JPS59200752A - 成膜部材加熱装置 - Google Patents

成膜部材加熱装置

Info

Publication number
JPS59200752A
JPS59200752A JP7554783A JP7554783A JPS59200752A JP S59200752 A JPS59200752 A JP S59200752A JP 7554783 A JP7554783 A JP 7554783A JP 7554783 A JP7554783 A JP 7554783A JP S59200752 A JPS59200752 A JP S59200752A
Authority
JP
Japan
Prior art keywords
casing
heater
forming member
heating device
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7554783A
Other languages
English (en)
Japanese (ja)
Other versions
JPH059515B2 (enExample
Inventor
Naoichiro Tanno
淡野　直一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Shimazu Seisakusho KK
Original Assignee
Shimadzu Corp
Shimazu Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp, Shimazu Seisakusho KK filed Critical Shimadzu Corp
Priority to JP7554783A priority Critical patent/JPS59200752A/ja
Publication of JPS59200752A publication Critical patent/JPS59200752A/ja
Publication of JPH059515B2 publication Critical patent/JPH059515B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP7554783A 1983-04-28 1983-04-28 成膜部材加熱装置 Granted JPS59200752A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7554783A JPS59200752A (ja) 1983-04-28 1983-04-28 成膜部材加熱装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7554783A JPS59200752A (ja) 1983-04-28 1983-04-28 成膜部材加熱装置

Publications (2)

Publication Number Publication Date
JPS59200752A true JPS59200752A (ja) 1984-11-14
JPH059515B2 JPH059515B2 (enExample) 1993-02-05

Family

ID=13579327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7554783A Granted JPS59200752A (ja) 1983-04-28 1983-04-28 成膜部材加熱装置

Country Status (1)

Country Link
JP (1) JPS59200752A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5063031A (en) * 1989-08-24 1991-11-05 Kabushiki Kaisha Toshiba Apparatus for growing vapor phase layer on semiconductor substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5063031A (en) * 1989-08-24 1991-11-05 Kabushiki Kaisha Toshiba Apparatus for growing vapor phase layer on semiconductor substrate

Also Published As

Publication number Publication date
JPH059515B2 (enExample) 1993-02-05

Similar Documents

Publication Publication Date Title
US3002895A (en) Incubator-shaker apparatus
JPS59200752A (ja) 成膜部材加熱装置
JPS5952342B2 (ja) 減圧平衡加熱方法
GB1502286A (en) Food steamer and warmer
JP2697250B2 (ja) 熱ｃｖｄ装置
JP2592396B2 (ja) 薄膜の形成装置
JP3430653B2 (ja) ローラハース形熱処理炉
JPS5855253Y2 (ja) 化学気相成長装置
JPH0338029A (ja) 気相成長装置
JPS6043340A (ja) 米菓の乾燥方法
JPS6024377A (ja) 堆積膜の製造方法と製造装置
JP2001248968A (ja) 熱処理装置
JP2551182B2 (ja) 半導体製造装置
JPH0426528U (enExample)
JPH097955A (ja) 半導体熱処理用の電気抵抗式ガラス状カーボン製ヒータ
JPH0224477Y2 (enExample)
JPH0445237Y2 (enExample)
JPH0548306B2 (enExample)
JPH01119057U (enExample)
JPS59220129A (ja) 植木鉢
JPH0526734Y2 (enExample)
JPH01187456A (ja) 試料回転装置
JPH0462168B2 (enExample)
JPH0350325U (enExample)
JPH05118763A (ja) 加圧真空炉