JPS59194390A - High frequency heater - Google Patents

High frequency heater

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Publication number
JPS59194390A
JPS59194390A JP6951483A JP6951483A JPS59194390A JP S59194390 A JPS59194390 A JP S59194390A JP 6951483 A JP6951483 A JP 6951483A JP 6951483 A JP6951483 A JP 6951483A JP S59194390 A JPS59194390 A JP S59194390A
Authority
JP
Japan
Prior art keywords
waveguide
heating
frequency
heating chamber
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6951483A
Other languages
Japanese (ja)
Inventor
哲男 窪田
岩淵 康司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Netsu Kigu KK
Original Assignee
Hitachi Netsu Kigu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Netsu Kigu KK filed Critical Hitachi Netsu Kigu KK
Priority to JP6951483A priority Critical patent/JPS59194390A/en
Publication of JPS59194390A publication Critical patent/JPS59194390A/en
Pending legal-status Critical Current

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  • Constitution Of High-Frequency Heating (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は高周波加熱装置の均一加熱に関する。[Detailed description of the invention] The present invention relates to uniform heating in a high frequency heating device.

従来、高周波加熱装置の均一加熱手段として。Conventionally, as a uniform heating means for high frequency heating equipment.

高周波を乱反射するスターラー、高周波を放射する回転
アンテナ、被加熱物を回転移動するターンテーブル、加
熱室に多数の高周波放射口を設けるもの等が知られてい
るが、いずれも均一加熱を十分満足しているものは少な
い。
Stirrers that diffusely reflect high-frequency waves, rotating antennas that radiate high-frequency waves, turntables that rotate and move objects to be heated, and devices that have multiple high-frequency radiation ports in the heating chamber are known, but none of them fully satisfies uniform heating. There are few.

本発明は上述した欠点を解消するためになされたもので
、その目的は均一加熱を十分満足する高周波加熱装置を
得るにある。そのため加熱室天井例設けられた2個の形
状の異なる高周波放射口とターンテーブルとを組み合わ
せて被加熱物に万遍無く高周波エネルギーが照射される
ようにすると共に、特に被加熱物中央部の加熱不足を解
消したものである。
The present invention has been made to eliminate the above-mentioned drawbacks, and its purpose is to obtain a high-frequency heating device that satisfactorily achieves uniform heating. Therefore, by combining two high-frequency radiation ports with different shapes provided on the ceiling of the heating chamber and a turntable, the object to be heated is irradiated with high-frequency energy evenly, and in particular, the central part of the object to be heated is heated. This solves the shortage.

以下2本発明の一実施例について図面を用いて説明する
。第1図は本発明の一実施例を示す要部断面図で、第2
図は第1図における加熱室天井部の高周波放射口付近を
上から見た場合の要部の平面図である。第5図、第4図
はそれぞれの高周波放射口寸法の違いによる被加熱物の
中央部の加熱温度特性および被加熱物の加熱むら特性を
示したものである。
Two embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view of a main part showing one embodiment of the present invention, and FIG.
This figure is a plan view of the main parts of the vicinity of the high-frequency radiation opening on the ceiling of the heating chamber in FIG. 1, when viewed from above. FIGS. 5 and 4 show heating temperature characteristics at the center of the object to be heated and heating unevenness characteristics of the object due to differences in the dimensions of the high-frequency radiation openings.

第1図、第2図により本発明の詳細な説明する。The present invention will be explained in detail with reference to FIGS. 1 and 2.

1は高周波エネルギーを発生する高周波発振器で。1 is a high frequency oscillator that generates high frequency energy.

6は高周波発振器1を加熱室2に連結する導波管である
。加熱室2および導波管6は金属板から形成されている
。加熱室2の下部には食品などの核力り熱動4を載置し
て回転移動させるター/テーブル5を設けている。加熱
室2に導波管ろを結合する部分には2個所の高周波放射
口6,7を設け。
A waveguide 6 connects the high frequency oscillator 1 to the heating chamber 2. The heating chamber 2 and the waveguide 6 are formed from metal plates. At the bottom of the heating chamber 2, there is provided a tar/table 5 on which a nuclear toner 4 such as food is placed and rotated. Two high frequency radiation ports 6 and 7 are provided at the portion where the waveguide filter is connected to the heating chamber 2.

一方の高周波放射口6を導波管乙の先端部とし。One of the high-frequency radiation ports 6 is used as the tip of the waveguide B.

もう一方の高周波放射ロアの位置を導波管6の先端部の
高周波放射口6よりλg/2±λg/4(λgは管内波
長)とするとともに加熱室壁面8よりλ/2±λ/4(
λ(は自由空間波長)離して設置し、放射ロアの導波管
軸方向の寸法Aをλg/12以上、高周波放射に乙の同
一方の寸法Bをλg/12以上、同他方の寸法Cをλg
/3±λg/6.としている。なお上記高周波放射口6
,7は加熱室の前後のほぼ中心線上に設けられている。
The position of the other high-frequency radiation lower is λg/2±λg/4 (λg is the wavelength inside the tube) from the high-frequency radiation opening 6 at the tip of the waveguide 6, and λ/2±λ/4 from the heating chamber wall surface 8. (
Installed at a distance of λ (where free space wavelength), dimension A of the radiation lower in the waveguide axis direction is λg/12 or more, dimension B of the same side for high frequency radiation is λg/12 or more, and dimension C of the other side. λg
/3±λg/6. It is said that In addition, the above-mentioned high frequency radiation port 6
, 7 are provided approximately on the center line of the front and rear of the heating chamber.

次に上記一実施例における作用について第3図。Next, FIG. 3 shows the operation in the above embodiment.

第4図を補足して説明する。This will be explained with supplementary reference to FIG.

高周波放射口6および7の位置を導波管3の先端部およ
びλg/2±λg/4離した位置にした理由について説
明する。導波管3内において先端部では磁界強度が最大
で、先端部よりλg/2の位置でも最大になることが知
られている。しだがって。
The reason why the high frequency radiation ports 6 and 7 are positioned λg/2±λg/4 apart from the tip of the waveguide 3 will be explained. It is known that in the waveguide 3, the magnetic field strength is at its maximum at the tip, and also reaches its maximum at a position λg/2 from the tip. Accordingly.

先端部に設けた高周波放射口6で磁界強度が最大となる
ことはもちろんであるが、高周波放射ロアも磁界が最大
あるいは最大に近い状態になり得るので、高周波放射口
6,7から能率よく高周波エネルギーを加熱室2内に向
かって放射できる。
It goes without saying that the magnetic field strength is maximized at the high-frequency radiation port 6 provided at the tip, but the magnetic field of the high-frequency radiation lower can also be at its maximum or close to the maximum, so high-frequency radiation can be efficiently transmitted from the high-frequency radiation ports 6 and 7. Energy can be radiated into the heating chamber 2.

高周波放射ロアの位置を加熱室壁面8よりλ/2±λ/
4としている理由について説明する。加熱室2内では加
熱室壁面8よりλ/2で磁界強度が最大となるため結合
度がよく、高周波放射ロアから放射される高周波エネル
ギーが効率よく加熱室2内に放射される。すなわち導波
管3に設けられた  1高周波放射ロアと加熱室2との
整合が非常にとりやすいだめである。
The position of the high frequency radiation lower is λ/2±λ/ from the heating chamber wall surface 8.
The reason why it is set as 4 will be explained. In the heating chamber 2, the magnetic field strength reaches its maximum at λ/2 from the heating chamber wall surface 8, so the degree of coupling is good, and the high frequency energy radiated from the high frequency radiation lower is efficiently radiated into the heating chamber 2. In other words, it is very easy to match the high frequency radiation lower part 1 provided in the waveguide 3 with the heating chamber 2.

高周波放射ロアの同寸法Aをλg/12±λg/24に
した理由について第3図を用いて説明する。第6図は縦
軸に被加熱物の中央部の加熱温度上昇値をとったもので
、上に行くに従って中央部の温度が被加熱物全体の温度
に対して高くなることを示している。横軸は高周波放射
ロアの同寸法Aを加熱室壁面8よりλ/2の位置を中心
にして変化きせた寸法を示している。第3図に示すごと
く5寸法Aが小さくなるに従って中心部の温度が高くな
る。A、 −0すなわち高周波放射口6を完全に閉じる
と中央部は低くなる。まだλg/12以下とするとスパ
ークが発生する心配があるため、実測はしなかったが、
第3図の点線で示すような特性を示すものと思われる。
The reason why the same dimension A of the high frequency radiation lower is set to λg/12±λg/24 will be explained with reference to FIG. In FIG. 6, the heating temperature increase value at the center of the object to be heated is plotted on the vertical axis, and it shows that the temperature at the center increases relative to the temperature of the entire object to be heated as it goes upward. The horizontal axis indicates a dimension obtained by varying the same dimension A of the high-frequency radiation lower with a center at a position λ/2 from the heating chamber wall surface 8. As shown in FIG. 3, as the 5th dimension A becomes smaller, the temperature at the center becomes higher. A, -0, that is, when the high frequency radiation opening 6 is completely closed, the central portion becomes lower. I did not actually measure it because there is a concern that sparks will occur if it is still below λg/12,
It seems to exhibit characteristics as shown by the dotted line in FIG.

被加熱物4を高周波エネルギーで加熱する時、放射むら
のため中央部の加熱不足状態が生じると、この加熱不足
分を補うだめ加熱時間を増はなければならない。すると
被加熱物の周囲が脱水したり、著しい場合には炭化する
などの加熱むらが生じてしまう。したがって被加熱物の
中央部の加熱不足をなくすることは、加熱むらを解消す
るのに有効な手段である。そこで第5図に示すごとく、
スパーク等の発生を考慮した場合、A=λg/12で被
加熱物4の中央部の加熱温度上昇が大きく、最良の寸法
であることがわかる。
When heating the object 4 with high frequency energy, if insufficient heating occurs in the center due to uneven radiation, the heating time must be increased to compensate for this insufficient heating. This may cause uneven heating such as dehydration around the object to be heated or, in severe cases, carbonization. Therefore, eliminating insufficient heating in the center of the object to be heated is an effective means for eliminating uneven heating. Therefore, as shown in Figure 5,
When considering the occurrence of sparks, etc., it can be seen that when A=λg/12, the heating temperature rises at the center of the object to be heated 4 is large, which is the best dimension.

ただし、スパークの関係からAは7712以上とする必
要がある。
However, A needs to be 7712 or more due to spark issues.

次に高周波放射ロアの同寸法Bを7g712以上。Next, the same dimension B of the high frequency radiation lower is 7g712 or more.

同寸法Cをλg/3±λg/6とした理由について説明
する。同寸法Bは上述したようにλg/12以下とする
とスパークを発生するために実用上26712以上とし
だ。一方向寸法Cは第4図に示すごとく種々変化させ、
この時の被加熱物4の加熱むらの状態を調べると、λg
15近辺で最もむらが少なく、これを中心にして短かく
なっても、長くなってもむらの度合が大きくなるという
実測結果を得た。これらの結果を元に同寸法Cはλg/
3±λg/6とすることにした。
The reason why the same dimension C is set to λg/3±λg/6 will be explained. As mentioned above, if the dimension B is set to λg/12 or less, sparks will be generated, so it is practically required to be 26712 or more. The dimension C in one direction is varied as shown in Fig. 4,
Examining the state of uneven heating of the heated object 4 at this time, λg
The actual measurement results show that the degree of unevenness is the least near 15, and that the degree of unevenness increases even if the length is shortened or lengthened around this point. Based on these results, the same dimension C is λg/
It was decided to set it to 3±λg/6.

以上のように本発明によると、導波管と加熱室の結合部
に高周波放射口を2個所設け2台形状の高周波放射口を
導波管の先端部に設け、もう一方の長方形スロット状の
高周波放射口を導波管の先端に設けられた前者の高周波
放射口よりおよそλg/2.加熱室壁面よりλg/2離
して設置することにより、ターンテーブルとの組み合わ
せから被加熱物に万遍なく高周波エネルギーが照射され
、特に被加熱物の中央部の加熱不足を解消して、加熱む
らを少なくした高周波加熱装置を提供することができる
As described above, according to the present invention, two high-frequency radiation ports are provided at the joint between the waveguide and the heating chamber, two trapezoidal high-frequency radiation ports are provided at the tip of the waveguide, and the other rectangular slot-shaped high-frequency radiation port is provided at the tip of the waveguide. The high frequency radiation opening is approximately λg/2 from the former high frequency radiation opening provided at the tip of the waveguide. By installing the heating chamber at a distance of λg/2 from the wall surface, in combination with the turntable, the object to be heated is irradiated with high-frequency energy evenly, which eliminates insufficient heating especially in the center of the object and reduces uneven heating. It is possible to provide a high-frequency heating device with reduced .

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示す高周波加熱装置の要部
断面図、第2図は第1図におけるx −x’より見た場
合の高周波加熱装置の要部の平面図。 第3図、第4図はそれぞれ高周波放射口の寸法を変化さ
せた時の被加熱物の中央部の温度特性図および加熱むら
特性図である。 1 ・・高周波発振器。 2 ・・・加熱室。 6 ・・・導波管。 4・・・・被加熱物。 5・・・・ターンテーブル。 6.7  ・・・高周波放射口。 8・・・・・加熱室壁面。 A−・・・・・放射ロアの導波管軸方向の寸法。 B ・・・放射口6の導波管軸方向の一方の寸法。 C・・・・・・同他方の寸法。 出願人  日立熱器具株式会社 第1図 第2図 431− 第3図 第4図 寸法C
FIG. 1 is a sectional view of a main part of a high-frequency heating device showing an embodiment of the present invention, and FIG. 2 is a plan view of the main part of a high-frequency heating device when viewed from x-x' in FIG. FIG. 3 and FIG. 4 are a temperature characteristic diagram and a heating unevenness characteristic diagram of the central part of the object to be heated when the dimensions of the high-frequency radiation opening are changed, respectively. 1...High frequency oscillator. 2...Heating chamber. 6... Waveguide. 4...Object to be heated. 5... Turntable. 6.7 ...High frequency radiation port. 8... Heating chamber wall surface. A - Dimension of the radiation lower in the waveguide axis direction. B: One dimension of the radiation port 6 in the waveguide axis direction. C... Dimensions of the same other side. Applicant: Hitachi Thermal Equipment Co., Ltd. Figure 1 Figure 2 431- Figure 3 Figure 4 Dimensions C

Claims (1)

【特許請求の範囲】 高周波エネルギーを発生する高周波発振器(1)と。 この高周波発振器(1)を加熱室(2)に連結する導波
管(6)と、被加熱物(4)を回転移動させるターンテ
ーブル(5)とを備えた高周波加熱装置において、導波
管(3)と加熱室(2)との結合部に2個所の高周波放
射口(6)、σ)を設け、一方の高周波放射口(6)の
位置を導波管(5)の先端部とし、もう一方の高周波放
射口(力の位置を導波管(3)の先端部の放射口(6)
よりλg//2±λg/4(λgは管内波長)、及び 
加熱室壁面(8)よりλ/2±λ/4 (λは自由空間
波長)離して設置し、上記放射口(7)の導波管軸方向
の寸法(2)をλg/12以上、放射口(6)の同一方
の寸法■を26712以上。 同他方の寸法(C1をλg/3±λg/6にしたことを
特徴とする高周波発振器#。
[Claims] A high frequency oscillator (1) that generates high frequency energy. In a high-frequency heating device including a waveguide (6) that connects the high-frequency oscillator (1) to a heating chamber (2) and a turntable (5) that rotationally moves the object to be heated (4), the waveguide (3) and the heating chamber (2) are provided with two high-frequency radiation ports (6), σ), and one high-frequency radiation port (6) is positioned at the tip of the waveguide (5). , the other high-frequency radiation port (the force position is the radiation port (6) at the tip of the waveguide (3)
From λg//2±λg/4 (λg is the tube wavelength), and
It is installed at a distance of λ/2±λ/4 (λ is the free space wavelength) from the heating chamber wall surface (8), and the dimension (2) of the radiation port (7) in the waveguide axis direction is λg/12 or more, and the radiation The dimension of the same side of the mouth (6) is 26712 or more. A high frequency oscillator # characterized in that the other dimension (C1) is λg/3±λg/6.
JP6951483A 1983-04-20 1983-04-20 High frequency heater Pending JPS59194390A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6951483A JPS59194390A (en) 1983-04-20 1983-04-20 High frequency heater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6951483A JPS59194390A (en) 1983-04-20 1983-04-20 High frequency heater

Publications (1)

Publication Number Publication Date
JPS59194390A true JPS59194390A (en) 1984-11-05

Family

ID=13404910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6951483A Pending JPS59194390A (en) 1983-04-20 1983-04-20 High frequency heater

Country Status (1)

Country Link
JP (1) JPS59194390A (en)

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