applicant
Nitto Electric Industry Co., Ltd. Agent Patent Attorney Kazu1) Akira

Claims (4)

[Claims] (1) In a vacuum processing apparatus configured to provide a rolled negative electrode and a semi-cylindrical positive electrode in a vacuum processing chamber, and to process the surface of the object by feeding the object between the two electrodes, A vacuum processing apparatus characterized in that a support portion of the semi-cylindrical positive electrode is provided with an elevating mechanism for adjusting the distance between the two electrodes. (2) The vacuum processing according to claim 1, wherein the elevating mechanism includes a linear head that is a combination of a two-pinion mechanism and its driving means, and a support base that supports the linear head. Device. (3) The vacuum according to claim 1, characterized in that a flow path for a medium for adjusting the electrode surface temperature is provided in the rolled cathode, and the temperature adjusting medium is configured to flow through the flow path. Processing equipment. (4) An electrode surface temperature adjusting medium flow path is provided in the semi-cylindrical positive electrode, and the temperature adjusting medium is configured to flow into the flow path. The vacuum processing apparatus described.