JPS59189585A - High frequency heater - Google Patents

High frequency heater

Info

Publication number
JPS59189585A
JPS59189585A JP6395283A JP6395283A JPS59189585A JP S59189585 A JPS59189585 A JP S59189585A JP 6395283 A JP6395283 A JP 6395283A JP 6395283 A JP6395283 A JP 6395283A JP S59189585 A JPS59189585 A JP S59189585A
Authority
JP
Japan
Prior art keywords
frequency
heating
heating chamber
high frequency
waveguide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6395283A
Other languages
Japanese (ja)
Other versions
JPH0129313B2 (en
Inventor
岩淵 康司
哲男 窪田
小田島 郁夫
芹沢 久幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Netsu Kigu KK
Original Assignee
Hitachi Netsu Kigu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Netsu Kigu KK filed Critical Hitachi Netsu Kigu KK
Priority to JP6395283A priority Critical patent/JPS59189585A/en
Publication of JPS59189585A publication Critical patent/JPS59189585A/en
Publication of JPH0129313B2 publication Critical patent/JPH0129313B2/ja
Granted legal-status Critical Current

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  • Constitution Of High-Frequency Heating (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は高周波加熱装置の均一加熱に関する。[Detailed description of the invention] The present invention relates to uniform heating in a high frequency heating device.

高周波加熱装置の均一加熱手段として、高周波を乱反射
するスターラ、高周波を放射する回転アンテナ、被加熱
物を回転移動するター/テーブル加熱室周壁に多数の高
周波供給口を設ける方法などが知られている。いずれに
してもカッドア/トドライによる多数の実験によって実
用に供せる程度に加熱むらを少なくしているが1人手と
かなりの倹J−j期間を要するという欠点があった。
Known methods for uniform heating in high-frequency heating devices include a stirrer that diffusely reflects high-frequency waves, a rotating antenna that radiates high-frequency waves, and a method in which a large number of high-frequency supply ports are provided on the peripheral wall of the heating chamber of a tar/table that rotates and moves the object to be heated. . In any case, although the heating unevenness has been reduced to the extent that it can be put to practical use through a number of experiments using Quadr/Todry, it has the disadvantage that it requires one person and a considerable amount of time.

本発明は上記欠点を解消するもので、簡単な手段で均一
加熱を得る高周波加熱装置を提供することを目的とする
The present invention solves the above-mentioned drawbacks, and aims to provide a high-frequency heating device that achieves uniform heating with simple means.

以下本発明の一実施例を莢1図、第2図に従って説明す
る。第1図は本発明の高周波加熱装置の一実施例を示す
要部断面略図で、第2図は第1図のXY方向から見た上
面図である。1は高周波エイ・ルギーを発生する高周波
発振器で12は高周波発振器1を加熱室ろに連結する導
波管である。加熱室6および4彼管2は金属板から形成
されているO加熱室6内の下部には食品などの被加熱物
4を載置して回転移動させるター7テーブル5を設けて
いる。加熱室6に導波管2を結合する部分には高周波放
射口を2個所6,7設け、一方の高周波放射口6を導波
管2の先端部とし、もう−力の高周波放射ロアを加熱室
ろの端部近傍とし、かつ導波管2の軸方向妊対する上記
2個所の高周彼放射ロ6,70寸法B、Dと上記2個所
の高周波放射口6゜7の間を隔てる仕切部8の寸法Cと
を合計し/C寸寸法 + C→Dを使用波長λに対して
壺λ〜λ+皆λにするとともに、仕切部8の寸法Cを百
λ以上としている。9 fd導波省2の下板と加熱室ろ
の土壁端部どを接合するだめのねじである。ねじ9の取
付部寸法Eは製作の容易官の点から15 mm以上は必
−要である。
An embodiment of the present invention will be described below with reference to Fig. 1 and Fig. 2 of the pod. FIG. 1 is a schematic cross-sectional view of a main part showing an embodiment of the high-frequency heating device of the present invention, and FIG. 2 is a top view as seen from the XY direction of FIG. 1. 1 is a high-frequency oscillator that generates high-frequency energy, and 12 is a waveguide that connects the high-frequency oscillator 1 to the heating chamber. The heating chambers 6 and 4 are each made of a metal plate. At the lower part of the heating chamber 6, there is provided a table 5 on which an object to be heated such as food 4 is placed and rotated. Two high-frequency radiation ports 6 and 7 are provided in the part where the waveguide 2 is connected to the heating chamber 6, and one high-frequency radiation port 6 is used as the tip of the waveguide 2 to heat the high-frequency radiation lower part of the power. A partition located near the end of the chamber and separating the above two high frequency radiation holes 6, 70 dimensions B and D from the axial direction of the waveguide 2 and the above two high frequency radiation ports 6°7. The total dimension C of the portion 8 is /C dimension + C→D, which is the pot λ~λ+total λ for the wavelength λ used, and the dimension C of the partition portion 8 is set to be 100 λ or more. 9 This is a screw that connects the lower plate of the FD waveguide 2 and the end of the earthen wall of the heating chamber filter. The dimension E of the mounting part of the screw 9 must be 15 mm or more for ease of manufacture.

高周波放射口6,70寸法B、Dと仕切部の寸法Cとの
合計寸法B+C十りをフλ〜λ+スλにしている理由を
説明する。導波管2内の管内波長λgI′i使用波長(
自由空間波長)λよシも大きく、長辺寸法aを狭くする
ほど大きくなるといつ件質があるが。
The reason why the sum of the dimensions B and D of the high-frequency radiation ports 6 and 70 and the dimension C of the partition portion (B+C) is set to λ˜λ+space λ will be explained. The internal wavelength λgI′i in the waveguide 2 is the wavelength used (
Free space wavelength) λ is also large, and there is a property that it becomes larger as the long side dimension a becomes narrower.

実用寸法の導波管では2X〜λ+72の範囲内に少なく
ともヲλgが含まれている。4波管2内におい−C1先
端部では磁界強度が最大で、先端部がらフλgの位置で
も最大となることが知られている。したがって先端部に
設けた高周波放射口6で磁界強度か最大となるのはもち
ろんであるが、高周波放射ロアも磁界強度が最大あるい
は最大に近い状態になシ得るので、高周波放射口6,7
から能率よく高周波エイ・ルギ−を加熱室S内に向かっ
て放射できる。
In a waveguide of practical size, at least λg is included in the range of 2X to λ+72. It is known that the magnetic field strength is maximum at the tip of -C1 in the four-wave tube 2, and is also maximum at the position of λg from the tip. Therefore, it goes without saying that the magnetic field strength is at its maximum at the high-frequency radiation port 6 provided at the tip, but the magnetic field strength of the high-frequency radiation lower part can also be at maximum or close to the maximum, so the high-frequency radiation port 6, 7
High frequency energy can be efficiently radiated into the heating chamber S from the heating chamber S.

仕切部80寸法Cは百2以上としているが、高周波加熱
装置の使用波長スを122mm (周$数2.450M
T−1zに対応)とした場合7 百2は約15 mmと
なる。この15陥は、家庭用の高周波加熱装置いわゆる
電子レンジにおいて、仕切部8を塗装した鉄板あるいは
ステンレススチールで製作したとき、500W〜700
Wの高周波エネルギーを供給している加熱室6内に被加
熱物4を入れ忘れた状態すなわち空焼状態で異常加熱に
よる変色や変形などの不都合が生じないために必要な最
小寸法であり、実用上は寸法Cは15聴より太き目にす
る必要がある。寸法B、Dの各々は寸法Cの位置の移動
によって互の大きさを違えることができる。
The dimension C of the partition part 80 is set to be 102 or more, but the wavelength used by the high-frequency heating device is 122 mm (circumference $2.450M).
(corresponding to T-1z), 7 102 is approximately 15 mm. These 15 conditions apply to a household high-frequency heating device called a microwave oven, when the partition part 8 is made of painted iron plate or stainless steel.
This is the minimum dimension necessary to prevent problems such as discoloration and deformation due to abnormal heating in a state where the object to be heated 4 is forgotten to be placed in the heating chamber 6 which supplies high frequency energy of W, i.e. in a dry firing state, and is practical. The dimension C needs to be thicker than the 15mm. Each of the dimensions B and D can be made different in size by moving the position of the dimension C.

次に1本発明の16周波加熱装置の作用、効果を説明す
る。高周波発振器1から加熱室3に向かう高周波エネル
ギーは、まず加熱室ろ端部の高周波放射ロアから加熱室
3内に放射きれ、続いて残シの高周波エネルギーが導波
管2の先端部の高周波放射口6がら加熱室6内に放射さ
れる。仕切部8の寸法Cや位置を調節し、て高周波放射
ロアの寸1宍りと同6の寸法Bとを互いに違えることに
より。
Next, the functions and effects of the 16-frequency heating device of the present invention will be explained. The high-frequency energy heading from the high-frequency oscillator 1 to the heating chamber 3 is first radiated into the heating chamber 3 from the high-frequency radiation lower at the lower end of the heating chamber, and then the remaining high-frequency energy is radiated into the high-frequency radiation at the tip of the waveguide 2. It is radiated into the heating chamber 6 through the mouth 6. By adjusting the dimension C and position of the partition part 8, and making the dimension 1 of the high frequency radiation lower and the dimension B of the same 6 different from each other.

高周波エネルギーの放射比率か調節でき、加熱条f′1
が変った場合でも実用的にターンテーブル5の一!1!
径方向の加熱むらを少なくすることができる。
The radiation ratio of high frequency energy can be adjusted, and the heating strip f'1
One of the most practical turntables even if the table changes! 1!
It is possible to reduce heating unevenness in the radial direction.

円周方向の加熱むらはター/テーブル5の回転移動如よ
り少なくすることができるのけいうまでもなり0 さらに、背の高いコンブや牛乳ビ/に入れた牛乳や、背
の高い徳利に入れた酒の場合は上下方向の加熱むらが住
し易いが、4彼管2の先端と加熱室3の側壁との距離A
を′調節して、高周波放射L〕6の真丁に上記牛乳や酒
が己ないようにすることにより十ド方向の加熱むらを少
なくすることができる。そのためには、前板って高周波
放射ロアをできるだけ加熱室ろの端部に近刊けておけば
よい。
It goes without saying that heating unevenness in the circumferential direction can be reduced by rotating the tar/table 5. Furthermore, it is possible to reduce the heating unevenness in the circumferential direction by rotating the tar/table 5. Furthermore, it is possible to reduce the heating unevenness in the circumferential direction by rotating the tar/table 5. In the case of sake, uneven heating tends to occur in the vertical direction, but the distance A between the tip of the pipe 2 and the side wall of the heating chamber 3
It is possible to reduce heating unevenness in the 10-degree direction by adjusting 1 to prevent the milk or alcohol from being present in the center of the high-frequency radiation L6. To do this, the front plate or high-frequency radiation lower should be placed as close to the end of the heating chamber as possible.

以上のように1本発明によると、一方の高周波放射I」
を導波管の先端部とし、他方の高周波放射L1を加熱室
の端部近傍とし7がっ両高周波放射口の大きさを違えて
高周波放射エネルギーの比率を調節しているので、ター
ンテーブル士の半径方向。
As described above, according to the present invention, one high frequency radiation I'
is the tip of the waveguide, and the other high-frequency radiation L1 is near the end of the heating chamber.The sizes of both high-frequency radiation ports are adjusted to adjust the ratio of high-frequency radiant energy. radial direction.

円周方向および背の高い被加熱物の上下方向の加熱むら
が少ない実用的な高周波加熱装置を提供でき、かつ加熱
むら改@に要する人手や期間を低減でき、実施する効果
は犬なるものがある。
It is possible to provide a practical high-frequency heating device that reduces heating unevenness in the circumferential direction and the vertical direction of tall objects to be heated, and can reduce the manpower and time required to improve heating unevenness, and the effect of implementing it is amazing. be.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の高周波加熱装置4の一実施例を示す要
部断面略図で、第2図は第1図のXY方向から見た上面
図である。 1 高周波発振器、  2・導波管。 3・・加熱室、     4・・・被加熱物。 5 ・ターンテーブル、6,7・・高周波放射口。 出願人  日立熱器具株式会社
FIG. 1 is a schematic cross-sectional view of a main part showing one embodiment of the high-frequency heating device 4 of the present invention, and FIG. 2 is a top view as seen from the XY direction of FIG. 1. 1. High frequency oscillator, 2. Waveguide. 3...Heating chamber, 4...Object to be heated. 5 ・Turntable, 6, 7...High frequency radiation port. Applicant: Hitachi Thermal Appliances Co., Ltd.

Claims (1)

【特許請求の範囲】 高周波エネルギーを発生する高周波発振器(1)と。 この高周波発振器(1)を加熱室(3)に連結する4彼
管(2)と、被加熱物(4)を回転移動させるターンテ
ーブル(5)とを侃1えた高周波加熱装置において、導
波管(2)と加熱室(3)との結合部に2個の高周波放
射口(6)。 (7)を設け、一方の高周波放射口(6)の位置を導波
性(2)の先端部とし、もう一方の高周波放射口(7)
の位置を加熱室(3)の端部近傍とし、かつ上記高周波
放射口(6)、(7)の大きさを違えたことを特徴とす
る高周波加熱装置。
[Claims] A high frequency oscillator (1) that generates high frequency energy. In a high-frequency heating device that includes a four-way tube (2) that connects the high-frequency oscillator (1) to a heating chamber (3) and a turntable (5) that rotates the object to be heated (4), a waveguide is used. Two high frequency radiation ports (6) at the joint between the tube (2) and the heating chamber (3). (7), one high frequency radiation port (6) is positioned at the tip of the waveguide (2), and the other high frequency radiation port (7) is located at the tip of the waveguide (2).
is located near the end of the heating chamber (3), and the high-frequency radiation ports (6) and (7) have different sizes.
JP6395283A 1983-04-12 1983-04-12 High frequency heater Granted JPS59189585A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6395283A JPS59189585A (en) 1983-04-12 1983-04-12 High frequency heater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6395283A JPS59189585A (en) 1983-04-12 1983-04-12 High frequency heater

Publications (2)

Publication Number Publication Date
JPS59189585A true JPS59189585A (en) 1984-10-27
JPH0129313B2 JPH0129313B2 (en) 1989-06-09

Family

ID=13244167

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6395283A Granted JPS59189585A (en) 1983-04-12 1983-04-12 High frequency heater

Country Status (1)

Country Link
JP (1) JPS59189585A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54151944U (en) * 1978-04-13 1979-10-22
JPS54167448U (en) * 1978-05-17 1979-11-26

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54151944U (en) * 1978-04-13 1979-10-22
JPS54167448U (en) * 1978-05-17 1979-11-26

Also Published As

Publication number Publication date
JPH0129313B2 (en) 1989-06-09

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