JPS59195112A - 荷電粒子線装置の試料表面高さ測定装置 - Google Patents

荷電粒子線装置の試料表面高さ測定装置

Info

Publication number
JPS59195112A
JPS59195112A JP58070649A JP7064983A JPS59195112A JP S59195112 A JPS59195112 A JP S59195112A JP 58070649 A JP58070649 A JP 58070649A JP 7064983 A JP7064983 A JP 7064983A JP S59195112 A JPS59195112 A JP S59195112A
Authority
JP
Japan
Prior art keywords
sample
charged particle
particle beam
height
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58070649A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0217050B2 (enrdf_load_stackoverflow
Inventor
Toyoki Kitayama
北山　豊樹
Shigeru Moriya
茂 守屋
Kazuhiko Komatsu
一彦 小松
Teruaki Okino
輝昭 沖野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP58070649A priority Critical patent/JPS59195112A/ja
Publication of JPS59195112A publication Critical patent/JPS59195112A/ja
Publication of JPH0217050B2 publication Critical patent/JPH0217050B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Electron Beam Exposure (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
JP58070649A 1983-04-21 1983-04-21 荷電粒子線装置の試料表面高さ測定装置 Granted JPS59195112A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58070649A JPS59195112A (ja) 1983-04-21 1983-04-21 荷電粒子線装置の試料表面高さ測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58070649A JPS59195112A (ja) 1983-04-21 1983-04-21 荷電粒子線装置の試料表面高さ測定装置

Publications (2)

Publication Number Publication Date
JPS59195112A true JPS59195112A (ja) 1984-11-06
JPH0217050B2 JPH0217050B2 (enrdf_load_stackoverflow) 1990-04-19

Family

ID=13437703

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58070649A Granted JPS59195112A (ja) 1983-04-21 1983-04-21 荷電粒子線装置の試料表面高さ測定装置

Country Status (1)

Country Link
JP (1) JPS59195112A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63269007A (ja) * 1987-04-10 1988-11-07 エテック・システムズ・インコーポレイテッド サブストレートの位置測定用検出器

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63269007A (ja) * 1987-04-10 1988-11-07 エテック・システムズ・インコーポレイテッド サブストレートの位置測定用検出器

Also Published As

Publication number Publication date
JPH0217050B2 (enrdf_load_stackoverflow) 1990-04-19

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