JPS59189586A - High frequency heater - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed description of the invention] The present invention relates to uniform heating in a high frequency heating device.

Uniform heating means for high-frequency heating equipment include a stirrer that diffusely reflects high-frequency waves, a rotating antenna that radiates high-frequency waves, and a turntable that rotates and moves the object to be heated.

A method is known in which a large number of high-frequency supply ports are provided on the peripheral wall of the heating chamber. In any case, through numerous cut-and-try experiments, the unevenness of heating in IDI has been reduced to the extent that it can be put to practical use, but it has the disadvantage of requiring nine hands and nine hours of study.

The present invention solves the above-mentioned drawbacks, and aims to provide a high-frequency heating device that achieves uniform heating with simple means.

An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.6 FIG. 1 is a schematic cross-sectional view of the main part showing an embodiment of the high-frequency heating device of the present invention, and FIG. It is a top view seen from the direction of force. 1 is a high frequency oscillator that generates high frequency energy, and 2 is a waveguide that connects the cylindrical frequency oscillator 1 to the heating chamber B. /of.

The heat chamber filter and the waveguide 2 are formed from a metal plate. At the lower part of the heating chamber 3, there is provided a tar/chill pull 5 on which a heated object 4 such as food is placed and rotated. There are two high-frequency radiation ports in the iζIS portion that connects the 4-wave tube 2 to the heating chamber B.
One high-frequency radiation opening 6 is located at the tip of the waveguide 2, and the other high-frequency radiation lower is located near the end A-1 of the heating chamber B, and relative to the axial direction of the waveguide 2. Dimensions B and D of the above two high frequency radiation ports 6.7
The sum of the dimensions of the partition part 80 that separates the high-frequency radiation ports 6 and 7 is set to λ1 + - λ for the wavelength λ used, and the dimension C of the partition part 8 is It is said to be over 100λ. Reference numeral 9 denotes a screw that connects the lower plate of the waveguide 2 and the end of the earthen wall of the heating chamber 6. The dimension E of the mounting part of the screw 9 must be 15 mm or more from the viewpoint of ease of manufacture.

The reason why the total dimension B+C+D of the dimensions B and D of the high-frequency radiation ports 6 and 7 and the dimension C of the partition part is set to 1 λ to 17 λ will be explained. The internal wavelength λ in the waveguide 2 is larger than the used wavelength (free space wavelength) λ, and it increases as the long side dimension a becomes narrower, but in a waveguide of practical size, it is -λ to λ+7λ. At least -λ is included in the range of . It is known that in the waveguide 2, the magnetic field strength is at its maximum at the tip, and is also at its maximum at a position 7λ degrees from the tip. Therefore, it goes without saying that the magnetic field strength is at its maximum at the high-frequency radiation port 6 provided at the tip, but the magnetic field strength of the high-frequency radiation lower portion can also be at its maximum or nearly jy large, so the high-frequency radiation port 6, 7 also efficiently directs high-frequency energy toward the inside of the heating chamber. The wavelength λ used by the high-frequency heating device is 122 mm and 15 mm. This 15+
nm is 500W to 7.00W when the partition part 8 is made of painted iron plate or stainless steel in a high-frequency heating device for household red beans, a so-called microwave oven.
This is the minimum size necessary to prevent problems such as discoloration and deformation due to abnormal heating when the object to be heated 4 is forgotten to be placed in the heating chamber 6 which supplies the high-frequency energy, i.e. in an empty firing state, and is the minimum size required for practical use. The upper dimension C needs to be larger than t 5mm. Although each of the above-mentioned dimensions is theoretical, in practice, these dimensions are used as a reference and are changed within a range that obtains the maximum effect.

Next, the functions and effects of the two high-frequency heating devices of the present invention will be explained. The high-frequency energy directed from the high-frequency oscillator 1 to the heating chamber B is first radiated into the heating chamber from the high-frequency radiation lower at the end of the heating chamber, and then the remaining high-frequency energy is transmitted to the high-frequency radiation at the tip of the waveguide 2. The radiation is emitted from the radiation port 6 into the heating chamber 6 . Therefore, the heat is uniformly radiated to the vicinity of the center of the heating chamber B and the vicinity of the peripheral wall, that is, in the radial direction of the turntable 5.
can be reduced. It goes without saying that the heating unevenness can be reduced by rotating the turntable 5 in the same circumferential direction.

Furthermore, in the case of tall kelp, milk in a milk bottle, or sake in a tall sake bottle, uneven heating tends to occur in the vertical direction. distance A
By selecting , it is possible to prevent the milk or alcohol from falling directly under the first high-frequency radiation beam, and to reduce uneven heating in the -1- downward direction. To this end, it is sufficient to place the predecessor high-frequency radiation lower as close to the end of the heating chamber 3 as possible.

As described above, according to the present invention, in a high-frequency heating device equipped with a rotor table, two high-frequency radiation ports are provided,
One high-frequency radiation opening is placed at the tip of the waveguide, and the other high-frequency radiation is placed near the end of the heating chamber. It is easy to reduce uneven heating of objects in the vertical direction.

It is possible to reduce the manpower and time required to improve uneven heating, which is advantageous in terms of manufacturing.

[Brief explanation of the drawing]

FIG. 1 is a schematic cross-sectional view of a main part of an embodiment of the high-frequency heating device of the present invention, and FIG. 2 is a top view of FIG. 1 as viewed from the xy force direction. 1. High frequency oscillator, 2. Waveguide. 6 heating chamber, 4 object to be heated. 5 Turntable, 6, 7, high frequency radiation port. Applicant: Hitachi Thermal Appliances Co., Ltd.

Claims (1)

[Claims] A high-frequency oscillator (1) that generates high-frequency gonergy. In a high-frequency heating device equipped with a waveguide (2) that connects this high-frequency oscillator (1) to a heating chamber (3) and a turntable (5) that rotationally moves an object to be heated (4), the waveguide % (2) and the heating chamber (3) are connected with two high-frequency radiation ports (6). (7), one high-frequency radiation port (6) is positioned at the tip of the waveguide (2), and the other high-frequency radiation port (7) is located at the tip of the waveguide (2).
) is located close to the end of the heating chamber (3).