JPS5919991A - Display - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed Description of the Invention] +a) Technical Field of the Invention The present invention relates to a display device.1 More specifically, the present invention relates to a display device in which the left and right elements and 1/8 of the drive circuit for these elements are integrally integrated on the surface of a semiconductor substrate. This invention relates to improvements in the structure of display devices.

(b) Background of the technology In recent years, EL display devices in which display elements and drive circuits for these elements are integrally integrated on the surface of a semiconductor substrate (
υ [researched and developed.

In particular, recently, in order to stabilize the operation, a shield electrode has been introduced to shield against light and electromagnetic induction from the outside.

(C1 Prior Art and Problems) FIG. 1 is a cross-sectional view conceptually showing the structure of one section of a conventional EL display device of this type, and the manufacturing process will be explained according to this drawing.

First, a driving circuit, that is, an active element group 2 consisting of MOS transistors, etc., and a passive element group 3 consisting of capacitors, resistors, etc. were integrated on the semiconductor substrate surface 1 and wired with vapor-deposited metal such as aluminum. It is covered with an insulating layer 4 such as silicon oxide (Si 2 O,), and a matrix array of pixel electrodes 5 and a shield electrode 6 are formed thereon.

Thereafter, silicon oxide (SiO, 1) is deposited again to form an insulating layer 7 with a thickness of 10,000 to 20,000 people covering all the above-mentioned elements to protect the elements from moisture, so-called passivation. At the same time, the EL light emitting layer formed in the steps !& is prevented from emitting light outside the light emitting region.

Next, a window is formed in the light emitting area directly above the pixel electrode by etching to define the display area. After that.

Dielectric layer such as yttrium oxide (Y, 0.)8.8
a, IEI, luminescent layer (usually zinc sulfide-manganese Zn
S: Mn) EL1 composed of 9 and 10
form.

Furthermore, a transparent front electrode 11 is formed thereon in common to each pixel electrode in the same column, thereby forming a light emitting region corresponding to the opposing region of the two electrodes, that is, corresponding to the pixel electrode.

As you can see from the above explanation, after installing the drive circuit.

There is a strong desire to reduce the number of steps involved, such as the deposition of various insulating layers and EL layers.

(dl Invention 1-1 Invention 4; This was made in view of the points stated in JIiil, and
The purpose is to review the abrasive quality of the dielectric If of L display devices, etc., and to provide an improved structure that can be performed without reducing the number of manufacturing steps.

tel Structure of the Invention The object of the present invention described above is to provide a display medium comprising an EL light emitting layer sandwiched between two dielectric layers via a plurality of regularly arranged pixel electrodes on a common substrate. , and in a configuration in which a drive circuit for the pixel electrode is integrally integrated, a lower dielectric layer sandwiching the EL light emitting layer and an insulating layer covering a shield electrode disposed on the drive circuit. This can be more easily achieved by constructing the same dielectric layer with a single dielectric layer.

(fl　Embodiments of the invention Before describing the embodiments of the present invention below.

L layer: Taking an L display device as an example, let's consider the dielectric layer material that makes up a part of it.

The insulating layers 4 and 7 are surface stabilizing layers that protect the drive circuit on the semiconductor substrate surface l from moisture and the like.

Since it also serves as an electrical insulating layer that blocks light emission in areas other than the display area of the drive circuit, it is required to have high insulation properties and moisture resistance.
is optimal and widely used.

On the other hand, the dielectric layers 8 and 8 constituting the EL layer 10
The abrasive quality of a has high insulation and dielectric coefficient, ffi+,
This is an essential condition from the viewpoint of the reliability of the layer and luminous efficiency. At the same time, the dielectric layer 8.8a
JV must also have good adhesion to zinc sulfide-manganese ZnS (Mn) 9.

Intrium oxide (Y
,0. ) and silicon nitride: I7 (Si, N 4 ). Their dielectric coefficients are approximately 12 and 8, respectively. The aforementioned silicon oxide (SiO) has a dielectric constant of about 3.5 and is not suitable for the dielectric layer of ELiIO.

On the other hand, yttrium oxide (Y, 02) is hygroscopic and cannot be used as a surface stabilizing layer due to its moisture resistance.

Among the dielectric materials mentioned above, silicon nitride (Si,
N4) is suitable for use as the surface stabilizing layer in terms of insulation and moisture resistance.

A careful consideration of the above considerations reveals that the BpJ electric material used in EL display devices has high moisture resistance, excellent electrical insulation, a large dielectric coefficient, and an EL light emitting layer (usually zinc sulfide-manganese). If there is a material that has good adhesion to ZnS (Mn) 9, the insulating layer 7 of silicon oxide (SiO,) and the EL light emitting layer (usually zinc sulfide-manganese) can be formed in the manufacturing process of an EL display device. By using the same material for the first insulating layer IN 8 of the two dielectric layers sandwiching ZnS:Mn) 9, the vapor deposition process can be performed simultaneously.

Specifically, silicon nitride (Si, N
), and the above two layers are simultaneously formed in one vapor deposition.

FIG. 2 is a conceptual cross-sectional view showing the structure of one section of the new EL display device according to the present invention. As shown in the figure,
A dielectric material ff112 is formed in place of the insulating layer 7 and dielectric material IN8 of the conventional structure shown in FIG.

The dielectric layer 12 has a thickness of 10,000 to 2,000 as described above in order to prevent light emission in areas other than the pixel electrode 5.
Since the number of electrodes must be zero, the portion facing one pixel electrode 5 must be etched into a thin layer of about 2,000 layers as shown in the figure to form the window 13.

Other than that, the structure is no different from the conventional structure.

(gl Effect of the invention As is clear from the above explanation, two new E
By adopting the structure of the L display device.

This is effective in reducing the vapor deposition process of the dielectric ILi of the device H, and reducing manufacturing costs.

[Brief explanation of the drawing]

1st closed l 4J, 1)(-)k(1)Iff+, sectional view conceptually showing the configuration of one section of the display device, Fig. 2 is El according to the present invention, new configuration of one section of the display device FIG. In the figure, C and I are semiconductor substrates, and 2 is an active element group. 3 is a passive element I11'; 4. 7 is an insulating layer, and 5 is a pixel electrode. 6 is shield 111JIJi, 8. 8 a.
] 2 is the dielectric layer 59 that emits E L light, -1, 10 is E
LI Jin, 11 is transparent front electrode, 1;) is dielectric 1 sound 1
Open the light emitting area windows drilled in step 2, respectively.

Claims (1)

[Claims] A display medium consisting of an EL light-emitting layer sandwiched between 62 dielectric layers via a plurality of regularly arranged pixel electrodes is provided on a common group JAi, I, and a drive circuit for the pixel electrodes is provided. - In a configuration in which the E1 is integrated in one
, a lower dielectric layer sandwiching the light emitting layer, and -1- of the drive circuit.
The insulating layer covering the shield electrode arranged on the flol
- A display device comprising a dielectric layer.